Barbara Bastek’s research while affiliated with Otto-von-Guericke-Universität Magdeburg and other places

What is this page?


This page lists works of an author who doesn't have a ResearchGate profile or hasn't added the works to their profile yet. It is automatically generated from public (personal) data to further our legitimate goal of comprehensive and accurate scientific recordkeeping. If you are this author and want this page removed, please let us know.

Publications (20)


Growth and surface characterization of magnetron sputtered zinc nitride thin films
  • Article

October 2012

·

61 Reads

·

15 Citations

Thin Solid Films

·

·

·

[...]

·

M.E. Kordesch

Zinc nitride films were deposited on Si(100) substrates at room temperature using RF-magnetron sputtering in pure N-2 and in Ar + N-2 atmospheres. Two active phonon modes (270.81 and 569.80 cm(-1)) are observed in Raman spectra for films deposited in Ar + N-2 atmosphere. Atomic force microscopy showed that the average surface roughness of the films deposited in pure N-2 atmosphere (1.3-3.33 nm) was less than for those deposited in a mixed Ar + N-2 atmosphere (10.3-12.8 nm). Low temperature cathodoluminescence showed two emission bands centered at 2.05 eV and 3.32 eV for both types of films.


Excitonic Transport in ZnO

September 2012

·

73 Reads

·

26 Citations

Journal of Materials Research

The temperature dependence of diffusion length and lifetime or diffusivity of the free exciton is measured in a commercial ZnO-substrate and in an epitaxial ZnO quantum well using nm-spatially and ps-time resolved cathodoluminescence (CL) spectroscopy. The characteristic temperature dependence of the exciton mobility is a fingerprint of the underlying excitonic scattering processes. Since excitons are neutral particles scattering at ionized impurities should be not effective. With decreasing temperature diffusion lengths and lifetimes give rise to a monotonous increase of the excitonic mobility. Two different methods for determining the excitonic transport parameters will be presented. On the one hand we are able to perform completely pulsed excitation experiments and on the other hand a combination of cw- and pulsed excitation in two independent measurements are needed.


Optical characterization of a InGaN/GaN microcavity with epitaxial AlInN/GaN bottom DBR

January 2012

·

17 Reads

Materials Research Society symposia proceedings. Materials Research Society

Resonant coupling of an optical mode confined within a microcavity and an emitter is the basic prerequisite for the observation of Bose-Einstein condensation phenomena and the development of novel optical devices based on cavity polaritons. We demonstrate highly spatially resolved 2” wafer characterization of the reflectivity and emission properties of a nitride based multi quantum well semi microcavity (i.e. structure without top Bragg reflector) to verify resonant regions. Photoluminescence and reflectivity spectra recorded at the same positions on the wafer exhibit a strong spatial dependence of the multi quantum well emission and the center wavelength of the stop band of the bottom Bragg reflector across the sample. Resonance, i.e., matching of the emission and the center wavelength of the stop band, is found in a region 8 mm off the center of the wafer. The thickness profile across the AlInN/GaN Bragg reflector and multi quantum well layers was obtained by x-ray mappings over the full wafer. A perfect correlation between the local optical properties and the x-ray thickness distribution is found. Additional transmission electron microscopy investigations indicate a complete crack free structure and smooth interfaces between the layers within the Bragg reflector making the structure appropriate for strong coupling applications.


Optical investigation of a hybrid GaN based microcavity with AlInN/GaN bottom and dielectric top distributed Bragg mirror

March 2011

·

13 Reads

·

3 Citations

Superlattices and Microstructures

A hybrid GaN based microcavity was fabricated to investigate light matter coupling. The sample consists of a lattice matched AnInN/GaN bottom and a dielectric upper Bragg mirror. To increase the coupling strength an InGaN/GaN multi quantum well was embedded inside a GaN cavity. The emission characteristics of the structure without top Bragg mirror were analyzed using photoluminescence spectroscopy. Two emission peaks at nearly fixed energy but changing intensity ratio with respect to the position on the sample arise. A detuning of the cavity mode and the excitonic emission into resonant condition is demonstrated by scanning across the wafer and temperature dependent measurements at about 50 K. Angle resolved photoluminescence investigations at the full hybrid structure exhibit two emission peaks. Predominantly excitonic behavior was found for the high and photonic-like behavior for the low energy peak. No clear anticrossing behavior was observed.


