Marc de Cea’s research while affiliated with Massachusetts Institute of Technology and other places

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Publications (18)


OPA beamforming applications. (a) Automotive LIDAR. (b) Free space optical communications. Beam-steering systems can be used for pointing, acquisition and tracking between two fixed terminals (top) or for the realization of reconfigurable networks (bottom).
The radiation pattern for a uniformly spaced (blue) and a non-uniformly spaced (orange) 1D OPA with the same total extent of 2 mm. The uniformly spaced OPA has $N_{u}$ N u =100 elements, and the non-uniform OPA has $N_{nu}$ N n u =50 elements. The different plots show the same radiation pattern but with a different extent in the angular axis (the x axis). In contrast to uniform OPAs, non-uniform OPAs have no grating lobes.
Non-uniform OPA emitter placement approaches. Both grid-based and continuous placement methods can be used, and different approaches can be used to determine the optimal position of the antennas.
The thinned array curse. Power contained in the main lobe as a function of the number of elements for non-uniform OPAs with different placement approaches (linearly increasing spacing (blue), pseudo-random placement (green) and Golomb ruler based (orange)). The dashed line shows the power in the main lobe for a uniform array with $N_{u}$ N u = 100 elements, and the red crosses plot $N/N_{u}=N/100$ N / N u = N / 100 . All the arrays have a 0.5 mm extent and a 0.012 $^o$ o angular resolution.
The effects of Side Lobe Suppression Ratio (SLSR). (a) Example radiation patterns with high SLSR (top) and low SLSR (bottom). (b) Low SLSR can cause an FSOC link to be established between side lobes, which decreases range. (c) In LIDAR, a low SLSR can cause the detection of a target due to light reflected at other angles other than that of the main lobe.

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Critical evaluation of non-uniform optical phased arrays for real-world beam-steering applications
  • Article
  • Full-text available

July 2024

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67 Reads

Marc de Cea

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Rajeev J. Ram

Optical phased arrays (OPAs) are a promising technology for the realization of fast and compact non-mechanical optical beam steering. While many experimental demonstrations of integrated OPAs exist in the literature, it is challenging to evaluate their suitability for real-world applications due to the lack of system-level performance requirements. Here, we derive such performance requirements for two of the most promising OPA applications - namely free space optical communications (FSOC) and light detection and ranging (LIDAR) - and show that traditional uniformly spaced OPA architectures likely cannot reach the required performance. In response, we propose the use of non-uniformly spaced OPAs, analyze its performance tradeoffs and show that in certain scenarios they can offer superior performance with decreased complexity.

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Waveguide-coupled silicon LED designs and experimental characterization. (a) Ridge waveguide resonant LED design fabricated in the GlobalFoundries 45RFSOI process. The ring outer diameter is 10 µm, the ring width is 1.2 µm, and the silicon thickness is below 100 nm. The p–n junctions are interleaved along the azimuthal direction. The lowest order optical mode propagating along the ring at a wavelength of 1130 nm is shown in the bottom left corner. (b) Rib waveguide linear LED design fabricated in a preliminary version of the AIM Photonics Base Active PIC process based on a lateral p–n junction. The total length of the device is 2 mm. The propagating optical mode at a wavelength of 1130 nm is shown in the bottom. (c) Light emission is achieved through phonon-assisted radiative recombination. (d) Optical power coupled into Single Mode Fiber (SMF) as a function of bias current and optical spectrum of the resonant silicon LED. Images of the emission from the grating couplers and from the ring itself acquired with an InGaAs camera are also shown, along with an optical micrograph of the fabricated device. (e) Optical power coupled into Single Mode Fiber (SMF) as a function of bias current and optical spectrum of the linear silicon LED.
Sentaurus TCAD and Lumerical FDTD simulation of resonant (a)–(c) and linear (d)–(f) silicon LEDs. (a) and (d) Recombination rate as a function of bias current for the different recombination mechanisms present in the devices obtained with Sentaurus TCAD. (b) and (e) Electrical to optical efficiency ηi as a function of bias current with suppressed surface recombination (orange, SRV = 0) and with surface recombination (blue, SRV = 1000 cm/s) obtained from Sentaurus TCAD simulations. (c) and (f) Optical mode coupling efficiency ηc obtained with Lumerical FDTD as a function of wavelength. In (c), the ring-to-bus coupling coefficient for different coupling gaps is also shown as an inset.
Comparison of the simulated and measured optical powers and efficiencies for both the resonant and linear Si LEDs.
On-chip detection of the light generated by the resonant Si LED. (a) Link configuration. Two identical silicon ring resonators are optically connected through a bus waveguide. The first resonator is operated as an LED (i.e., forward biased), while the second resonator is operated as a photodetector (i.e., reverse biased). Photodetection at these wavelengths is achieved through surface state absorption. The high fabrication quality results in dark currents below 100 fA. (b) On the top, the driving voltage applied to the LED is shown as a function of time. On the bottom, we show the photocurrent detected by the detector as a function of time. Clearly, the photodiode can detect the light generated by the LED. The photocurrent levels we would obtain with optimized configurations are also shown.
Single-mode waveguide-coupled light emitting diodes in unmodified silicon photonics fabrication processes

