Masks - Science topic

Hi All!!

I am currently working to get a very small structures (goal is to get 4.5 µm in-diamterer cirlces) with soft lithography.

I am using SU8-3005 (thick 5 µm) and currently I am struggling with getting 4.5 µm circles. Whatever I do the circles come out 12 - 15 µm in diameter.

SU8 protocol

spin: 1250 rpm

soft bake: 3 min @ 95 ˚C

Exposure: 200 mJ/cm2 (229.5s) *** Our system is has energy 11.29. After calculation exposure time should be 26.6s but we've learned that the energy has to be much higher that in the case of small circles***

post exposure bake: 1 min @ 95 ˚C, 7.5 min @ 95 ˚C (tried 2 min @ 95 ˚C and did not changed a thing just started loosing cirles)

Development: 1 min

I would love any advice!

Thank you!

I have a few images for which I will be calculating grey values. I will be using Image J. I know how to do it but there are several drops that need analysis and clicking. I already tried recording in Image J but I was wondering if there's a macro that exists that lets you select the oval ROI and automates the rest- creates a mask to calculate this grey values there. Clicking each drop get tedious and time consuming. Also curious what everyone uses for their analysis.

Hello

When we pattern a mask in a wafer, after exposure we noticed that the length of our patterns in the center of our wafer is thicker in copmarison with edges of it.

What is the reason and the solution.

Thanks for your helps.

Hi researchers,

I need your help as I am not sure if my thoughts are correct regarding the usage of a repeat-masked genome as reference for read mapping and SNP calling. I am not familiar with analyses on a whole genome level and I was wondering if you have good reasons why or why not using a (hard-)masked genome? It will be highly time consuming running it with both genomes.

I thought using a masked genome would reduce the computational power. I map short reads to detect SNPs for Population Genomcis Study (detecting population structure). I have many reads per sample and a 2.4Gbp genome. If I am interested in SNPs does it matter if I cover the repetitive regions? Does is have any effect on the mapping quality? If reads would map to masked regions, but instead map incorrectly to another region, can I filter them out by mapping quality?

Alternatively, I thought about using the non-masked genome but removing the scaffolds that are only repeats (or with other words would be 100% masked in the masked genome).

I appreciate your feedback. What are your thoughts? What would be accepted by Journals?

Have a great evening. I am looking forward to you ideas and arguments.

Julia

The sample is a silicon wafer, as the source of illumination comes close to being perpendicular, the surface is masked by the reflection.

1) How do public perceptions vary regarding environmental impacts of face masks post-COVID-19?

2) What are the global geospatial patterns of facial mask-related pollution?

3) Should disposable face masks be included in Single-use Plastics Prohibition regulations?

Research topic is "Perceptions, Global Scope, and Criteria for the Control of Micro-Plastics Pollution from Disposable Face Masks"

What types of mask designs for metal deposition, to be used in a PVD system, are best suited for perovskite-based solar cells?

I am trying to configure the instrument in Profex but I can't get a chi-squared value below 9.65 for LaB6. This is the configuration of the equipment, which is a Bruker D8 Advance with a Linxeye detector:

_FILEVERSION = 3

_SAMPLE = B6La-reference

_+SAMPLE =

_SITE = ????

_USER = Administrator

_GONIOMETER_CODE = 21

; Goniometer : D8 theta/theta, stage : Unknown

_ATTACHMENTS_CODE = 0

_GONIOMETER_RADIUS = 250

_FIXED_DIVSLIT = 1

_FIXED_SAMPLESLIT = 0

_SOLLER_SLITS = 2

_FIXED_DETSLIT = 13.48

_MONOCHROMATOR = 0

; Incident beam monochromator : None

_SOLLER_SLITS_2 = 2

_THIN_FILM = N

_BETA_FILTER = Y

_FIXED_ANTISLIT = 9.6

_ANALYZER_CODE = 0

; Received beam analyzer : None

_DATEMEASURED = "30-Nov-2023 12:15:31"

_WL_UNIT = A

_WL1 = 1.5406

_WL2 = 1.54439

_WL3 = 1.39222

_WLRATIO = 0.5

_ANODE = Cu

_V4_INF_CREATOR = "XRDWizard"

_V4_INF_CREATOR_VERSION = "V2.9.0.22"

_V4_INF_WIZARD_VERSION = "V2.9.0.22"

_V4_INF_WIZARD_ADDINS = "V2.9.0.22"

_V4_INF_WIZARD_DOCTYPE = "XRD"

_V4_INF_OSUSER = "UniAuto de Queretaro"

