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Measurement and control of stiction force in in-plane electrostatically actuated Si nanoelectromechanical cantilever relays with Pt contacts

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We measure the stiction force using in-plane electrostatically actuated Si nanoelectromechanical cantilever relays with Pt contacts. The average current-dependent values of the stiction force, ranging from 60 nN to 265 nN, were extracted using the I DS vs V GS hysteresis curves, the cantilever displacement information from finite element method (Comsol Multiphysics) simulations, and the force distribution determined using an analytical model. It is shown that the stiction force is inversely and directly proportional to the contact resistance (R c) and drain-source current (I DS), respectively. Using the dependence of the stiction force on the contact current, we demonstrate the tuning of the voltage hysteresis for the same relay from 8 V to 36 V (equivalent to a stiction force of 70 nN to 260 nN, respectively). We attribute the stiction force primarily to the metallic bonding force, which shows a strong dependence on the contact current.
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Journal of Micromechanics and Microengineering
J. Micromech. Microeng. 33 (2023) 085006 (7pp) https://doi.org/10.1088/1361-6439/acdc32
Measurement and control of stiction
force in in-plane electrostatically
actuated Si nanoelectromechanical
cantilever relays with Pt contacts
Md Ataul Mamun, Bennett Smith, Benjamin Horstmann, Kai Ding,
Gary Atkinson, ¨
Umit Özgür and Vitaliy Avrutin
Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, VA
23284, United States of America
E-mail: vavrutin@vcu.edu
Received 17 February 2023, revised 22 May 2023
Accepted for publication 7 June 2023
Published 27 June 2023
Abstract
We measure the stiction force using in-plane electrostatically actuated Si nanoelectromechanical
cantilever relays with Pt contacts. The average current-dependent values of the stiction force,
ranging from 60 nN to 265 nN, were extracted using the IDS vs VGS hysteresis curves, the
cantilever displacement information from nite element method (Comsol Multiphysics)
simulations, and the force distribution determined using an analytical model. It is shown that the
stiction force is inversely and directly proportional to the contact resistance (Rc) and
drain-source current (IDS), respectively. Using the dependence of the stiction force on the
contact current, we demonstrate the tuning of the voltage hysteresis for the same relay from 8 V
to 36 V (equivalent to a stiction force of 70 nN to 260 nN, respectively). We attribute the stiction
force primarily to the metallic bonding force, which shows a strong dependence on the contact
current.
Keywords: nanoelectromechanical system relays, stiction force, metallic bonding force,
NEMS/MEMS, electrostatically actuated relays, Pt contact, adhesion force
(Some gures may appear in colour only in the online journal)
1. Introduction
Since their inception, electrostatically actuated relays based
on nano/micro electromechanical systems (N/MEMS), mostly
based on single crystalline or polycrystalline Si, have gathered
considerable attention due to their compact design, relative
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ease of fabrication process, and many potential applications,
ranging from accelerometers and sensors [13] to logic
devices [46]. These relays exhibit a zero off-state leakage
current together with a steep subthreshold slope, and can oper-
ate at relatively high temperatures [1,79] while withstand-
ing radiation levels up to two orders of magnitude higher
when compared to complementary metal-oxide semicon-
ductor (CMOS) devices, leveraging them for high-efciency
and harsh-environment applications [911]. Despite these dis-
tinct characteristics, the poor reliability due to contact failures
in the NEMS relays remains a major concern. Due to the large
surface area-to-volume ratio of these relays, one of the major
modes of failure is the stiction that occurs at the contact area
1361-6439/23/085006+7$33.00 Printed in the UK 1 © 2023 The Author(s). Published by IOP Publishing Ltd
J. Micromech. Microeng. 33 (2023) 085006 M A Mamun et al
of two electrodes [2,8,1214]. Controlled stiction, however,
may be benecial for memory applications, such as in static
random access memory and eld programmable gate arrays
[1,15].
Fundamentally, an electrostatically actuated relay pos-
sesses three terminals, as shown in gure 1(a): a cantilever
as the source (S), a driving electrode as the gate (G), and an
input/output electrode as the drain (D) in analogy to the con-
ventional switches based on eld-effect transistors. Generally,
Si-based relay electrodes contain a thin metal coating for
effective electrostatic actuation and enhanced current conduct-
ivity when the cantilever is actuated. When an electric eld
is applied between the gate and the source, the cantilever
bends towards the gate electrode due to electrostatic attrac-
tion force (Fes). A restoring/spring force (Frestore ) in the can-
tilever beam counteracts Fes, preventing the collapse of the
cantilever tip to the drain, and a new equilibrium position is
established. However, when the gate voltage VGequals a crit-
ical value, the pull-in voltage (Vpi), the cantilever tip contacts
the drain, closing the switch. Once the relay is pulled-in, a con-
tact adhesion/stiction force (Fstiction) develops on the contact
surface, which increases with increasing actual contact area
(e.g. when an overdrive is applied, VG>Vpi) (gure 1(b)).
