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Heterostructures - Science topic
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Questions related to Heterostructures
I do with heterostructure system like the g- C3N4/TiO2..., any one who know how to make this type of structure by material studio?
Thank you so much for your reply!
How can we mathematically calculate the critical thickness of polycrystalline(Sputtering) grown thin?
I am trying to calculate the electronic properties of a vdW heterostructure with the application of the external electric filed. What will be the suitable value for the emaxpos and eopreg in the input file? Using the default values, the bandgap of the monolayers are changing with electric field. Can anybody guide me?
I found "the correlative plot for monolayer mos2 " in a publication "Spectroscopic evaluation of charge-transfer doping and strain in graphene/MoS2 heterostructures" in (Figure-2b).
However, I can't draw it in origin.
Any idea, how to draw this correlative plot?
I have been trying to resolve this issue for a long time now trying different strategies and still do not have a fix for this.
The problem:
I have a Si(p++)/SiO2 substrate with a 2D heterostructure consisting of hBN and TMDC. After exposure, I usually develop without a post-exposure baking step. I see cracks appearing only after the development process especially in resist where h-BN is under it. These cracks mostly appear starting from the edges of the pattern and propagate upto 50 microns in distance. I do not see any origin of cracks from the part where the resist is in direct contact with SiO2.
Things I have tried :
1. Different resist materials (PMMA, PMMA with copolymer EL11, ZEP520A). All resist have the same problem.
2. Using rounded corners in my pattern to avoid sharp features. The minimum feature size in my patterns is about 2 µm.
3. Post exposure bake.
4. I am already using low acceleration voltages of 10kV with 30µm aperture.
Can anyone help me with this?
I want to know how to plot interfacial total charge transfer (=the amounts of transferred
charge) in FET, I attached images below.(pink line in image 2)
It refers to a picture where I want to know how much charge is moved depending on the distance of one axis in the unit cell structure in a heterostructure (2D semiconductor and 3D metal).
I am using VASP code., DFT simulation.
please help me.
Photodetector is made up of:
cellulose paper as a substrate. Into the substrate we add SnS followed by MoSe 2
Hello,
I want to model an heterostructure device with the drift-diffusion model, for that I need a boundary conditions. At the heterostructure there is a junction barrier that dictates a thermionic emmition current injection boundary at the junction (J=A*T^2*exp(Phi-dPhi/vt)). Moreover, due to poor surface conditions there is a high surface recombination, which is modeled as Jn=qS(n(0)-np0).
*Phi and dPhi are the junction barrier and reduced junction barrier respectivally.
Does these boundary conditions (thermionic emmition and surface recombination) can be combiend together or they equivalent in some degree?
Not sure how to think about this situation.
Thanks.
I want to see the effect of transverse electric field on band structure of heterostructure. However I am unable to reproduce the reported results using tefield, dipfield, emaxpos, parameters. Please help me to get the desired results. If possible, please share the input files
I want to derive the tight-binding Hamiltonian for a heterostructure. I choose 'random' initial projection and choose the energy window as +(-) 8 eV. I changed the energy window in various ways. Still I am getting "Energy window contains fewer states than number of target WFs". Can anybody help me to resolve the issue? Thanks in advance.
To achieve superlubricity in two-dimensional heterostructures, do we need to stack it at a certain angle? or directly through mechanical exfoliation, we can achieve superlubricity in 2D heterostructures. Please provide some useful suggestions.
I am aware of the concept of commensurate and incommensurate, but in the heterostructure, do we need to follow that?
I have to fabricate a 2D Hot electron transistor for my project.
I come mainly from a theoretical physics background. So I don't know what to search or read to know about what parameters affect the frequency of a 2D heterostructure Transistor. Can someone help me out by pointing the literature I should really be looking for?
A heterostructure is composed by two different materials like pn junction. The work function refers to the potential difference between the interface of a heterostructure.
What substrate should be used and what materials should be used for quantum well etc.
I am looking for the deepest quantum well created by semiconductors bands offset in heterostructures. Would greatly appreciate any help!
I looking forward to know how to specify the band gap alignment and band offsets of two layers 2D heterostructure semiconductor?
Can I determine the band alignment (type I or II) without using XPS or STM?
Hi everyone, I previously asked for your assistance in doing simple calculations using QE, and I would thank you all for your comments.
