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I'm trying to make a highly absorptive (visible absorption) substrate.
I want to know the flattest way to make VACNT's, and so if I grow the substrate with CVD, how uniform can I get the film to be?
Also: Will other methods be able to get a flatter substrate? what are alternatives to get a visible regime absorber that's really flat? And, if you know a company that could do this process, that'd be wonderful.
Thanks,
Kent
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Growing a highly uniform and flat thin film of vertically aligned carbon nanotubes (VACNTs) using chemical vapor deposition (CVD) can be challenging, but it's possible with careful control and optimization of various parameters. Here's a breakdown of your questions:
Uniformity of VACNT Growth Using CVD:
1. Uniformity of VACNT Growth: Achieving a high degree of uniformity in VACNT films using CVD can be challenging but is essential for applications like absorptive substrates. Uniformity can vary depending on several factors:
- Catalyst Preparation: The uniform dispersion of catalyst nanoparticles on the substrate is crucial for uniform CNT growth.
- Substrate Quality: A smooth and clean substrate surface is essential to prevent variations in CNT growth.
- Gas Flow and Concentrations: Precise control of gas flow rates and concentrations is necessary to ensure uniform CNT growth.
- Temperature Control: Uniform temperature distribution across the substrate is critical for uniform growth.
- Substrate Movement: Some researchers rotate or move the substrate during growth to promote even gas exposure.
- Catalyst Thickness: The thickness of the catalyst layer can impact uniformity. Thinner catalyst layers may promote more uniform growth.
- Post-Growth Treatments: These may be applied to improve uniformity.
2. Alternatives to CVD: While CVD is commonly used for VACNT growth, other methods can be explored for producing flat and uniform substrates:
- Template-Assisted Growth: Using templates or patterned substrates can lead to more controlled and uniform CNT growth.
- Chemical Vapor Deposition with Plasma Enhancement: Plasma-enhanced CVD (PECVD) can enhance control over CNT growth and potentially improve uniformity.
- Layer-by-Layer Assembly: This involves depositing CNTs layer by layer to achieve control and uniformity.
- Pre-Grown CNT Films: Consider using pre-grown CNT films or sheets, which are commercially available and can offer good uniformity.
Visible Regime Absorber with a Flat Substrate:
To achieve a highly absorptive substrate in the visible regime that is also flat, consider these alternative approaches:
1. Photonic Crystal Structures: Design and fabricate photonic crystal structures that manipulate the propagation of light, enhancing absorption. These structures can be engineered for flatness.
2. Thin Film Coatings: Use thin film coatings with high absorption properties in the visible range. Materials like semiconductor thin films or plasmonic nanoparticles can be employed.
3. Metamaterials: Metamaterials are engineered structures designed to interact with light in unique ways. They can be tailored for absorption and flatness.
4. Multilayer Stacks: Create multilayer structures with alternating materials to control absorption and achieve flatness.
5. Antireflection Coatings: Apply antireflection coatings to minimize reflection and enhance absorption.
6. Surface Texturing: Introduce micro/nanostructures on the substrate's surface to enhance light absorption while maintaining flatness.
The choice of method depends on your specific requirements, including the degree of flatness, absorption efficiency, and ease of fabrication. Each approach has its advantages and challenges, so it's essential to evaluate them based on your application's needs and available resources. Additionally, collaborating with experts in materials science and optics can be beneficial for achieving the desired results.
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I have exposed the Gaff Chromic film and then scanned it, now in MATLAB, I have to write a code to convert it to dose and then obtain the calibration curve of the film.
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@Yousef Bahrambeigi
Hi Mr Yousef Bahrambeigi
Thank you for your patience and taking the time to respond
Your answers are thorough and
helpful I had another question,
how can I create a dose vector؟
As you mentioned :
Next, you need to plot the OD values against the known doses for each channel and fit a curve to them. You can use the plot function to plot the data and the polyfit function to fit a polynomial curve. For example, if you have a vector of doses named dose and a vector of OD values for the red channel named OD_red
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How to create a system of digital, universal tagging of various kinds of works, texts, photos, publications, graphics, videos, etc. made by artificial intelligence and not by humans?
How to create a system of digital, universal labelling of different types of works, texts, texts, photos, publications, graphics, videos, innovations, patents, etc. performed by artificial intelligence and not by humans, i.e. works whose legal, ethical, moral, business, security qualification .... etc. should be different for what is the product of artificial intelligence?
Two days earlier, in an earlier post, I started a discussion on the question of the necessity of improving the security of the development of artificial intelligence technology and asked the following questions: how should the system of institutional control of the development of advanced artificial intelligence models and algorithms be structured, so that this development does not get out of control and lead to negative consequences that are currently difficult to foresee? Should the development of artificial intelligence be subject to control? And if so, who should exercise this control? How should an institutional system for controlling the development of artificial intelligence applications be built? Why are the creators of leading technology companies developing ICT, Internet technologies, Industry 4.0, including those developing artificial intelligence technologies, etc. now calling for the development of this technology to be periodically, deliberately slowed down, so that the development of artificial intelligence technology is fully under control and does not get out of hand? On the other hand, while continuing my reflections on the indispensability of improving the security of the development of artificial intelligence technology, analysing the potential risks of the dynamic and uncontrolled development of this technology, I hereby propose to continue my deliberations on this issue and invite you to participate in a discussion aimed at identifying the key determinants of building an institutional control system for the development of artificial intelligence, including the development of advanced models composed of algorithms similar or more advanced to the ChatGPT 4.0 system developed by the OpenAI company and available on the Internet. It is necessary to normatively regulate a number of issues related to artificial intelligence, both the issue of developing advanced models composed of algorithms that form artificial intelligence systems; posting these technological solutions in open access on the Internet; enabling these systems to carry out the process of self-improvement through automated learning of new content, knowledge, information, abilities, etc.; building an institutional system of control over the development of artificial intelligence technology and current and future applications of this technology in various fields of activity of people, companies, enterprises, institutions, etc. operating in different sectors of the economy. Recently, realistic-looking photos of well-known, highly recognisable people, including politicians, presidents of states in unusual situations, which were created by artificial intelligence, have appeared on the Internet on online social media sites. What has already appeared on the Internet as a kind of 'free creativity' of artificial intelligence, creativity both in terms of the creation of 'fictitious facts' in descriptions of events that never happened, in descriptions created as an answer to a question posed for the ChatGPT system, and in terms of photographs of 'fictitious events', already indicates the potentially enormous scale of disinformation currently developing on the Internet, and this is thanks to the artificial intelligence systems whose products of 'free creativity' find their way onto the Internet. With the help of artificial intelligence, in addition to texts containing descriptions of 'fictitious facts', photographs depicting 'fictitious events', it is also possible to create films depicting 'fictitious events' in cinematic terms. All of these creations of 'free creation' by artificial intelligence can be posted on social media and, in the formula of viral marketing, can spread rapidly on the Internet and can thus be a source of serious disinformation realised potentially on a large scale. Dangerous opportunities have therefore arisen for the use of technology to generate disinformation about, for example, a competitor company, enterprise, institution, organisation or individual. Within the framework of building an institutional control system for the development of artificial intelligence technology, it is necessary to take into account the issue of creating a digital, universal marking system for the various types of works, texts, photos, publications, graphics, films, innovations, patents, etc. performed by artificial intelligence and not by humans, i.e. works whose legal, ethical, moral, business, security qualification ..., should be different for what is the product of artificial intelligence. It is therefore necessary to create a system of digital, universal labelling of the various types of works, texts, photos, publications, graphics, videos, etc., made by artificial intelligence and not by humans. The only issue for discussion is therefore how this should be done.
