Hyeongmin Cho’s research while affiliated with Seoul National University and other places

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Publications (11)


a) Fabrication process of Hall‐bar pattern. BSO is deposited using MBE, followed by the deposition of LIO using PLD. Hall‐bar geometry is fabricated through ion milling. Contact pads of 4% BLSO are deposited using PLD with a stencil mask. Areas not intended for modulation are covered with photoresist, and for measurements, gold wires are affixed to the pads using silver paste. b) A top view image of the finished sample with a Hall‐bar geometry and 4% BLSO pads, as seen through an optical microscope.
a) A schematic diagram with the addition of the ionic‐liquid ([DEME]⁺[TFSI]⁻) for the Hall‐bar patterned sample for liquid gating. A sealant to prevent gating of un‐doped BSO and a gate electrode for top gating were added. b) Change of sheet resistance (Rs) and leakage current (IGS) as a function of gate voltage (VGS) at 220 K. VGS was swept from 0 to 8 to 0 V at 2 V intervals, and at the time of application, a time interval of 20 min per voltage was set to provide enough time for [DEME]⁺ and [TFSI]⁻ in the ionic‐liquid to align. After 7 days, the change in Rs (purple circle) was observed.
Temperature‐dependent transport properties of LIO/BSO heterostructures. a) Change of sheet resistance (Rs), and b) electron mobility (μ) and sheet carrier density (n2D) as a function of temperature (T) at different gate voltages (0 to 8 V at intervals of 1 V). As VGS increases, Rs decreases, but n2D continues to increase, approaching 10¹⁴ cm⁻², and μ also increases along with it, exceeding 10³ cm² V⁻¹ s⁻¹.
Mobility (μ) as a function of n2D for 2DEG with gate voltage at 150 K (green circles) and 10 K (blue circles). For comparison, the data from another BSO‐based system is also shown: 248 nm thick BSO film via IL gating from Fujiwara et al. at Tohoku University at 150 K (crimson triangles).[⁵⁰] The dotted line represents a line for a relation of μ ∝ n2D3/2.
Changes of magnetoresistance in magnetic fields. Change of magnetoresistance a) with increasing gate voltage at 2 K, and b) with increasing temperature under 0 V.
Observation of Mobility Above 2000 cm/V s in 2DEG at LaInO3/BaSnO3 Interface by Electric‐Double‐Layer Gating
  • Article
  • Full-text available

December 2024

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72 Reads

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1 Citation

Jaehyeok Lee

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Hyeongmin Cho

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[...]

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Kookrin Char

The LaInO3/BaSnO3 heterostructure has recently emerged as a promising platform for realizing 2D electron gas (2DEG) with unique transport properties, including excellent field‐effect at room temperature. However, there is a limit to improving its mobility due to intrinsic defects including the threading dislocations occurring during film growth. In spite of such high density defects at present, as an effort to increase the mobility of the 2DEG, the 2D carrier density to 10¹⁴ cm⁻² by ionic‐liquid gating is increased and we found the resulting 2DEG mobility enhancement up to 2100 cm² V⁻¹ s⁻¹ at 10 K, which is consistent with the fact that 2‐dimensionality offers more effective screening for defects. This findings offer insights into the properties of 2DEG formed with perovskite oxide semiconductor BaSnO3 as well as highlight its future potential for applications.