This time, I want to build a heterostructure of Fe/Sc/Fe using QE, but the problem is I don't know how to prepare the input file for QE. Therefore, my question is how to build the needed input file for QE starting from the Fe.scf.in and Sc.scf.in files. I use Xcrysden for the structure visualisation.
Thank you for your assistance,
Ahmed.
Sc.scf.in file:
&CONTROL
calculation = 'scf' ,
outdir = '/home/ahmed/q-e-qe-6.4.1/tutorials/' ,
pseudo_dir = '/home/ahmed/q-e-qe-6.4.1/pseudo/' ,
prefix = 'Scan_Nitr' ,
/
&SYSTEM
ibrav = 0,
nat = 8,
ntyp = 2,
ecutwfc = 40 ,
ecutrho = 400 ,
occupations = 'smearing' ,
degauss = 0.01 ,
smearing = 'marzari-vanderbilt' ,
starting_magnetization(1) = 0.6,
/
&ELECTRONS
/
CELL_PARAMETERS {angstrom}
4.5112339250 0.0000000000 0.0000000000
0.0000000000 4.5112339250 0.0000000000
0.0000000000 0.0000000000 4.5112339250
ATOMIC_SPECIES
Sc 44.955912 Sc.pbe-spn-rrkjus_psl.1.0.0.UPF
N 14.006700 N.pbe-n-rrkjus_psl.1.0.0.UPF
ATOMIC_POSITIONS {angstrom}
Sc 2.2556169620 2.2556169620 0.0000000000
Sc 0.0000000000 0.0000000000 0.0000000000
Sc 2.2556169620 0.0000000000 2.2556169620
Sc 0.0000000000 2.2556169620 2.2556169620
N 4.5112339240 4.5112339240 2.2556169620
N 2.2556169620 2.2556169620 2.2556169620
N 4.5112339240 2.2556169620 4.5112339240
N 2.2556169620 4.5112339240 4.5112339240
K_POINTS automatic
10 10 10 1 1 1
Fe.scf.in file:
&control
calculation='scf'
pseudo_dir= '/home/ahmed/q-e-qe-6.4.1/pseudo/',
outdir='/home/ahmed/q-e-qe-6.4.1/tutorials/'
verbosity = 'high',
prefix='fe',
/
&system
ibrav = 0,
nat = 2,
ntyp = 1,
ecutwfc = 40 ,
ecutrho = 400 ,
occupations = 'smearing' ,
degauss = 0.01 ,
smearing = 'marzari-vanderbilt' ,
starting_magnetization(1) = 0.6,
/
&electrons
/
CELL_PARAMETERS {angstrom}
2.8443263750 0.0000000000 0.0000000000
0.0000000000 2.8443263750 0.0000000000
0.0000000000 0.0000000000 2.8443263750
ATOMIC_SPECIES
Fe 55.845 Fe.pbe-nd-rrkjus.UPF
ATOMIC_POSITIONS crystal
Fe 0.0000000000 0.0000000000 0.0000000000
Fe 1.4221631880 1.4221631880 1.4221631880
K_POINTS automatic
12 12 12 1 1 1
How to figure out the stability of a heterostructure eg. MoSe2-PtS2 heterostructure. How to ensure lattice matching...and how to reduce lattice mismatch if exist.
I want to calculate binding energy of heterostructure crystal via DFT. But I am familiar with CASTEP, not yet have knowledge about any other software. Can I find binding energy of crystal by CASTEP in material studio? If answer is negative , plz suggest me alternative program to do that.
Au contact on ZnO turned out to be ohmic which has been confirmed by linear response of current in Au/ZnO/Au configuration. But Au/Si/Au is schottky. Now, i have a device with p-Si as the substrate and n-ZnO as the thin film with gold contacts deposited on both Si and ZnO. Given the contact with Si is schottky, will the accuracy of the junction parametrs (ZnO/Si) be compromised?
Can i categorically state that a junction has been formed? or, should i call Au/ZnO/Si/Au as heterostructure device rather than a heterojunction?
I did syntheses of pure carbon nitride, pure molybdate and some heterostructures with both. When calculating the bandgap, I noticed that the indirect bandgap of C3N4 is close to what is reported in the literature, but the direct bandgap is not. On the other hand, the molybdate that I used, according to the literature, only has direct bandgap. If so, what choice should I make? To make it easier to understand, I have attached the sketches of the direct and indirect bandgap graphs of the samples.