The stiction/adhesion force is a combination of normal van der
Waals (vdW) forces, retarded vdW forces, and metallic bond-
ing forces [16]. With decreasing gate voltage, Fes reduces, and
once the combination of Fes and Fstiction falls below the Frestore,
i.e. when VGis below the pull-out voltage Vpo, the cantilever
separates from the drain. The following conditions thus apply
for the cantilever’s attachment to or detachment from the drain:
Attached: Fes +Fstiction >Frestore.(1)
Detached: Fes +Fstiction <Frestore.(2)
For relatively soft cantilevers (small restoring force), even
if the attracting electric eld is completely removed (i.eFes =
0 V), the cantilever tip may remain attached to the drain if the
surface adhesion force, Fstiction, overpowers the Frestore. This is
the failure mode, which can be mitigated by tuning the restor-
ing force and the stiction force, or by changing the operation
mode, which will be discussed later.
Compared to other approaches, the processing of
NEMS/MEMS devices using Si technology is desirable as
it is well established, and single-crystal Si is well known to
be extremely resistive to material fatigue and creep deform-
ation, providing superior reliability to absorb electromechan-
ical shocks or stress, or both [17]. However, even with heavy
doping, the conductivity of Si is not sufcient for a reliable
contact [5]. As a solution, the Si-based device is coated with
a thin conductive material, such as Pt, which has shown an
outstanding performance due to its high current conductivity,
mechanical robustness, and high chemical resistance, even in
harsh ambient environments [1,18]. With increased conduct-
ivity, stiction becomes a more prominent mode of failure [13]
for N/MEMS relays. It is thus necessary to know the strength
Figure 1. (a) A schematic diagram of a NEMS relay with three
terminals: a cantilever anchored in a source (S), a driving electrode
as the gate (G), and an output electrode as the drain (D). (b) An
electrostatically actuated relay with forces in effect. The
electrostatic force between G and S causes the cantilever to pull-in
to the drain. (c) The IDS vs VGS characteristics of the relay,
indicating pull-in and pull-out voltages. (d) A schematic of a
released and metallized cantilever relay. The inset in (d) shows the
cross-section SEM image of a metallized test sample to estimate the
sidewall to top metal deposition ratio for a gap of 300 nm.
of the stiction force for appropriate design and operation of
N/MEMS relays. Although Pt stiction force has been meas-
ured using atomic force microscopy (AFM) [19], it is not
entirely applicable to NEMS/MEMS relays since an AFM
tip surface guarantees maximum contact with the measur-
ing surface, unlike a source-drain contact in a NEMS/MEMS
cantilever relay, where only a few asperities are in actual
contact [6,7,13]. Additionally, contributions from retarded
vdW forces and metallic bonding forces may not be properly
accounted for during stiction force determination using an
AFM tip. Also note that the AFM tip material and relay contact
material are often different, as evident from past experiments
[15]. Therefore, direct quantication of the stiction force in
actual NEMS/MEMS relays would provide the much-needed
design rules.
In this work, stiction is evaluated in laterally actuated Si
NEMS cantilever relays with Pt contacts. The stiction force
is determined using the actuation voltage hysteresis curves,
the cantilever displacement from nite element method (FEM)
simulations, and force distribution obtained from an analytical
model. The drain current and contact resistance are shown to
strongly impact stiction, which is primarily attributed to metal-
lic bonding forces. Accordingly, the stiction force can be tuned
within a wide range by changing the current ow through the
contact.
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J. Micromech. Microeng. 33 (2023) 085006 M A Mamun et al
2. Experimental methods
The gate-voltage-dependent tip displacement and pull-in
voltage values of cantilevers with different dimensions were
simulated using FEM COMSOL Multiphysics 5.4 software,
and the design dimensions were determined for the desired
operational voltage range. For fabrication, a silicon-on-
insulator wafer with a 2.8 µm thick device layer and 2 µm thick
buried-oxide layer was utilized. First, the device layer was
thinned by an inductively coupled plasma reactive ion etching
(ICP RIE) system (SAMCO RIE-101iPH) down to 550 nm
using an Ar and SF6gas mixture. Then, a 500 nm thick posit-
ive e-beam resist (ZEP-520A ZEON CO.) was spin-coated on
the device layer, followed by patterning using a Raith Voyager
50 KV electron-beam lithography system. After 75 s develop-
ment in xylenes, the sample was etched in the ICP RIE system
using a SF6and C4F8gas mixture. This was followed by resid-
ual e-beam resist removal in n,n-dimethylacetamide solution,
followed by additional cleaning in H2SO4/H2O2mixture (3:1).
