Experimental comparison of substrate structures for inductors and transformers
An experimental comparison of the substrate structures for silicon inductive devices is proposed. On-wafer measurements for both inductors and stacked transformers revealed that better performance is achieved by exploiting a n<sup>+</sup>-doped buried layer as a patterned ground shield. The proposed solution increases inductor quality factor and allows a wide operative bandwidth for transformers to be achieved, as well. Moreover, owing to a well-defined RF ground reference, cross-talk phenomena are inherently reduced. Finally, the buried layer patterned ground shield highly simplifies substrate modeling and allows accurate electromagnetic simulations to be easily carried out.
Data provided are for informational purposes only. Although carefully collected, accuracy cannot be guaranteed. The impact factor represents a rough estimation of the journal's impact factor and does not reflect the actual current impact factor. Publisher conditions are provided by RoMEO. Differing provisions from the publisher's actual policy or licence agreement may be applicable.