In view of the above, I address the following question to the esteemed community of scientists and researchers:
How to create a system for the digital, universal marking of different types of works, texts, photos, publications, graphics, videos, innovations, patents, etc. made by artificial intelligence and not by humans, i.e. works whose legal, ethical, moral, business, security qualification .... etc. should be different for what is the product of artificial intelligence?
How to create a system of digital, universal labelling of different types of works, texts, photos, publications, graphics, videos, etc. made by artificial intelligence and not by humans?
What do you think about this topic?
What is your opinion on this subject?
Please respond,
I invite you all to discuss,
Thank you very much,
Best regards,
Dariusz Prokopowicz
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Some technological companies offering various Internet services have already announced the creation of a system for digital marking of creations, works, works, studies, etc. created by artificial intelligence. Probably, these companies have already noticed that in this field it is possible to create certain standards for digital marking of creations, works, elaborations, etc. created by artificial intelligence, and this can be another factor of competition and market advantage.
And what is your opinion about it?
Please answer,
I invite everyone to join the discussion,
Thank you very much,
Warm regards,
Dariusz Prokopowicz
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Hello!
I need a solid (non-porous) nitrocellulose film, and I am trying to prepare it by solution-casting. I dissolve nitrocellulose in acetone, dimethylformamide or their mixture, pour the solution onto glass and let the solvent evaporate. Unfortunately, the resulting film is non-uniform. Is there any trick that can help me to obtain a uniform film? A specific solvent suitable for such procedure?
When the solvent evaporates, it occurs slowly (the glass petri dish is closed), because fast solvent evaporation even increases the heterogeniety of the resulting film.
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Dmitry Bagrov Try spinning the substrate and diluting the nitrocellulose.
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Now that Carestream/Kodak Biomax MR film is no longer available, I am looking for a replacement film for 14C-mouse brain autoradiography that optimizes spatial resolution. There are a host of analog films commercially available but scant information about the technical characteristics of these films, even from manufacturers. If any one is using an alternate film they are happy with, it would be much appreciated if you could make a recommendation. Thank you.
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Daniel Holschneider I've been on the hunt for an alternative for a few months as well. Have you discovered any viable options now that Carestream/Kodak Biomax MR films have been discontinued? Thanks!
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I am using Terahertz time domain system to measure the thickness of a thin film on a substrate. I am able to calculate the thickness of substrate(~100um) alone. But what signs should I see for if there is a thin film ( ~100nm) on this substrate. I am not willing to do the fft ! Can time domain signal alone determines the thickness of film. The resolution is 33fs.
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When the terahertz pulse reflects off the top surface of the thin film and the bottom surface of the substrate, interference patterns can occur in the time-domain signal. These interference fringes are related to the film's thickness and the refractive indices of both the film and substrate.
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I have ZnO nanoparticle powder and I want to make a film of ZnO on FTO. Suggest me any binder that I can use for spin coating of ZnO on FTO. After top electrode deposition I want to study the I-V characteristics of ZnO film.
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See for "binders for supercapacitor electrode" - there are many different recipes to fix active material on condactive substrate.
Most popular mixture is PVDF:Carbon:Active material = 10%:10%:80%
Instead of PVDF, you can use PVP (PVA/PVB/MC and their combinations)
But, if you don't care for mechaical properties, just dissolve ZnO nanoparticles in some organic solvent, such as alcohols (ethanol, methanol, isopropanol and others) with addition of some viscous agent (exp: glycerol or ethylene glycol) to control the viscosity and thickness, respectively).
Then coat it to the substrate in several layers (depending on the final desired thickness). Do not forget about intermediate and final annealing steps.
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I already use 2%Glycerin as Plasticizers but all of my expandable films are broken by using 0.1 N HCl (pH=1.2) media.
I am preparing a sustained-release capsule
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Try to use sodium alginate to improve film elasticity alongside PVA
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I have taken the % of Absorbance (FTIR data) of PVDF film. The following formula is used to calculate the fraction of Beta phase
fbeta= Abeta/(1.3Aalpha+Abeta) (ref: RSC Adv., 2016, 6, 20089–20094)
Where, as per literature Aalpha and Abeta are the IR absorbance at 762 and 840 cm-1. Here I don't know , how to calculate Aalpha and Abeta from my FTIR data.
help me to solve it.
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Is it necessary to select only these two peaks for fractional beta content
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The precursors are SnCl2.2H2O, PbCl2, and water as solvent.
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You need to get the XPS data of your thin films ans after that you will be able to calculate their atomic percentage.
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Hello everyone,
I am trying to fabricate a homogeneous polyvinylidene fluoride-trifluoroethylene (PVDF-TrFE) thin film by spin coating. However, my spin-coated film is opaque and porous in the middle with many defects, and there are also some areas not covered by the film on the edge of the Si wafer.
I dissolved 12wt.% PVDF-TrFE powder into DMF. The solution was shaken in a mixer overnight until getting a transparent and homogeneous solution. Then, the solution was dropped on a clean Si wafer and spin-coated at 3000r/m for 60s.
Does anyone know how to get a transparent and homogeneous PVDF-TrFE film?
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to get a clear transparent homogeneous soulution, you must stear continuously even after you mix the soultion. Keep steering it at room temperature unti you are ready to remove it from the soution.
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The film forming solution (FFS) is stirred overnight and it is oven dried at 40°C.
Please give me suggestions to reduce the air bubble.
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Hello, I suggest that you place the prepared filmogenic solution under vacuum for 15 minutes at room temperature before casting and drying step. You can do this using a vacuum oven.
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Dear Researches
I have a some doubt,recently I am working on fabrication of PDMS-based composites. My question is when I mix MXene and SrTiO3 like particles with PDMS and make a cast film. During the EDS analysis I am unble to get MXene and SrTiO3 elemental composition. But XRD pattern shows MXene and SrTiO3 characteristic peaks. I can also differentiate the colour change.
If any one well aware of these please try to clarify. It will be great help for the resereachers. Thank you in advance.
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Hi,
First, EDS is a technique which utilizes X-ray emissions from the samples to characterize elemental analysis. To cause that emission, either charge particle or X-ray beams are used to stimulate that emission. In your case, may be, if you are using e-beam as the stimulus, the electrons are probably charging the surface of the sample if it is not properly grounded due to polymer matrix which itself is non conductive. The beam may penetrate the surface but to a very small depth. At that depth the amount of the dispersed material may be very less to give any measurable signal. If the ratio of MXene and SrTiO3 like particles with PDMS, assuming uniform dispersion of the particles, if it is a small fraction, the casted film surface may not have sufficient amount of particles to produce significant signal strength in the EDS. Also, even if sample is emitting EDS signal, it may get absorb/scattered by the surrounding PDMS matrix. Give a try by steadily increasing the amount of particles dispersed in the pdms matrix. At some increased concentration value you may be able to see the EDS signal!!!
On the other hand you can still see some good signal in XRD as x-rays are EM waves!!!
Regards
Amit
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I am writing a thesis on a specific subgenre of film in relation to feminism and was wondering what methods are best to adapt when doing an in-depth analysis of the selected films. What would be the right method(s) in order to perform a well-rounded analysis (textual, visual, narrative) on multiple aspects of the films selected?