To release the cantilevers, the sample was dipped into a 49%
HF solution for 2 min to remove the SiO2layer underneath. For
metallization, different thicknesses of Pt layers were deposited
via DC power sputtering using an AJA Orion 5 sputtering sys-
tem. To achieve a relatively uniform coating on both sidewalls
of the cantilever electrode, the sample was rotated with the
holder inside the sputtering chamber. Figure 1(d) shows the
schematic of a released and metallized cantilever.
For stiction force measurements, a number of relays of
different cantilever widths (300–500 nm) were fabricated.
Although the cantilever widths were different (i.e. of differ-
ent spring constants) the cantilever-to-drain gap was kept at
a narrow range of 300–325 nm. Based on measurements on
test samples, for a typical cantilever-to-drain separation of
300 nm, the metal thickness on the sidewalls was determ-
ined to be 30% of that on the top surface, as shown in the
cross-sectional scanning electron microscopy (SEM) image in
gure 1(d) inset. The actual devices were then sputtered with
Pt for various time durations to obtain different Pt thicknesses
(2 nm to 7 nm) on the cantilever sidewalls and drain.
The IDS VGS characteristics of the relays were measured
using a Keithley 4200 SCS system connected to a Karl Suss
probe station. The measurements were performed in a con-
trolled air ambient environment with a temperature of 24 C
and relative humidity of 29%. To acquire a voltage hyster-
esis, both forward and reverse sweeps of IV(primarily with
a 2 V resolution) were performed with or without a current
compliance.
An applied VGS exerts a distributed force on the cantilever
which, as a result, bends towards the drain. A cantilever pivot
model [20] provides the amount of resultant effective Fes and
its acting point for a given VGS using the following formula
Fes =ϵAV2
GS
2
δ+ (gδ)ln(gδ
g)
δ2(gδ)
(3)
where ϵ, A,VGS,g, and δare the permittivity of the gap mater-
ial (air in this case, and the value is considered the same
as for vacuum), the electrostatic actuation area, the gate-to-
source voltage, the gap between the source and the gate,
and cantilever displacement at the gate tip, respectively. We
acquire the cantilever displacement (δ) dependence on VGS
from COMSOL simulations using the actual electrode dimen-
sions of the relay (xed cantilever length of 11.65 µm and
cantilever thickness of 550 nm, but varying gap and cantilever
width). Then, using equation (3), the Fes at its acting point
(which is at 7.3 µm from the pivot point of the cantilever) is
calculated. Finally, the equivalent amount of Fes on the canti-
lever tip is determined using the lever rule. As stated earlier,
when a VGS is applied, the cantilever bends towards the gate
and parks at an equilibrium position, where the Fes becomes
equal to the Frestore. For any δ, the pivot model provides the
magnitude of a single equivalent Frestore and its acting point
using the following formula
Frestore =kδ(4)
where kis the stiffness or the spring constant of the cantilever
given by [20]
k=2
3Et(w
L)3
(5)
where E, t, w, and Lare the modulus of elasticity of Si, canti-
lever thickness, width, and length, respectively. Single-crystal
Si has an elastic modulus that varies with the direction of
the applied force. For our work, we selected (100) Si to pro-
duce cantilevers oriented in the <110>direction, which has an
elastic modulus of 169 GPa [21]. Using equations (4) and (5),
the Frestore at its acting point (which is at 6.2 µm from the pivot
point of the cantilever) is calculated. Finally, the equivalent
amount of Frestore on the cantilever tip is determined using the
lever rule.
3. Results and discussion
The stiction force can be estimated from the IDS vs VGS hys-
teresis curves using the cantilever displacement information
from simulations. For reliable assessment of an average stic-
tion force, we fabricate a range of relays with xed cantilever
length (11.65 µm) and thickness (550 nm) but with varying
cantilever widths and varying S–G gaps. Figure 2(a) presents
the SEM image of a relay with a cantilever width of 390 nm
with a D–S gap of 300 nm. This relay exhibits a hyster-
esis of 16 V with a pull-in voltage of 61 V, as presented in
gure 2(b). Under a drain bias of VDS =1 V, the drain cur-
rent (IDS) reaches its peak of 165 µA at a gate voltage (VGS)
of 80 V (i.e. 30% voltage overdrive). In the reverse sweep,
when the VGS is reduced, the drain current does not follow its
forward sweep trajectory due to the stiction force at the con-
tact point. The IDS value remains constant (165 µA) until the
pull-out occurs at 45 V.