August 2023

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229 Reads

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3 Citations

We realize single-mode, waveguide-coupled, electrically driven silicon light emitting diodes in commercial, unmodified silicon photonics foundry processes and develop a model of both the electrical and optical behavior to understand the performance limitations. We measure a center wavelength of 1130 nm, a 90 nm 3 dB optical bandwidth, and 200 pW of optical power propagating in each direction. We show on-chip modulation and detection of the generated light using native resonant photodetectors integrated in the same chip. Our work unveils a new native light source available in silicon photonics processes, which can find applications ranging from device screening and fabrication quality assessment to imaging, refractive index sensing, or intra-chip communication.


Device structure and emission spectra
a Photograph of a fully fabricated 300 mm wafer with monolithic electronics and photonics, and optical micrograph of a diced, unpackaged chip with different active and passive photonic components and mixed-signal circuits integrated side-by-side, and close-ups of the LED and the reference emitter on this chip. b A schematic top view of the LED and the reference emitter. Here the back-end-of-line (BEOL) dielectrics and the gate oxide are not shown. STI: shallow trench insulator. c A zoom-in side view of the LED on the white dashed line in b and the corresponding carrier transport. The solid and the hollow circles indicate electrons and holes, respectively. The black and the white dashed arrows indicate electron and hole transport, respectively. d A micrograph of the LED when it is biased at 6 mA. The wide-field illumination light is from a commercial LED centered around 1100 nm. e Spectra of the LED and the reference emitter were measured by routing the emission through a single-mode fiber into a spectrometer based on an InGaAs camera. (Supplementary Section 1.) The hollow circles are the raw data and the solid lines are from the Savitzky--Golay filter with polynomial order 3 and frame length 21. The spectral full-width-half-maximum (FWHM) of the LED is presented in the inset.
Characterization of the LED
a–c Images of the emission pattern at multiple currents with 50 ms integration. A microscope equipped with a 100×, 0.95NA objective and an InGaAs camera were used to characterize the devices. (Supplementary Section 1). The chip die was wirebonded to a chip carrier and the carrier was fixed on a piezo translation stage. Scale bar: 1 μm. d 2D Gaussian fit of the emission pattern at 6 mA. Scale bar: 1 μm. e n+/n emission power and the associated external quantum efficiency (EQE) with the background emission neglected. The inset shows the forward bias voltage versus current. The error bars are from the 95% confidence interval of the corresponding fitting parameters. f, gx and y cross-sections of the fit emission pattern at 6 mA from −5 to 5 μm. The inset figures are fit from ± 5 to ± 10 μm. Only the 20 × 20 μm² area centered at the emission spot is considered in the fit because the emission outside of this region is shadowed by metal fill required by the process. h Deconvolved emission area and spatial intensity. The deconvolution results are based on the spatial full-width-half-maximum (FWHM) of the point-spread function (PSF) of the microscope. (784 ± 50 nm in x and 740 ± 46 in y. Methods and Supplementary Section 2.) The dashed line indicates the shallow trench insulator (STI) defined opening area which confines carriers when the bias is low. i Single-mode fiber (SMF) coupled power and coupling efficiency. The schematic setup is presented to indicate the measurement methods. The SMF is PM980 (Thorlabs). The error bars in h and i are from the error propagation considering the PSF measurement error and the fit error in e.
Digital in-line holography setup and results
a Schematic of the experimental setup demonstrating in-line holographic imaging of 20 μm diameter latex beads with a single LED (bias current at 6.5 mA) as the illumination source. Close-up on the left illustrates the interference pattern formed between the incident light and the scattered light from a bead. b Full hologram recorded by a cooled CMOS camera (5 °C) for 16 s integration. The imager chip size and the pixel pitch are 1.76 cm × 1.33 cm and 3.8 μm, respectively. The raw hologram is filtered by a 5 × 5 median filter. The white dashed box indicates the illumination area. c Close-up of the hologram in the red box in b. d Digital counts of the hologram on the red dashed line in c. The filtered curve is from Savitzky–Golay filter with polynomial order 3 and frame length 11. e Reconstruction of the hologram on the whole imager. The contrast is enhanced by histogram equalization with 64 bins. f Close-up of the reconstruction in the same area as c. g Optical micrograph of the sample in the same area as c and f, taken by a 5× objective.
A sub-wavelength Si LED integrated in a CMOS platform