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a) HRXRD 2θ−ω scan around the (220) Bragg reflection of the NdScO3 substrate and b) rocking curve measurement around the (002) BaSnO3 film peak. c) RSM measurement in the vicinity of the asymmetric (332) NdScO3 reflection with black crosses indicating the bulk positions of SrSnO3 and BaSnO3.
a) TEM bright field image showing the vertical entirety of the heterostructure. b) HRTEM image of the SrSnO3/NdScO3 interface and c) HRTEM image around the BaSnO3/SrSnO3 interface.
a) Schematic cross‐sectional view of the heterostructure fabricated for investigations of the electric conductance of the LaInO3/BaSnO3 heterointerface. b) Conductance measurements of the heterostructure before and after deposition of LaInO3 on the BaSnO3:La layer.
a) Schematic of contact geometry for C–V measurements. Light gray marks the size of the samples, blue the Hg‐contacts, and dark gray the vacuum pad. b) C–V measurements measured from positive to negative gate voltage after formation of the LaInO3/BaSnO3 heterointerface of samples with 0.35% (black) and 0.40% (red) La‐doping of the channel. The horizontal axis refers to the applied gate voltage between the small disc‐shaped contact and the large U‐shaped contact. The integral total sheet carrier density is given. c) Volume charge carrier density with respect to the distance from the sample surface of the two investigated samples derived from the C–V measurement. To account for series capacitances due to the oxidized Hg surface as well as contaminations on the sample surface, an offset of 45 and 95 nm was subtracted from the distance for the 0.35% and 0.4% sample, respectively. d) Integrated sheet carrier density inside the BaSnO3 as function of distance to the heterointerface derived from the C–V measurement.
a) Sheet resistance, b) carrier density, and c) carrier mobility determined by means of Hall effect measurements in a temperature range between 25 and 320 K at the LaInO3/BaSnO3 interface of samples with 0.4% (red spheres) and 0.35% (black squares) La‐doping concentration in the BaSnO3 layer.
Confinement of Electrons at the LaInO3/BaSnO3 Heterointerface

October 2022

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168 Reads

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10 Citations

The properties of the conductance at the LaInO3/BaSnO3 heterointerface are reported. The heterointerface is formed by covering the semi-insulating BaSnO3:La thin films with 10 nm LaInO3 films, which are all epitaxially grown on NdScO3 substrates. Structural properties of BaSnO3 thin films are investigated by means of X-ray diffraction and transmission electron microscopy and exhibit a threading dislocation density of 6 × 10^10 cm−2. Via capacitance–voltage (C–V) measurements, clear evidence is present for the accumulation of electrons at the interface within 2.5 nm in the BaSnO3 layer, confirming the formation of a 2D electron gas (2DEG). Additionally, temperature dependent Hall effect measurements reveal a semiconducting behavior of the electron density of the 2DEGs. The room temperature mobility of 22 cm^2 V^−1 s^−1 at an electron density of 4 × 10^13 cm−2 is found to increase as the temperature decreases to 25 K.


Low resistance epitaxial edge contacts to buried nanometer thick conductive layers of BaSnO 3

October 2022

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35 Reads

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3 Citations

As the size of the semiconductor device decreases, the importance of the low resistance contacts to devices cannot be overstated. Here, we studied the contact resistance to buried nanometer thick δ-doped Ba 1-x La x SnO 3 (BLSO) layers. We have used epitaxial 4% (x = 0.04) BLSO as a contact material, which has additional advantages of forming Ohmic contacts to BaSnO 3 and providing thermal stability even at high temperatures. The contact resistance was measured by a modified transmission line method designed to eliminate the contribution from the resistance of the contact material. The upper bound for the contact resistance to a 12 nm thick δ-doped 1% BLSO conductive layer was measured to be 1.25 × 10 ⁻¹ or 2.87 × 10 ⁻⁷ Ω cm ² . Our results show that it is possible to provide low resistance epitaxial edge contacts to an embedded nanometer-thick BLSO conductive layer using an ion-milling process. Our low resistance contact method can be easily extended to a two-dimensional electron gas at the oxide interfaces such as LaInO 3 /BaSnO 3 .


