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I want to measure the electrons effective mass, concentration, and mobility in an AlAs/InGaAs quantum well on an InP substrate. Is there a book or guide on designing a Hall bar for such measurements?
My main uncertainties concern the following points:
  • Do I need to etch through the top layers to access the QW? If so, should I stop at the top barrier or reach the well itself?
  • Should the metallization cover only the top surface of the QW, or should it extend to the sidewalls as well?
I have found some papers on this topic, but they do not provide detailed fabrication procedures.
For reference, the epitaxial structure is as follows:
  • In₀.₈Ga₀.₂As cap (doped)
  • LM-InGaAs (doped)
  • LM-InGaAs (undoped)
  • AlAs
  • In₀.₈Ga₀.₂As
  • AlAs
  • LM-InGaAs (undoped)
  • LM-InGaAs (doped)
  • InP substrate"**
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Etching to Access the Quantum Well
Typically, the quantum well should remain intact, and you should not etch down to the well itself.
You need to etch through the top doped layers to define the Hall bar structure but stop at the upper undoped layer or barrier layer. This ensures that the QW remains undisturbed while still allowing electrical access.
If your top layers are too thick, you may need to thin them down selectively for optimal contacts, but excessive etching can damage the QW.
Ohmic Contact Metallization
The metallization should form low-resistance ohmic contacts to the QW electrons. This generally means:Alloyed contacts (e.g., AuGeNi followed by annealing) that diffuse slightly into the structure to reach the 2DEG. Deposition directly onto the doped InGaAs cap layer is usually sufficient, as it allows for carrier tunneling into the QW. Some studies employ deep contacts where the metallization extends into etched regions (e.g., recess etching down to or near the top barrier). Sidewall coverage is generally not necessary unless lateral conduction issues arise.
Hall Bar Geometry and Fabrication Steps
The Hall bar should be designed with well-defined contacts for longitudinal and transverse resistance measurements.
Standard fabrication steps include:Optical or e-beam lithography to define the Hall bar pattern. Wet or dry etching to remove unwanted material (typically using selective etchants for InGaAs and AlAs). Ohmic contact deposition (AuGeNi, Ti/Pt/Au, or similar) and annealing to achieve good electrical connectivity. Dielectric passivation (e.g., SiO₂ or Si₃N₄) if needed for device stability. Metal interconnects and bonding pads for measurements.
References and Guides
S. Datta, Electronic Transport in Mesoscopic Systems (1995) S.M. Sze, Semiconductor Devices: Physics and Technology (2012). "Physics of Low-Dimensional Semiconductor Structures" by J.H. Davies
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I am working on a project using Sentaurus TCAD to design a Silicon and Silicon-Germanium quantum well structure. Below is the physics configuration I have implemented:
Physics(Region = "R.emitterl1") {
HeteroInterface
}
physics(Region = "R.qbl1") {
HeteroInterface
Active(Type=QuantumWell)
QWLocal(
eDensityCorrection
hDensityCorrection
)
}
Physics(Region = "R.emitterl2") {
HeteroInterface
}
physics(Region = "R.qbl2") {
HeteroInterface
Active(Type=QuantumWell)
QWLocal(
eDensityCorrection
hDensityCorrection
)
}
Physics(Region = "R.emitterl3") {
HeteroInterface
}
I encounter the following error when selecting materials via the "include material" function:
“Regions adjacent to an active quantum well region must be semiconductor, and the keyword HeteroInterface must be specified in the physics section.”
Could you please assist me in resolving this issue? Specifically, I need guidance on:
  1. Properly defining the quantum well for Silicon and Silicon-Germanium.
  2. Correctly setting up the material properties to avoid this error.
Thank you in advance for your support. I appreciate any insights or documentation references that can help address this problem.
Best regards,
Yuan
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Many thanks
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I'm making quantum well with 2 different bandgap materials, but I'm not sure quantum confinement effect was occurred because the well width is ~ 60 nm.
How can I make sure that effect? Is there any technique or equipment (for example, PL) to measure quantume confinement?
Thank you.
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Kuantum kuyusu için sonlu veya sonsuz kuyu olup olmadığına bakılır. x, y ve z sınır koşulları ile enerji hesaplanır. Kuyu genişliği hangi koordinatlar üzerinde ise o koordinatların enerjisi hesaplanır. Sonsuz kuyu için x ekseni üzerindeki enerji, sonlu kuyu için x, y, z düzlemi için sınır koşulları sağlanır ve enerji hesaplanır. Kuantum hapsetme etkisini ölçmek için kuyudaki enerjiyi ölçmek gerekiyor.
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Hello everyone ,
for a layered quantum well, does the addition of layers in the quantum well increases its depth.
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Katmanlı bir kuantum kuyusuna katman eklemek kuyunun derinliğini arttırır. Kuantum kuyusunun x, y ve z bileşenlerinin özellikleri değişir. Kuyuda farklı fiziksel ve kimyasal olaylar gerçekleşir. Kuyuya gelen ışınların gelme açısı, yansıma açısı, dalga boyu, frekansı ve enerjisi değişir.
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What is the highest EQE ever achieved by a light-emitting diode containing a multiple quantum well structure? I'm looking for record values achieved for different colours / wavelength regions (red, green, blue, UV, IR).
