March 2025
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10 Reads
Sensing and Imaging
In this paper, a new ion selective tunneling field effect transistor (IS TFET) based on double gate (DG) aspect and SiSn-Si-Si heterojunction channel is proposed. The device is numerically modeled based on band-to-band tunneling model (BTBT) using ATLAS 2-D simulator. The effect of SiSn alloy as a source region in DG TFET platform on the pH sensor performance is investigated. It is found that the use of 40% Sn containing in SiSn source region can allow achieving a high sensitivity of 86 mV/pH, far surpassing the Nernst Limit (59 mV/pH). This enhancement can be attributed to the role of the Sn concentration in reducing the tunneling barrier at the source/channel interface, leading to modulate the pH sensitivity characteristics. Furthermore, the impact of various high-k dielectric gate oxides such as Si3N4, Al2O3 and HfO2 on the device sensitivity is analyzed. Our analysis highlights the ability of the proposed pH sensor for offering a high sensitivity of 104.9 mV/pH, while maintaining a very low leakage current. Therefore, we believe that the present work can open up new pathways to develop highly-sensitive pH sensors with low power consumption using CMOS-compatible TFET platform.