a) Schematic illustration of the (LaO)⁺/(SnO2)⁰ interface (SnO2 termination) and (InO2)⁻/(BaO)⁰ interface (BaO termination). At the (LaO)⁺/(SnO2)⁰ interface, the direction of the polarization is toward to BaSnO3. At the (InO2)⁻/(BaO)⁰ interface, direction of the polarization is the reverse of the previous one. b) Calculated band diagram at the SnO2 termination and BaO termination interface using a self‐consistent P‐S calculation. In addition to the conduction band offset between the two materials, the energy level is lowered due to polarization at the interface. In the case of SnO2 termination, 2DEG was formed at the interface, but in the case of BaO termination neither 2DEG nor 2DHG can be formed.
SnO2 X‐ray spectrum and growth rate measurement using X‐ray reflectivity (XRR). SnO2 is grown by 525 laser pulses with the laser energy fluence of 1.4 J cm⁻² in 100 mTorr O2 atmosphere at 750 °C. The results of X‐ray reflectivity measurement of SnO2 sample. Inset presents X‐ray diffraction spectrum of 150 nm SnO2 on (101¯$\bar{1}$2) Al2O3 substrate. The growth direction of SnO2 is (101) direction.
LIO/BSO 2DEG conductance as a function of additional SnO2. a) Schematic illustration of in‐situ LIO/BSO 2DEG on MgO with additional SnO2 deposition on BSO layer. b) The sheet conductance of LIO/BSO on MgO substrate as a function of additional SnO2 thickness. The 2DEG conductance increases until 1.1 Å of SnO2 and the conductance decreases as the thickness of SnO2 increases beyond 1.1 Å. c) Schematic illustration of in situ LIO/BSO 2DEG on STO with SnO2 dusting on BSO layer. d) The sheet conductance of LIO/BSO on STO substrate as a function of additional SnO2 thickness. This trend was similar to the samples made on MgO substrates in (b).
CAICISS spectrum of three different samples (as‐grown BSO / additional 1.1 Å SnO2 deposition on BSO / additional 1.9 Å SnO2 deposition on BSO). a) Measurements were performed at [111] direction with a Ne ion beam. Ne ions are backscattered by the topmost atomic layer, and the inner ions are hidden by the shadowing cone. b) The CAICISS spectrum of the As‐grown BSO shows that the intensity of both the Ba and Sn peaks are quite large. The Ba peak intensity is significantly decreased in the additional SnO2 spectrum. The additional SnO2 layer deposited BSO samples are SnO2 dominant. However, there are no significant differences between 1.1 and 1.9 Å of additional SnO2.
STEM images of BSO/LIO. a,b) HAADF‐STEM image of LIO on optimally SnO2 terminated BSO (3‐pulse dusting). c) Schematic diagram of LIO on SnO2 terminated BSO film on an MgO substrate. d,e) HAADF‐STEM image of LIO with excessive SnO2 (11‐pulse dusting) on BSO. The red rectangular lines of (b) and (e) are guides for the interfacial region. f) Schematic diagram of LIO with excessive SnO2 dusting on BSO film on an MgO substrate.
Critical Role of Terminating Layer in Formation of 2DEG State at the LaInO 3 /BaSnO 3 Interface

September 2022

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61 Reads

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5 Citations

Based on the interface polarization model, the 2D electron gas (2DEG) at LaInO3(LIO)/BaSnO3(BSO) interfaces is understood to originate from a polarization discontinuity at the interface and the conduction band offset between LIO and BSO. In this scenario, the direction of polarization at the interface is determined by whether the first atomic LIO layer at the interface is LaO+ or InO2−. The role of the terminating layer is investigated at the LIO/BSO interface in creating the 2DEG. Based on conductance measurements of the in situ grown LIO/BSO heterostructures, it has been reported in this work that the 2DEG only forms when the BSO surface is terminated mainly with a SnO2 layer. The terminating layer is controlled by additional SnO2 deposition on the BSO surface. It has been shown that the as‐grown BSO surface has a mixed terminating layer of BaO and SnO2 while the BSO surfaces prepared with additional SnO2 deposition are terminated mainly with the SnO2 layer. The terminating layer is confirmed by coaxial impact collision ion scattering spectroscopy. The finding is consistent with the interface polarization model for 2DEG formation at LIO/BSO interfaces, in which the direction of the interfacial polarization in LIO is determined by the terminating layer of the BSO surface. The LaInO3/BaSnO3 2D electron gas (2DEG) is understood by a polarization discontinuity at the interface. The direction of interfacial polarization is determined by the first atomic LaInO3 layer on the terminating layer of BaSnO3. In this paper, it is revealed that the LaInO3/BaSnO3 2DEG only forms when the BaSnO3 surface is terminated mainly with a SnO2 layer.