_V4_INF_USER = "Administrator"

_V4_INF_SITE = "Mexico"

_V4_INF_SAMPLEID = "B6La-reference"

; Data for range 1

_DRIVE = COUPLED

_STEPTIME = 190

_STEPSIZE = 0.0148742

_STEPMODE = C

_START = 5

_THETA = 2.5

_2THETA = 5

_KHI = 0

_PHI = 0

_X = 0

_Y = 0

_Z = 0

_DETECTOR = 5

; Detector type : Unknown

_DETECTORSLIT = unkn

_AUX1 = 0

_AUX2 = 0

_AUX3 = 0

_TIMESTARTED = 18

_TEMP_RATE = -1

_TEMP_DELAY = -1

_KV = 40

_MA = 40

_RANGE_WL = 1.5406

_3DPLANE = 0

_V4_ADDITIONALDETECTOR = 257

_V4_PSD2THETA = 3.4145

_V4_PSDCHANNEL1 = 0

_V4_PSDAPERTURE = 0.075

_V4_PSDTYPE = 5

_V4_PSDFIXED = 0

_V4_D8_DIBNUM = 1

_V4_DETECTORNAME = Unknown

_V4_TTLDETECTOR = Unknown

_V4_DETECTORTYPE = 9999

_V4_DETECTORFLAGS = 0

_V4_COUNTERS_MASK = 4096

_V4_DRIVES_MASK = 0

_V4_ENCODERS_MASK = 0

_2THETACOUNTS = 1

; 2THETA PSD

To mask cloud cover, the following details are needed:

- Algorithm for Landsat 8 Level 2, Collection 2, Tier 1 data

- The algorithm should be applied to each KML to mask out cloud cover

- Credible sources for the algorithm

I want to analyze some images (nearly 1000) in a loop. I want to analyze HSV and RGB. I have masked those images in ImageJ, which is binary masked. I tried to explore them in R, but all the results came as NA. I also checked those images (some of them) separately in R to determine whether they were correctly masked, and the result was in matrix 0,0,0 1,1,1. But still, the result is NA. I used a chatbot to generate and analyze code. Can anyone suggest any codes and packages?

I want to analyze some images (nearly 1000) in a loop. I want to analyze HSV and RGB. I have masked those images in ImageJ, which is binary masked. I tried to explore them in R, but all the results came as NA. I also checked those images (some of them) separately in R to determine whether they were correctly masked, and the result was in matrix 0,0,0 1,1,1. But still, the result is NA. I used a chatbot to generate and analyze code. Can anyone suggest any codes and packages?

I need some mask for UV photolithography. Can you suggest any software to draw those patterns with proper file format so that directly the file can be inserted and required pattern can be obtained. Note I don't need PowerPoint files though we can design the mask.

I want to deposit gold to form arrays on top of my ITO glass substrate that is spin coated with three layers, namely;TiO2, Perovskite and Spiro-OMeTAD layers. The problem, I don't have have deposition mask to control the pattern of gold to be deposited. can I use aluminum foil to make deposition mask with a special designed pattern for deposition. Is it won't melt during the deposition process in the sputter coater or contaiminate my samples.

I want to deposit gold to form arrays on top of my ITO glass substrate that is spin coated with three layers, namely;TiO2, Perovskite and Spiro-OMeTAD layers. The problem, I don't have have deposition mask to control the pattern of gold to be deposited. can I use aluminum foil to make deposition mask with a special designed pattern for deposition. Is it won't melt during the deposition process in the sputter coater or contaiminate my samples.

Im doing my study and wanted to do forest masking to separate forest from mangrove cover.

I want to design electrode shadow masks for photodetectors .The shadow mask can be made from uncontaminated materials.

We do not have lithography fabrication at my university, so i want to design a shadow mask as a template to fabricate an electrode for a photodetector.

The design is shown in the picture below .