I used 'Build Layers' from Build tab. I used it to optimize a heterostructure with GGA - PBE exchange correlation function. Then this error message was shown '*Warning* max. SCF cycles performed but system has not reached the ground state.' .
Later I increased my SCF iterations same happened, then I increased SCF cycle as well as cut-off energy, still this was shown. I did those calculations using 'smart' in 'apply finite basis set correction'.
As those trials were failed so I chose 'never' in 'apply finite basis set correction' and tried all those attempts and still the job was failed and that warning was shown.
What should I do now?
N.B. - I need to study my heterostructure, run electronic and optical calculations. In my heterostructure those two atoms I used were in same phase. Any suggestion in this purpose?
Hello everyone. How can we verify from band diagram, weather the band crossing is pointing towards Dirac metals or weyl metals or it is just normal band crossing.? What observation we should make? What confirmations we need to do ? More generally, just looking at the band structure how could we could say. Please guide me. Thanks.
Hello. I want to calculate dispersion curves for vdWH systems. I am trying it using quantum espresso with DFT-D vdw_correction. scf.in, ph.in, q2r.in are running fine, but when i do matdyn.x, calculation just stops without any error or crash. The problem can be seen in the attached picture. Kindly suggest or please guide for a proper calculation of phonon for vdWH system. Eagerly waiting for yours guidance. Thank you.
Dear all
What does it mean to have a horizontal line in the negative frequency regime of the phonon dispersion modes? I have a Li ion adsorbed at the surface of a heterostructure. The Li ion is at the saddle point. Actually I want to find the zero point energy of the Li ion. Should I consider the negative frequency of Li? or real? The image is attached.
Thank you for your cooperation.
Abdus Samad
Research associate at the University of Ulsan
When ferromagnet (FM) and antiferromagnet (AFM) are coupled, exchange bias can be generated at the interface of FM and AFM which acts as a bias field in the hysteresis loop.
I am particularly interested in the case that FM has perpendicular magnetic anisotropy (PMA) and the localized magnetization in AFM lies in the plane. In this case, it is possible to generate an in-plane bias field to the FM layer.
In a system like PtMn + Co/Ni multilayer, where the Curie (Neel) temperature TC (TN) are both very high ( > 300 C), a typical way to induce this in-plane bias field is by applying a large in-plane field (~ 1T) and annealing the sample at ~300 C, which is below TC. I assume that the annealing is required because it is not a good idea to heat the sample above TC and therefore change the property of the material.
Now, my question is: If I have a similar system (FM with PMA, in-plane AFM), but with room temperature > TC >TN, can I induce an in-plane field by applying a large in-plane filed above TN and then cool the sample to a temperature below TN?
Relevant paper:
Annealing to get bias field:
Neel temperature of AFMs:
Is it possibile to measure the "back stress" via compressive loading-unloading-reloading (LUR) test? I found numerous publications where back stress is measured using tension LUR test.
Greetings. I have to etch some regions of a heterostructure to make ohmic contacts. The sample has a Si capping layer which, due to exposure to the atmosphere, is actually a Silicon Oxide layer. Under this Si capping layer, there is a Ge-rich SiGe layer. I have available an 8% HF solution. Is this concentrated enough to etch the Si oxide away? I have seen this done in a few papers but they do not mention the concentration nor mention for how long I should dip the sample.
And one last question if I may: What about the SiGe layer? Will the HF passivate it and prevente native oxide growth? I know HF, HBr, and HCl can be used to clean Ge native oxide and it will prevent the regrowth for about 10min, I am not sure about the SiGe alloy.
Thank you very much.
I have investigated heterostructure for lLIBs; According to my AIMD run, it is thermodynamically stable. Further, I would like to check their thermodynamic stability with formation energy combined with the convex hull method. I need help from the expert, How to get the convex hull energy for my heterostructure?
Looking forward to hearing from the generous scientific community. I will be thankful for your time and considerations.
Your Sincere,
Nisar.
Hi All,
I have a basic doubt related to QDs. Can I realize QDs using any semi-conducting materials, starting from Si, Ge or any other compound S/Cs. If I grow any two layers in the heterostructures, what are the factors based on which I can predict the formation of QDs.
