Somchai Arunrungrusmi's research while affiliated with King Mongkut's University of Technology Thonburi and other places

... Another area of focus consists in developing methods for localization and identification of transformer faults. A literature overview shows that methods based on locating PD hotspots and comparing their location to the equipment layout (windings, OTLCs, etc.) in the transformer tank [78][79][80] are more promising. ...

... Note that because solar energy has a high intensity in the absorbance wavelength 450-550 nm, which has a wavelength close to the film obtained 29 . In addition, when the oxygen flow rate is steadily increased, the absorption coefficient (a) of the film would be shifted onto the ultraviolet (UV) (<350 nm), which can be calculated by Lambert's formula 11,12,16,30 . In this point, it affects to the optical band gap values of the films. ...

... Moreover, it shows a jagged hole and a groove on the surface is decrease. The lower oxygen flow rates have importantly affect to the ITiO films, which cause to the surface have a free space and electron concentration will be increased 33,34 . ...

... Thus, some approaches could be proposed to improve the performance of in-plane interdigital MSCs to increase the energy-storage performance and enhance the robustness of the electrode materials, such as three-dimensional nanostructures designed to increase the specific surface area, enhance the adhesion between electrodes and the substrate, and optimize the size of the device. Oblique angle deposition [13][14][15] is a technique to form three-dimensional oblique nanowire arrays by electron beam evaporation, which allows the material to grow on a tilted substrate. It can be used to prepare high specific surface area, non-binder electrodes for interdigital MSCs, thereby increasing the capacity and energy density of MSCs and improving the flexibility by making the material more firm on the substrate. ...

... 5 Their intensive uses are because of their suitable physical properties, such as the high transmission in the visible region, nearly metallic conductivity, 8,9 high reflectance in the infrared spectral regions, 10,11 good adhesion to the substrate, and high thermal stability. 12 Structural, optical, electrical, and thermoelectrical properties of sputtered ITO depend on various deposition condition parameters, such as the argon pressure, 13 RF power, 14,15 initial pressure, oxygen concentration, 16 deposition time, 15,17 heat treatment, 1 angle of incidence of the deposition on the substrate, 18 ITO target crystallinity, 19 film thickness, 2,15 temperature of the substrate, 20 annealing temperature, 21 percentage of nitrogen in the argon plasma, 11 substrate type, and oxygen flow rate. 22 ITO thin film nanostructures are generally n-type with a direct transition wide band gap of ∼ 3.6ev. ...

... These materials oxides are semiconductors, which has a wide band gap, there are also other advantages including good insulators, transparent electronics, and photonics. These oxide materials have been widely used in many flexible devices, for instance, flexible solar cells, electroluminescence (EL), thin film transistors (TFT) and others [4][5][6] . ...

... For EL devices, the voltage applied is about 100-500 V and frequency is about 400-800 Hz. The electric field flows through the phosphor layer causing the distribution of phosphor material [13] and collision electron fast transfer between the electrode which is based on frequency [14][15][16][17][18]. ...

... In addition, by this process, organic contaminants can be removed from the surface and the surface can be controllably modified such as changing the chemical functional groups on the surface. [5][6][7] From the experimental results of these authors thus far, it has been clarified that, in the gas mixture of Ar + O 2 in the vacuum chamber, the electrons and oxygen radicals generated in the plasma temporarily adhere to the poly(ethylene naphthalate) (PEN) film surface and cause chemical reaction on the surface to improve hydrophilicity. [8][9][10] Thus, plasma surface treatment is a useful technique for enhancing the adhesive properties in the cluster manufacturing industry of flexible solar cells. ...