As shown in gure 2(c), up to the pull-in voltage (61 V),
the extracted Fes and Frestore values are nearly equal, as expec-
ted for a balanced system. Just at the pull-in point, when the
cantilever contacts the drain, the force is 325 nN. Beyond
3
J. Micromech. Microeng. 33 (2023) 085006 M A Mamun et al
Figure 2. (a) An SEM image of a fabricated relay showing the dimensions of electrodes. (b) The measured IVresponse of the relay shown
in (a). No current compliance was set for the measurement, (c) Electrostatic force and restoring force at the cantilever tip as a function of the
gate-to-source voltage. The force plots (i.e. Fes and Frestore) in (c) are calculations using the pivot model and the COMSOL simulations with
the experimentally determined dimensions (shown in (a)) and experimental values of Vpi and Vpo (b).
Figure 3. (a) Stiction force correlation with contact resistance (RDS ) extracted from a range of cantilevers with various widths (spring
constants). Low contact resistance means a larger actual contact area, leading to higher stiction force. (b) The correlation of stiction force
with current conduction through the contact. A higher current ow leads to higher stiction force. The error bars show the standard deviation
of the stiction force for an IDS, measured over a number of samples with different widths and G–S gaps but with xed thickness and D–S
gaps.
Vpi,Fes increases with increasing VGS , but the Frestore remains
constant (at 325 nN) as the cantilever tip is in contact with
the drain and cannot move further. Note that any further bend-
ing of the cantilever beyond Vpi is neglected in this picture.
The increasing Fes is counteracted by the drain as it exerts an
opposing force (Fes Fstiction ) to the cantilever tip. In reverse
sweep, if the VGS is gradually reduced to slightly below the
Vpi, the cantilever will pull-out in the absence of stiction [13].
However, the cantilever pulls out at 45 V. The Fes just before
the pull-out is 180 nN, whereas the Frestore remains at 325 nN
(as the cantilever is still in contact with the drain). As shown in
gure 2(c), the difference force (145 nN) between the Frestore
and Fes at the pull-out point is attributed to the minimum stic-
tion force, Fstiction.
When two surfaces of any material(s) are in contact, vdW
forces are active. For small separations (<5 nm), normal
vdW forces are prominent whereas, for larger separations
(>5 nm), retarded vdW forces dominate [12,16]. However,
the attractive forces between ‘metallic’ surfaces at separa-
tions below 0.5 nm also involve the metallic bonding force,
which arises due to short-range electron exchange interactions
between the surfaces [16,22]. This type of force is partially
responsible for retaining contact, even when the gate voltage
is reduced well below the pull-in voltage. As a result, the IDS,
and thus the contact resistance RDS, remain nearly constant, as
seen in the reverse sweep of gure 2(b).
As alluded to earlier, the total stiction force increases with
increasing contact area. The electrical contact resistance (RDS)
is a good representative measure of the actual contact area and
can be obtained from the measured IDS for a given VDS. As
shown in gure 3(a) for a variety of cantilevers with differ-
ent stiffnesses (different widths) and bias conditions, a clear
correlation between Fstiction and RDS is evident. The stiction
force is inversely proportional to the contact resistance, i.e. it
decreases with decreasing contact area. Accordingly, relays
with low contact resistance below 1Kconsistently show
large voltage hysteresis, i.e. high Fstiction.
Figure 3(b) shows that Fstiction is also closely related to
the magnitude of IDS. In general, the higher the current ow,
the higher the stiction force is. A too high current (in the
4
J. Micromech. Microeng. 33 (2023) 085006 M A Mamun et al
Figure 4. Compared to the relay whose characteristics are shown in gure 2, we show the IDS vs VGS characteristics (upper panels) and
force curves (bottom panels) (a) for IDS 250 µA: hysteresis enlarged to 36 V, which corresponds to Fstiction 260 nN (no current
compliance was set for this test); and (b) for IDS =10µA: hysteresis shrinks to 8 V, which is equivalent to Fstiction 70 nN. For both (a) and
(b) the VDS was kept constant at 1.5 V, indicating that a low drain-to-source voltage has a negligible role in the hysteresis. The force curves
(i.e. Fes and Frestore) presented in the bottom panels are calculated using the pivot model and the COMSOL simulations using the
experimentally determined dimensions (shown in gure 2(a)) and experimental values of Vpi and Vpo (upper panel).