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Up until recently, the highest EQE achieved for various types of Quantum Well LEDs was:
  1. Single Quantum Well (SQW) LED: EQE in the range of 30-40%.
  2. Double Quantum Well (DQW) LED: EQE in the range of 40-50%.
  3. Multiple Quantum Well (MQW) LED: EQE in the range of 50-70% or higher.
However, it's important to note that these values can vary depending on the specific materials used, the design of the quantum well structure, and the fabrication techniques employed. Research and development in this field continue to push the boundaries of efficiency.
For the most up-to-date and accurate information, I recommend checking recent scientific literature, conference proceedings, and industry reports on quantum well LED advancements.
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I am trying to simulate a Single Quantum Well green LED using Silvaco. I want to see the effect of adding an insulator to the sidewall of the structure. However, when I do that, the current in I-V characteristics increases by 1 order of magnitude and I can observe a band bending in the insulator and the semiconductor. How do I resolve this issue to obtain a reasonable band diagram after adding insulator?
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passivation不是影响LED性的根本原因。上面的答案说的对,应该调整侧壁表面层的缺陷、复合系数等。
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We have fabricated free-standing monolayer MoS2 (0.8 nm thickness). The surrounding medium(both side) are air (insulating in nature). The monolayer MoS2 has a band gap of 1.8 eV. It is a kind of double heterostructure condition.
Therefore, Is it correct to consider that a free-standing structure is a quantum well or not?
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I found its answer.
We cant tell the structure as quantum well as it does not fulfil the criteria of a quantum well.
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I would like to study the interaction of intense light with quantum wells and wires. I would appreciate it if you inform me which software you use.
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You can use Ansys Lumerical commercial software for your study.
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Dear All,
I need experimental researches that explain the tradeoff between short circuit current and open circuit voltage when we increase the number of QW, or width.
Thanks in advance
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What substrate should be used and what materials should be used for quantum well etc.
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depending on calculate the rate
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I am able to solve the Schrodinger Equation of AlGaAs-GaAs Single Quantum well for eigenvalue study. Please suggest how to simulate for Schrodinger-Poisson equation self consistently in COMSOL
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Dear Ajit:
You can benefit from this valuable Link, about your topic at:
Also this one:
I hope it will be helpful...
Best wishes...
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I am trying to use k.p theory to calculate bandgap of range of nanowire diameters. Can someone show me any example file in Matlab or script in any other language? Also if someone can suggest book for the beginning user? 
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Please check the following reference for a general picture with an 8 times 8 hamiltonian and how to calculate the matrix elements in the case we use the term k.p in semiconductors, it is instructive:
  • Evaluation of matrix elements of the 8×8 k⋅p Hamiltonian with k-dependent spin-orbit contributions for the zinc-blende structure of GaAs by T. E. Ostromek Phys. Rev. B 54, 14467, 1996.
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I am looking for the deepest quantum well created by semiconductors bands offset in heterostructures. Would greatly appreciate any help!
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If the combinations are limited within the inorganic semiconductors, it is not very practical to achieve a bandgap shift over 500 meV, due to various limitations, such as lattice mismatch, as mentioned above. However, some organic-inorganic hybrids can achieve much stronger "quantum confinement" effects with a bandgap shift over 1 eV, and more interestingly near perfect crystal structures. See this paper:
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I would like someone to guide me to simulate a quantum well solar cell based on SiGe / Si. If I find this silvaco code example it will really help me a lot
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Hi.
I am trying to simulate a 10 QW hetero-structure in Silvaco Atlas. I am trying to extract the following parameters of the quantum wells -
  1. Bound state energies
  2. Photon absorption rate
  3. Electron quantum potential
If anybody has extracted above parameters from the simulations of MQW structure, then please let me the models in Silvaco which are useful.
Thanks
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Dear Sp Prabhu ,
To solve your problem of multiple quantum well characterization using SILVACO please follow the example given in link:https://silvaco.com/examples/tcad/section14/example5/index.html
If you could draw the energy level diagram you can define the quantum barriers and wells of the structure that is the width and the height and the width of the barriers and wells.
By solving the Schrodinger equation you can get the bound sate. To can also get the density of sates as well as the absorption coeffect
Best wishes.
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Hi ,
this is a basic question which came to mind..
Can we have the well material and the bulk(host) material same and different material for barrier ? If we have Type-1 band structure and lower bandgaps for well, higher bandgaps barriers, then will there be any real problem implementing this structure ? In text books/references, I find the barrier and the bulk material are same and different material for same.
Thanks
Prabhu
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Dear Sp Prabhu ,
Hope you are well!
You can use the same material for the host and the well. As an example you can form wells by differently doping the the layers of the material. Say you can start with heavily doped material and then deposit on it low doped material and then alternate such structure. One possible solution is n++ n- n++ n- n++
This is called superlattice structure.
It can also be formed by alternating wide gap material with narrow bandgap materials. The narrow gap material will be act as wells in the conduction band and in valence band.
So, the quantum well structures can be made either from homo or heterostructures.
Normally the quantum wells in optoelectronic devices are build from herero structures by bandgap engineering of compound semiconductors.
Best wishes
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I was trying to build a quantum well structure using ATLAS TCAD where in barrier and well material need to be repeated many times, say 50 times. What I thought is defining a material for barrier and well, grouping them and repeating them through programming ( in lines of "for loop in HLL"). Is this idea possible Silvaco ? Please let me know if anybody has done similar work/code.
Thanks
Prabhu
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Thank you very much Dmitri Arteev
--Prabhu
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Hello!