Critical role of terminating layer in formation of 2DEG state at the LaInO3LaInO_{3}/BaSnO3BaSnO_{3} interface

August 2022

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16 Reads

Based on the interface polarization model, the two-dimensional electron gas (2DEG) at LaInO3LaInO_{3}(LIO)/BaSnO3BaSnO_{3}(BSO) interfaces is understood to originate from a polarization discontinuity at the interface and the conduction band offset between LIO and BSO. In this scenario, the direction of polarization at the interface is determined by whether the first atomic LIO layer at the interface is LaO+^{+} or InO2_{2}^{-}. We investigate the role of the terminating layer at the LIO/BSO interface in creating the 2DEG. Based on conductance measurements of our in-situ grown LIO/BSO heterostructures, we report in this work that the 2DEG only forms when the BSO surface is terminated with a SnO2_{2} layer. We controlled the terminating layer by additional SnO2_{2} deposition on the BSO surface. We show that the as-grown BSO surface has a mixed terminating layer of BaO and SnO2_{2} while the BSO surfaces prepared with additional SnO2_{2} deposition are terminated mainly with the SnO2_{2} layer. The terminating layer was confirmed by coaxial impact collision ion scattering spectroscopy (CAICISS). Our finding is consistent with the interface polarization model for 2DEG formation at LIO/BSO interfaces, in which the direction of the interfacial polarization in LIO is determined by the terminating layer of the BSO surface.


Transport Properties of the La In O 3 / Ba Sn O 3 Interface Analyzed by Poisson-Schrödinger Equation

January 2022

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29 Reads

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13 Citations

Physical Review Applied

2DEG systems formed in quantum wells of semiconductor heterostructures have been instrumental in advancing science and technology for many decades. Here, we report two unique transport properties of 2DEG formed at the interface of two perovskite oxides LaInO3 (LIO) and BaSnO3 (BSO): the peculiar LIO thickness dependence of the high two-dimensional (2D) carrier density (n2Dn_{2{\rm{D}}}) and the very narrow width of the quantum well. We analyze, via Poisson-Schrödinger simulation, how the various materials parameters affect the 2D carrier density and its profile when using the “interface-polarization” model in which the polarization exists only near the interface. Our simulations show that the known material parameters of LIO and BSO are capable of generating a deep and narrow quantum well as suggested by the experimental transport properties and reveal some distinct features of the LIO/BSO interface from the conventional 2DEGs. Furthermore, they predict how the LIO/BSO 2DEG will evolve as the defect density decreases.