Nanomasks CORO-X

Art of Abstraction of Unified Word and its Concepts (Views, Masks, and Instances): Introduction We discovered over 50 discoveries, 300 innovations, and 100 cognitive knowledge, which generated over 450 questions per unified word to be answered. Every field of Knowledge depends on ABSTRACTIONS. Unfortunately, current abstractors could be doing better regarding the abstraction process and the type of abstractions because they are based mainly on tangibility and ignore other more essential conceptions. Fayad's Art of Abstraction (FAA) supports abstracting over 50 discoveries per word (Noun and noun phrase), 300 innovations, the generation of more than 100 cognitive knowledge, and Great value to the natural languages. The FAA can be used in both application and system developments. As a unique system, every word has more than 50 discoveries, including functional requirements, special non-functional requirements, stable and Unified design, contexts, challenges, constraints, applicability, measurability, and more. FAA led to unified, stable discoveries and included unlimited advantages. 1. Understand and appreciate our natural languages 2. The future of technology depends on these discoveries. 3. Unification of unified domain or unified word analysis of any field of Knowledge 4. Know how to generate stable and unified requirements and the ultimate design of any system. 5. Knowledge Unification 7. Limit and control maintenance problems 8. Explore and create a massive number of new systems 9. Generate better methodologies for developing unified and stable systems 10. Stop reinventing the wheels 11. Develop and executable self-manageable, self-adaptable, self, extendable, and self-configurable systems with unlimited applicability, reuse, and many more.

I have a cylindrical deep-drawn cup. This cup is subjected to cathodic hydrogen charging for a hydrogen embrittlement behaviour study as shown in the figures below.

I wish that the electrolysis only take place at the inner surface of the cylindrical deep-drawn cup where the cup is submerged in the electrolytes during cathodic hydrogen charging.

Any masks or barriers can be used to cover the specific areas where electrolysis needs to be restricted?

Thanks in advance

Netcdf data files of Global Mean Temperature and Outgoing Longwave Radiation are available and the shapefile (polygon) of a state (province) of India is in hand then what is the procedure we must follow in Matlab to extract the Netcdf data file only of the region which lies within the polygon?

Hello everyone!

It is my first time to fabricate InP-based photonic crystal. I've already finished fabricating the photonic crystal using EBL. And now I want to remove the 200nm SiO2 mask from the InGaAsP layer. What kind of solution should I use without damaging the photonic crystal structrue?

I am confused regarding protection of virus by wearing mask. The mask which is hurdle of inhaling of oxygen also. how we protect our selves from virus ?

Dear Sir or Madam,

could you investigate, why with my account i cannot send full-text using your on-line procedure to reply to requests? I'm using Google Chrome from my company site.

Thanks and Best Regards

Francesco Linares

I have only ledit file how to make hard mask for mask aligner. is this possible to do using laser writer or engraver.

how to make pattern?

How to fabricate complex heterostructure-based devices using shadow mask method?

There are many differences between a word and its concepts (Word's Masks)

First: We have a new word classification:

(1) Enduring Business Themes (EBTs) that are enduring, stable, unified, continuous, and ultimate goals, each has a rule of conduct and essential discoveries words—for Example, Friendship, Love, Marriage, Thinking, Retaliation, and others.

(2) Business Objects (BOs) that are Stable internally and adaptable externally; each has a beginning and end, each has an ultimate goal that can be positive or negative, and each has a rule of conducts moderate level) and unknown to all. -- Unfortunately, many people don't know them.

Words. We add "Any" to each BO. For example -- Any Project, Any Proposal, Any Culture, Any Data, any others

(3) Industrial Objects (IOs) or Application Objects (AOs) are tangible and changeable. Unfortunately, and currently building and developing everything based on them. (Disasters), Well-known to most people, Has no value -- The strange thing is people say I love my car or smoking; some have side effects or high impacts on society, such as Oil, Drugs, and other concepts—for example, Specific Novels, Conference Tables, Mac Book, etc.

Concepts of BOs.

(4) EBTs + BOs = Core Knowledge. Our focus is on EBTs, BOs, and Core Knowledge words.

Second: Any word has many concepts (word's masks). Each word has many different concepts based on your education, background, beliefs, agenda, culture, etc.

Third: Any word is stable, and a concept is unstable over time.

Fourth: Any word is unified (Innovation and not known), and a concept is not. For example, any "Account" as a word, a bank account, email account, investment account, and others with different data and knowledge and unify as "an account." with more than 50 innovative keys. Each professional in the various account concepts knows an account's innovative (Creative) keys.

Fifth: Therefore, any word is stable, unified, and ultimate, and the Concepts of a word are changeable over time.

Unfortunately, all your knowledge you know is the concepts of the word "word's masks,"

Word versus Concepts (Masks or views of a word) is a significant volume of three Unified Word Engineering (UWE) volumes.

We are open to debates, discussions, collaborations, and participation in any events related to words and concepts in any field of knowledge.

You may find the word "concept' in most of my writing as a base of my publications to start breaking in the notion of "strong embedded use of concepts without thinking." We will update and rewrite our publication.

Examples:

(1) You don't know the unified word "Debate" and "Debate," as we know them as a concept, has different views, and all of them is not complete.