milliampere range and above), however, can cause a substan-
tial increase in contact temperature and eventually permanent
welding in the contact. In this work, we investigated Fstiction
vs IDS for relays with RDS values within the range of 0.5 k
to 500 k(gure 3(a)) by keeping VDS 2 V, while ensuring
IDS <700 µA (gure 3(b)), resulting in the power released in
contacts not exceeding 0.375 mW. In this operation window,
we did not observe any noticeable effect of joule heating due
to the contact current in our experiments. In separate experi-
ments, we observe an increase in contact resistance and even-
tual contact welding at powers exceeding 1.2 mW.
Although within our operation range (i.e. maximum power
0.375 mW), we did not observe any modication in con-
tact resistance, regardless of a higher or lower current pass; a
higher current should cause a rise in local temperature, which
may affect IVhysteresis. He et al [23] conducted an exper-
iment to nd out the potential effect of elevated temperat-
ure on NEMS relays’ electrical characteristics by raising the
relay ambient temperature. When an environmental temper-
ature is raised the contact temperature should also rise by
the same amount. However, as reported by He et al, no sig-
nicant effect is found for NEMS relays’ electrical charac-
teristics, even when the temperature is elevated to 500 C
[23]. For all-metal electrostatic relays, Sushil et al [14] report
a 12% increase in hysteresis when the ambient temperature
is raised from room temperature to 150 C; however, they
also report a decrease in hysteresis (6%) when the ambient
temperature increased from 150 C to 300 C. Figure 3(b)
shows a clear boost in the stiction force from 60–65 nN to
200–265 nN when the current ow is increased from 0.01
to 1 µA to 500–1000 µA. We attribute this extra force to the
current-induced metallic bonding (CIMB). Thus, by changing
the current ow through the relay contact (with varying CIMB)
the hysteresis, i.e. the Fstiction, can be tuned. As shown in
gure 4(a), a higher IDS (250 µA) for the same relay shown
in gure 2(a) increases the voltage hysteresis and Fstiction to
36 V and 260 nN, respectively (from 16 V and 145 nN). A
lower IDS (10 µA) to the same relay produces 8 V hysteresis
equivalent to Fstiction 70 nN (gure 4(b). This value is close
to the reported stiction force for Pt contact (Fstiction =50 nN)
in NEMS relays (for IDS 10 µA and RDS 10 kΩ), extrac-
ted using experimental IVhysteresis in electromechanical
simulations [24]. Our results also agree with the data reported
by Tabib-Azar et al [19], who measured the Pt stiction force
between a Pt-coated tip in an atomic force microscope and a
Pt thin lm to be 65 nN. However, the authors did not report
the stiction force dependence on the RDS and/or IDS.
The above-mentioned characteristics are for relatively stiff
cantilevers (width of 400 nm), which would require a
higher current ow for stiction failure compared to softer
(thinner) cantilevers. For cantilevers with a reduced width
of 300 nm but the other dimensions kept the same as
those shown in gure 2(a), the restoring force is much
smaller, Frestore =135 nN. Figure 5(a) shows the IDS -VGS
5
J. Micromech. Microeng. 33 (2023) 085006 M A Mamun et al
Figure 5. The IVdiagram (top panels) shows that the cantilever (a) is stuck after switching for IDS =10 µA, and (b) low hysteresis when
the IDS compliance was set to 1 µA. The inset in (b) shows the SEM image with the dimensions of the relay associated with the IVcurves
in (a) and (b). The measured dimensions are used in the corresponding simulations in COMSOL Multiphysics and the pivot model to
calculate the force plots. The bottom panel shows the electrostatic force and restoring force at the cantilever tip as a function of the
gate-to-source voltage for currents (a) 10 µA and (b) 1 µA.
characteristics and force curves at 10 µA current ow, which
reveals that the cantilever remains stuck to the drain, even
when the VGS is reduced to 0 V and the IDS remains at 10 µA.
This indicates an adhesion force of at least 135 nN. Upon
completion of the IDS VGS sweep, the cantilever releases
itself, which was expected because of the absence of the
IDS and, therefore, the relay was ready for further cycling.
The same cantilever shows a low hysteresis of 6 V for an
IDS =1µA (gure 5(b)) with a corresponding stiction force
35 nN. This further conrms the dependence of the stiction
force on the contact current ow. However, when two metal-
lic surfaces are in contact, even if there is no apparent current
ow (through the contact), a metallic bonding force is still act-
ive in addition to vdW forces because of short-range electron
exchange among the adjacent atoms on the contact asperities
[16]. If the actual contact area is large (i.e. RDS is low), this
force can be large enough for a soft cantilever (i.e. a cantilever
of narrow width), and the cantilever can be permanently stuck,
even without any contact current ow after actuation.