Dear colleagues:
I need the electrical conductivity or resistivity of the following photocatalytic semiconductors and the following Heterostructures (made of two or more semiconductors joined interfacially). I have had a very hard moments trying to get this kind of information. If you know articles or handbooks that may be useful, please tell me their name so that I can get them.
Semiconductors: TiO2, ZnO, Bi2WO6, BiOI, Ag2O, BiVO4, Bi2O3, SnO2, WO3, MoS2, CuO, Cu2O, MoS2, ZrO2, CdS, α-Fe2O3 , β-PbO2, g-C3N4, GO
Heterostructures: Bi2WO6-rGO, TiO2-Sb2S3, TiO2- MoS2
Best wishes
Marco
How can I prove the formation of heterojunction between two semiconductors using the XRD spectrum?
How does the interface quality of ferromagnet and metal heterostructure (FM/NM) effect the Spin pumping process?
Instead of enhancement in Gilbert damping, is it possible that gilbert damping of this heterostructure (FM/NM) may be reduced????
During the fabrication or hetero-structuring of different TMDs, traps and defects are inherited. These traps contributes/affects on charge transport behavior on various interfaces. To interpret different applications involved TMDs heterostructure, these anomalies and artifacts must be quantified. My specific question is about MoS2/Oxide junction.
Generally i have seen most of the rietveld analysis performed on powder sample. why can we not perform it on thin films and more specifically multilayered heterostructure films?
Except the 2D transfer system sold by HQ Graphene
In a p-n heterojunction under internal electric field, the photogenerated electrons and holes will transfer to the n-type semiconductor and the p-type one, respectively. It can be assigned to the fact that CB and VB of n-type semiconductor are normally lower than those of p-type semiconductor. It seems that the type-II heterostructure is similar to this p-n photocatalyst. So what is the main difference between these two heterostructures?
I am trying to calculate the electronic properties of van der Waals heterostructure, calculations goes smoothly for self consistence (scf.in) but for nscf calculations i encountered with en error "Error in routine efermig (1): internal error, cannot bracket Ef". i tried to play with nbnd and cutoff energy and also with mixing beta but every time i got the same error.
I am attaching the nscf.in and nscf.out file herewith, please help me to resolve the issue.
Dear All,
I trying to model heterointerface between two oxides, at first I modeled each surface oxide alone and then I tried to attached OH, O, OOH molecule to find Gibbs free energy. My problem occur when I tried to model the heterointerface. I built my structure using vesta by importing the first unit cell of oxide and enlarge the cell in X and Y direction to fit with the other unit cell of the oxide. I found this procedure is done in some paper to match both lattice parameter. When optimized the oxide alone, the relaxation was not that hard, but when I had an interface between two oxides, the relaxation distort the structure.
I am seeking help in making better structure and relaxation.
This calculation was very costly and I do not want to lose core-hour in the supercomputer.
I appreciate your advice
Shift in PL emission peaks of SL- WS2 and SL-MoS2 is observed individually under applied strain but due to inter-layer coupling WS2/MoS2 hetero-structure does not show Excitonic behaviour corresponding to both mono-layers rather it shows the PL peaks corresponding to WS2 only in the PL spectra obtained for the hetero-structure. Why?
While observing overall water splitting of pure water, my heterostructure photocatalyst exhibited H2 evolution initially in 1st hour and then O2 evolution in 2nd and 3rd hour. After that it became inactive. I have used Pt and Ag as cocatalysts.
What can be the possible reason for;
(1). Why it is not able to produce H2 and O2 simultaneously?
(2). Why after 3rd hour, O2 evolution is also stopped?
I know we can edit the layers (and make different cifs) and do the calculation for each layer separately to find their HOMO-LUMO. But I was wondering if there's a way to calculate HOMO-LUMO of each layer, while the layers are stacked in the heterostructure in a single cif. Thanks!
*I'm using Quantum Espresso. But I guess the problem is same the regardless of the code one is using.
We have obtained extensive XRD, TEM and other relevant data about the crystal heterostructure (it is a metal core-shell quantum dot). What is the formula for determining the lattice mismatch between the two materials (core-shell)?
Thank You!
2D hetero-structures are finding numerous applications in energy storage, flexible electronics and nano-composites. But there has not been much experimental work in investigating the mechanical properties (elastic modulus, shear modulus, inter-layer friction etc.). Let us discuss what has been done in this field. Just to trying to keep ourself busy with some fundamental scientific discussions while we are locked down in our homes.
