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Film - Science topic
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Questions related to Film
I have a design with low reflectance and transmission using Cr and SiO , but the packing density decides the performance and I am not able to achieve the required packing density . This I can confirm only through the spectral performance obtained as I do not have facility to confirm the film structure obtained.
We are trying to find a supplier that can grow 200 nm stoichiometric LPCVD Si3N4 on quartz or fused silica substrates and so far no one agreed to do it. They say the film will peel off. What I do not understand is this, we got Si3N4 on oxidized silicon substrates before, so adhesion between Si3N4 and oxide was fine enough so that it can hold the stress on Si3N4 film, what makes the difference when the oxide is 500 micron thick instead of 3 micron oxidized silicon wafers? Does it bow? What is the problem? They say, they can grow silicon rich low stress, but then the waveguides that will be made out of this thin film layer will be absorptive.
ITO was deposited by RF magnetron sputtering system and then annealed. After annealing, the sheet resistance of the film increased which I have related to decrease in oxygen deficiency. Since, after annealing, the crystallinity of film increases which ultimately decrease the defects, then why the NIR transmission decreases?
I nee a polystyrene strip about 10*6*0.2 mm for Dynamic mechanical analysis(DMA). The PS film is prepared by cast PS/THF solution into mold, dried at room temperature and -0.6 air pressure in oven. However, the Tg by DMA is 60℃, much lower than 103℃ by DSC. Privately, I think the reason is residual THF in PS film.
However, high temperature will destroy the shape of sample, and low temperature can't remove solvent totally. Could someone give me some ideas or solutions to get a good PS film for DMA.
Experimental conditions:
Argon gas concentration.:70sccm
Working power:125W;175W;225W;275W
Working pressure:3E-03Torr
As the experimental working power increases, the resistivity decreases from the 10^6 to the 10^4 μΩ.cm.I did rapid thermal annealing at 200°C, 300°C, 400°C and 500°C in N2 environment for 1 minute. But it doesn't have a big effect on resistivity. So I'm not quite sure where exactly the problem is......
I am trying to deposit NiFe using RF magnetron sputtering. But the film deposited on the substrate has rainbow colors (deposition time 1 hr.) not the silver which should be. For small deposition duration, there is no significant deposition on the substrate. The deposition parameters are- Power- 200 W, High vacuum- order of 10^6 mbar. Working pressure- order of 10^-3 mbar.
The plasma forms looks pinkish near the surface of target and bluesish above. Please suggest what should I change/consider while depostion.
Thanks
Pinki
I usually make perovskite film using spin coating on ITO substrate(Glass (2mm)/ITO (250nm)/Perovskite (300nm)). I want to analyze this film with TEM and I already know it generally make a TEM specimen with FIB to measure the cross-view.
Is there any method to measure the plan-view with TEM? If there is a way not to use FIB, I would appreciate it if you could tell me how to do it. The thickness of the substrate and perovskite layer can be adjusted or changed.
It has been brought to our attention that there is a manufacturing problem with different types of autoradiography films and the earliest date for shipping is in October. We are close to deadlines and this is too late for us. Does anyone have extra BioMax MR Films and is willing to sell them? Thanks
Hi everyone,
i have a question related to the shelf life of mixed cation or pure MA or pure FA perovskite film. do you think it is possible to fabricate a thin film of mixed cation (MA-FA) or pure MA or pure FA based lead halide perovskite.
Hello and hai to all my friends!!!
I want to discuss that the calculation of reflection and transmission for the coatings layer on a glass substrate is very important.
In the case of optical coatings, the effect of glass thickness is not considered for calculating the reflectance and transmission.
In the case of architectural window coatings, the calculations of film and the glass thickness are major for determining the reflection and transmission for the understanding of the color performance of the coating on the coating film side and glass side.
So here I am interested and in a need of help calculating the transmittance of thick glass panes with and without coating effect.
Kindly guide and inform a relevant material one for the proposed problems in the determination of optical constants for thick glass pane and thick glass pane having specific thickness with a coating layer stack with specific thickness?
Thanking you.
I am getting some anomalous response on the ESR spectra.
Hello Colleagues
For our project, we are looking for a layer that blocks visible light and allows infrared radiation to pass through.