February 2023

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122 Reads

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11 Citations

A nanoscale on-chip light source with high intensity is desired for various applications in integrated photonics systems. However, it is challenging to realize such an emitter using materials and fabrication processes compatible with the standard integrated circuit technology. In this letter, we report an electrically driven Si light-emitting diode with sub-wavelength emission area fabricated in an open-foundry microelectronics complementary metal-oxide-semiconductor platform. The light-emitting diode emission spectrum is centered around 1100 nm and the emission area is smaller than 0.14 μm² (~∅400400\varnothing 400 nm). This light-emitting diode has high spatial intensity of >50 mW/cm² which is comparable with state-of-the-art Si-based emitters with much larger emission areas. Due to sub-wavelength confinement, the emission exhibits a high degree of spatial coherence, which is demonstrated by incorporating the light-emitting diode into a compact lensless in-line holographic microscope. This centimeter-scale, all-silicon microscope utilizes a single emitter to simultaneously illuminate ~9.5 million pixels of a complementary metal-oxide-semiconductor imager.



CMOS LED light source and holography apparatus. (a) On the top, a micrograph of the ${2}\;{\rm mm} \times {3}\;{\rm mm}\;{55}\;{\rm nm}$ 2 m m × 3 m m 55 n m bulk CMOS chip is shown, as well as a closeup of the tapered LED source. The inset shows the light emission spot when the LED is forward biased, demonstrating an emission spot below $1.3\;\unicode{x00B5}{\rm m} \times 1.3\,\,\unicode{x00B5}{\rm m}$ 1.3 µ m × 1.3 µ m . On the bottom, a schematic of the LED configuration is shown. 10 µm long tapers in the polysilicon layer are used to inject carriers into a crystalline silicon pillar region via breakdown of the thin gate oxide. Once in the crystalline silicon, phonon-assisted carrier recombination results in light emission. (b) The experimentally measured emission spectrum when the LED source is biased at a current of 6 mA. The spectrum has an FWHM of 450 nm with a peak wavelength around 1100 nm. (c) Schematic of the lensless holography microscope. The light emitted by the CMOS LED illuminates the sample, and the coherent interaction between the light that interacts with the sample and the unscattered light is recorded by a CMOS camera in the form of a hologram. The small emission spot of the CMOS LED eliminates the need for a pinhole, and its large numerical aperture allows for placement of the source very close to the sample, resulting in a compact setup.
Untrained deep neural network framework for simultaneous spectral and holographic reconstruction. Two untrained deep neural networks were used: one for phase and one for amplitude, and then we backpropagate for the network weights ${\theta _\alpha},{\theta _\varphi}$ θ α , θ φ , as well as the learned spectrum ${\gamma _n}\,(n = 1,2, \cdots ,N)$ γ n ( n = 1 , 2 , ⋯ , N ) .
Qualitative comparison in 20- µm bead reconstructions of a baseline method and the proposed architecture for a narrowband commercial LED (top) and broadband CMOS LED (bottom). Quantitatively, the Pearson correlation coefficient was used as a metric to compare the reconstructions with the brightfield image as the ground truth (see Supplement 1, Fig. S2). Experimentally measured and learned spectra for both illumination sources are also compared.
Qualitative comparison between brightfield image, NIR micrographs, and complex object reconstructions by the proposed untrained deep neural network framework under our CMOS micro-LED illumination across different biological specimens.
Simultaneous spectral recovery and CMOS micro-LED holography with an untrained deep neural network

