Denise Reichel's research while affiliated with Universität Stuttgart and other places
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Publications (3)
This chapter gives an overview where flash lamp annealing is used in semiconductor applications. After a short introduction to defect engineering several use cases in the field of doping are discussed including ultra-shallow junctions and hyperdoping in silicon, doping and superconductivity in germanium, silicon carbide, III–V semiconductors, and d...
This chapter discusses a couple of issues which are relevant for process management. Thereby, the main focus is on temperature measurement and temperature simulation. The first section deals with pyrometry as the dominating temperature measurement technique in short time annealing, and it addresses the various challenges that come with optical temp...
This chapter gives a brief overview about flash lamp annealing of non-semiconductor materials, although the line to semiconductors is flexible. The first section is devoted to dielectric thin films with the focus on high-k materials and rare earth doping of silicon dioxide. The next section discusses the use of flash lamp annealing for monocrystall...
Citations
... For example, laser-processed thin films can be used to form local contact openings or passivate Si surfaces [15,16]. In recent studies, millisecond laser annealing has been used to minimize undesirable diffusion [17][18][19][20]. P may be activated with a low specific contact resistance [21][22][23][24] through millisecond laser annealing. ...
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