I'm trying to modulate the electron density in a thin layer of InGaAs highly doped (25nm, 1e19cm-3 n-doped) using field effect with a MOS-like structure, but for the moment, I can only change about 1e17cm-3 of the free electron density (Hall effect measurement) when I apply a +/-4V gate voltage.
Our computation using 1D-Poisson code '(Sneider's one) shows a much larger modulation (about 5e18cm-3). We are not sure what was not taken into account in the computation.
Is this feasible to modulate such large electron density? I'm searching in the literature but I haven't found any study about this. In MOS transistor I saw doping levels of 1e17cm-3 but not as high as what I'm studying.
Thanks!
N. LE-Tuan
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From the first glance, the higher is the equilibrium density of free carriers, the shorter is the Debye screening length of the gate voltage. It might happened it's a great deal different as compared to 25 nm. Just a thought aloud.
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I am writing a program for quantum well simulation. To increase the no. of wells i have come across a statement MQW in SILVACO ATLAS. If i use i am getting error or the simulation getting inturrepted. Can anyone please guide me through this.
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The fact that , electron can have only discrete energy level is obtained by solving schrodinger equation with boundary conditions, which is a mathematical derivation .
Physically, What makes the electron possess only certain energies ?
Or is there any physical insight or explanation or physical intution which can arrive at same conclusion(without math) that electron can have only discrete energy levels inside potential well
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When the electron's energy can take only certain values this just means that the states that would correspond to the other values don't exist, under those circumstances. These circumstances are described by the boundary conditions imposed, that are part of the physical description, too.
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In solar cell applications I need to model PN junction, In lumerical's FDTD we can create new material in material database, there we can make any material with desired np density (electron hole density), but after that my simulation diverges due to material gain I suppose. 
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you can use solar cell analysis provided at analysis group library to generated charge carrier in respect to illuminated source, however I suppose that's not your problem, as far as I know, there is no direct way to perform doping to materials, FDTD knows material only with their index, you can look for your doped material permittivity then import that data to FDTD, at the Device module you can simply perform a doped material for electrical matters.
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Dear all:
I am currently working on nanostructured solar cells simulation. I study analytically the impact of nanostructures such as quantum wells and quantum dots on solar cells, but I also want to learn about and use other free software to performe numerical simulations on nanostructured solar cells and for comparison. Please, in your experience can you recommend me any potential free sofware to performe numerical calculations on the impact of nanostructures on solar cells (in particular inorganic solar cells) based on quantum mechanics and semiconductor physics? Is it there any free of charge software or all are for paid? If so, please can you help me with links to access the sofware? How much does non-free software approximately cost? Thank you very much for your kind response in advance!
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Dear Maykel Courel,
The following article may help you,
Recent progress on quantum dot solar cells: A review
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I am working on III Nitride multi-quantum well light-emitting diodes using Crosslight APSYS. Here I would like to extract the electron and hole wave functions, Can anyone please suggest how to extract it?
Thanks in advance.
Regards,
Ravi
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Dear Ravi,
I would like to give a conceptual answer as a proposal.
The electronic states in the one dimensional quantum well and the wave functions are well known and can be found in the literature in case of infinite well and infinite well. In both cases there is analytical solutions and you can utilize them to solve your problem.
Best wishes
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I want to calculate the QWSC performance. The problem encountered is how to introduce the Quantum well in the structure . Can anyone suggest to me how can I simulate QWSC without any problem? Thank You!!
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Thank you Muhammad Hamza El-Saba, Aparna Sathya Murthy and Zia Hameed .
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The development of quantum well solar cells QWSCs (Quantum Well Solar
Cells) has generated a great deal of interest. These configurations have shown good
promise to optimize the conversion efficiency of current solar cells because of the
high rate of absorption losses present in them.
I need a help in this point : How to introduce the quantum well in CIGS absorber part, using silvaco software?
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Dear Idris,
you can introduce the quantum well in the solar cell structures by building it from layers of alternating high low material. Where high and low stands for low and high bandgap respectively. Physically you can change the bandgap by changing the mixing ratio of the material.
As an example please see the paper in the link:
Best wishes
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I have read that, from broadening of the peak the existence of defects is realised. Is it right? If so, I want to know the reasons of broadening.
Formation of quantum well is a reason I have found. How quantum well is related to defects?
Thanks in advance.
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Dear Mahfuz,
welcome!
The recombination generation phenomena is well described and well understood.
Semiconductors absorb light with specific energies and generate electron hole pairs. The generated electron hole pairs if not extracted from the material, they will recombine. There are some recombination mechanisms showing how the electrons loose their energy to recombine with holes. One of the very effective recombination mechanisms is the Shockley Read Hall where the electrons are captured by traps in the energy gap and then fall from the trap in a hole in the valence band. These traps are called recombination centers. As their density increases the recombination rate will increase.
So, the existence of the defects which act as recombination centers will lead to in the rapid decay of the PL.
I would like that you refer to the book:
Best wishes
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I am trying to simulate the thermal resistance of an AlGaN/GaN based laser. Mainly, I want to see the temperature profile of the assymetric design of the paper in the attachment (Arafin et al 2019). The device consist of three quantum wells each having 20 nm thickness. Pumping 1.5 W of electrical power (10e16 W/m3), I see there is a temperature rise of around 14K. So the thermal resistance was found to be 9 K/W. Can anyone tell me what is the typical thermal resistance of this kind of devices? Thanks!
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Thank you very much Alex. Sounds awesome!