Figure 1. Dielectric properties of LaScO 3 (LSO). (a) Capacitance and dissipation factor of the 165 nm LaScO 3 dielectric layer sandwiched between Ba 0.96 La 0.04 SnO 3 (4% BLSO) electrodes was measured with respect to the applied frequencies of AC voltage. κ was calculated from the measured capacitance. (b) Leakage current density (log J) versus electric field (E) characteristics plot of the LaScO 3 dielectric layer. E BD is determined from the rapidly increasing J. In the inset the ln(J/E 2 ) versus E −1 graph is plotted for analysis by the FN tunneling process in the LaScO 3 dielectric layer. (c) Diagram of the band alignment between LaScO 3 and BaSnO 3 systems. ΔE CB is derived from the experimental results in (a) and (b).
Figure 2. (a, b) A 3-dimensional view and a top view of the LaScO 3 /Ba 1−x La x SnO 3 (LSO/BLSO) interface. (c) Sheet conductance (σ s ) before and after LaScO 3 deposition as a function of the La concentration of the Ba 1−x La x SnO 3 layer (crimson color) and comparison with those of LaInO 3 deposition (sky blue color). (d) Sheet carrier density (n 2D ) and electron mobility (μ) generated at the LaScO 3 /Ba 1−x La x SnO 3 interface (crimson empty squares) and LaInO 3 /Ba 1−x La x SnO 3 interface (sky blue empty squares).
Figure 3. (a) Changes of sheet conductance, sheet carrier density, and electron mobility generated at the LaScO 3 /Ba 0.997 La 0.003 SnO 3 (LSO/ BLSO(0.3%)) and LaInO 3 /Ba 0.997 La 0.003 SnO 3 (LIO/BLSO(0.3%)) interfaces as a function of the LaScO 3 (crimson color) and LaInO 3 (sky blue color) thickness. (b) Self-consistent Poisson−Schrö dinger simulation for the LaScO 3 /Ba 0.997 La 0.003 SnO 3 and the LaInO 3 /Ba 0.997 La 0.003 SnO 3 heterointerfaces. Interface polarization values used for each simulation. The polarization exists over four pseudocubic unit cells from the interface and disappears after them. (c) Comparison of n 2D by experiments (circles) with those by simulation (dotted lines). The deep donor density (N DD ) in the LaScO 3 is set to N DD = 2.5 × 10 20 cm −3 .
Figure 5. (a, b) Cross-sectional high-angle annular dark field scanning transmission electron microscope (HAADF-STEM) images of LaScO 3 (78 nm)/BaSnO 3 (17 nm) films on SrTiO 3 substrate and LaScO 3 /BaSnO 3 (LSO/BSO) interface. In the yellow dashed area, a threading dislocation created in the BaSnO 3 film continues in the LaScO 3 film. But, no new formation of dislocations was found at the interface, indicating the coherent epitaxial growth of LaScO 3 on BaSnO 3 . The Sc atoms look distinct from the Sn atoms unlike the case of the LaInO 3 /BaSnO 3 (LIO/BSO) interface where it is difficult to distinguish between Sn and In. (c, d) The RSM (103) scans results of LaScO 3 /BaSnO 3 films and LaInO 3 /BaSnO 3 films on the SrTiO 3 (001) substrate. The LaScO 3 (103) peak is on the crimson vertical line, and the LaInO 3 (103) peak is on the sky blue vertical line. The BaSnO 3 (103) peaks in both figures are located between the two lines.
Figure 6. A field-effect transistor using Ba 0.998 La 0.002 SnO 3 (0.2% BLSO) as a channel layer and LaScO 3 as a gate oxide. After depositing the LaScO 3 layer on the Ba 0.998 La 0.002 SnO 3 layer, there is conductance enhancement from the formation of 2DEG. (a) Schematic of the structure of the device. (b) Top view of the device pictured by an optical microscope. Dashed lines are plotted to distinguish each deposited layer. (c) Output characteristics of the device varying the gate voltage (V GS ) from 25 to −5 V with a 5 V interval. (d) Transfer characteristics of the device with the source−drain voltage (V DS ) maintaining 1 V. The source−drain current (I DS ) is represented by a red line and the leakage current (I GS ) is represented by a red dashed line. The calculated field-effect mobility (μ FE ) is represented by the blue circles. The device shows an I on /I off ratio about 10 6 and a maximum μ FE close to 100 cm 2 V −1 s −1 at room temperature.
High-Mobility Field-Effect Transistor Using 2-Dimensional Electron Gas at the LaScO 3 /BaSnO 3 Interface

December 2021

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128 Reads

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19 Citations

ACS Applied Electronic Materials

A 2-dimensional electron gas (2DEG) system with high mobility was discovered at the interface of two perovskite oxides: a polar orthorhombic perovskite LaScO3 and a nonpolar cubic perovskite BaSnO3. Upon depositing the LaScO3 film on the BaSnO3 film, we measured the conductance enhancement and the resulting 2DEG density (n2D). Comparing the results with the previously reported LaInO3/BaSnO3 polar interface, we applied the “interface polarization” model to the LaScO3/BaSnO3 system, in which the polarization exists only over four pseudocubic unit cells in LaScO3 from the interface and vanishes afterward like the LaInO3/BaSnO3 interface. Based on the calculations of the self-consistent Poisson–Schrödinger equations, the LaScO3 thickness dependence of n2D of the LaScO3/BaSnO3 heterointerface is consistent with this model. Furthermore, a single subband in the quantum well is predicted. By use of the conductive interface and the LaScO3 as a gate dielectric, a 2DEG transistor composed of only perovskite oxides with high field-effect mobility (μFE) close to 100 cm² V–1 s–1 is demonstrated.