Heavy Si doping: The key in heteroepitaxial growth of a-plane GaN without basal plane stacking faults?

March 2011

·

18 Reads

·

17 Citations

In this paper, we compare the effectiveness of two different methods regarding the reduction of defect densities in heteroepitaxially grown a-plane GaN by heavy Si doping. The insertion of well-established in situ SixNy nanomasks leads to locally heavy Si d-doped GaN. By increasing the SixNy deposition time in the range from 0 to 300 s the full width at half maxima (FWHM) of the X-ray diffraction w-scans at in-plane GaN(1-100) and GaN(0002) Bragg reflections decreases from 0.55° to 0.24° and from 0.45° to 0.16°, respectively. When growing without any SixNy interlayer but instead with continuously heavy Si-doping, these values are further decreased to 0.13° and 0.15°, respectively. By measuring several higher order reflections and detailed evaluation of the w-scan broadening in Williamson–Hall-plots (WHPs) a considerable reduction in defect densities and no hint of basal plane stacking faults (BSFs) were found for the heavy Si doped a-plane GaN sample. To verify this result the micro-structural properties of this sample were additionally investigated by transmission electron microscopy and cathodoluminescence (CL).


Stranski--Krastanov transition and self-organized structures in low-strained AlInN/GaN multilayer structures

January 2011

·

25 Reads

·

6 Citations

Low-strained AlInN/GaN multilayers aimed as Bragg mirrors were grown by metal organic vapour phase epitaxy on GaN/Si(1 1 1). In such structures the upper AlInN/GaN interfaces show a considerable roughening on a nanometre scale whereas the lower ones appear flat as evaluated by cross-sectional electron and transmission electron microscopy. The roughening is attributed to a Stranski-Krastanov transition from two-dimensional layer-by-layer to three-dimensional island growth. In addition, a self-organized wavy-like surface morphology on a micrometre scale is observed in such structures which we discuss in terms of Grinfeld instability.


Comparison of spot mode CL spectra from a pure semipolar (full line) and a pure nonpolar (dashed line) crystallite, exclusively showing excitonic     (   D 0  , X  )     or BSF luminescence, respectively.
Direct microscopic correlation of crystal orientation and luminescence in spontaneously formed nonpolar and semipolar GaN growth domains
  • Article
  • Full-text available

April 2010

·

104 Reads

·

6 Citations

We present a direct microscopic correlation between local optical properties, characterized by spectrally resolved cathodoluminescence microscopy and the microscopic crystallographic orientation determined by electron backscatter diffraction at identical sample positions of nonpolar and semipolar GaN growth domains simultaneously formed during metal-organic vapor phase epitaxy on the same r-plane sapphire substrate. The luminescence from all nonpolar, (112_0) grown crystallites is dominated by the basal plane stacking fault luminescence, while all crystallites having semipolar (112_6) orientation show a luminescence characterized by pure excitonic emission, i.e., without any contribution of stacking faults, and with an order of magnitude enhanced quantum efficiency.

Download




Citations (12)


... [44,45] Despite the presence of oxygen, the characteristic ZnO peak in Raman at 437 cm −1 was found absent that illustrates either very low concentration of ZnO or the interaction between ZnO////N could also be responsible for its disappearance that is in agreement with literature. [46] Moreover, the appearance of minor broad peaks stationed at 1342 (D-band) and 1609 cm −1 (G-band) are labelled to the sp 2 hybridized carbon in carbonyl group from residual DMPU. [47] In addition to the XPS and Raman spectroscopic analysis, the surface morphology of Zn was examined by SEM after initial deposition to characterize the surface chemistry. ...