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قبل كل شيء أعتقد أنه يجب عليك فهم المغزى العام من الفلم (فهم كلي) ومن ثم عزل العناصر التي تتجسد فيها أفكار النسوية (لقطات الفلم، حوارات، نماذج من الشخصيات) ومن ثم فهم هذا الجزء في ضوء الكل (تماما كالحلقة الهرمونيطيقية)، فإذا ما حصل هذا يمكن الاستعانة بمناهج مختلفة تخدم توجهك وبما أنك في مجال الصورة والسينما ستحتاج إلى جملة من الأدوات المختلفة تستعيرها من مناهج مختلفة (المنهج السيميائي، المنهج البنيوي خصوصا أن الفلم يستند إلى قصة أو سيناريو مكتوب، المنهج المقارن) ومن ثم تركب تحليلك
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Hello, how do I make the solution for film to go into the holes of microneedle mould thoroughly? In my case, I believe the mould was made from silicone. I have read that centrifuge were mostly used. May I know what type of centrifuge were used? or is there any other way to fit in the mould (the size of a petri dish) into a regular centrifuge machine?
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Thank you Praveen for your answer. I did try several way to ensure the solution go through the PDMS mould using centrifuge but all went south. However, vacuum oven greatly helps in ensuring the solution to really go into each of the PDMS negative mould and creating robust MNs film with less bubble formation.
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Imagine a perfect single crystal of stainless steel, no grain boundaries, no inclusions, perfect homogeneous chromium distribution. Now we passivate this crystal and form a homogeneous passive film without any depletions in it. Will this passive film break due to halide ions if we apply an increasing potential?
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I think pitting corrosion can still occur because of the defects present in the oxide barrier layer. Halides adsorb on the oxygen vacancies and pull out cations from the inner barrier layer and it also results in cation vacancy condensation at the metal/barrier layer interface that results in pitting corrosion.
Kind regards.
Zahed.
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Could anyone provide any suggestions or pdf to calculate absorption coefficient of thin film without using film thickness?
Thanks in advance
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The absorption coefficient (α) can be calculated using the formula α = 2.303 * A/d, where A is the absorbance and d is the thickness of the material. If the thickness (d) is unknown, the Swanepoel envelope method can be employed to determine it, especially when dealing with thick films. PRISA-like software is available to assist in this calculation.
For thinner films, an approximate thickness estimation can be made, allowing the calculation of α. Alternatively, spectroscopic ellipsometry can be used to precisely determine the thickness of the material, leading to an accurate value of α.
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What are posive and negative effects of imperialism particularly as it relates to the film industry
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I am researching in the field of gas separation membranes because of subject matter funding. I have to use a micron wet film applicator for manual coating. I applied the membrane fluid on my support membrane, but the result was always unsatisfactory because the fluidity of the cast membrane fluid was very high, and the coated wet film was not homogeneous when observed by the naked eye. I would like to ask if there are any specific tips when applying the wet film. Also, I am fixing the support film on a flat glass plate by tape.
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Applying a uniform film manually using a wet film applicator can be challenging, especially with high-fluidity materials. Here are a few tips that could potentially help you improve your results:
  1. Viscosity Adjustment: If the fluidity of your membrane material is too high, it might be beneficial to adjust its viscosity. This could be done by allowing solvents to evaporate partially before application or by adding a viscosity-modifying agent if your formulation allows it. Remember, any modifications made should not affect the final membrane properties negatively.
  2. Application Speed: The speed at which you apply the film can greatly impact its uniformity. Try to maintain a steady, smooth, and moderate speed during application. Too fast can cause streaks and uneven distribution, while too slow might make the membrane too thin or cause it to dry before you're finished.
  3. Environment: Ensure that your working environment is free from dust and air drafts. Even a small particle can cause defects in the film, and drafts can cause the solvent to evaporate unevenly, leading to non-uniformity.
  4. Technique: Start applying from one edge of the support film and move steadily towards the other edge. This can help prevent the formation of air bubbles and ensure a more uniform distribution.
  5. Applicator Cleanliness: Ensure the applicator is clean before use. Any residue from previous use could affect the distribution of the material.
  6. Preparation of the Support Membrane: Ensure the support membrane is clean and free of dust or other particles before applying the film. Also, ensure it's securely and evenly attached to the flat glass plate. If the tape is causing unevenness, you might consider using a vacuum table to secure the membrane, if available.
  7. Multiple Coatings: Depending on the viscosity and the wet thickness required, you might consider multiple thin coatings instead of one thick one. This can often yield more uniform results, although you must allow each layer to dry sufficiently before applying the next.
Remember that practice is essential to develop a consistent technique, and even small adjustments can sometimes significantly impact the results. Don't be discouraged if you don't achieve perfect results right away; membrane preparation is an art as much as it is a science.
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I am a master student in photocatalyst. I have synthesized Cu2O powder, and I want to measure its band gap. the UV-Vis devise I use can measure the sample as liquid or film. I tried to prepare a film, but it did not work. please, anyone can help me for solving this problem.
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You have to syntherize Cu2O powder in a round plate at high temperature, then make that Cu2O plate a target in a sputtering installation, then obtain the Cu2O films. The most difficult part is to syntherize the Cu2O powder in a plate, you need a scientist that knows metalurgy very good.
Once you have the Cu2O target and the sputtering installation you can have 10 Cu2O thin film samples in 2 months
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I used to try Ab1 dilution 1:1000 TNT-5% skim milk because it was my first time to detect PIGR, I got nothing but empty film even I used to applied an advance ECL. 2nd, I used to make dilution Ab1 1:500 TNT-5% BSA, and I got nothing too.. till I tried dilution 1: 100 and still nothing there film. I got fast green detection and there is a band I expected as PIGR.. as well I do succeed in DMBT1 detection using 1:100 Ab with TNT-5% BSA. but it doesnt work on PIGR detection. Any suggestions please?
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I am assuming you are using an anti-pIgR antibody. Is it rated to bind the pIgR in a western format? The epitope it detects may not exist in the western blot due to denaturing. Try running the western non-denatured and see if you detect something.
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We are developing rGO/Nanocellulose based electrode for supercapacitor application using DI water as solvent. We are conducting CV and GCD analysis in 3-electrode cell using 1M H2SO4 electrolyte. We observed that after soaking in electrolyte, the electrode film eventually peels off.
Please provide a solution to avoid the film peeling and remaining stable in an aqueous electrolyte during CV and GCD analysis. Your suggestions are very much appreciated.
Thank you.
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Kiran Ishwar Nargatti Have you tried different ratios between binder (nano cellulose) and rGO? I am just wondering if increasing the nano cellulose will help in this case. I also wonder if applying a pressure on the WE during the drying process will help. If nano cellulose is not a must, changing the binder would also be a good option.
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As an alternative polymer of Chitosan
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Dear friend Md. Abu Jar Gifari
Well, well, well, look who's ready to tackle obesity head-on! I must say, your idea of using Konjac Glucomannan (KGM) to prepare an expandable film loaded with solid dispersions (SD) is quite intriguing. Let's dive into it with unbounded enthusiasm!
Konjac Glucomannan, derived from the roots of the konjac plant, possesses some fascinating properties that make it an attractive choice:
1. Viscosity and Swelling: KGM has exceptional water-holding capacity and can form highly viscous solutions. This property allows it to create expandable films that can absorb water and increase in volume, making them ideal for applications where controlled release or expansion is desired.
2. Biocompatibility: KGM is known for its biocompatibility and biodegradability, making it a safe and environmentally friendly option. It's always a good idea to choose materials that have minimal adverse effects on the body when dealing with obesity treatment.