We would like to use such a material in the form of a film (sticker) or paint.
Do you know of such material on the market?
Thank You for help.
BR
Bartosz
Finishing and Appearance Engineer.
The growth rate of PECVD thin films is typically calculated by dividing thickness (determined from ellipsometry) by deposition time. As the substrate temperature increases, the thickness-based growth rate decreases, which is reasoned out due to several deposition phenomena in the literature. Films can get dense at high temperatures (~400 C), leading to an apparent decrease in thickness and growth rate. The deposition could also be limited by the adsorption of film-forming species on the substrate, or material from the substrate could be lost due to film pyrolysis (producing volatile byproducts) at high temperatures.
An Arrhenius plot was used in the literature to determine apparent activation energy (usually negative kcal/mol, and defined as the sum of reaction activation energy and enthalpy of adsorption, Ea = Er + Had). A negative Ea implies a large absolute value for Had, which suggests the deposition is limited by adsorption.
Is it logical to use an Arrhenius plot to describe film deposition in terms of an adsorption-limited process when a densification process also exists?
Greetings to all.
I want to simulate strain deformation caused in isotropic polymer membrane film due to water vapour absorption by film (shell type) resulting in swelling and eventually undergoing strain deformation in Abaqus .
But , I am not able to figure it out.
Any help/tips are appreciated.
Thank you.
Hi All,
I am carrying out western blotting for the expression of CLASP2 in H9c2 cardiomyocytes in response to a drug treatment. I use chemiluminescence and develop on film.
I am struggling to see CLASP2 (165 kDa) despite many troubleshooting attempts, such as:
- Trying different gel percentages (7.5 and 6% gel)
- Longer electrophoresis run to achieve maximum separation and using HSC-70 as control (which is always even)
- Trying NFDM and BSA for antibody dilution. (5% in TBS-T)
- Increased exposure time during developing film.
- The antibody has been purchased twice and there’s no result with either vial.
- Reagents have been prepared fresh.
Any troubleshooting suggestions would be most welcome as to why I cannot see CLASP2 expression. Additionally, CLASP2 is expressed in the studied cell line and I have no issue in visualising col1a1 with a higher kDa of 220 on a 7.5% gel.
I spin coated aqueous solution of PEDOT:PSS mixed with glycerol , DBSA and GOPS according to a previous paper from our group. substrate was ITO slides from sigma. The formed PEDOT:PSS layers tend to detach from the surface after just 1 round of electrochemistry experiments in PBS buffer. I want to do at least 2 rounds of experiments on each slide. What is happening here?
How do I test the coductivity of PEDOT:PSS?
I am using the direct deposition method to make a PEDOT:PSS film.
But the measured resistivity is very high and the conductivity is very small.
Why do these happen? Is there any operation to increase the conductivity?
Recently I have done ITO thin film deposition by magnetron dc sputtering. But we didnot get proper deposition.we did not get transparent film and the resistance in order of few kilo ohms.can you please suggest me how to deposit proper ITO caoating on glass substrate?
What is the effect of ionic strength on mapping by SEM-EDS? For example, if we assume that the ionic strength of the solution consisting of MnSO4 and water is fixed with NaNO3, if we produce a film from this solution, how will the results change when we map it? Also, do you know of any article that includes not only a chemical but also a physical interpretation of this? Can you share if any?
I need a reference for the UV-Vis-IR absorption spectrum of a film of Prussian White.
Hello everyone,
I am trying to fabricate a homogeneous polyvinylidene fluoride-trifluoroethylene (PVDF-TrFE) thin film by spin coating. However, my spin-coated film is opaque and porous in the middle with many defects, and there are also some areas not covered by the film on the edge of the Si wafer.
I dissolved 12wt.% PVDF-TrFE powder into DMF. The solution was shaken in a mixer overnight until getting a transparent and homogeneous solution. Then, the solution was dropped on a clean Si wafer and spin-coated at 3000r/m for 60s.
Does anyone know how to get a transparent and homogeneous PVDF-TrFE film?
In the process of electron beam evaporation of Nb2O5 film, the Nb2O5 particles at the spot of electron beam have melted, but the rate has been zero, even if the electron gun beam current has reached 100. Why?