(2) You don't know the word "Human," which represents all of us, and the Human we understand as a concept has different views. All of them are horror, and it is not valid.

You don't know "Software Engineering and development (SWE)," which should be unified and stable because of all we do in SWE. The SWE, we know as concepts, have different, unlimited, bizarre views. In my 40 years of software engineering experience, I found out everyone (at any University where I worked, for example) knows SWE from all the Faculty, Chairs, Deans, VPs, Evaluators, Reviewers, and others; they don't even know their field of knowledge. Why? Because they know only the view of their field of knowledge, which needs to be completed and contaminated by their notion of knowledge. What I am telling you here caused me a lot of collective injustice. They are gruesome scenarios of the destruction of my career, life, family, freedom, and startups. I will cover all the views that happened to me personally and to my startups in my Documentary books on Collective Injustice.

I am trying to deposit some magneto impedance thin film sandwich structures and I was wondering if I can skip the photolithography step and make use of Kapton tape instead. Let me know if anyone has any experience with using Kapton tape for masks.

I am designing the mask in CleWin software, but how can I know what is the unit (m, nm, um) of the design that I draw.

Hello,

I am trying to etch 2 μm of PECVD SiO2 using a ~4 μm PR mask to create a pattern of 20 * 60 μm. I am using the Oxford ICP-RIE Plasmalab System 100. I have tried multiple recipes, but I have encountered issues such as low selectivity, polymer redeposition, and extremely low etch rates at times. Any suggestions would be greatly appreciated.

Thank you.

Hey All,

My main goal is to measure LFP in the VP. As a first step I try to test my system and just stick an electrode in the brain and see the recording. the noise is very noticeable and pretty much masks everything else.

At the moment we dont have a Faraday cage, I guess I'll make some time soon, but at the moment I'd love to hear ideas how can I overcome this noise

My next step is to unplug every device that is not necessary for recording and see if it will have any effect

I added a picture of the noise in my recording

Thanks in advance

How do semantic segmentation methods (UNet), and instance segmentation methods (mask R-CNN) rely on convolutional operations to learn spatial contextual information?

I'm able to load a dose cloud into python as a numpy ndarray using pynrrd. The next challenge is to extract isodose lines (like V50%) to create masks (bitmap images) that I can overlay onto other images. How can we find the isodose profile and convert this into a bitmap image, or a matrix of 0-1 from the numpy array?

PVDF made mask was taking 6 - 7 times more to reach the 4E-6 mbar than when using stainless steel substrate mask. So is it due to degassing from PVDF and so this should not be used?

Hello everyone,

for a couple of weeks now i try to realize a PCR amplification of DNA extract from coral of the species Pocillopora.sp using ITS2 primer (internal transcribed spacer region 2)

for around 3 weeks now, i keep trying to realise the PCR but fail at getting negative Blanks for absolutly uknown reason.

the last PCR i did today just confuse me at the maximum.

here is the link to it https://drive.google.com/file/d/1kspwqAmiBQ5uAwCFNDg_x8jJa2x90qUq/view?usp=share_link

i won't describe everythink i did but i have been extremely carefull to clean everythink, use mask, lab coat and so on. I also used a laminar hood and placed all the material i used under an UV light for 30 minutes.

the first row of the gel is only blanks. i have prepared a master mix and haven't touched my sample at all. i just placed the master mix in one row of the plate and closed it with capes right away so there is absolutly no posibility for cross contamination.

so from that i just came to the conclusion that the contamination must come somehow from the material i use, even tough i take great care of cleaning everythink.

The second row goes as follow (sample/sample/sample/sample/space/blank/blank/blank/blank)

again, all my blank came out as strongly positive but then i don't understand why some of my sample came out negative since the first row tell me that the material is contaminated.

if my material is contaminated, although my sample is negative it should come out as positive

i am completly out of idea right now, i have tried basicly everythink that existed but can't figure out the problem.

if any of you has ever had a similar problem, i would really appreciate the help

In many of the crops it is noted one or the other colour of the fruit is considered as a dominant character. In many of the crops masking or co- dominant character is also noted. How it is evaluated or verified?

I want to create a ground truth mask for the object that dominates the scene in the image or video. The most noticeable thing in the ground truth mask should be white, and the part's reset should be black. I also keep the contour of the thing. The primary goal is to produce a dataset with real-world scenarios.

Please assist me and recommend a tool I could use to accomplish this.

Greetings, fellow researchers,

I am working on developing a new model for deep 3D face anti-spoofing, and I am reaching out to the research community to seek your help. My goal is to develop a model that can accurately distinguish between real and fake faces in various scenarios, using a range of attacks such as 3D masks, silicone masks, and mobile phone replays.