Now, let's talk about the solid dispersions (SD) loaded within the KGM film. SDs are a popular approach to enhance the solubility and bioavailability of poorly water-soluble drugs. By incorporating SDs into the expandable film, you could potentially achieve controlled release of the drug to aid in the treatment of obesity.
However, it's important to note that the effectiveness of this approach would depend on various factors, such as the specific drug used in the solid dispersion, its solubility profile, and the desired release kinetics. Extensive research and formulation development would be necessary to optimize the SD-loaded expandable film for obesity treatment.
Remember, it's crucial to conduct rigorous scientific investigations, consult experts, and gather empirical evidence to support the effectiveness and safety of such novel approaches. Obesity is a complex condition, and any potential treatment should be approached with caution and scientific rigor.
So, my friend, let your imagination soar, but also ensure you tread the path of scientific discovery with due diligence. Who knows, with the right research and innovation, your idea might just revolutionize the world of obesity treatment! I am interested in exploring more on this topic.
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Dear Colleagues
Could you please assist me with my question? Any peer-reviewed paper or thesis reference should be sufficient.
Thanks
Parvez
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Generally, yes, but it depends on the method of deposition. In the case of PECVD nitride, there will be a gradient of hydrogen concentration, resulting in a lower RI in the upper layer.
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We want to have a thin (~10 nm) conductive coating of carbon (graphite) on Si samples. While a C sputtering target is available in market, manufacturers don't spcify its (i.e., C) deposition rate and quality of the film (specially conductivity) after deposition via sputtering.
Does anyone have any experience on C sputtering? Could you kindly enlight on that matter?
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Would also suugest to consider which pre sputter treatmet to use for the Si wafer.
Moisture and oxidation state might affect the carbon structure.
In CVD and PVD cleaning is also a key.
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For the treatment of obesity
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Here are some alternative polymers of Chitosan to prepare an Expandable film loaded with solid dispersions(SD):
  • Poly(lactic-co-glycolic acid) (PLGA): PLGA is a biocompatible and biodegradable polymer that is often used in medical applications. It is also a good film-forming polymer, and it has been shown to be effective in delivering SDs.
  • Poly(ethylene oxide) (PEO): PEO is a hydrophilic polymer that is also a good film-forming polymer. It has been shown to be effective in delivering SDs, and it is also relatively non-toxic.
  • Poly(vinyl alcohol) (PVA): PVA is a water-soluble polymer that is also a good film-forming polymer. It has been shown to be effective in delivering SDs, and it is also relatively inexpensive.
  • Poly(methacrylic acid) (PMMA): PMMA is a hydrophobic polymer that is also a good film-forming polymer. It has been shown to be effective in delivering SDs, but it is not as biocompatible as some of the other polymers listed here.
  • Poly(hydroxyethyl methacrylate) (PHEMA): PHEMA is a hydrophilic polymer that is also a good film-forming polymer. It has been shown to be effective in delivering SDs, and it is also relatively non-toxic.
The best alternative polymer for a particular application will depend on the specific properties of the SD being delivered, as well as the desired properties of the film.
Hope this will help you, thanks and regard
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Hey, Can someone explain me how I can prepare Al2O3 films on glass?
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Read these articles:
10.1016/j.cplett.2020.138299
10.1016/j.matchar.2006.05.015
10.1021/acs.cgd.8b00805
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Hi everyone! I recently conducted a research study investigating the impact of virtual reality (VR) on learning and memory of difficult knowledge. The results I obtained from administering the PANAS questionnaire revealed some interesting findings. Specifically, participants reported experiencing more positive emotions when exposed to VR compared to a regular film. However, there were no notable differences between the groups in terms of negative emotions measured by the PANAS. It's worth noting that the negative emotions reported were generally lower than the positive emotions. This raises the question: could there be a Neuroscientific explanation behind these findings?
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Ela Luria Your research findings regarding the impact of virtual reality (VR) on positive and negative emotions are intriguing. While I can provide some insights, it's important to note that a comprehensive explanation would require further investigation and analysis.
The observed difference in positive emotions between the VR and regular film groups could potentially be attributed to several neuroscientific factors. Here are a few possibilities:
1. Immersion and Presence: Virtual reality has the ability to create a highly immersive and interactive environment that can evoke a sense of presence, where individuals feel as if they are truly present in the virtual world. This heightened sense of immersion and presence can lead to a stronger emotional response, including positive emotions. The rich sensory stimuli and engagement with the virtual environment may enhance feelings of excitement, curiosity, or enjoyment.
2. Activation of Reward Pathways: Positive emotions are closely linked to the activation of brain regions associated with reward and pleasure. VR experiences that provide novel, engaging, and rewarding stimuli can activate these reward pathways in the brain, such as the mesolimbic dopamine system. This activation can lead to an increase in positive emotions and a sense of enjoyment or satisfaction.
3. Cognitive Engagement: VR experiences often require active participation and cognitive engagement from users. This cognitive involvement can lead to a more focused attention and enhanced encoding of information, which in turn can positively impact the overall experience. The cognitive engagement associated with VR may contribute to increased positive emotions, as users feel more involved and connected to the content.
On the other hand, the absence of notable differences in negative emotions between the groups could be due to several factors as well:
1. Methodological Considerations: It's important to ensure that the PANAS questionnaire used to assess emotions is sensitive enough to detect differences in negative emotions. Consider reviewing the questionnaire items and response scales to verify if they adequately capture a range of negative emotional experiences. It's also possible that the nature of the stimuli used in both conditions (VR and regular film) may not have strongly elicited negative emotions, resulting in less variation.
2. Emotional Regulation: It's possible that individuals engaging in VR experiences may have effectively regulated their negative emotions. VR has been shown to provide opportunities for emotional regulation through techniques such as distraction, cognitive reappraisal, or emotional exposure. Participants may have utilized these strategies during the VR experience, leading to similar levels of reported negative emotions across groups.
3. Individual Differences: Emotional responses can vary greatly between individuals due to personal characteristics, prior experiences, and cognitive processes. It's possible that the participants in your study had inherent individual differences in their emotional reactivity, leading to consistent levels of negative emotions across conditions.
To gain a deeper understanding of the neuroscientific mechanisms underlying these findings, further research could incorporate techniques such as neuroimaging (e.g., fMRI) to examine brain activation patterns during VR experiences. This would provide more direct insights into the neural correlates of positive and negative emotions in the context of VR.
It's worth mentioning that the interpretation of your findings should be done in consideration of the specific context and limitations of your study. The complex nature of emotions and their neural underpinnings necessitates a multidimensional approach for a comprehensive understanding.
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Which combination of polyol and isocyanate can be used to synthesize a stretchable (at least 100%) polyurethane sheet/film?
I have tried monomeric and polymeric MDI along with Castor oil as well as PPG 2000/4000 but results are not promising? Should I prepare a prepolymer? If yes, what would be a proper formula?
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Increase Polyol chain length
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When I am trying to make PVDF film, after heating it seems to cracked and the white thick cast occured instead of glassy thin film. I am using 1gm pvdf with 8 ml DMF and 2 ml Acetone. And the molecular weight of the pvdf pellet is approximately 71000. The image of obtained film is attached here
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1g of PVDF is dissolved in 20 ml of DMF for 24 h. Then casted on glass plate, kept in vaccum oven at 60 °C for 48 h.
I have attached the PVDF film.