High-mobility field-effect transistor using 2-dimensional electron gas at the LaScO3/BaSnO3 interface

October 2021

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29 Reads

A novel 2-dimensional electron gas (2DEG) system with high-mobility was discovered at the interface of two perovskite oxides, a polar orthorhombic perovskite LaScO3 (LSO) and a nonpolar cubic perovskite BaSnO3 (BSO). Upon depositing the LSO film on the BSO film, the conductance enhancement and the resulting 2DEG density (n2D) was measured. Comparing the results with the previously reported LaInO3/BaSnO3 (LIO/BSO) polar interface, we applied the interface polarization model to the LSO/BSO system, in which the polarization exists only over 4 pseudocubic unit cells in LSO from the interface and vanishes afterward like the LIO/BSO interface. Based on the calculations of the self-consistent Poisson-Schrodinger equations, the LSO thickness dependence of n2D of LSO/BSO heterointerface is consistent with this model. Furthermore, a single subband in the quantum well is predicted. Using the conductive interface and the LSO as a gate dielectric, a 2DEG transistor composed of only perovskite oxides with high field-effect mobility (uFE) close to 100 cm2 V-1 s-1 is demonstrated.


Melt Growth and Physical Properties of Bulk LaInO3 Single Crystals

July 2021

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260 Reads

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18 Citations

Large bulk LaInO3 single crystals are grown from the melt contained within iridium crucibles by the vertical gradient freeze (VGF) method. The obtained crystals are undoped or intentionally doped with Ba or Ce, and enabled wafer fabrication of size 10 × 10 mm². High melting point of LaInO3 (≈1880 °C) and thermal instability at high temperatures require specific conditions for bulk crystal growth. The crystals do not undergo any phase transition up to 1300 °C, above which a noticeable thermal decomposition takes place. The good structural quality of the crystals makes them suitable for epitaxy. The onset of strong optical absorption shows orientation‐dependent behavior due to the orthorhombic symmetry of the LaInO3 crystals. Assuming direct transitions, optical bandgaps of 4.35 and 4.39 eV are obtained for polarizations along the [010] and the [100], [001] crystallographic directions, respectively. There is an additional weak absorption in the range between 2.8 and 4 eV due to oxygen vacancies. Density‐functional‐theory calculations support the interpretation of the optical absorption data. Cathodoluminescence spectra show a broad, structured emission band peaking at ≈2.2 eV. All bulk crystals are electrically insulating. The relative static dielectric constant is determined at a value of 24.6 along the [001] direction.


