Mark R. Lucksinger's scientific contributions
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It was automatically created by ResearchGate to create a record of this author's body of work. We create such pages to advance our goal of creating and maintaining the most comprehensive scientific repository possible. In doing so, we process publicly available (personal) data relating to the author as a member of the scientific community.
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Publication (1)
This work describes the implementation and performance of AGILE focus corrections for advanced photo lithography in volume production as well as advanced development in IBM's 300mm facility. In particular, a logic hierarchy that manages the air gage sub-system corrections to optimize tool productivity while sampling with sufficient frequency to ens...
Citations
... La problématique de la topologie du wafer n'est pas récente [49] Pour s'assurer que la mesure donne une valeur correcte de la topographie du wafer, un second capteur pneumatique (non impacté par ces effets), nommé AGILE [52] pour « Air Gauge Improved Leveling » (ou mise à niveau améliorée par capteur pneumatique), a été installé dans les scanners de lithographie ASML. AGILE mesure une différence de pression entre deux jets d'air : une référence et le capteur. ...