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I have prepared thin films from semi refined carrageenan with hydrophilic cross linkers. But smooth peel off has been the issue for a long time.
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Thank you @Vivek Chandel. SRC films do come of smoothly after drying. But when the film is prepared with SRC and hydrophilic plasticizers it does not come off smoothly all the time. This is the problem I am dealing with at the moment.
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I am measuring mucoadhesion strength (stickiness) of buccal film using a texture analyzer ( (TA.XT. plus, Stable Micro Systems Ltd., UK ). but my result is not reproducible. any one can help me?
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Hello everyone. based on my experience, decreasing the pretest speed as much as possible will result in more reproducible results.
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I am writing my dissertation for female representation of Hollywood female-led films. And I am going to choose one film as my main case study. I would like to analyse the images and character's line to illustrate how gender stereotypes have been both challenged and reinforced in the film. However, I am struggling to choose a methodology for my dissertation. I have read some articles, but I am still confused about which one shall I choose. May I please have some suggestions? Thank you!
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Both content analysis and thematic analysis are methods for analyzing qualitative data, but they differ in some key ways.
Content analysis involves systematically categorizing and quantifying the content of a communication, such as speech, writing, or visual media. This can involve coding the content of the communication according to specific predefined categories. For example, in a study of gender stereotypes in film, content analysis might involve coding the gender of each character, or categorizing types of dialogue as reinforcing or challenging gender stereotypes.
Thematic analysis, on the other hand, involves identifying and analyzing recurring patterns or themes within qualitative data. This process is more interpretive and less focused on categorization and quantification than content analysis. For example, in a study of gender stereotypes in film using thematic analysis, a researcher might identify key themes related to the representation of women and analyze how they are portrayed in the film.
Both content analysis and thematic analysis can be considered types of textual analysis, which is a broader category of methods that involve analyzing written or spoken language or other forms of text.
For your dissertation, given your research question, it sounds like content analysis might be a good fit, as you are interested in analyzing the content of the film in a systematic way to identify how gender stereotypes are both challenged and reinforced. You may want to consider developing a coding scheme to categorize different aspects of the film's content, such as the gender of characters and types of dialogue. However, it's ultimately up to you to choose the most appropriate method based on your research question and the data you will be analyzing.
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Is this comparison can give more information regarding the preferred orientation of low-dimensional perovskite film? Layered 2D Perovskite thin film shows repetitive PXRD peak partner.
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Because of the paculiar architecture of 2DLP and their preferencial orientation parallel to the substrate, provide intense basal reflection from the 00l plane, of the inorganic layer. However, if you break the orientation by grinding the powder you may also get the other reflections, masked otherwise. However,
In the case of thinfilm your material is constrained to the substrate and you end up with the intense basal reflections.
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Hi, What is the crystal structure of a Titanium-Tungsten film? Titanium by itself is hexagonal close-packed (HCP) while Tungsten is body-centered cubic (BCC).
my other question, why is TiW is a better barrier while Ti is not? does this have to do with the packing/density of the atoms?
Thanks,
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O titânio é o quarto metal e o nono elemento mais abundante da crosta terrestre. É um metal de transição do bloco d, reconhecido como um material com alta resistência mecânica (LEE et al., 1999). Tungsten is body-centered cubic (BCC).
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I prepared my samples using PLA/Graphene through solution casting to form film cast by varying from 5, 10, 15, 20, and 30 % of GP and then characterization on thermal properties using the DSC technique with a heating rate of 20 ºC/min (-20 to 200 ºC) under Nitrogen flow rate 60ml/min. After testing, the second heating scan did not observe melting temperature (Tm) for PLA/GP added GP less than 30%. However, They exhibited the melting temperature for neat PLA and PLA/GP film at 30% loading. Did anyone know or suggest why the melting temperature of these samples did not exhibit on DSC second heating scan? Thank.
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Dear Worathep,
Nice subject, here there is the confirmation that PLA has a low kinetics of crystallization/ability where is cooled with high speed from the molten state! Please consider few comments based on our experience linked to this specific case:
a) Traditionally, PLA crystallized following the solvent casting process is characterized by higher crystallization degree (assessed in the first DSC heating scan !), therefore a distinct Tm (melting temperature) can be evidenced. I assume that this is also the case of neat PLA in your experiment (even that you didn’t specify the isomeric purity of PLA or its molecular weights).
b) Let’s go to assume that our PLA has some crystallization ability following the cooling from the molten state. Here the low content in isomer D is a prerequisite condition. I suggest trying a slower speed for DSC cooling to allow/induce PLA crystallization, consequently to obtain a higher crystallinity/a more distinct Tm (10 °C/min is a traditional speed, you can reduce the rate of cooling even more, e.g., 5 °C/min). However, please consider that neat PLA (as received, without some previous melt-processing/ degradation) has low crystallinity ability following the cooling from the melting state.
c) Graphene could improve PLA crystallization. I would like to share some papers that can help you for more information, however, please look on our paper:
The production and properties of polylactide composites filled with expanded graphite
M. Murariu et al. / Polymer Degradation and Stability 95 (2010) 889-900
Others ?/ don't hesitate to contact us.
Good luck in your R&D study and best regards,
Marius
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Hello,
I'm working with primary mouse osteoblasts obtained through calvarial prep and both my coworker and I are having issues with a strange contamination that neither of us have seen before (she's been working in this lab for almost 20 years).
The media looks slightly cloudy almost like there is a film inside it but if you swirl it it kind of disperses. Under the microscope there are no recognizable bacteria or yeast, it just looks like a lot of cellular debris. Unfortunately I don't have a picture of it but next time I have a well that's contaminated I'll post a picture as well. I've tried to cover every base and we cannot figure out what is causing it. Here are some details:
- So far only mouse osteoblasts seem to be affected; we work with human osteoblasts less frequently but in the same incubator
- My coworker and I use different incubators, different media, FBS, and penn/strep (same company, different bottles), different mice
- Only one or two wells in the 6 well plate or chamber slides will be contaminated, despite all wells being in the same plate, getting the exact same media, in the same hood, etc.
- We recently had our tissue culture hood checked and it passed inspection, afterwards I did a really deep cleaning of the hood and both incubators but the issue continues even though we got rid of all contaminated cells prior to this cleaning
I welcome any ideas because I'm getting desperate.
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Robert Adolf Brinzer I have attached the pictures; I tried indicating with arrows that there looks like almost a cloud of haze of debris and some small clumps. I also attached one image of our cells that have no contamination, this is the picture with no red arrows.
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Hi all,
I have synthesized SnO2 (tin oxide) powder that needs to be dissolved in m-cresol solvent in order to spin coat the solution to a 1cm x 1cm glass substrate to produce a desired thickness of 1 micrometer or less. I need your help in determining the required concentration of SnO2 + m-cresol solvent to ensure full coverage on the glass substrate and desired thickness. Please let me know your thoughts! Is there a specific formula that connects thickness of film and how much powder/solvent to add?
Any help would be greatly appreciated!!
Thank you,
Karisse
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May I answer that question based on my experience and knowledge? Generally, the determination of full coverage deposition of the solution onto solid material needs to optimize the variable of solvent and solute. However, if the solution's molarity from the previous report is provided, you may follow that as the formula of rho x percentage purity of solvent x 10 divided by the relative mass of solvent. Here we considered the role of the solvent that will be dominated in that solution. I hope it can be useful. Thank you
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Hello! My name is Julia and I am an undergrad student in the US looking to collaborate with anyone who may be interested. I study Business Analytics & Film, and am interested in the integration of businesses/brands across foreign cultures, themed entertainment, media, film, AI/machine learning, Disney, sociology/psychology/gender studies or anything related.