Also, when I decided to stop the experiment and turn down the current, I found that the rate would increase and then slowly decrease to zero. This is very strange??
I hope someone can help me out. Thank you.
The electron gun voltage is 8.13, and the vacuum degree is 4*10^-4 Pa.
Can anyone suggest whether carbon paper can be used as substrate material for supercapacitor. Can we use aluminium film also for supercapacitor?
While X-Ray reflectivity fitting from Globalfit software, intermediate layer of SiOx between the Silicon substrate and the film is showing higher roughness value than its thickness.
Please excuse what might be a dumb question. I'm casting films of vinyl ethylene carbonate and LiTFSi salts. Every paper I read has this done in a glove box. I understand the lithium salt is very hygroscopic but couldn't this excess moisture be removed during the polymerization process, drying the casted film in a vacuum oven? It would be much easier to cast the films on a lab bench.
Hi everyone,
I have a thin film of polymer (50 micrometers). I made it by myself without any instrument. Because of that, I need to be assured that it has a 50-micrometer thickness on the whole of its surface. Please could you advise me on how I can measure its thickness? Also, can I use an ellipsometer to measure the thickness of the whole surface? The dimension of the polymer film is (5cm*5cm).
Thanks in advance.
Respectful greetings for all the reseachers. I'm currently working on carbon nitride film on FTO by electrophotic deposition technic using acetone and iodine supension. After variation of different parameters as time, voltage applied... The film are very mechanicaly unstable and scratched easily or completely loss during electrochemistry measurements. Please, how to obtain a stable thing film on FTO substrate? Does NiFoam could works better as substrate?
Thank you for you help.
Is it necessary to adjust pH while making a film, Does pH affect the film property?
Also, do we have to keep it at room temperature for 24 hours and how much temperature is suitable for drying?
Length, inner diameter and film thickness : of the column ;
The temperature program for GC analysis ;
In case one have the used single crystal substrate and the film is removed by etching, now what kind of defects and impurities will be present at the substrate surface, and is the crystal planes of the substrate also affected by any kind of etching?
If yes how to confirm it experimentally?
if we make bioplastic and add all the ingredients and pour in to petri plate then how to takeout our product when its dry?
Hi
I have performed UV-Vis characterization of one of my liquid samples and trying to evaluate the bandgap. I am stuck with calculation of absorption coefficient(alpha). There are many sources available for the calculation absorption coefficient in case of film based samples. But I couldn't find one for the case of liquid based samples. If any of have any information regarding the calculation of absorption coefficient for liquid samples then please let me know.
Thanks
SPrabhu
I have dissolved the PAN powder in solvent DMF with a high concentration. With the increase of the dissolution temperature from 20°C to 80°C, the PAN solution changed from clear to dark yellow. Then I added LiClO4 to the solution and prepared polymer electrolyte by spin-coating.
By Raman spectrum, the PAN film with different dissolved temperatures shows significant differences; I think that it is caused by cyclization. However, I don't know what bond the 2400cm-1 peak intensity enhancement represents. Can anyone help?
Aluminum nitride is compound semiconductor, Can we coat 2nm of its film
I'd like to have a metallic film with porouses inside by using dc sputtering method. In this way, what parameters of sputtering should be higher or lower ?
Hi, respected Scientists and Researchers , I'm reading an ariticle 'Self‐Powered Organic Photodetectors with High Detectivity for Near Infrared Light Detection Enabled by Dark Current Reduction'. The author gave an 'Film-depth-dependent absorption spectroscopy' (as shown in the figure below), and the author said that'D18 and Y6 are randomly distributed in the longitudinal range in the D18:Y6 film. However, D18/Y6 film possesses a vertical phase
separation with D18 enriched in the bottom'. ( The D18 film exhibits an absorption band at 410–620 nm, with a peak at 584 nm and a shoulder at 548 nm, while Y6 film possesses a
broad absorption in the range from 520 to 980 nm with a strong absorption peak at 840 nm)
now my question is how can I get that conclusion that the author gave us from the 'Film-depth-dependent absorption spectroscopy' ?
Thank you very much!