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Dear frnds,
From my point of view SSB is happening due to following reasons in double quantum wells.
1. Due to variational technique
2. symmetry in envelop function and inherent asymmetry impurity wave function
3. self-consistent calculation of Coulomb interaction.
Kindly give reasons beyond this.
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From examples of double wells arising say in Chemistry,
as well as the simplest matrix calculations that can be made
in the quantum, the answer is relatively simple, that there are two energy levels that emerge, the bonding and antibonding.
I dont see any symmetry breaking in this refered to left-right with symmetric or anti symmetric wave function respectively.
The probabiity of stay in each well is equal, for a balanced double well.
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In addition to the width of the well, there is still planar size.
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Many thanks for the answer.
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Among different shapes of well, which is the most suited well in terms of efficiency
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Theoretically speaking the quantum well may be in the shape of a rectangular well
sandwiched between an n-type electron emitter with the conduction band edge lying above that of the well with sufficient energy to prevent the back injection of the electrons and p-type material with valence band edge lower than that of the well such that the holes will be injected easily in the well from the p-type emitter.
Also the difference in the valence band edges must be high enough to reduce back injection. The LED is constructed by double injection structure into a middle well. It is so that when the electrons and holes are injected in the well they will be trapped there and confined into well.
Best wishes
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Since quantum well lasers are made up with heterostructures is there any chance of a photon to be emitted with a different energy of the one related to the well bandgap? I mean the energy of the bandgap of the semiconductor without the well.
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In a quantum well laser, states are quantized in the conduction and valence bands. Therefore, the transition energy will be greater than the bandgap of the material.
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Dear Researchers,
What is the effective mass of electron and hole of InxGa1-xN and does the effective mass depends on the indium mole fraction x?
and Does it also depends on the thickness of the quantum well of InGaN in InGaN\GaN MQW structure?
Thank you.
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Dear Dhanu Chettri,
I suspect you are looking into wurtite GaN. In this case, what the colleagues recommended is not fully state-of-the-art. For GaN, we did measure effective electron masses:
For InGaN, you will have to interpolate towards smaller values however, for small In mole fractions (approx. <20%) the effective mass of pure GaN does work well as an approximation.
Electron masses are not dependent on well thickness but weakly on strain:
Hole masses are a completely different story. They should be described by Luttinger-like parameters which are again not dependent on well thickness but the derived masses are very sensitive to strain. Those Luttinger-like or valence band parameters are not easily available experimentally, you'll have to use theoretical values.
Regards,
Martin
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Dear Researchers,
I need to study the 14 band k.p model for which I need Heavy hole energy, Spin orbit Split off energy, coupling parameter of Al in AlGaAs/GaAs quantum well.
Thank You
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Look up this reference
"Band parameters for III–V compound semiconductors and their alloys",
I Vurgaftman, JR Meyer, LR Ram-Mohan, Journal of Applied Physics, vol. 89, pg. 5815 (2001)
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The MQW is (GaAs/AlAs) on GaAs substrate?
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.
if you mean absorption with perpendicular incidence, the first reference above gives you the necessary steps to remove the GaAs substrate (polishing, selective etching of the substrate)
it is much easier to perform these steps if your sample includes a stop-etch layer at the bottom (typically, a not too low Al, half a micron thick GaAlAs layer between substrate and MQWs)
.
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Dear Researchers,
I getting a convergence problem while simulating InGaN/GaN multiple quantum well solar cell. How can I solve it?
Note: The problem occur when I add quantum well region, without quantum well region the code runs fine.
Also I have adjusted the mesh so there is no problem in messing I guess,
additionally I use GUMMEL and NEWTON numerical technique. Any suggestion how to remove the convergence issue?
UPDATE:
When I remover calculated valued of permittivity and affinity from the code there is no convergence.
But adding this value gives rise to convergence. why is that?
Thank you
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Dear Dhanu,
It is clear that the inclusion of the quantum well caused the problem of convergence.
So, i would propose that you solve for the quantum well alone with simplified boundary conditions. Then you will get feeling how to adjust the simulation parameters of the well to get fast convergence.
It seems that the device simulator solves the quantum mechanical equations in the well region while solving the semicondcutor equations in the other pin device region. You can also, treat the well from the macroscopic point of view after undermining its macroscopic parameters.
You can also try to change the dimensions of the well , it may relax the problem and leads to convergence.
My opinion is to make physical changes to facilitate the mathematical problem!!!
Best wishes
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I am studying diffusion of electron spins under different optical excitation conditions for some compound semiconductors quantum well.
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Thank you Alessandro Surrente for these links, they will be of great help.
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Is there some methods to measure electrons temperature in a quantum well, other than PL?
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dear colleague
you can try the thermoluminescence that can be useful but be careful this can damage your structure.. send me the exact structure i would help you .
best regards
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I have seen many authors introduce the Dresselhaus contribution after averaging over the growth direction of a confining quantum well or wetting layer, thus giving the linear expression and a cubic (the latter often being neglected). However, in a dot, there is also quantum confinement in the x-y directions. Whilst this may not be so tightly confined as in the z direction, it is of the same order as a typical quantum well width or less, so shouldn't one also average the Dresselhaus Hamiltonian over these lateral dimensions?
If this were carried out, though, the Dresselhaus term would disappear altogether (since <kx> = <ky> = 0). This does seem to be implied by some authors, who only consider the Rashba term. So far, though, I have not seen any explicit comments to the effect that the Dresselhaus term disappears. I was wondering if there is an issue here and if so, is there a general consensus?