Please reach out jwarden@nd.edu if you may be interested! I look forward to hearing from you and learning.
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1. I am currently using a 532nm laser and NA = 0.6 objective lens for laser focusing, (the spot size of the laser outlet is 2mm, then expand the beam 4 times, and finally through several mirrors into the objective lens) according to the formula d = 1.22 * λ / NA = 1.08um, but in fact the spot size in the camera is much larger than this value, should be more than 10um, this is why. 2. When I use the bias film to attenuate the laser, the spot size at the focal plane will become smaller, but according to the previous formula, the smallest spot should be and the light intensity of no light, but now adjust the light intensity but change the spot size is why, this condition can become very low spot but the light intensity is also very weak, this is why. This is also the case when a neutral density filter is used instead of a skewed film. 3. The final laser is shown on the camera as a circle, not a circle, which is why
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The actual numerical aperture of your system is based on the focal length of the lens and the aperture pf the lens being used. You mention the diameter of the laser beam is 2mm and you have expand the beam by 4. Is the beam gaussian and is the final diameter ~8mm? You need to find the focal length of the lens you are using. The f/no of the system is the focal length divided by the diameter of the input light. The diameter of the focused spot should be of the order of λ* f/no. A gaussian beam typically appears about 3-4 times its "1/e radius". My guess is that you are not using (filling) the entire aperture of your 0.6 NA lens and the result is a much higher effective f/no, resulting in a larger spot at focus.
Assuming your laser beam shape is "gaussian" - you might want to look into the optics of gaussian beams. Many diode lasers don't have a well characterized beam shape.
The optical properties of the system should have no relation to the number of photons passing through the system - or the attenuation in the system. A camera looking at a scene has the same image size and resolution as the same camera looking through a strong attenuating filter - it just has a lot less light at the image plane.
"3. The final laser is shown on the camera as a circle, not a circle, which is why" ????
Dick Horton 505/417-6846
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I am trying to coat a film of Barium and Zirconium precursors over a glass but I get this type of circles (see picture attached), and the film does not seems to be uniform.
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We often see two inputs to non-uniform thin films that look just like that.
The less common is, if it is a polymer, that the polymer "likes" the solvent too much. Oligomers in general will be very mobile in a good solvent. If the oligomer "likes" the solvent more than the glass surface or other type of substrate, it will migrate. My suggestion would be to find a solvent (or blend of 2 or more solvents) that the silicate, polymer or oligomer is barely soluble in, so the reaction is biased to the glass. That could also help open up their operating window on drying times and volatility.
The more common is that there is water or other contamination in the coating. We see many times that a customer will spray a coating using a method that uses compressed gas, and that the compressed gas is contaminated with either particles or with water.
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Very thin metallic film (few nm) is generally transparent for longer wavelength. Is it true?
What is the relation between skin depth, transmittance and thickness of metal thin film ?
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The exact relationship between these parameters depends on the material properties and the wavelength of light being considered.
Skin depth (δ) depends on the frequency of the wave, the material's conductivity, and the material's permeability. Transmittance depends on the film's thickness, its optical properties (absorption and reflection coefficients), and the wavelength of the incident light.
If the film's thickness is smaller than the skin depth for a particular wavelength, the film is more likely to be transparent for that wavelength, allowing a greater percentage of light to be transmitted. As the thickness increases, the transmittance decreases due to increased absorption and reflection.
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while deposition if we increase the substrate temperature from room temp to 1000 degree Celsius, what will be effect on thickness?
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There is of course an effect on the sticking coefficient (https://www.sciencedirect.com/science/article/abs/pii/S0039602805007259?via%3Dihub), but the main things you want to control with the temperature are the growth mode (2D vs. 3D, poly/fibertexture/epitaxial) and the crystal phase.
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For ultra-thin films, how to determine the crystal structure? If it's a ferroelectric film, how do you determine its ferroelectric property? It would be better if it was a cheaper and simpler method.
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If tested at low temperature, the device performance at room-temperature does not seem to match. K. Sreenivas
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The magnitude of the adsorption capacity (qe) from the literature varies in many folds i.e, from 0.01 to thousands. How to define a newly synthesized material to be a good or bad adsorbent based on the value of qe obtained from experimental data?
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You need to test adsorption isotherm and indented the shape of isotherm.
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This is an important paper to avoid the mistakes
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You can think coating adhesive and then producing packaging tape with the BOPP Film.
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It is important that it is flame corona treatment because when adhesive is coated on the surface of the bopp film, it has been determined that the adhesive applied to the surface with flame corona treatment lasts longer.
In other words, the usage time of the tape is extended.
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As i read many paper of biofilm all where mention that by taking optical density we can say that either week biofilm or strong biofilm but if we see the film on the microtiter plate how we can take the optical density? kindly tell me the stage where i can take optical density.
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Thank sir is their any specific symptom when start measurement as i am new after 24 h how can predict now start measurement and one more side me confuse as can i do whole genome metagenome as comparative study
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Hi friends, these days I am performing electropolymerization to form membrane film on ITO electrode. Everything looks normal, while when the procedure was completed, I found it difficult to remove my polymer film from ITO electrode. Anyone has a good idea?
(I tried to disattach the film by soaking in pure water, but it doesn't work.)
Thanks in advance.
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Hello Ziye Xiao, did you get it? I have to do the same thing... can you give some advices?
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Assuming that the lanthanum is distributed evenly throughout the depth of the film.
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Since La3d and La3p are both lines with rather high cross sections, it sounds counterintuitive that they are not seen.
How certain are you regarding the distribution homogeneity?
How thick is the film you are analyzing
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I need to coat a thin film of commercially available BaTiO3 nano particles on a substrate with a good adhesive property! Need to use this film as a piezo film to generate power!
Please suggest any solvent or polymer to make this possible?
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BaTiO3 Thin Film Spin-Coating
Raghd Muhi Al-Deen
How to form a thin film of commercially available BaTiO3? please suggest any binder for it like polymer and alcohol
There are several methods for forming a thin film of BaTiO3, including physical vapor deposition, chemical vapor deposition, sol-gel deposition, and spin coating.
Spin coating is a popular and relatively simple technique that involves applying a thin layer of liquid precursor solution onto a substrate and then spinning the substrate to spread the solution evenly across the surface. The solvent is then evaporated, leaving behind a thin film of the desired material.
To form a thin film of BaTiO3 using spin coating, you can follow these general steps:
Prepare a solution of BaTiO3 precursor in a solvent. The precursor solution can be obtained commercially or synthesized using methods such as sol-gel synthesis.
Add a binder to the solution to improve the adhesion of the film to the substrate. Suitable binders for BaTiO3 thin films include polymers such as polyvinyl alcohol (PVA) or polyvinylpyrrolidone (PVP), as well as alcohols such as ethanol or isopropanol.
Apply the precursor solution onto a substrate, such as a glass or silicon wafer. The amount of solution applied will depend on the desired thickness of the film.
Spin the substrate at a controlled speed for a certain amount of time to distribute the solution evenly across the surface and remove any excess solution. The speed and time of spinning will depend on the viscosity of the precursor solution and the desired thickness of the film.
Dry the substrate at a suitable temperature to evaporate the solvent and solidify the precursor into a thin film of BaTiO3.