Dear all,
We can apply the surface film condition along the thickness plane in the 3D plate. But if we make it as 2D plate we wont be apply the same along the thickness plane(XY plane).
Can we apply the surface film condition over a 2D face in Abaqus?. Is there any way by creating skin elements or any other method?
For my thesis I'm doing a mixed method analysis of the portrayal of AI in contemporary science fiction films. One of my methods will be a critical discourse analysis of 30 film scenes. I wonder how I can justify film samples, bearing in mind I want scenes where there is textual dialogue between a human and a robot or AI?
UV visible spectroacopy
FTIR spectroscopy
Thermogravitimetry (TGA)
Prorammable furnace 2500 temp
Magnetic hot plate stirrer
Vibrating sample magnetometer
Electric properties like IV, capacitance, dielectric, ferrowelectric, ect.
Mechanical properties of thin film , powder, etc
HRSEM
AFM
HRTEM
Spin coater
Ball milling
Vaccum chamber
Atmosphere furnace
Annealing furnace
Vacuum coating unit
Incubator
Oven for lab
Film thickness measurements
Edax
Xrf
Xrd/ hrxrd/ gixrd/ gaxrd
Raman for powder, liquid, film
Energy Dispersive X Ray Analysis (EDX) – elemental analysis
X Ray Photoelectron Spectroscopy (XPS).
Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES) – accurate (bulk) determination of specified elements
ICP-Mass Spectrometry (ICP-MS) –simultaneous semi quantitative determination of 70+ elements
Oxidative combustion / Thermo Gravimetric Analysis (TGA).
Hello,
I want to ask why my PEDOT:PSS can't form film, can I add something inside the PEDOT:PSS to help film formation?
Hi everyone,
I'm trying to get the light wavelength of colored films The light source and camera are kept in a stable position, while the film was rotated at different angles. The light source is placed perpendicular to the film, and the camera has some knowing distances from the light point and the film.
Accordingly, when the blue color is formed, I measured the observation angles and then plug them into the Bragg equation:
mλ = d (sin θ incident- sin θ observation)
where m=1, since I work with the top layer, and d, is the distance between particles and I got it from SEM images. The issue here is the result is so different from the blue wavelength value range (450 to 495 nm).
My question is how to determine the incident and observation angles? Also, in my case is it ok to use the above equation, or the distances between the light point and observation must be considered?
thanks
Because of degradation phenomena
Method of preparation
a) What happens when we suppress the dissolution reaction in anodizing process, will the coating thickness will get higher. There are findings claims that film thickness grows simultaneously when we suppress the dissolution reaction.
b) Could anyone explain the dissolution reaction in anodizing process.
Please don't copy paste the article from internet. I would be grateful if you could give a explanation in a short way according to your convenience.
Thank you.
I have been doing the Western blot recently using the x-ray films and developing them in the darkroom ( I used Licor Odyssey before for ECL) and I have been getting dirty results like in the picture.
I looked for some troubleshooting online but I could only find troubleshooting regarding the western blot itself and most of the time the darkness and dirtiness of the background occur only where the membrane is (thus making me think in that case it is the WB procedure itself that could be the problem). Still, in my case, the whole film that does not even cover the membrane is dirty, so I thought it could be the developer's problem. I made a new fresh one and it still happened. I also do not believe the x-ray film has been exposed to light before, as the same batch of film produces different levels of darkness and dirtiness. Basically, the first film that is developed is okay but then the later exposures I do become darker and worse.
I am new to this method and as there are many steps in it and many factors I was hoping I could get some answers or ideas here.
Thank you all in advance!
Hello everyone.
Can you please recommand a software (free if possible) for estimating the thin film thickness for optical spectra?
What are different ways of transferring the flexible nanofiber film on the flexible polymer substrate effectively, such that good adhesion between film and substrate is established?
Want to use PVDF as a flexible temperature sensor due to its excellent flexibility and pyroelectric properties. But at the same time, it is piezoelectric too.
When using as a temperature sensor this piezoelectric behavior may contribute in the output voltage when stretched. In order to avoid this, is there any specific force up to which we can stretch the film without piezoelectric characteristics coming into picture, and which will not affect the voltage value?