I have access to several datasets, including:

I welcome any suggestions, feedback, or new ideas from the research community to make a novel contribution to the field of deep 3D face anti-spoofing.

Thank you for your attention and support.

Best regards,

MOHAMMED K. HUSSEIN

In one of the projects with the help of python (jupyter notebook), I applied mask RCNN for masking pomegranate fruit and classify it based on its size. During model application in real time the frame rates drop due to system limitations (8 GB RAM, 500 GB SSD without GPU). Someone, please help/suggest me to built a fast model from scratch which can segment the fruit in lesser time for its online application.

Hi All, I am using cell mask orange dye to label HEK 293 T cells plasma membrane. I am using 5 ug of dye as final concentration and incubating cells for 10 min at 37•C. I am facing issue with dye internalisation. I did staining before fixation as well as after fixation. In both case All dye internalize. So here is the protocol I am using:

1. Growing cells

2. wash with PBS

3. Stained with cell mask orange for 10 min

4. washing 3 time with PBS

5. Fixation with 4% PFA

6. Washing with PBS.

7. Stored in PBS,Same day Imaging.

Note: Some time I pellet down the cells after second step and then stained the cell suspension. At the end step I just mount the sample on slide.

How can I prevent dye internalization in cell? what are the possible reason of this issue? Please let me know.

Presently, Telecom masks are being planted in the residential areas,how can we measure the radiation effects of this mask against the residents.

There is an increase in cases of these three infectious diseases (RSV, FLU, and COVID-19).

Ethical, economic, and behavioral aspects have been discussed in relation to the mandate to wear masks universally.

With COVID-19 we gained experience on when and how to implement the mandatory use of masks, as well as the phasing out of this order.

Consider implementing a mask mandate with prebunking with information about when, how, where, and for what. The evidence says that they are good at controlling contagion when used in closed spaces. There is no evidence that the use of masks in open spaces (outdoors), when there are no crowds, is beneficial. Before withdrawing the mask mandate, verify that your epidemiological surveillance is working correctly, Consider phasing out the mandate and be aware of any changes.

Referencias:

1.

2.

3.

4. Organización Mundial de la Salud. Consideraciones relativas a los ajustes de las medidas de salud pública y sociales en el contexto de la COVID-19: orientaciones profesionales. 2020. [citado 2022 Jun 20]. Disponible en: https://apps.who.int/iris/handle/10665/331970

I computed the structural similarity index (SSIM) value between a ground truth mask and its corresponding predicted mask in an image segmentation task using a UNet model. Both the ground truth and predicted masks are of 1024 x 1024 resolution. I got an SSIM value of 0.9544. I resized the ground truth and predicted mask to 512 x 512 using bicubic interpolation and measured its SSIM value to be 0.9444. I repeated the process for 256 x 256, 128 x128, and 64 x 64 image resolutions and found the SSIM values as 0.9259, 0.8593, and 0.8376. I observed that the equations for luminance, structure, and contrast components in the SSIM formula appear to be normalized and does not seem to vary with image resolution. My question is for the same pair of ground truth and predicted mask, why the SSIM values keep decreasing with decreasing image resolution?

I'm going to make an aluminum hole array with a 100nm scale. The thickness of aluminum is 150nm and I'm trying to dry-etch aluminum with a thickness of 150nm using ZEP520A mask which is a positive electron beam resist. After spin coating of ZEP520A with a thickness of 500nm on Al 150nm and masking a mask through electron beam exposure patterning, dry etching is performed using Cl2, BCl3 gas. Several attempts were made, but holes were created in some places, and holes were not created in some places, so the hole array was not created uniformly. I think the ZEP520A mask can not act as a mask because of the gas used in the etching process, for example, reaction with gases in etching process. Is there anyone who can advise? Thank you.

Dear all,

I have been trying to use ArtRepair and I have some questions regarding the preprocessing I am doing, and I would be very grateful if you could answer some of them. The preprocessing I am doing is as follows:

1. “art_slice”: Normally the threshold has to be modified until it is inferior to 5%.

- IS IT OKAY IF THE THRESHOLDS ARE DIFFERENT FOR DIFFERENT PARTICIPANTS?

- WHAT TO DO IF THE MASK CREATED IS NOT ACCURATE (THERE SEEMS TO BE DATA OUTSIDE THE HEAD)?

2. Slice timing

3. Realign & reslice

(4). art_despike IF “visual inspection of the ArtGlobal figure uncovers greater than +/-1 % drift in the mean global signal across the entire time series”.