Martin Vaughan
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I have addressed this question in the working paper "Model expressions for the spin-orbit interaction and phonon-mediated spin dynamics in quantum dots", DOI: 10.13140/RG.2.2.12936.52486, added to the project "Spin Space", in which the spin space iteration is directly coupled to the quantum dot states.
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In the literature there are many investigations and results on PL spectroscopy for thin films and quantum wells. But if I need the exact band gap of thick  film, for example InGaAsN alloys with nonuniform structure or constituent concentration in depth, is the Pl useful?
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Short answer: Yes, the PL peak can be used to roughly determine the band gap of most semiconductors, regardless of the penetration depth, but the signal level may be hard to detect depending on the material stack design/thickness.  The proper way to find the band gap this is absorption spectroscopy...but not everyone has this setup ready to go.
PL arises from electron and hole recombination, and these carriers will relax to the lowest conduction band and highest valence band.  In some semiconductors at some temperatures, the exciton binding energy will keep the electron and holes together at a slightly higher energy before recombination, but I think in your case its a minor effect ~10 meV vs about~1eV, right?  This broad response is the real response.  If the absorption is mainly in the surface layers, the bottom layers are unaffected ,you need a laser that can go through the top layers and be absorbed by the lower layers.  You can also cleave the sample and do PL from the side to expose these layers as well. 
If the band gaps of the surface layers are larger than the emitted light of the lower layers, then it helps as you won't have re-absorption into these surface layers.  If the band gap of these surface layers is small, they'll absorb all your PL before you can collect it.
Hope that helps.
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Can any one suggest me where can I get the e-book of 'Wave mechanics of electrons in metal' by Stainley Raimes ?
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There are some hard-copies available in university library but I also didn't find the soft copy of it 
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What methods can be used to model mathematically this problem.
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As, interface states in CdS/ CIGS in hetero junction solar cells, reduces the minority carrier life time, it can be modeled by SRH recombination mechanism. 
I think it in this way.
Surface states ---- increasing recombination---- lower minority carrier life time--- reduces the collection probability of minority carriers (practical situation) 
If we reduce SRH life time, it will reduce the collection probability mathematically. (modeling) 
You can solve drift diffusion and Poisson's equation simultaneously to solve this kind of problems.
The reference given below can help you to model this kind of solar cell numerically. 
I modeled CZTS/CdS in that way. I am attaching my publication as well :) 
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Any detailed physical explanation would be highly appreciated.
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Hi,
For interband-transition light-emitting devices the wells are 7.5-10 nm-thick and the barriers are typically 10 nm-thick. However, for intersubband-transitions devices, so -called quantum cascade lasers, the wells vary between 0.7 and 4 nm with the barriers varying between 1 and 4 nm. That's because in that case coupling between wells is necessary.
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Hello, 
I am currently working on the k.p method, and more specifically the application of this method, for the calculation of electronic bands in quantum well structure. 
I would like to use finite difference method for my calculation on matlab software, unfortunately I am a newbie in this technique. I think I can generate the code to create the discretized hamiltonian but I don't know how to resolve it and treat the eigenvalues. 
Does anyone have a detail algorithm, or some article related to the problem ? 
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simply start with transient diffusion equation and you will find lots of discretization available for the diffusion equation. And also the analytical solution of transient diffusion equation is available. Then compare your numerical results from finite difference and you will understand the finite difference and hot it works!  then go and solve the Hamiltonian equation.
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There are different numerical methods to solve the k.p Hamiltonian for multi quantum well structures such as the ultimate method which is based on a quadrature method (e.g. doi: 10.1016/0039-6028(94)90904-0), or one based on a finite-different method (e.g. doi: 10.1063/1.342118). In both, so-called spurious solutions can emerge and different methods exist to eliminate them (e.g. doi: 10.1063/1.3689821). However, I am searching for a comprehensive overview of the different numerical models and solutions regarding the spurious solutions to find advice on which numerical model and solution should be preferred.
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Dear Phillips,
                 As far as quantum well is concern the fundamental finite difference scheme is useful. Once we involve the non-parabolicity factor, mismatches in material parameters and some peculier dielectric functions, once can get apparent answers from it.
                The problem which i am facing is the grid points setting. It directly affects the results over few magnitude.
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Are they same? I read some of the post in RG regarding this question but didn't get a clear idea. 
Thank you for your time. 
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Yes. Basic level of the energy in temperature near 0 K we can describe by Electrochemical potential (area of chemistry for example  analytical chemistry but not only)  or Fermi level if you consider physical properties of matter.
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electronic band gap from optical band gap
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to A. Ali: please refer to this previous post. You'll understand the difference between the "electronic" and "optical" bandgap.
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Dear Researchers and seniors
For example, if I am creating a bulk heterojunction of an organic material (pentacene) and PbS quantum dots, what are the key points that i should be looking out for? how can i know if it is even possile to mix those two?
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In most cases you choose two materials with different electrical properties such a hole- and electron-type conductivity. Since you need to have continuous path from the interface of these to materials up to the electrode of your device (to inject or to extract charges), these two materials cannot make homogeneous blend. Hence ,you need certain phase separation to conduct the charges and this is possible only if these two materials are not fully miscible. Of course, the phase separation depends on many parameters such as mixing ratio and you need to find proper ratio to increase the Gibbs free energy (representing energetically favorable phase separation).