#graphene #2DMaterials #hBN #Heterostructures
What are the most useful mechanical applications of two dimensional heterostructures? And what are the most efficient 2D heterostructure systems for flexible electronics?
How to construct a heterostructure in Quantum Espresso for e.g: GaAs/GaN?
I am working on development of Z-scheme based heterostructure photocatalyst in which both semiconductor components are structurally engineered (doped and defected). What parameters should be considered for successful direct Z-scheme design.
Dear Siesta Users,
I work on a 2D lateral heterostructure with siesta 4.0.2.
I have used the super-cell approach with a vaccume region of 20 Å perpendicularly to the sheet.
I have checked my code by lateral and vertical graphene heterostructures and they were okay and the vacuum region didn't have altered much. But In my structure vacuum region get extremely bigger also I checked my code by using GGA-PBE, GGA-revPBE and LDA-CA. any help would be appreciated.
I want to make a Teflon reactor , with quartz window for Photo-electrochemical characterization having three electrodes . I need help in making can some show me the photo or the sketch how to make it .
TO KNOW MORE ABOUT MY QUERY read the " section 2.3 " as ------
The PEC experiments were performed in a Teflon reactor equipped with a quartz window for frontal illumination. All the tests were carried out in a three electrode configuration using the TiO2 NP film, TiO2 NTs, ZnO NWs or ZnO@TiO2 core– shell heterostructures as the working electrodes for the water photo-electrolysis reaction, a platinum wire as the counter electrode, and an Ag/AgCl (KCl 3 M) as the reference electrode, in a 0.1 M NaOH aqueous electrolyte (pH = 12.7).
here i got no idea what the reactor is . and i need to make it .. help me in making it .
Electron affinity values reported in literature are mostly of monolayer or bulk TMDC materials. However, is there any reported data/method/ way to calculate affinity of bilyer TMDC materials and their heterostructures(i.e. MoS2/WS2)?
Thanks in advance.
Dear community. As far as I understand, the dielectric confinement problem is scale invariant, while the quantum confinement problem has a length scale defined by the Bohr radius.
I have been trying to understand some experimental results in terms of the change in dielectric confinement of the system: one material phase, with a higher permittivity, embedded into a secondary phase with a lower permittivity. After some treatment, the phases distribution change, with the first phase increasing its volume ratio. This will be consistent with changes in dielectric confinement. The problem is that the scale of the phases is way above the Bohr radius of the specific material, and all the literature I have found, deals with dielectric confinement only for very confined systems, within the quantum confined scale.
Can anyone point me to some literature that deals with the scale of dielectric confinement?
Thanks.
Recently, i am using VASP to optimize a heteroscurture by setting isif = 3 or 4,but the result of the optimization shows that the lattice constant of the heterostructure is bigger that the two materials` .
I tried to use a 2x2 supercell , but i got the same result in ferromagnetic settings.Anti-ferrimagnetic settings comes lattice constant between two materials.
The total energy is lower in ferromagnetic settings.
One of the materials is ferromagnetic and the other one is non-magnetic.
Will it happen in a vdW 2D heterostructure?
Responsivity is a measure of the electrical output per optical input.
We have recently synthesized a colloidal solution of (what we think is) 2D heterostructure. We first prepared a colloidal solution of an exfoliated 2D material and synthesized a different quasi-2D material in that solution. We have shown that the second material is indeed synthesized. We have a strong hunch that the latter material is being synthesized on top of the exfoliated 2D material, but this is hard to verify. What is the best way of checking if the two materials are existing separately, forming heterostructure, or both?
I need to know about the material to use as a medium or spacer
between GaAlAs/GaAlAs layers and for GaAlAs/GaAs heterostructure. How would I make the selection of the spacer material for these type of bilayer system? If any other suggestion you need to give then please tell me.
Dear all,
I am wondering if we have to capsulate any tunneling device based on vdW heterostructure by h-BN in top and bottom as well? to let current pass through overlapping area of three layers stacked vertically ????
many thanks
Most of the people build their own transfer stations to move flakes of 2D materials (e.g. graphene), but I'm interested in knowing if there is any company selling a complete transfer station including software to do the transfer.
