C.-Y. Su’s scientific contributions

What is this page?


This page lists works of an author who doesn't have a ResearchGate profile or hasn't added the works to their profile yet. It is automatically generated from public (personal) data to further our legitimate goal of comprehensive and accurate scientific recordkeeping. If you are this author and want this page removed, please let us know.

Publications (3)


Reliability Characterization for 12 V Application Using the 22FFL FinFET Technology
  • Conference Paper

April 2020

·

18 Reads

C.-Y. Su

·

M. Armstrong

·

·

[...]

·

D. Young

Performance summary of HyPowerFF and the reference devices
Implementation of High Power RF Devices with Hybrid Workfunction and OxideThickness in 22nm Low-Power FinFET Technology
  • Conference Paper
  • Full-text available

December 2019

·

226 Reads

·

20 Citations

Download

Citations (2)


... Cost-effective CMOS technology with high transistor density is suitable for beamforming applications of mobile devices. FinFETs have a better maximum oscillation frequency (fMAX) than the planar MOSFET [4,5]. However, the cut-off frequency (fT) of FinFET cannot outperform planar MOSFET [4,6] due to the low electron mobility of its (110) sidewalls. ...

Reference:

RF Performance Benchmark of Nanosheets, Nanowires, FinFETs, and TreeFETs
Implementation of High Power RF Devices with Hybrid Workfunction and OxideThickness in 22nm Low-Power FinFET Technology

... Although nowadays some manufacturers (e.g. Intel [6], [7]) use significantly reduced channel doping to suppress RD induced fluctuations of device parameters, some other leading companies (such as IBM [8] and TSMC [9]) still employ FinFETs with "conventional" channel doping and therefore RD related variability still remains an issue. ...

Transistor reliability characterization and modeling of the 22FFL FinFET technology
  • Citing Conference Paper
  • March 2018