FIG. 1. Experimental and calculated results for d-doped BSO films. (a) 2D carrier density of d-doped BSO films with different BLSO thicknesses of the structure in the inset. The BLSO layer is doped with 0.5% La in blue and 1% in red. The lines are the results calculated with deep acceptor densities of 1 Â 10 19 and 3 Â 10 19 cm À3 . The experimental results in circles fit well with the calculations at a deep acceptor density of about 3 Â 10 19 cm À3 . (b) Calculated results of conduction band bending for 1% d-doped samples with different thicknesses of the 1% BLSO channel layer.
FIG. 2. The effect of an undoped BSO capping layer over the BLSO layer. (a) Experimental conductance of the 1% 7.5 nm BLSO layer as a function of the thickness of the undoped BSO overlayer. (b) 2D carrier density of 0.5% and 1% BLSO layers with (circle) and without (triangles) the 20 nm undoped BSO overlayer as a function of BLSO thickness. The 2D carrier density increases after depositing the undoped BSO overlayer.
FIG. 3. 2D carrier density and band bending of d-doped BSO films with the 1% doped 7.5 nm BLSO layer with three boundary conditions. (a) Experimental and calculated carrier densities using three kinds of boundary conditions as a function of the BSO capping layer thickness. (b) Band bending of the Slope ¼ 0 boundary condition showing the opposite trend with the experimental carrier density. (c) Band bending using the Ohmic boundary condition showing a similar trend to the experimental carrier density only in the thick BSO capping layer. Five cases of BSO capping layer thicknesses of 0.4, 1.5, 3.0, 4.5, and 10 nm described in the experimental result in (a) are shown. (d) Band bending using the Schottky boundary condition well fitted to the experimental carrier density. Five cases of BSO capping layer thicknesses of 0.0, 1.5, 3.0, 4.5, and 10 nm described in the experimental result in (a) are shown. (e) The position of the conduction band minimum in comparison to the Fermi level used for the Schottky boundary condition in (d).
FIG. 4. Calculated band bending of d-doped BSO films by the same Schottky boundary conditions as in Fig. 3(e) using a deep acceptor density of 2.7 Â 10 19 cm À3 . The shaded areas represent the differences between with and without the capping layer in the case of (a) 20 nm thick 0.5% BLSO and (b) 20 nm thick 1% BLSO.
Fermi level pinning and band bending in δ -doped BaSnO 3

February 2021

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107 Reads

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6 Citations

Various δ-doped semiconductor heterostructures have been effectively used for devices at room temperature and for quantum phenomena at low temperatures. Here, we use BaSnO3 and investigate its δ-doped system, focusing on its band bending and surface boundary conditions. We measured the two-dimensional carrier density (n2D) of the δ-doped BaSnO3 system of various thicknesses and doping levels. We also studied the effect of the BaSnO3 capping layer thickness on n2D. We show that the δ-doped BaSnO3 system can be very well described by band bending with the aid of the Poisson–Schrödinger simulation. At the same time, the capping layer thickness dependence of n2D reveals how the boundary condition on the surface of La-doped BaSnO3 evolves as a function of its capping layer thickness.


Citations (9)


... They have also witnessed the search for other perovskite systems exhibiting 2DEGs, and one of the most recent (and interesting) systems to have been discovered is LaInO 3 |BaSnO 3 . [8][9][10][11] The latter was chosen on account of its extremely high roomtemperature electron mobility; the former is its latticematched partner. ...

Reference:

Oxygen diffusion in LaInO3 films grown by molecular beam epitaxy
Observation of Mobility Above 2000 cm/V s in 2DEG at LaInO3/BaSnO3 Interface by Electric‐Double‐Layer Gating

... Theoretical calculations suggest that interfacing BSO with lattice-matched LaInO 3 (LIO) lead to the formation of a 2DEG inside the BSO for an SnO 2 /LaO terminated interface layer due to polar-discontinuity doping [25], while for the BaO/InO 2 interface termination a twodimensional hole gas inside the LIO is formed [1]. Electrical transport measurements on these and other systems using BSO as a channel material validate the presence of a 2DEG, however, they are struggling with freeze-out of the 2DEG [5] or need additional La doping of the BSO channel [20,23,39]. These studies result in RT mobility values of 40 -60 cm 2 /Vs and leave a key subject of interest untouched, i.e., interface termination. ...

Confinement of Electrons at the LaInO3/BaSnO3 Heterointerface

... 1. transistors with improved functionalities; 12-29 2. memory and memristive devices; 30-42 3. detectors, energy storage, and lighting devices; 43-51 4. fundamental studies. [52][53][54][55][56][57][58][59][60][61][62][63][64][65][66][67][68] Several papers focus on advancing the TFT performance via device and channel engineering approaches. AlGhamdi et al. 22 and Abe et al. 20 explore low-dimensional channel architectures that exhibit energy quantization phenomena and study their impact on electron transport across the channel. ...