To completely eliminate stiction, the mode of cantilever
operation can be changed to electrostatic repulsion rather than
attraction. When the same voltage is applied to S and G of a
relay, because of the like charges, the electrodes will repel each
other. When a cantilever is stuck, its spring force is already in
effect. Thus, to release it, the required extra force is equal to
(Fstiction Frestore), i.e. application of a voltage equivalent to
Vpi to both S and G terminals will result in detachment of the
cantilever from the drain.
Finally, the determination of stiction force per unit area
can be a useful parameter as it can be universally used. To
calculate the stiction force per area, it is essential to determ-
ine the actual contact area. Although the apparent surface area
of the source and drain contact is large in the cantilevers dis-
cussed here (550 nm ×650 nm), the actual contact area can be
quite small. As stated earlier, the electrical contact resistance
(RDS) is a good representative measure of the actual contact
area. For RDS =1 k,the actual contact area can be calcu-
lated as 1.1 nm2from the following relation:
Aactual
Aapparent
=Rapparent
Ractual
where Rapparent is 3 m(considering both the cantilever and the
drain sidewalls, each coated with 5 nm of Pt), and Aapparent
is the apparent overlap area of the cantilever and drain. From
gure 3(b) we can extract that, for an IDS of 0.01 1µA,
the average stiction force is 60 nN. Therefore, the stiction
force per unit area is 55 N m2, which aligns reasonably well
with the theoretical stiction force per unit area (100 N m2) for
Pt reported by Pawashe et al, calculated from the Pt surface
energy (2.7 J m2) [22].
4. Conclusion
In this work, we quantify the average stiction force using
in-plane electrostatically actuated Si NEMS cantilever relays
6
J. Micromech. Microeng. 33 (2023) 085006 M A Mamun et al
with Pt contacts. It is shown that the stiction force is inversely
and directly proportional to the contact resistance (Rc), which
is the measure of the contact area and drain-source current
(IDS), respectively. Using the dependence of the stiction force
on the contact current, we tune the voltage hysteresis from
8 V to 36 V, which is equivalent to a stiction force of 70 nN
to 260 nN, respectively, by increasing the drain current from
1 0µA to 250 µA. We attribute the stiction force predomin-
antly to the metallic bonding force and show that the latter has
strong dependence on the contact current. The quantication
of the stiction force provides the means to tune it either by
designing the parameters or operating conditions of a relay,
and makes it possible to eliminate or mitigate stiction-related
contact failure in such cantilever designs.
Data availability statement
All data that support the ndings of this study are included
within the article (and any supplementary les).
Acknowledgments
This research was funded by the Electric Power Research
Institute (EPRI). The relays were fabricated in the C Kenneth
and Dianne Harris Wright Virginia Microelectronics Center at
Virginia Commonwealth University.
ORCID iDs
Md Ataul Mamun https://orcid.org/0000-0003-2122-7709
Kai Ding https://orcid.org/0000-0003-4791-4742
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... Micro-and nano-electromechanical systems (M/NEMS) devices benefiting from the advanced micro/nanofabrication methods exhibit vast potential across numerous application fields, including gas sensors [1], accelerometers [2], and dielectric barrier discharge actuators [1] to name a few. * Author to whom any correspondence should be addressed. ...
... Besides these applications, M/NEMS based combinational logic circuits have garnered attention as possible replacements for electronic logic systems in safety critical environments such as nuclear reactors, particle accelerators, and satellites where conditions make the use of electronics non-ideal [2,3]. In addition to fixed electrodes with sub-micron separations, these devices commonly incorporate flexible electrodes with even narrower controllable gaps from few 100 s to 10 s of nm down to zero nm to facilitate their operation [2,[4][5][6]. ...
... Besides these applications, M/NEMS based combinational logic circuits have garnered attention as possible replacements for electronic logic systems in safety critical environments such as nuclear reactors, particle accelerators, and satellites where conditions make the use of electronics non-ideal [2,3]. In addition to fixed electrodes with sub-micron separations, these devices commonly incorporate flexible electrodes with even narrower controllable gaps from few 100 s to 10 s of nm down to zero nm to facilitate their operation [2,[4][5][6]. In M/NEMS devices, electrostatic forces are usually harnessed to drive mechanical action. ...