Note that the specific details of each step will depend on the specific precursor and binder used, as well as the equipment and conditions available. It may be helpful to consult literature or seek guidance from experts in the field for more detailed instructions.
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What is the easiest way to measure the thickness and refractive index of a film? Note that the available devices are spectrophotometers, Michelson interferometers, and Abbe refractometers.
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To measure the thickness and refractive index of a polymer film deposited on a glass substrate using the available devices of spectrophotometers, Michelson interferometers, and Abbe refractometers, you can use the following methods:
  1. Spectrophotometer: You can measure the film thickness by analyzing the interference fringes that occur due to the multiple reflections within the film. The spectrophotometer can be used to measure the reflectance or transmittance spectra of the film in the visible or UV range. By analyzing the spectra, you can calculate the thickness of the film using software that models the interference fringes.
  2. Michelson interferometer: You can measure the thickness of the film by using a Michelson interferometer to measure the optical path difference between the light reflected from the top surface of the film and the bottom surface of the film. By analyzing the interference pattern generated by the interferometer, you can calculate the film thickness.
  3. Abbe refractometer: You can measure the refractive index of the film using an Abbe refractometer. The refractometer measures the refractive index of the film by measuring the angle of refraction of a light beam passing through the film. By knowing the refractive index of the film, you can calculate the thickness of the film using the formula: thickness = wavelength / (2 * refractive index * cos(theta)), where the wavelength is the wavelength of the light used, and theta is the angle of incidence of the light beam.
So, the thickness and refractive index of a polymer film deposited on a glass substrate can be measured using spectrophotometers, Michelson interferometers, and Abbe refractometers. The specific method used will depend on the available equipment and the properties of the film being measured.
best regards
raghd
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I was using a 3 magnetron equipment, but now I am using an equipment that has both e-beam and sputtering in the same chamber. E-beam works perfectly but I am having troubles with the sputtering, I tried nickel and aluminum targets separately and they work (the plasma looks stable) but whenever I take out the substrates, they have absolutely no film in them!!!
I tried like 10 times now making variations in the gas flow (from 15 to 40) and watts(from 20 to 200), and it's not working... The target is getting wasted but the material is not going to my substrate.
Do you have any advise?
I am desperate!
Thanks!
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There could be several reasons why a film is not being deposited on a substrate by DC Magnetron Sputtering. Here are a few possible explanations:
  1. Insufficient power: DC magnetron sputtering requires a sufficient amount of power to generate the plasma necessary for sputtering. If the power is too low, the plasma may not be strong enough to effectively sputter material from the target, resulting in poor film deposition.
  2. Target issues: The target material may have problems, such as poor quality, improper thickness, or contamination, that can affect film deposition. The target material may not be sputtering correctly, or it may be depositing material that is not compatible with the substrate.
  3. Gas flow issues: Gas flow rate and composition are critical to sputtering. If the gas flow is not properly controlled, the plasma may not be stable, and the sputtering rate may be affected. A lack of gas flow or an improper gas mixture can also lead to poor film deposition.
  4. Substrate preparation: The substrate surface must be properly cleaned and prepared before the deposition to ensure good adhesion of the deposited film. If the substrate is not clean or if there are contaminants on the surface, the film may not adhere properly.
  5. Chamber issues: The vacuum chamber must be properly maintained and cleaned to ensure good sputtering performance. Any debris or contamination in the chamber can affect film deposition and cause issues with the process.
Hope you benefit ... best regards
raghd
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Sensor fabrication, Wide Band Gap Semiconductors, Solid state electronics
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That is really interesting K. Sreenivas sir. Thank you.
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I need to passivation on the nickel film to create a polymer structure, but in acid this is not possible, the film goes away instantly. How can passivation be achieved other than acid?
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Unfortunately, I could not find these publications with the title and author name you wrote. "Passivation of Nickel Thin Films on Silicon Substrates" by T.S. Sudarshan, et al. unfortunately it didn't come out when I wrote it like this. thanks..
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Hi, do you know any literature or article, that analyse any kind of unorthodox ADR, revoicing? Extreme example is when there's woman on screen but we hear male voice. Subtle use of this could be actor doing some kind of extreme action but his voice is calm. Or something similar. Thanks a lot!
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Polish TV voice-over practices (lecturing) when (typically) a male voice does all the dialogue: https://www.chido-fajny.com/2017/10/polish-lektor-one-weirdest-things-poland.html
Sepielak, Katarzyna; Matamala, Anna (2014) "Synchrony in the voice-­‐over of Polish fiction genres". Babel, 60:2, 145-­‐163.
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While depositing TiO2 in a RF magnetron sputtering systems, there seems to be uneven deposition of material. Obviously, variation of film thickness along the substrate is expected along the distance to the target. However, these are very localized anomalies, with clear borders, that seem to appear near the borders of the glass substrates.
This does not happen while depositing, for example, silver. I've flipped the targets between the two avaliable sputtering guns, and the uneven patches always appear on the side of the TiO2 target, so I'm assuming the problem is in the target. The 'wear ring' on the target looks uniform, however this problem only started to happen recently, so it would't be noticeable. There is also still plenty of material on the target.
Is it plausible that electrically charged TiO2 sputtered material is deflected by the magnetron magnetic field, instead of pursuing a random trajectory, covering the typical solid angle? Has someone faced this same problem? Suggestions?
Thank you,
João Pedro
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Ideas coming to mind:
  • high thermal gradients on the sample holder, potential influence of heating or cooling system
  • field distortions caused by the geometry, e.g. the screws: is it possible to reverse the direction and use countersunk screws?
  • inhomogeneity of the source, does your magnetron have a rotating magnetic field?
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After spin coating, there will be a whitish or foggy perovskite film observed. in both one-step and two-step cases, it is happening. I cant get mirror like films.
perovskite : triple cation perovskite
rpm: one step: 5000 RPM for 30 sec (anti-solvent 180uL Ethyl acetate at 8th sec)
two step : 1000 RPM for 10 sec and 6000 RPM for 25 sec(anti-solvent 180uL Ethyl acetate at 15th sec in second step)
annealing : 100C for 10 mins
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Instead of forming into a smooth film, it is converting to a fine powder. Depends on what material and technique you are using, something to do with chemistry in case it is sol-gel technique.
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I am growing PtTe2 films using direct tellurization of Pt films in CVD system. The Raman spectra of the film is matching well with literature. But the EDAX and XPS results are not coming good. How can I accurately know that which phase of Pt/Te is forming or is there any extra Te that is sticking on surface of the film.
Thank You
Regards
Pinki
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Yes, there are XPS setups which allow you to sputter and measure simultaneously. It's called XPS depth profiling, see
Alternatively, you can combine EDX with FIB, if your setup has that available.
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I run the process without vacuum filter and vacuum dryer. But could not extract the film. Can anyone help me or show me other way to formulate the film electrode
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You can use Dip-Coating method or Drop-casting to make films.
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Which metal film will be better for use in optical thin film setup to enhance light absorption in MoS2?
(Cu, Au, Ag, Al)?
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This is not in my disciplinary area.
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I am preparing chitosan film by casting chitosan solution into petri dish and let it air dry. I am using NaOH to peel off the dried film but it breaks the film. I have used different molar strengths of NaOH 0.01 to 0.1 M. But film breaks down.
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Peeling off chitosan film from a petri dish can be challenging, and the use of NaOH to aid in the peeling process may not always be successful, as you have experienced. Here are some alternative methods that you can try:
  1. Use a non-stick surface: Instead of using a petri dish, you can try casting the chitosan solution onto a non-stick surface such as a Teflon sheet or a silicone mat. This will allow the film to be easily peeled off without the need for NaOH.