Low resistance epitaxial edge contacts to buried nanometer thick conductive layers of BaSnO 3
  • Citing Article
  • October 2022

... In comparison, References. [18,19] show that the intentional deposition of an SnO 2 layer at the BSO/LIO interface results in a decrease of sheet resistance. However, charge carrier density (CCD) and mobility remain behind the values of the abovementioned systems by one order of magnitude. ...

Critical Role of Terminating Layer in Formation of 2DEG State at the LaInO 3 /BaSnO 3 Interface

... This interface polarization can explain the very unique 2DEG conductance dependence on the LIO's thickness, and the Poisson-Schrödinger simulation can provide its quantitative justification. 23,26,27 When Ga is alloyed with In for LIO to increase the lattice mismatch at the interface, a decrease in 2DEG conductance, presumably resulting from the decrease in the interface polarization, was revealed. 28 Moreover, we recently emphasized that for the formation of the 2DEG in LIO/BSO, the proper direction of the interface polarization in LIO is crucial, necessitating the termination of BSO with the SnO 2 layer. ...

Transport Properties of the La In O 3 / Ba Sn O 3 Interface Analyzed by Poisson-Schrödinger Equation
  • Citing Article
  • January 2022

Physical Review Applied

... They also reported that when the thickness of LaScO 3 (LaInO 3 ) film is 12 unit cells, the interfacial charge density of HS system at RT is about 2.5 × 10 13 cm −2 , and the electron mobility is about 20-25 cm 2 V −1 s −1 , which is obviously higher than that of LaAlO 3 /SrTiO 3 system. Moreover, with the increase of La concentration doped in BaSnO 3 , the interfacial electron density and mobility of HS system shows an increasing trend 18,19 . Aggoune et al. 20 preliminally explored the formation mechanism of 2DEG and two-dimensional hole gas (2DHG) by regulating the polarity and thickness of LaInO 3 film, as well as the interface structure using the first-principles calculation. ...

High-Mobility Field-Effect Transistor Using 2-Dimensional Electron Gas at the LaScO 3 /BaSnO 3 Interface

ACS Applied Electronic Materials

... acceptors species rather than electrons). The input parameter for the simulations is the relative dielectric permittivity ε r ; here we took ε r = 24, as measured (see Fig. S4) and as reported for single crystals 26,38 [higher values are reported from atomistic simulations (ε r = 32) 27 and for other thin films (ε r = 38.7) 8 ]. ...

Melt Growth and Physical Properties of Bulk LaInO3 Single Crystals

... As activation becomes easier, a smaller density of acceptors is needed. For example, in the case of δ-doped BLSO[53] of a 10 nm 1% doped BSO channel, a deep-acceptor density of 2.5 × 10 19 cm −3 in BSO with 1.0 eV activation energy generates the same experimental results as a deep-acceptor density of 3.0 × 10 19 cm −3 with 1.55 eV activation energy does.The cases for varying LIO deep-donor activation energy are similar. The deep-donor activation energy of LIO is varied from 2.5 eV, which is half of the LIO band gap, to 2.0 and 1.5 eV, and the modified quantum wells are described inFig. ...

Fermi level pinning and band bending in δ -doped BaSnO 3

... Ultrawide band gap (UWBG) transparent conducting oxides have emerged as essential materials for next-generation optoelectronic applications. Among these materials ZnGa 2 O 4 , with a band gap of approximately 5 eV [1][2][3][4], is a promising candidate for high-power electronics [5,6], deep-ultraviolet photodetectors [7][8][9], and transparent photovoltaics [10]. The cubic spinel structure of ZnGa 2 O 4 exhibits intrinsic n-type conductivity, caused by Ga Zn antisites [11,12], with concentrations reaching 9 × 10 19 cm −3 and electron mobilities up to 107 cm 2 V −1 s −1 in bulk single crystals [3]. ...

Thin film transistors based on ultra-wide bandgap spinel ZnGa 2 O 4
  • Citing Article
  • May 2020