D. T. Larson’s research while affiliated with Dow Chemical Company and other places

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Publications (4)


Film thickness determined by comparison of experimental reflectance with theoretical reflectance calculations vs ellipsometric thickness.
Wavelength, excitation purity, and luminous reflectance as a function of ellipsometric thickness for U–UO2 system. The wavelengths are represented by four regions. Region indicated by 1: dominant wavelengths 610–780 mμ; complementary wavelengths 493 c –567 c mμ and dominant wavelengths 380–450 mμ. Region indicated by 2 is for dominant wavelengths from 500 mμ to 570 mμ.
Film thickness determined by color analysis method vs ellipsometric thickness.
Reflectance spectra for UO2 films on uranium substrates.
Surface Film Thickness Determination by Reflectance Measurements
  • Article
  • Publisher preview available

June 1973

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39 Reads

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14 Citations

D. T. Larson

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L. A. Lott

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D. L. Cash

The thicknesses of UO2 films from 100 Å to 1800 Å on uranium substrates were determined from reflectance measurements in the visible region. The reflectance measurements on the U–UO2 system were analyzed by two different methods to determine film thicknesses. In the first method, film thicknesses were determined by comparing theoretical reflectance calculations with the experimental reflectance measurements. In the second method, film thicknesses were determined by obtaining the best match of the colorimetric properties (wavelength, excitation purity, and luminous reflectance) of the sample with the colorimetric properties of a predetermined film thickness calibration curve.

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Retardation of Plutonium Oxidation by a PuO Surface Film

April 1972

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2 Reads

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15 Citations

Journal of Vacuum Science and Technology

An anomalous rate minimum exists at about 400 °C for the oxidation of plutonium, i.e., there is a decrease in the oxidation rate as the temperature is increased toward the rate minimum. In situ X-ray diffraction studies have shown that in the temperature region of the rate minimum, there is an increased rate in the formation of PuO. The influence of a PuO surface film on the oxidation of plutonium was investigated with an ellipsometer to determine if a PuO film affects the oxidation rate. Measurements showed that the PuO surface film does retard oxidation at 80 °C. It is further postulated that the anomalous rate minimum for plutonium oxidation near 400 °C results from the increased rate of formation of the protective PuO surface film.



Citations (3)


... For thin film thickness measurements, the spectral reflectometer has been widely employed due to high measurement speed and simple configuration [3][4][5][6][7]12,14 . The lights reflected from the top and bottom surfaces interfere with each other, as shown in Fig. 1. ...

Reference:

A novel method to design and evaluate artificial neural network for thin film thickness measurement traceable to the length standard
Surface film thickness determination by reflectivity measurements
  • Citing Article

... 9,10 Unlike the reactive metallic plutonium carbide compound, for which photoemission data have shown itinerant 5f behavior, 11 plutonium oxycarbide surface films have shown to be unreactive and offer oxidation resistance or protection to δ-Pu alloys. 12,13 Prior to chemical analysis, plutonium oxycarbide surface films were thought to be the homoleptic monoxide phase, "PuO," 14 but first principles calculations have since shown this to be unstable. 15 As both PuC 1−x and the oxycarbide are isostructural with the rock salt structure, 16 the contrasting chemical reactivity of these two compounds may be due to the differences in the Pu 5f electron behavior and concomitant electronic structure. ...

Retardation of Plutonium Oxidation by a PuO Surface Film
  • Citing Article
  • April 1972

Journal of Vacuum Science and Technology

... In earlier studies with SR, the theoretical reflectance spectrum was modeled by considering only the reflection and transmission under the assumption that the absorptivity of the material is negligible. However, because the absorptivity cannot be ignored depending on the material, various methods adopting the complex refractive index instead of the real refractive index have been studied in an effort to realize a more accurate model of the theoretical reflectance spectrum, even when the absorptivity is quite low [6,7,[9][10][11][12][13][14][15]18]. From this line of research, a more accurate model of the reflectance spectrum can be created by considering the absorption effect quantitatively, thus facilitating thin-film thickness measurements with greater accuracy. ...

Surface Film Thickness Determination by Reflectance Measurements