Reference:

Two Birds with One Stone: Green Solvent Enabled High‐Stability and Durable Zn Anode in Both Non‐Aqueous and Aqueous Electrolytes
Growth and surface characterization of magnetron sputtered zinc nitride thin films
  • Citing Article
  • October 2012

Thin Solid Films

... b) Present address: Istituto per la Microelettronica e Microsistemi, Consiglio Nazionale delle Ricerche, via del Fosso del Cavaliere 100, 00133 Roma, Italy formation. [4][5][6][7][8][9][10][11][12][13][14][15] In materials with high exciton binding energies such as diamond, [13][14][15] exciton diffusion may profoundly modify the carrier diffusivity even at elevated temperatures and high carrier densities. Given the exciton binding energy of 26 meV in GaN, we would expect exciton diffusion to play an important role in this material as well. ...

Excitonic Transport in ZnO
  • Citing Article
  • September 2012

Journal of Materials Research

... They commonly observed I 1 -and I 2 -BSFs but were not able to observe E-BSFs with an energy of 3.29 eV, which is controversial for existence because it overlaps with those of PSFs and PDs. 37,38 GaN/InGaN grown on the m-plane, however, have a defect density higher than 10 5 /mm, and the separation between the defects is in the order of 30-50 nm, which inevitably requires higher spatial resolution to correlate luminescence and the microstructure. See the supplementary material 55 for the dark-field images to reveal different types of dislocations and its relative density. ...

A-plane GaN epitaxial lateral overgrowth structures: Growth domains, morphological defects, and impurity incorporation directly imaged by cathodoluminescence microscopy

... Sum of the half-widths of E 2 (high) Raman modes is used to evaluate grain size and residual strain [38]. With increased temperature, the E 2 (high) vibrational mode gradually shifts to a lower wave number and the FWHM value gradually increases [40,41]. The Raman scattering peak of GaN does not shift noticeably in the range of 80-300 K. ...

Structural and optical properties of nonpolar GaN thin films

... Thus, the growth of non-polar nitrides has been extensively studied with developing various techniques. [12][13][14][15][16][17][18][19] However, the target nitride has been mainly on GaN, and only a few studies were reported on AlN. Growth of nonpolar AlN is crucial to the realization of polarization-free LEDs in deep UV range. ...

Heavy Si doping: The key in heteroepitaxial growth of a-plane GaN without basal plane stacking faults?
  • Citing Article
  • March 2011

... 4 Owing to its noticeable effect on the processing of multilayered semiconductors, ATG instability is extensively analyzed. 5 In addition to experimental techniques, theoretical treatments have been adopted to understand the interplay of surface and elastic energy in governing the configuration of the interface. The phase field method is a mathematical tool for describing interfaces and their motion. ...

Stranski--Krastanov transition and self-organized structures in low-strained AlInN/GaN multilayer structures
  • Citing Article
  • January 2011

... A constant target voltage is maintained by regulating the nitrogen flow with a proportional-integral-derivative control loop enabling growth rates above 1.5 nm/s, which is one order of magnitude higher than typical MOVPE rates. 18 All investigated AlN films have a thickness of 560 ± 10 nm, as determined by spectroscopic ellipsometry (J. A. Woollam M-2000) combined with a Cauchy-model fit. The crystal structure of the AlN films and the substrate off-cut of the Si (111) substrates are examined by high-resolution x-ray diffraction (XRD, Bruker D8 Discover equipped with Goebel mirror and LynxeEye XE detector). ...

MOVPE growth of high-quality AlN
  • Citing Article
  • December 2006

... High-quality GaN substrates for homoepitaxial growth are small in size and highly priced [3,4], while a-plane GaN heteroepitaxially grown on foreign substrates, as, e.g., r-plane sapphire, is characterized by a poor crystal quality expressed in high dislocation densities as well as basal and prismatic plane stacking faults (BSF and PSF, respectively) [5]. Thereby, the BSF luminescence usually dominates the emission spectra [6], while their influence regarding the performance of optoelectronic devices is still under discussion. ...

Direct microscopic correlation of crystal orientation and luminescence in spontaneously formed nonpolar and semipolar GaN growth domains

... This peak was previously observed and was assigned to the presence of aluminum vacancies. 18 This observation is consistent with the favorable formation of Al vacancies under N-rich growth conditions. The contribution at 3.52 eV is associated with GaN rods due to the shorter length of the AlN section compared to the other samples, which leads to additional excitation of the GaN base by the electron beam. ...

Analysis of point defects in AlN epilayers by cathodoluminescence spectroscopy
  • Citing Article
  • July 2009