Atsushi Kimura's scientific contributions

Publications (10)

Conference Paper
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows in...

Citations

... In addition to the advance of manufacturing technologies into the atomic range, it is increasingly important to enable the flexible and cost-effective production of components with complex geometries and a cross-scale mix of macroto micro-to nano-scale structures, even in smaller quantities. Therefore, international research is being conducted in new, unconventional approaches, such as tip-based nanofabrication [15], new highly efficient e-beam processes [16] or nanoimprinting [17]. These technologies are currently advancing into molecular and atomic ranges with increasing complexity and 3D requirements. ...
... A high order distortion correction (HODC) system is one of the unique features of NZ2C. [4][5][6][7][8][9][10][11] The HODC system consists of two different approaches; one is a magnification actuator system that applies force using an array of piezo actuators, and another is heat input to correct distortion on a field by field basis. ...
... A high order distortion correction (HODC) system is one of the unique features of NZ2C. [4][5][6][7][8][9][10][11] The HODC system consists of two different approaches; one is a magnification actuator system that applies force using an array of piezo actuators, and another is heat input to correct distortion on a field by field basis. ...
... A high order distortion correction (HODC) system is one of the unique features of NZ2C. [4][5][6][7][8][9][10][11] The HODC system consists of two different approaches; one is a magnification actuator system that applies force using an array of piezo actuators, and another is heat input to correct distortion on a field by field basis. ...
... To accelerate this technology adoption, recently CEA-Leti and EV Group initiated a new program called INSPIRE to diversify the NIL applications beyond semiconductors [68]. Canon also designs nanoimprint lithography tools by collaborating with other vendors and the end users [69]. ...