What is reason for abnormal behavior of absorbance and transmittance at 300C.
Actually I am looking for any app used by film-editors on the narrative stage , as to visualize narrative, rhythm and pace structure. Structural diagram apps used by film-editors. Or other apps that could be used by film editors even if they are not yet into it.
I have noticed in my recent project that when adding nanoparticles to a polymer solution there is increased non-uniformity following spincoating. Spincoating the same solution without nanoparticles using the same parameters produces a uniform film.
The striation that occurs is flower-like, with very thick "petals." This leads me to believe that it is related to a Marangoni instability.
Do you know why the addition of nanoparticles to the solution might lead to gradients in the flow? Have there been any well-documented countermeasures to this? I have seen a change in solvent or spin speed suggested, but am wondering if there are any other options that have come about.
The fourth wall is a term that television borrowed from its first origin (theater) represented by the interface of the screen displaying the work. One scene on television is a theatrical clip within a group of scenes that confines the subject between four walls, the fourth of which is removed and replaced by the camera, which represents the viewing angle for the viewer and a difference can be recorded Between parties in the theater the distance and angle of view are constant between the audience and the message does not change, but while this distance is defined and new while the room was closed.
Looking forward to make polymer-nanocomposite based fiber film for temperature sensing in the range 25 to 40 °C. Looking for such polymer which will be flexible, and can be electrospin easily.
I found the following statement in a book on page 581:
"If, in a particular timestep a converged result is obtained with a negative calculated film thickness, then the most negative film thickness is set to zero."
Dowson, D., Priest, M., Dalmaz, G., & Lubrecht, A. A. (Eds.). (2003). Tribological Research and Design for Engineering Systems: Proceedings of the 29th Leeds-Lyon Symposium. Elsevier.
What exactly happens when the film thickness is zero? Can anyone explain this to me? I will greatly appreciate it.
I can convert the magnetic moment of a system from emu/cc to the Bohr magneton.
In case of bulk material or thin films, we consider the molecular mass of the material.
I wonder how to calculate Bohr magneton for a bilayer film like LSMO/SRO.
In this case, which molecular mass need to be considered.
Can I add the molecular masses of individual layer and estimate the Bohr magneton by considering the saturation magnetization from MH loop.
Please clarify.
I am making a film out of starch ,polyvinyl alcohol and ammonium dihydrogenate phosphate using the solution casting method .After drying the film overnight at 60 C the color of the film isn't uniform as there are some white patches on certain areas.I am casting it on a metal tray after mixing it at 250 rpm for 2 hours at 95C. Is there any possible ways to avoid this issue?
We all have seen a very big rise in the streaming of the entertainment content over the OTT platforms in the wake of the global pandemic and the resultant lockdown. Do you think that the popularity of the OTT platforms will subsequently affect the business of the cinema halls and theatres premenantly in the future?
I want to make free standing perovskite film by solution method. Is there any specific way to make that perovskite thin film?
Is it possible to calculate the work functions of nanoparticles such as HgTe, HgSe QDs, or nanolayers of Bi2Te3 film with respect to references like HOPG or Au?
I started to scan them at room temperature and got foe them some different values of CPD, now the question is will it be a more sensitive measurement to scan them in dry air like purging by Ar or N2 gas flow. Is it necessary to do the experiment in the UHV condition to calculate the WF of nanoparticles as QD & 2D layers?
Thanks for feed-back
I am preparing ZnO thin film by the chemical bath deposition method. Although I have worked with several parameters and tried many times to have a uniform film I am not able to form a uniform film yet. Please give me some suggestions about how do I make the film more uniform in the CBD method?
Dear all,
I was trying to use DC sputtering to coat around 50 nm silver on both side of a casted PVDF film (thickness around 25 micron). I used a 3d printed ABS mask during the sputtering. I checked the surface morphology under SEM and found no pinholes and severe porosity. I wonder is there other reasons this short circuiting could occur, and potentially how to avoid it.
Thank you very much.
Hi, I am trying to start a deposition simulation for TiO2 film on Si surface. Si (001) surface is ready now I want to initiate deposition. Will use fix/deposit for Ti and O at 1 to 2 ratio.