I am not sure about the size you have available; however, the size must be greatly smaller than the film thickness. In addition, the energy levels of quantum dots gretly depend on the nanoparticle size, so you need to keep in mind the energy band diagrams of both materials you will use in the experiment.
The required concentration mostly depends on the deposition technique you will use (spin-coating, dip-casting, Dr. Blade technique, etc), this cannot be judged so easily in general way. Nevertheless, the concentration will be probably at the level of 1 w% or more.
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Seen from the attached pictuire.
Based on bandgap requirement, Ic1=Ic2.
Because Ic2 and Ic3 are in series--> Ic2=Ic3
Because of size ratio n, Ic4=n*Ic3
So Ic4=n*Ic1
But Ic4 and Ic1 are in series, Ic4 should be equal to Ic1. It conflicts with Ic4=n*Ic1.
Where is my error in this above deduction? I'm puzzled about it.
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As Aparna Sathya Murthy points out, your notation is poorly specified and confusing.  Are IC3, IC4 collector currents of Q3, Q4 or emitter currents as shown in your diagram?
What are IS, IS1, IS2, IS3, IS4, V?  These are not labelled on the diagram.  Is there any external current into the connection to Q4 collector and the resistor attached to Q1 collector?. 
Why do you assume IC1 = IC2 ?
In your circuit diagram, there is no bias current to the bases of either of the two PNP bipolar transistors, Q3 or Q4, so collector currents from both these transistors will be at leakage levels and very small.
For a PNP current mirror, you should connect bases Q3 and Q4 to collectors of Q4 and Q2.  In this case VBE1 = VBE2 + RE2 IE2, where RE2 is the emitter resistor and IE2 the emitter current of Q2.
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I have read several papers and books from Professor Tapan, I have seen that he is almost devoted to spectral methods. I was wondering the type of technique for work. Will this based on spectral methods too or FD/FV methods. ?
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The spectral methods are indeed very accurate, however, the observations provided in the note by Moin and Verzicco are the main reason why these methods are not useful in complex geometries with the multi physics and chemistry problems.
There are numerous trends emerging based on the combination of the finite element/finite volume schemes with exponential techniques for time stepping; they were tested recently in many disciplines including meteorology. Methods of this class provide flexibility, mathematical precision and efficiency due to the use of the Krylov space projection methods.
Considering the fact that these methods are well suited for use with the massively parallel computer architectures I expect that they will dominate the field of large scale computing in the near future.
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Im looking to extract the quantification energy band of quantum wells from Silvaco Atlas, can help me to do it please?
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lik this 
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Somebody show me how i can extract and plotting the transitions energies of quantum dots structure using silvaco please
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Salam, Well u can calculate it from the energy band diagram which is can extracted from the structure image provided by silvaco
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I am trying to extract the real and imaginary dielectric constant for a 2D semiconductor with alternating layers of high and low dielectric (a quantum well material). I am using a Wollam Ellipsometer with their software and cannot produce a meaningful fit for the raw data. 
Are there any tricks towards finding the correct model? Also, I have a general idea of what the dielectric constant should be for each layer (6.1 and 2.1) and the models I've produced are not where close to that. 
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When you are trying to obtain dielectric constants of a material it is often necessary to make a simplified sample. Ideally you should make single layer samples of each material in the quantum well stack with thicknesses greater than 1000 angstroms. From these single layer samples you can obtain accurate dielectric constants for each material. Once you have determined the dielectric constants you can go back to the quantum well stack and do more in-depth studies of the stack.  
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How to use non parabolic band approximation for the analysis of interband effects of electrons for plasmonic device application?
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For a device application, you need the dielectric function. The experimental is the best. It includes all quantum effects.
You can calculate it in a model, or you can use a phenomenological  model, for example  describing interband transition with a Lorentz function.
To calculate the dielectric function from the band structure, you need in addition to the structure itself, the matrix elements of transitions between different states. Then calculate the appropriate sum. It is a lot of work to perform for the device application with little result. 
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How does surface electronic properties (i.e band structure, electron affinity and Ionization energy) vary from bulk to nano domain (i.e quantum well, nanorod etc.) and can we get any information of 2DEG formation using XPS or UPS.
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Dear Mishra,
Please find the attached lecture titled "Characterization of solid catalysts 3. XPS" by 
Prof drJ W (Hans) Niemantsverdriet, Schuit Institute of Catalysis
It is a part of his book "Spectroscopy in Catalysis"
Hope this helping
Thanks
Ahmed
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I have a Si p-i-n diode structure with semiconducting iron disilicide quantum wells inside the i-Si layer. The width of the QWs is about 25 nm. Under reverse bias (at the avalanche mode), clear and significant red shift of the photoresponse edge is observed. I suppose that it results from quantum cinfined Stark effect. Next, I want to calculate energy shift of the ground state and compare it with experimental results. One can easily solve it for the case of the infinite quantum wells and weak field regime. In my case, the quantum well is finite and high field is applied.
Could anyone please help me with this situation?
As a starting point I have chosen Article (see attachement).
Applied Field range: 0,2-2,4 MV/m.
m*=0.83 m0(electrones) and 0.21 m0 for holes.
Barriers height is about 0.2 eV
Quantum well width is 25 nm
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You know the potential profile of the QW. Then why not solving the envelope function equation for this potential profile. You will need a numerical procedure for finding the eigenstates of a matrix.  Maybe nextnano3 can help for this.