Article
Full-text available
A thorough understanding of arc discharge mechanism as well as determination of arc discharge voltage at the nanometer scale remains challenging due to the complexities associated with electrode preparation and precisely maintaining nanoscale separations in experiments. This work addresses this challenge through a novel approach by accurately measuring electric breakdown/discharge voltages between Pt-coated Si electrodes with separations ranging from ∼5 nm to 370 nm using a combination of fixed and flexible nano-electrodes while inherently creating an ideal environment to mitigate the effect of mechanical vibrations on the measurement results. For separations of 10, 100, and 300 nm, the corresponding discharge voltages are ∼15, 75, and 160 V, respectively, with the apparent electric field for the 10 nm separation exceeding 1.5 GV m⁻¹. The results acquired from the investigated electrode configuration closely resembling the laterally actuated nanoelectromechanical system (NEMS) cantilever relays reveals strong agreement with NEMS relay breakdown characteristics, emphasizing the importance of arc discharge considerations while designing micro/nano electromechanical devices. Furthermore, deliberately applied arc discharge is shown to provide electrode nano-welding for realization of configurable NEMS circuits.
... These two gasses flow simultaneously allowing for ion bombardment and sidewall passivation to occur at the same time (this is known as a Pseudo-Bosch process) [15]. This yields a highly anisotropic etch, without the characteristic scalloping of a traditional Bosch process, as seen in Figure 4 [15], [16], [17], [18], [19]. Then, the residual e-beam resist was removed, and the cantilevers were released from the oxide beneath via wet etching of the exposed oxide layer in 49% hydrofluoric acid for 2 min. ...
... This conventional technique results in a conformal sidewall coating as confirmed by SEM imaging and electrical testing. The fabrication process, depicted in Figure 4, allows for the robust construction of relays without requiring multiple lithography steps as is the case with vertically actuated relays [19]. A target pull-in voltage of 60 V was chosen for control circuitry applications; however, this value can be tuned by varying the device dimensions [7], [19]. ...
... The fabrication process, depicted in Figure 4, allows for the robust construction of relays without requiring multiple lithography steps as is the case with vertically actuated relays [19]. A target pull-in voltage of 60 V was chosen for control circuitry applications; however, this value can be tuned by varying the device dimensions [7], [19]. ...
Article
Nano electro-mechanical systems (NEMS) based combinational logic circuits have garnered attention as possible replacements for electronic logic systems in safety critical environments where conditions make the use of electronics non-ideal. The principal advantages of NEMS are the inherent near zero leakage current and ability to operate in harsh conditions where substantial parasitic field effects are present. In this work, we design and experimentally demonstrate NEMS based logic gates which utilize multi-gate relays, designed to actuate when input signals are applied to all gate terminals simultaneously. This design enables signal propagation through a single relay for NAND, NOR, and NOT gates with any number of inputs, eliminating variations of output resistance and capacitance, which affect the output generation time. Furthermore, these devices are fabricated using a conventional process requiring only one lithography step. These devices can be utilized to produce all primary logic functions. The proposed platform exclusively uses relay structures based on straight cantilevers, favoring a complementary logic, and allowing for the aforementioned improvements over current designs. The relay structures are optimized using a procedure based on COMSOL simulations. The efficacy of the logic gate designs, and corresponding optimization procedures are validated through a series of electrical tests on fabricated 3-input NAND gate structures utilizing a multi-gate relay. The tests show successful operation for input voltages ranging from 62 and 74 V thus confirming that the approach put forth in this paper can effectively constitute NEMS based complementary logic circuits, while fulfilling all constituent input and output requirements. 2023-0125
... This can be problematic for certain applications. Many types of MEMS devices rely on the Bosch process for fabrication, but some of these devices [12], [13], [14] . However, the optimized Bosch process provides a sidewall roughness of 110 -140 nm peak-to-peak range with a 10 nm RMS deviation, as reported. ...