Dear community,
I'm looking for Post-Doc position in :
-Metal nano-oxide synthesis ( eco-design and application in environment): examples: ZnO, TiO2.....
and/or
- Nano-composites ( noble metal/ metal oxide for energy and health applications): examples: Ag/ZnO, Au/ZnO......
and/or
- Reduced metallic nano particles for antibacterial activities
Thank you
I have a coherent THz acoustic phonon parametric oscillator, via a doping superlattice grown by MBE on (100) silicon, and now wish to transmit the generated phonons into a single-crystal antiferromagnet, grown epitaxially on the (100) Si substrate (perhaps using a buffer layer), for magnon-phonon studies. I am searching for a paper describing such a heterostructure. Would appreciate a reply with a paper describing such a fabricated heterostructure. I could alternatively possibly use GaN as the substrate, provided it can be modulation-doped. Thank you.
Thomas Wilson
how can we calculate the work function of 0-D (quantum dot or nanocrystal or molecules) and 3-D (bulk) materials using density functional theory?
I know that Rashba coupling parameter magnitude in experiments is about 0.1 eV.A. I also have seen some papers that has reported gigantic Rashba couplings about 0.3 eV.A or higher magnitudes. If fact, I need to know that can we have small quantum rings (radius 20-60 nm) with about 0.2 eV.A or higher Rashba coupling?
Thin film deposition of same materials (Polyaniline emeraldine salt and base) one is conducting and another is non conducting. Thin film being deposited and termed as heterostructure, is it correct?, junction of layered thin films.
I am trying to make Hall bars on InAs/AlGaSb based heterostructure . For that I am doing optical lithography to cover the area which I want to protect with a positive resist(S1813 or S1828). After that I etched the sample with solution of 1 molar citric acid (C6H8O7), 85% phosphoric acid (H3PO4), and 30% hydrogen peroxide (H2O2) with volume ration of 97.17%: 1.06%: 1.77% . But from the optical image and AFM image, it is clear that etching is not happening that smooth and the roughness of the etched area is pretty high. I am still trying to figure out the problem.
Any suggestion regarding the potential reason and solution will be highly appreciated. Thanks in advance.
Could anyone please help, i m working on tertiary composite as photo catalyst for Hydrogen production, which characterization method i should use to know the internal connection of component with each other that how they make heterostructure or through which bonds they make composites??? a deeply molecular level not the most common one like FTIR,XRD,SEM, elemental mapping etc if possible then plz consider my request thank you.
In 3D code like plane wave, we need to make supercell and large vacum to study the properties, if we have 2D code, we should not need to make supercell and computational cost also will be low.
The real part and imaginary part of refractive index of a bulky material comply with the Kramers-Kronig relation, does the same apply for the effective refractive index and the modal gain in an active waveguid structure (e.g, a double heterostructure semiconductor laser)?
Since quantum well lasers are made up with heterostructures is there any chance of a photon to be emitted with a different energy of the one related to the well bandgap? I mean the energy of the bandgap of the semiconductor without the well.
Ag nano particles are deposited by electron beam evaporation method on mechanically exfoliated MoS2. And XPS data were taken freshly after Ag deposition and after long exposure to ambient atmosphere.
I have synthesized quantum dot/nanowire heterostructure catalyst. I observed the reductive photocurrent of my catalyst reduced by x4 when doing it in O2 free environment compared to ambient condition. What would be the reason for that reduction of photocurrent in O2 free conditions.
I want to know more about the difference between heterostructure composite. How is homostructure composite different from it, only in terms of band gap? Is there any difference between homostructures and composites or is it the same?
Lot of people have done investigations on 'valance band offset' of heterostructures while 'conduction band offset' studies are rarely found. Is it experimental difficulties or Irrelavancy of information?
We know that one-dimensional (1D) or two-dimensional (2D) materials have confined space for charge, or electron transportation, which makes them promising in conductive or semi-conductive devices. Obviously we cannot say which one is better. Can anyone explain the difference between 1D and 2D in terms of their specific applications?
Dear All,
I want to build a hetero-structure based on 2D materials or mixed-dimensional materials such as a 2D/3D assembly?
I am wondering what is the following procedure I should do it to make it for keeping the physical properties of electronic devices, or during studying optoelectronic properties are similar or close to each other??
I have prepared 2D materials using a scotch tape (exfoliation technique) and I utilize a dry transfer for making a vertical stacking?
do you think contaminants resulting from adhesion tapes or non-flatten surfaces play a main role? how should be overcome ? are there other factors should be taken in account?
thanks in advance