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nano wire solar cell with kdse  structure.
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I think you should check 3D Device simulator.
Check the below link:
note: I am not sure whether it is possible with 3D Device Simulator or not. But I am suggesting you to check this simulator. I believe it will help you.
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Is there any difference between Surface Optical (SO) and Interface (IF) phonon modes in Raman spectra of Nanostructure and multi quantum wells (MQW), respectively ?
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I fear to be saying the obvious and thus missing the sweet spot of your question...
if you regard a surface as being the "interface to vacuum" then you could put that in the same category.
If on the other hand you would want to make a difference between there being nothing (vacuum -> surface) on one side of the interface, or there bein something on both side (material interface) then you may as well categorize them as different.
Both situations have something in common: the symmetry is reduced with repsect to a continuation of a bulk lattice.
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Im going to take as a example a quantum well (i.e 2DEG). Literature says that motion of electrons is quantised in the vertical direction for a 2DEG, therefore motion in the vertical direction is forbidden. The way I understand this is , if motion in the vertical direction is quantised, it means  the particle can take certain (discrete) energy values in that direction, meaning its k-vector in that direction can take certain values therefore it can move in that direction. I know I am wrong in my reasoning, I just do not know where? Some light please :)
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I think you are looking at a 2D electron gas case. There is no third physical direction here, which is supposedly a vertical one. For convenience of plotting wave functions a third direction may be used which corresponds to amplitude of wave function. Alternatively if you plot eigenvalues of available quantum states (within the well) then a vertical axis may be used to plot energy of that state. As an example zero point energy of a harmonic oscillator is 1/2 hbar w, next available energy is 3/2 hbar w and so on.
Wikipedia shows a plot which tries to put a lot of information at one place in a picture of a 1D well. Here vertical axis corresponds to energy eigenvalues. Shapes of wave functions are also displayed but for the displayed shapes of wave functions, vertical direction is used to plot probability amplitude.
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I got extra peaks in UV-Vis of ZnS nanowires at 500 nm.
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Dear Gawai
Stacking faults change atoms order in the nanocrystal as a result it introduces new energy line levels. If these levels happened to be inside the energy gap the energy gap is reduced in value. If these levels are not inside the gap the gap remains at its value. In either of the cases UV-Vis is changed due to transitions to and from the new energy levels.
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is there literatures or book to understand the complete details about How the 2D electron gas in the Quantum well structure (AlN/GaN) will influence its Raman modes and photoluminescence spectra?
How its band diagram look like?? how these structure will influence its phonon dispersion curves? How it will exactly affects the Raman modes of Quantum well structure?
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I am not sufficiently expert in Raman spectroscopy to answer that part of your question.
Regarding PL, I would expect the emission peak will be broadened and compared to that of PL from a QW that does not contain a 2DEG. ALso, it is possible that the excitonic enhancement of the emission peak will be less too, because of carrier screening effects.
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Can someone provide me any references which report the relative magnitude of the slow decaying component to fast decaying component A2/A1 in a biexponential decay function of the time-resolved photoluminescence measurement for InGaAs/GaAs quantum wells? I would like to know the ratio A2/A1. The quantum wells could be based on homoepitaxy (on GaAs substrates) or heteroepitaxy (e.g. on Si substrates).
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From my research, I see the amplitude of A2 and A1 increse linearly, But the ration between A2 and A1 is not linearly. Could some one let me know there are any relation between A1 and A2 through their ratio? Thanks alot.
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Im looking to know the main difference of using QDs and QWs in a solar cell, and when we can use QDs or QWs
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Quantum dots are small spherical nanoparticles made of semiconductor materials, in which the band gap can be tuned by the size. The larger the diameter of the quantum dots, the smaller the bandgap. We can convert more light to electricity by using a multi-junction of quantum dots.
Quantum well solar cells however mainly discuss about structure. Quantum well is a semiconductor with small bandgap which normally takes place between two relatively wide bandgap semiconductors. This well confines charge carriers to move in 2-dimensions rather than 3 dimensions. It seems that CPV would be the beneficiary of this structure as it easily collect and convert quantized charge carriers into the electricity.
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How to handle tunneling modes and modes which pop-off from the well on applying external field-bending the potential profile. Looking for tunneling and unconfined modes by integrating the wavefunction square in well and surrounding regions while studying QCSE using effective mass model and restricting to lowest two solutions which would be the only significant solutions while operating away from band-edge were used but at the cost of generality. Latter works only for deep wells. Shallow wells will have eigen values popping-out and causing steps in calculated refractive indices or absorption coefficients while band-bending for ex. under external field. Using the continuum solutions is often recommended, I wish to avoid that since it makes the code computationally heavy.
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Give your Hamiltonian in complete form(if you have no reservation).In that case I will suggest how to go ahead.Or you talk to KORSCH,request him to do a MATLAB programme .
                          B.Rath
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I synthesized a nanostructure, ofcourse its dimensions were less than 100 nm. I doped a metal in the semiconductor nanostructure. Then Photoluminescence spectroscopy was carried out at 10 to 100 Kelvin with a step of 10 Kelvin and also at higher temerature. I found some of the peaks which were never reported before. So, I decided to calculate the electron transitions in the nanostructure which might be behaving like quantum well due to its dimensions. So, please let me know, is there any tool, software, mathematical model etc. which can be applied to calculate the band transition of the Doped semiconductor nanostructure, which might be behaving like quantum well?