- IS THERE A WAY TO CALCULATE THE PERCENTAGE OF THE SIGNAL DRIFT IN ORDER TO CHECK IF IT’S GREATER THAN +/-1 %? (For example by calculating the % of decrease between the maximum and the minimum value OR the first and the last image?

5. Coregistration

6. Segmentation

7. Normalization

8. Smoothing

(9). art_global: apply if art_despike was not applied.

When using art_global, users are asked “always repairs 1st scan of each?”. IF I ALREADY DELETED THE TWO FIRST DUMMY SCANS, SHOULD I REPLY “YES” OR “NO”?

- IF THERE IS TOO MUCH MOTION, IS IT OKAY TO SKIP “art_motionregress” AND USE THE “.rp” FILE FROM THE REALIGMENT STEP AS MOTION REGRESSORS?

- WHEN USING MOTION REGRESSORS, IS IT BETTER TO LEAVE THE SCAN-TO-SCAN MOVEMENT THRESHOLD AT 0.5 mm/TR?

- IS IT A PROBLEM IF ART_DESPIKE IS PERFORMED FOR SOME PARTICIPANTS AND ART_GLOBAL FOR OTHERS?

Finally, I would like to know if you believe the preprocessing I described is correct or not.

I would be extremely grateful if any of you could answer to these questions, it would be very helpful!

Best,

Ariadna

I want to create a hard etch mask for etching Si anisotropically using KOH. The etched structures need to be quite deep, several 100 um.

I understand that the two common hard etch mask materials are Si3N4 and SiO2. Currently I have access to RIE, but only Ar and O2 gas tanks, so I can't dry etch the silicon nitride, which seems to be the most common method. We've tried sputtered Cr as a mask, but the adhesion to Si is less than ideal. The best success we've had is a complicated process: sputter Cr onto Si3N4 coated Si, create a photoresist mask, etch the Cr, strip the resist, etch the Si3N4 with BOE, strip the Cr and finally etch the Si with KOH. I'm looking for something simpler ideally.

Hello,

when we expose a photoresist with a mask that has big and small structures, which structures will have a better adhesion on the wafer? and why (how can we explaine that in the physic)?

thank you very much!!

best regards

Mokhtar

How do you think COVID-19 countermeasures taken by states and governments comply with the human rights guarantees established by national Constatutions and the International Human Rights Treaties? Among those measures are :

-mandatory vaccination

-lockdown

-mandatory usage of masks

Ahshar suggested his experiment rejected the Copenhagan Interpretation. But part of his suggestion was the description based on a model of waves of the interference of light in a Young's Experiment (double-slit).

The Copenhagen Interpretation advocates continue the describe theoretical faults in Afshar's explanation. These papers usually suggest some modification the the Afshar Experiment, but lack (to my knowledge) realization of an actual experiment. For example, Tabish Qureshi, ``Understanding Modified Two-Slit Experiments using Path Markers''. So, this question need not be in support of Copenhagen. But using other interpretations of QM such as the TIQM are also theoretical not actual experiments.

For example, the Hodge Experiment [there are other observations called ``transparent mask'' experiments] rejects wave models in support of a particle model of light. The STOE model of this light interference experiment supports the data results of the Afshar Experiment.

Any other?

Hodge Experiment:

Interference Experiment with a Transparent Mask Rejects Wave Models of Light

Optics and photonics journal vol. 9, No. 6 jun 2019

We use Nitric-HF-Acetic mixture - HNA - to etch silicon. HNA is the most popular isotropic etchant. Some part of Si surface do not need to be etched. We try to use masks - various hard baked photoresists, adding adhesion promoters, try parylene too...but the HNA is so agressive that everything flakes off. And we also prefer to avoid silicon nitride mask. What might work better as the mask here?

Hello everyone,

I'm new on Imagej, I know how to manually obtain the fluorescent profile along a straight line crossing the center of a structures composed by cells. I would like to get it automatically for multiple structures.

I was able to create a mask and calculate the average intensity for each structure, but I need the profile for each.

The image 1 is the starting point.

The image 2 is the mask.

The image 3 is the information that i Would like to obtein for each structures.

Hello everyone. I hope someone can help me with this. Thanks.

I have been using Mask-RCNN for work. I have to do custom object detection. For this, I have labeled all my images using polygon in the given image. I have 50 images and hence I have 50 annotations.json files. But according to the information given on the Mask RCNN Github Repo, we need only one annotation JSON file.