October 2022

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44 Reads

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7 Citations

Lensless holography promises compact, low-cost optical apparatus designs with similar performance to traditional imaging setups. Here, we propose the use of a silicon micro-LED fabricated in a commercial CMOS microelectronics process as the illumination source in a lensless holographic microscope. Its small emission area ( {\lt}4\,\unicode{x00B5}{\rm m}^2 < 4 µ m 2 ) ensures high spatial coherence without the need for a pinhole and results in a large NA setup, circumventing the limits to the source-to-sample distance encountered by conventional lensless holography apparatus. The scene is reconstructed using an untrained deep neural network architecture that simultaneously performs spectral recovery by learning from the given single experimental diffraction intensity. We envision this synergetic combination of CMOS micro-LEDs and the machine learning framework can be used in other computational imaging applications, such as a compact microscope for live-cell tracking or spectroscopic imaging of biological materials.


A sub-wavelength Si LED integrated in a CMOS platform

September 2022

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38 Reads

A nanoscale on-chip light source with high intensity is desired for various applications in integrated photonics systems. However, it is challenging to realize such an emitter using materials and fabrication processes compatible with the standard integrated circuit technology. In this letter, we report an electrically driven Si light-emitting diode (LED) with sub-wavelength emission area fabricated in an open-foundry microelectronics CMOS platform. The LED emission spectrum is centered around 1100 nm and the emission area is smaller than 0.14 μm<2>( ≈ 400 nm diameter). This LED has high spatial intensity of > 50 mW/cm<2> which is comparable with the state-of-the-art Si-based emitters with much larger emission areas. Due to sub-wavelength confinement, the emission exhibits a high degree of spatial coherence, which is demonstrated by incorporating the LED into a compact lensless in-line holographic microscope. This centimeter-scale, all-silicon microscope utilizes a single emitter to simultaneously illuminate ≈ 9.5 million pixels of a CMOS imager.




Citations (9)


... The integrated power measured over the detection range of the spectrometer (up to λ =1590 nm) is 5.1 nW at 5 mA reverse bias current, corresponding to a measured efficiency of approximately 1.0 × 10 −6 W/ A and a quantum efficiency of 1.1 × 10 −6 . The efficiency compares favorably with previous reports of emission from silicon devices, and the integrated optical power emitted vs. input electrical power is approximately twice as large as previous reports for forward-bias emission 17 . In addition, the integrated internal intensity of the emitter, 4100 mW/cm 2 at 5 mA, is an order of magnitude larger than the previously reported record value for a silicon emitter, 600 mW/cm 2 42 . ...