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If you have heterostructure and some experiance in Matlab calculation you can use my tool for calculating of spontaneous recombination spectrum. If You need some help I'll try to assist You. Regards
Volodymyr Lysak
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Can the k.p method be used to short period superlattice like 1ML InAs/4 ML GaAs?
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Thanks. But how to judge the effective mass we set is proper in each layer?
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i mean to ask, they are what type of states and how they are helped out in quantum well......
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Dear friends,
                     The above discussions are very good for understanding and i wish to add one more point. If you look at the Fermi energy in QWs we used to call that as Quasi-Fermi energy. This can tell you only about the number of carriers in that state; not more than that. So in order to differentiate from the conventional terms we used to add the scientific prefix "Quasi".
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we are working on a simple quantum well simulation (AlGaAs/GaAs) in Sentaurus Device
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The details for the band offsets are well documented in the manual. You may need to look at a couple of the reference papers, especially the paper by Krijn. You can do a search for "band offset" in the manual. 
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The k.p Luttinger Hamiltonian H for bulk semiconductors considering 8 bands (cb, hh, lh, so, each twice spin degenerate) can be found in many publications and text books, all using some different definitions of the wave function at the Gamma-point, but otherwise equivalent. Let us consider the explicit bulk Hamiltonian from this page (http://www.optronicsdesign.com/en/theory/hamiltonian.php), especially the general form Eq. (5).
Next, I like to compute the band structure of quantum wells, using the "ultimate concept" (see http://journals.aps.org/prb/abstract/10.1103/PhysRevB.48.8918). I would like to know how I construct the Hamiltonian for a quantum well from the bulk Hamiltonian. Here is how I understand the approach:
(1) All k.p parameters P get z-dependent P->P(z), for example the Luttinger parameters, the bulk band edges etc.
(2) I have to replace k_z P(z) and k_z^2 P(z) by 1/2[k_z + k_z'] P(k_z-k_z') and k_z k_z' P (k_z-k_z') according to Table I. P(k_z) is the Fourier transform of P(z). The resulting Hamiltonian now depends on k_z-k_z': H=H(k_z-k_z').
(3) I now have to solve the integral equation \int_{-\infty}^\infty dk_z' H(k_z-k_z') \Phi(k_z') = E \Phi(k_z) where \Phi is a spinor containing the different bulk band components of the lattice periodic part of the wave function.
(4) Numerically, I would have to write the integral as a sum, \sum_j dk_z^(j) H(k_z^(i)-k_z^(j)) \Phi(k_z^(j))  = E \Phi(k_z^(i)) and then formulate this as a matrix times a vector, see attached figure (note that a dk should be included in the matrix). In that, a double underline means that it is the bulk 8x8 matrix from step 2, and the single underlined \Phi is a 1x8 vector containing the 8 bulk components of the lattice periodic part of the wave function. So this is a (8*num_k_z)x(8*num_k_z) matrix, when num_k_z the number of k_z points in my numerical grid is.
(5) Solve the eigenvalue problem defined by step 4 for each k_\parallel I like and I should end up with the band structure of the system.
Is this in principle correct or did I miss something?
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Well, I don't think this can help me. Your paper utilizes the finite-difference method instead of the quadrature method used in the paper I have mentioned. That way, you do not have to solve an integral equation. I guess you need to find your envelope functions as a shooting problem solution?
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when we grow semipolar InGaN/GaN MQWs, if we add high temperature capping layer (AlGaN) to the MQWs, then the indium diffusion (desorption) happens. This fact is due to the high indium composition in the QWs (around 570nm). Do you have any ideas to suppress the indium diffusion? or normally (in c-plane or semipolar samples), how to change the growth condition to solve this kind of problem?
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Yes, AlGaN usually grown crystalline at high temperature that temperature In in  InGaN is diffusion prone
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I want to measure I-V curve of an Infrared photodetector under illumination condition but I don't know which photon source to use. Would you please introduce me an appropriate infrared light source (brand and part number) to this aim? By the way, I need a source with wavelength of about 1550 nm.
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The simplest  and cheapest way is to use tungsten filament-lamp (about 200 W in the case of using monochromator-spectrgraph for the spectral dependence of the photoresponse or 100 W or less in the case of the direct incident geometry). All that remains is to callibrate lamp with the power-meter if it is necessary. Inspite of weak efficiency of filament-lamp as a source of the light, in my current expirements with NIR photodetectors characterizing, I was abble to achive several mW of incident light at 1550 nm after the lens, monochromator and filter. If you have some doubts you are welcome to see my last publication. I wish you success in experiments.
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 infrared photodetector
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Hi
Thank you very much
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I mean in the context of light-matter interaction.
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take a look at this publication:
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I would like to know if there is a simple method of calculating the absorption coefficient (alpha at different wavelengths) for a quantum well.
Cordially,
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Hi Abderrahmane,
I just tried and downloaded the attached document without problem from the link at the bottom of my first message to you. Please try again. If this does not work, I'll see if I can upload it as part of my publications, but clearly Research Gate does not account for presentation slides as part of documents that can be posted.
By the way, the works of Prof. Mackillo Kira may also be of interest to you.
Regards,
Henni
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Semiconducting nanoparticles can be classified as QDs, Q wires and Q wells. I have doubt whether this quantum confinement is only in semiconductors. Is this aclassification based on confinement is possible in carbon materials or any conductors or any material other than semiconductors.
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I also agree  with Geetak Gupta.