So my question is:

How to change the export_boxes and load_mask functions given in the code to accommodate my problem? If so, how do I do that? or should I merge all the JSON files into one? If I go ahead with the merging, would that have the correct formatting?

Pls help me out.

regards,

Saqib

I have a T1 weighted MRI scan (please see the attached). It has regions of tumour+peritumoral edema. I am trying to develop mask images (.nii) of

1. CSF

2. white matter

3. Grey matter

4. tumour region

5. One single .nii file comprised of 1-4.

I need your expert opinions and recommendations on the best way to get this task done. Thank you in adavance!

Dear all,

I am very new in the TE field. I have run RepeatModeler on a newly assembled genome and as a result got the following files: families.stk and consensi.fa.

As I understand, consensi.fa file has all the repeats predicted and I can create consensi.fa.classified by running RepeatClassifier. But I still do not understand what to do with these files in order to see the content and variety of the repeats "my" genome has. I did not find any clear explanation on that in the RMasker or RModeler github pages. What would be the basic, general command to get the info I need?

Note: I am not interested in masking my genome. I need to understand its TE and repeat content.

Thank you!

Well, it can be Si02 or metal (Ni/ Pt) or even a Photoresist (PR). Let me know if you have any ideas.

Hi, everyone. I am facing a problem with using the Extract by mask tool. When I apply it to a mosaiced image, the output image has strange colours ( in the attachment).

Wearing of nose mask is one the Corona Virus (Covid-19) preventive measures recommended by World Health Organization (WHO).

Mesh R-CNN is an improved 3D version of Mask R-CNN. Though there are a lot of tutorial about training Mask R-CNN with custom dataset, but I couldn't find anything for Mesh R-CNN. Any kind of help would be greatly appreciated.

By running TBSS, I got all_FA_skeletonized.nii.gz. Instead of doing "fslstats"

fslstats -t all_FA_skeletonized.nii.gz -K mask.nii.gz -M

and getting a mean FA across all voxels per subject for the mask.nii.gz, can I get a per voxel per subject FA value and its corresponding (x,y,z) coordinates?

For example, if there were 2000 voxels identified per mask by following command:

fslstats -K mask.nii.gz JHU-ICBM-labels-1mm.nii.gz -V,

can I get a FA value for each of the 2000 voxels per subject along with their coordinates?

I searched online, and my solution so far was to extract the coordinates of the individual mask first through Matlab and then create a binary mask for each voxel and followed by running "fslstats" to extract stats for each voxel. Is there an alternative to generate voxels' stats along with their coordinates?

After COVID 19 a new pollution has appeared which is the mask pollution, some of the masks are polluted with the virus and increase the chance to spread the virus, my question is what is the new procedure to deal with this new solid waste pollution??

The amount of medical waste generated from COVID-19 since the outbreak is estimated to be 2.6 million tons/day worldwide and is still growing. Such an amount of medical waste can be also attributable to global mask mandates which are still in force despite the global vaccine rollout. As the Wuhan spike protein-based vaccines have waning efficacy against transmission of new variants, medical mask mandates are still applicable, but there is a need to discuss more focused approach when it comes to medical masks recommendations/mandates in a incidence-dependent manner, meaning that higher the new COVID-19 cases stronger should be the recommendations/mandates, and vice versa, in case of significantly lower incidence of new COVID-19 cases, recommendations/mandates should be relieved. There is also a need for the development of new technologies in medical masks manufacturing towards easily recyclable and biodegradable protective medical equipment, if possible, as well as the need for the improvement of existing technologies for medical waste sanitation. Open scientific debate on the ecological sustainability in the context of COVID-19 pandemic is mandatory.

I am looking for a cheap and simple sputter unit that can sputter metals like Au, Ni, Cr, Al onto a substrate through a shadow mask for pattering (20 mm x 15 mm mask area, 30 micron resolution, for film thickness in the order 100 nm). One target at a time is enough.

I am on a budget so I am looking for researchers with personal experience of a simple machine, not for marketing broadcasts from manufacturers.

Swamping and masking are caused by input data that is too large for the purposes of anomaly detection.

Wearing mask has been inevitable, though not bad, it too has established a mask culture over the world. Along with it arose some major problems, likewise, identity issues, healty issues and bargaining. Production of mask has taken the shape of big profit making Industries. There is a lack of knowledge regarding proper wearing of mask. There is no check on production firms. There should be parameters and specifications on material, size, thickness, etc. for producing masks of good quality. Many a time, wearing a mask creates identity crisis and it may create some other social problems if not handled within time. What do you think about these issues? Kindly share your views and experience.