Reference:

Broadband near-infrared emission in silicon waveguides
Single-mode waveguide-coupled light emitting diodes in unmodified silicon photonics fabrication processes

... In contrast to the EL behavior of MLEC25, the emission bandwidth of the BLEC1 device is greatly reduced, covering a range of approximately 580 nm to 680 nm with the maximum emission peak located at 620 nm, as seen in the figure 9(a). In this case, the increase on the applied voltage does not change the width of the emission band, it only increases the intensity [56,57]. The EL emission is obtained in whole area, with a threshold voltage of −8 V (inset of the figure 9(a)), which is much lower than the obtained in the MLEC25 monolayer. ...

A sub-wavelength Si LED integrated in a CMOS platform

... In equation (3), SSIM stands for structural similarity index metric, a widely accepted loss function 17,27,46,47 , which computes the similarity between the estimated 3D image stack ĝ and the input g. ℛ( θ (r)) is a regularizer that incorporates prior information on the spatial piecewise smoothness and distribution of voxel values of the structure θ (r). ...

Simultaneous spectral recovery and CMOS micro-LED holography with an untrained deep neural network

... Efforts have therefore been attempted to enhance the conventional transistor-based computing paradigm with alternative platforms. Among these, promising advances in the energy efficiency of integrated optoelectronic devices and their compatibility with CMOS [4][5][6][7] have led to an increased interest in integrated photonic computing, which allows operations at unprecedented bandwidths [8]. ...

Energy harvesting optical modulators with sub-attojoule per bit electrical energy consumption

... So, Si-Ge photodetector under zero-bias illumination achieves 0.35 A W À1 at 1180 nm wavelength and 0.043 A W À1 around 1270 nm ones. [38] Si-Ge phototransistors fabricated on 20 Ω·cm Si substrates have 1.35 A W À1 responsivity at 50 MHz under phototransistor mode operation with 850 nm multimode fiber illumination. ...

High-speed, zero-biased silicon-germanium photodetector

... Nowadays, most silicon photonic devices and circuits are demonstrated on the siliconon-insulator (SOI) platform [14][15][16]. Crystalline silicon (c-Si) is the most widely used material due to its low optical losses and excellent electronic properties [17]. However, it is challenging to achieve three-dimensional (3D) multilayer PICs and electronic-photonics integrated circuits (EPICs) based on c-Si due to the extreme difficulty in full wafer bonding and polishing. ...

18 GHz 3 dB bandwidth SiGe resonant photodetector in 45 nm SOI CMOS
  • Citing Conference Paper
  • September 2020

... This establishes multiple parallel photodiodes that sweep out and collect photogenerated carriers in the silicon waveguide. An adiabatically wrapped ring-bus coupler prevents higher-order transverse modes from being excited in the 2.8 µm wide waveguide crosssection of the resonator, coupling only to the fundamental mode propagating closer to the outer edge of the ring [55,56]. This separation between heavily doped contacts and propagating light allows the resonator to maintain an intrinsic Q on the order of 10 5 , comparable to undoped single-mode microrings in the same process [45,50]. ...

Photonic Readout of Superconducting Nanowire Single Photon Counting Detectors

... Microring resonance control, a common technique for addressing microring initialization [11]- [16], involves sweeping the microring resonance across the tuning range and identifying the resonance alignment. For a single microring with a laser tone, the resonance alignment is identified by the peak in intra-cavity optical power (wavelength search) [11]- [13], followed by a feedback loop that stabilize the resonance wavelength (wavelength lock) [14]- [16]. However, in DWDM systems, the wavelength search would yield multiple peaks due to the multi-wavelength laser, necessitating an "informed" decision to guarantee maximum wavelength allocation [17]; we will call this wavelength arbitration. ...

Power handling of silicon microring modulators

... The first design [ Fig. 1(a)] is a microring resonator LED based on interleaved p-n junctions, similar to devices we have presented elsewhere. 16 The outer radius of the ring is 10 μm, and the waveguide width is 1.2 μm. The device is fabricated in GlobalFoundries pubs.aip.org/aip/app ...

A Thin Silicon Photonic Platform for Telecommunication Wavelengths
  • Citing Conference Paper
  • September 2017