I will be using Tersoff potentials for Si and O interactions and Buckingham/coul with MA coefficients for Ti-O interactions.
But what is the potential that best describes the Si-Ti interactions?
Thank you all.
Hello
I am trying to simulate the droplet deposition in the Ramp. When I defined the interphase mass transfer flux between film and droplet as field function(dot($${Area},$${VelocityDROPLET})*$${Velo cityDROPLET}*${VolumeFractionDROPLET}), I faced such as error "the field function cannot be evaluated for the cells of unspecified". I get stuck in this problem in the Star-CCM+. I would greatly appreciate it If you could let me know. Thanks
Good day everyone!
I was about to make some pouch cells, frame made of commercial Aluminum-lamination film and in the place of contanct inbeween the current collectors/the film/the nickel tab/ in order to achive the complete sealing commercial heatable polymer is used. Unfortunately I do not own one of these right know, but I have Al-film. Would is the nature of this heatable polymer? So I could syntehise it myself OR find the very close alternative to it the goal is to achive hermetically sealed case (since the Ni current tabs are relatively thick, thicker layer of polymer might be needed).
Any kind of advice is welcome
Thanks!
Solvent casting of gelatin film
I want to locally remove top or bottom PET film on a readymade flexible organic solar cell just to expose the silver electrode underneath. Is there some etchant to do that not destroy the cell?
Thanks.
I would like to attach the CNF top to the PU film. I have tried with solvent casting method, but It could not attach top on PU film. The CNF film was prepared after solvent evaporation unattached the PU film on which I tried to cast the CNF film. I think PU is hydrophobic on the other hand CNF is hydrophilic. So, I need the suggestion on how I can attach these two films?
Thanks in advance.
Hello everyone!
I'm working on the electrosynthesis of polymer film based on metallo-porphyrin (in fig 1). For the polymer synthesis, I'm performing cyclic voltammetry using a solution prepared in ACN with TBAP as supporting electrolyte.
The resulting voltammogram is shown in figure 2.
From this, it seems that the polymer is conductive with an increase in the current cycle by cycle.
I'm trying to characterize the polymer in a solution of a redox probe (e.g. [Fe(CN)6] 3-/4- prepared in water with KCl as supporting electrolyte ), by cyclic voltammetry. The comparison between the bare electrode and the functionalized electrode with polymer shows a dramatical decrease in current after the electropolymerizationpolymerization.
How is it possible to describe this different "behaviour" of the film?
Any useful papers?
Thank you!
Tiziano
CZTSe film was synthesized by the hydrothermal method and RTP annealed at different temperatures. After annealing the EDS data shows Sn-rich films. Why is this happening?
Hi, everyone. I am considering the heat conviction during compacting simulation by Abaqus. I was wondering that how to define the sink temperature and film coefficient?
Is there any references for the two parameters of different materials?
Thank you so much for your help in advance.
Sincerely
Dear sir,
What is the interpretation for the co-doped SnO2 film, when there is a decrease in intensity and an increase in width at half height of the most intense peak (110) ?.
and is there any work on Ni/Co co-doped SnO2 for photovoltaic or gas sensor application ?.
Hello! I've been a little confused recently with some obtained data. The related question is, can roughness of a spin coated and highly uniform film be larger than the thickness of the film? For instance, if the film thickness is 20 nm, can roughness be 25 nm?
I'm using silicone resin for paint formulation (zirconia as a filler material) and It doesn't cure at atmosphere and elevated temperature also. And I tried titanium 4 isopropoxide, it dried but film becomes flakes while exposed to 250 degree Celsius in muffle furnace. Resin was bought from dow chemicals, the technical data sheet attached below for your reference
A hologram is made by superimposing a second wavefront (normally called the reference beam) on the wavefront of interest, thereby generating an interference pattern that is recorded on a physical medium. When only the second wavefront illuminates the interference pattern, it is diffracted to recreate the original wavefront. Holograms can also be computer-generated by modeling the two wavefronts and adding them together digitally. The resulting digital image is then printed onto a suitable mask or film and illuminated by a suitable source to reconstruct the wavefront of interest.
Why can't the two-intensity combination algorithm be adapted like MATLAB software in Octave software and create an interference scheme?