In this preprint (Schwarz, 2021) they indicate that the use of masks has a number of negative effects on children and adolescents, although they were unable to distinguish between the use of masks and the psychological and traumatic disruption caused directly by living through a pandemic with all its consequences.

"53% of children suffer from headaches.

15% of children play less".

Source: Schwarz, S., Jenetzky, E., Krafft, H., Maurer, T., & Martin, D. (2020). Corona children studies" Co-Ki": First results of a Germany-wide registry on mouth and nose covering (mask) in children. Researchsquare.com (preprint) https://doi.org/10.21203/rs.3.rs-124394/v2

In any case, although I do not like to use preprints, it is useful for me to reflect on the impact that the pandemic may have on children. I have two daughters and I am beginning to observe symptoms of stress, anguish and sadness, with occasional moments of crying for no apparent reason. It is not the scope of my research, but I am concerned about this.

How do you think this will end?

NOTES FOR CONSPIRANOIDS:

As I mentioned in my discussion, talking about this preprint "...they were unable to distinguish between the use of masks and the psychological and traumatic disruption caused directly by living through a pandemic with all its consequences.". Face masks are very important to fight against flu and SARS-CoV2. The incidence of flu this year is very low due to the use of face masks, and it's important to wear masks to avoid COVID disease and the collapse of the hospitals.

Cherry-picking, suppressing evidence, or the fallacy of incomplete evidence is the act of pointing to individual cases or data that seem to confirm a particular position while ignoring a significant portion of related and similar cases or data that may contradict that position. In this case, many COVID negationists are using papers like this one to attribute that masks are bad, and this is absolutely CHERRY-PICKING, especially when in the paper's conclusions it states the following:

"It is very important to us that our results do not lead to parents developing a fundamentally negative opinion of mask-wearing among children. Many children and adolescents are grateful that they can continue to attend school thanks to the AHA+L rules and would like adults to have a positive opinion about the masks, especially since the type of mask worn can usually be chosen. Furthermore, there are children for whom the mask may be a necessary aid, for example, if they are immunosuppressed after chemotherapy. Unreflective negative statements about the mask can cause a nocebo effect and unnecessarily stress children: it is better to listen and take it seriously when problems arise. "

I made evaporated Cr/Au patterns through lift-off process on silica on Si.

Then, I sputtered Cr on the wafer and pattered the Cr layer for SiO2 dry etch mask formation.

Cr/Au was for heater on silica waveguide, and etched trench was for thermal isolation between waveguides.

After SiO2 etch process, Cr etchant did not remove completely the Cr hard mask on Au layer.

On the other hand, Cr on SiO2 was removed without problem.

The residual Cr was confirmed by measuring the surface profile, showing ~100nm thickness.

Has anyone experienced something similar?

What machine learning or AI techniques can be used to detect and mask sensitive information in a semi-structured or unstructured dataset.

Hi,

I would like to know how to test face mask coating with antiviral compounds for its effectiveness against viruses like H1N1 or corona etc. Is there any standard laboratory protocol for testing? (means how to know after applying virus suspension on mask virus gets killed or not?) if yes please share.

Thanks

Ajit

So , I am trying to setup a photolithography setup where I will use CNC controlled laser beam to plot the shape for exposure instead of physical masking system . I need a better conversion system . Jscut was helping much but was not effective enough for it.

Hi!

I realize a time series with MOD09GQ to finally extract index vegetation but there are many many many solutions to create mask cloud and each has his complex methods with personel algorithm. So the first question is :

- Can I used layer QC_250m from MOD09GQ to make mask ? Should it necessary to create shapefile from layer and applicate in surf_b01 or b02 layer ?

Or

- I must used MOD35 but.... BUT... the time including date and hour and they are not the same between both

T_T

Thanks to your rely

best regards :)

Charlène

Does ethanol play a major role in masking the peaks of the UV vis spectrum? And when does its effect appear? Does a difference in its percentage in reference to the one with which it was purified cause a disappearance in the peaks? Does deionized water have the same effects as masking peaks?

Hi there, I am trying to do two-channel light sheet microscopy for a whole mouse oviduct, but the autofluorescence from the vessels is masking my true target. I am currently using PFA for fixation and 488 secondary. Does anyone have suggestions for minimizing autofluorescence in whole mount samples?

Don't know, is anyone asking for this or the same question, but

I want to do the electrochemical measurements of thin film deposited on a silicon substrate (the structure in the picture). So, should I create an insulating mask (I can get it by SiO2 (thermal oxidation) or by chemical-resistant varnish) around this film to eliminate the influence of silicon surface on measurements?