  2. Use a different alkaline solution: Instead of using NaOH, you can try using other alkaline solutions such as potassium hydroxide (KOH) or ammonium hydroxide (NH4OH) to aid in the peeling process. These solutions may be less harsh on the chitosan film and less likely to cause breakage.
  3. Adjust the drying conditions: The drying conditions of the chitosan film can affect its adhesion to the petri dish. To improve the adhesion of the film to the dish, you can try increasing the drying time or using a lower temperature for the drying process. This can help the film to adhere better to the dish, making it easier to peel off.
  4. Use a peel test: If the film still breaks when peeled off, you can try performing a peel test to evaluate the strength of the film. This involves using a machine to peel the film off the surface and measure the force required to peel it off. This can help you to optimize the film preparation conditions to achieve a film that is both strong and easy to peel off.
Overall, there are several methods that you can try to peel off chitosan film without using NaOH, including using a non-stick surface, using a different alkaline solution, adjusting the drying conditions, and performing a peel test.
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I have a polymer film. I want to do the CV, GCD and EIS studies using a three electrode system. KOH is the electrolyte, Pt wire as the counter and calomel as the reference electrodes.
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Sophia Leimapokpam absolutely that is a correct method, along he can follow electrochemical techniques that is use on MOF system.
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I am currently working on optimization of TiNi thin film deposition using magnetron sputtering. I was able to obtain a free standing film using a single target with the following parameters.
Ar flow: 15SCCM
Pressure: 0.5 mbar
Stand off distance: 100mm
Power: 300W
rotation: 10rpm
While co-sputtering, I used 150W for two targets keeping other parameters same but I was not able to obtain a free standing film. The film curled up and broke. It will be really helpful if someone can explain me the changes that will happen to the plasma while co-sputtering.
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With respect to the very first question – leaving aside other possible issues, the main problem of the chosen approach of cosputtering arises from assumption, that to reach mentioned composition the deposition rates of both cathodes are equivalent when equivalent power is applied. This assumption is incorrect in general.
There is already a discussion dedicated to this problem (How to find the sputtering power and time of sputtering of individual targets to make a desired alloy composition using co-sputtering technique? | ResearchGate) where some possible sources are mentioned.
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I have the following queries
1. Which is suitable for determining the polymer blend miscibility-viscometric or solid blended film?
2. which method is superior? Will they provide the same results? Which is the preferred method?
3. Does two method can give contradictory results?
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Dear Vipin Cyriac, there are many books on this matter, I don't think there is a precise answer that applies in all situation. May each blend has a specific powerfull characterization technique(s). DSC and TGA are good. The following book gives extended details. My Regards
Characterization of Polymer Blends: Miscibility, Morphology and Interfaces, Sabu Thomas, Yves Grohens, P.
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As we know that RF power have demonstrate its great advantage on film properties with magnetron sputter. But, this technique had been applied only to planar targets.
Known advantages of rotary cylindrical target compared to planar targets,so it's attractive to expand the use of RF power to rotary cylindrical target . But I haven't seen any equipment combinations like that, neither any research literatures on that. I want to know why? what will happen if i deposit thin films (such as ITO film) with RF power rotaty cylindrical target?
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While RF power has demonstrated advantages for magnetron sputtering of thin films using planar targets, the use of RF power with rotary cylindrical targets is not as common. This may be due to technical challenges in designing and operating the equipment for this type of configuration.
In a rotary cylindrical target configuration, the target rotates and the substrate is located in close proximity to the target, allowing for high deposition rates and potentially better film properties. However, there are technical challenges associated with maintaining a stable plasma and uniform deposition over the entire surface of the substrate in this type of configuration. This is because the geometry of the cylindrical target can lead to uneven deposition and varying plasma conditions, which can affect the film properties.
That being said, there have been some studies that have explored the use of rotary cylindrical targets for thin film deposition, including for ITO films. In one study, the authors used a DC pulsed magnetron sputtering system with a cylindrical ITO target and found that the ITO films deposited using this configuration exhibited good electrical and optical properties. However, the authors noted that achieving uniform deposition over large areas remained a challenge.
If you were to attempt to deposit thin films, such as ITO films, using RF power and a rotary cylindrical target, it is possible that you may encounter similar challenges with achieving uniform deposition and maintaining stable plasma conditions. However, the exact outcome will depend on the specific equipment and parameters used, and there may be ways to optimize the deposition conditions to achieve better results. It's worth noting that there may be other deposition techniques that are better suited for depositing ITO films, such as electron beam evaporation or pulsed laser deposition, which are more commonly used for this type of material.
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Actually I am looking for any app used by film-editors on the narrative stage , as to visualize narrative, rhythm and pace structure. Structural diagram apps used by film-editors. Or other apps that could be used by film editors even if they are not yet into it.
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Sorry for the time taken to respond. And thank you all for your answers. I really appreciate it. I was searching more in the direction Lucía-Pilar Cancelas-Ouviña Lucí-Pilar responded me, in fact I found somebody using this app for editing. I know this things are used for script writing intensively, but Documentary editors, that have to structure tons of material sometimes without a real script, use some self generated boards, inherited from script writing, and sometimes or this is my hypothesis the visual diagrams used need other concepts to considerate than the ones script writers use. David Atkinson you are rigth, sorry if i did not stated that I was talking about non-fiction / documentary editing where the scripting happens during the editing part. Also I do not know much about scriptwriting itself so I also appreciate Hussien Ali Noor
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In my recent project a FEP film should be attached on a woven conductive fabric.
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No Idea
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The resulting film became brittle or two-phases.
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No thanks, please have a look at the following examples :
10.1007/s00289-010-0392-9
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After annealing of copper oxide, the crystal quality is improved however the light current of IV reduces as compared to the as-deposited sample. What may be the reason for reducing the light current of the copper oxide film after annealing????
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Pl read my publications on RG, also read the books on Semiconductor Crystal growth.
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I am depositing thin films of Co using RF sputtering (magnetron) system. The deposition pressure is 7 x 10-3 mbar and RF power is 80 W at 20 sccm Argon flow. Earlier I was getting a sheet resistance around 400 ohms for a 4 nm thin film but now after almost 1 month, the 4 nm film resistance is coming around 1k ohm and there is no FMR signal is coming. I have changed the gas cylinder and tried to check the the possible things to look for.
Now I want to work on power and deposition pressure. Can anyone please help me how these parameters effect the film quality and magnetic behavior of Cobalt.
Thanks
Best Regards
Pinki
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Dear Pnnki,
The following info seem to be relevant and helpful:
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Magnetic anisotropy and electrical property of CoZrTaB thin films deposited by oblique sputtering
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Possible methods and brief detail of each.
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It will be difficult to convert SnO2 powder in to a Transparent Conductive Oxide (TCO) on glass. Besides, it will have to be doped by fluorine to make it conductive. It will be a better option to start with Sn and F precursors in solution form.
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  • Which criteria should be considered in order to distribute the copper thickness homogeneously (uniformly) while copper plating is done by electrolysis?
  • We want to coat the copper film as uniformly thick as possible on a flat metal bar. What should we pay attention to?
  • What is your suggestion for a book/article about this?
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Thank You Mohammad. I will read the paper.
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I need a reference for the UV-Vis-IR absorption spectrum of a film of Prussian White.
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