Patterning microfluidic device wettability using flow confinement

School of Engineering and Applied Sciences/Department of Physics, Harvard University, Cambridge, Massachusetts, USA.
Lab on a Chip (Impact Factor: 6.12). 07/2010; 10(14):1774-6. DOI: 10.1039/c004124f
Source: PubMed


We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

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Available from: Julian Thiele, Dec 01, 2015