Article
Full-text available
Cryogenic deep reactive ion etching (Cryo DRIE) of silicon has become an enticing but challenging process utilized in front-end fabrication for the semiconductor industry. This method, compared to the Bosch process, yields vertical etch profiles with smoother sidewalls not subjected to scalloping, which are desired for many microelectromechanical systems (MEMS) applications. Smoother sidewalls enhance electrical contact by ensuring more conformal and uniform sidewall coverage, thereby increasing the effective contact area without altering contact dimensions. The versatility of the Cryo DRIE process allows for customization of the etch profiles by adjusting key process parameters such as table temperature, O2 percentage of the total gas flow rate (O2 + SF6), RF bias power and process pressure. In this work, we undertake a comprehensive study of the effects of Cryo DRIE process parameters on the trench profiles in the structures used to define cantilevers in MEMS devices. Experiments were performed with an Oxford PlasmaPro 100 Estrelas ICP-RIE system using positive photoresist SPR-955 as a mask material. Our findings demonstrate significant influences on the sidewall angle, etch rate and trench shape due to these parameter modifications. Varying the table temperature between −80 °C and −120 °C under a constant process pressure of 10 mTorr changes the etch rate from 3 to 4 μm min⁻¹, while sidewall angle changes by ∼2°, from positive (<90° relative to the Si surface) to negative (>90° relative to the Si surface) tapering. Altering the O2 flow rate with constant SF6 flow results in a notable 10° shift in sidewall tapering. Furthermore, SPR-955 photoresist masks provide selectivity of 46:1 with respect to Si and facilitates the fabrication of MEMS devices with precise dimension control ranging from 1 to 100 μm for etching depths up to 42 μm using Cryo DRIE. Understanding the influence of each parameter is crucial for optimizing MEMS device fabrication.
... The proposed method has been found to be an effective solution to avoid stiction and improve reliability of the MEMS switches. Another solution to mitigate the stiction problem in MEMS switches is the use of harder metallic materials [143]. However, use of such materials causes issues of pull-in voltage requirements and switches the speed because of more of a stiffness constant for a harder metal. ...
Article
Full-text available
Micro-Electro-Mechanical System (MEMS) switches have emerged as pivotal components in the realm of miniature electronic devices, promising unprecedented advancements in size, power consumption, and versatility. This literature review paper meticulously examines the key issues and challenges encountered in the development and application of MEMS switches. The comprehensive survey encompasses critical aspects such as material selection, fabrication intricacies, performance metrics including switching time and reliability, and the impact of these switches on diverse technological domains. The review critically analyzes the influence of design parameters, actuation mechanisms, and material properties on the performance of MEMS switches. Additionally, it explores recent advancements, breakthroughs, and innovative solutions proposed by researchers to address these challenges. The synthesis of the existing literature not only elucidates the current state of MEMS switch technology but also paves the way for future research avenues. The findings presented herein serve as a valuable resource for researchers, engineers, and technologists engaged in advancing MEMS switch technology, offering insights into the current landscape and guiding future endeavors in this rapidly evolving field.
Article
Nano/microelectromechanical systems (N/MEMS) based complementary logic circuits offer a physically robust alternative to conventional CMOS control systems, which are able to function in environments unsuitable for transistor devices. In this work we demonstrate novel, configurable, complementary logic circuits comprised entirely of relays at both NEMS and MEMS scale, which are capable of fulfilling all primary logic functions. Lifetime testing of the fabricated devices revealed two key failure modes: contact degradation and welding of high voltage cantilevers, both of which are caused by the charging and discharging of unwanted parasitic capacitances inherent to complementary relay structures. Devices are consequently damaged by high transient current and arc discharge between contacts. Several solutions are proposed and implemented to mitigate these issues, including minimization of unwanted capacitances, optimization of metallization scheme, introduction of intermediate operation cycles intended to increase time between state changes, and prevention of welding by preemptively charging capacitors to an intermediate voltage. To this effect, a detailed study of lifetimes for both single cantilevers and logic gate structures is presented comparing a variety of metallization schemes using Pt, Ti, TiN, and W, including their multilayer combinations. These varied optimization methods yielded single cantilever lifetimes of 1.74 billion cycles on average for devices with a Ti adhesion layer, a Pt primary layer, and a W surface layer to increase durability. Using the same metallization scheme, complementary logic structures achieved 0.6 million cycles on average. These results demonstrate the viability of robust N/MEMS based complementary logic circuits for safety critical control applications. 2024-0203
Conference Paper
Full-text available
The current electromechanical and solid-state relays employed in the Nuclear PowerInstrumentation and Control (I&C) are outdated and subjected to maintenance and reliabilitychallenges primarily related to degradation caused by ageing, high voltage/current operations,electromagnetic interference ( EMI), and non -ionizing and ionizing radiation. To address theseconcerns, we assert that significant performance and cost advantages may be gained by shifting tomicro- and nano-scale electromechanical relays for I&C applications in nuclear power plants(NPPs). Single-crystal silicon is well known to be extremely resistive to material fatigue and creepdeformation, providing superior reliability of electromechanical actuation. Each micro-scaled relaycan be situated within a 2 mm x 2 mm area and nano-scaled relays may be implemented to have a 200 μm x 200 μm footprint. A single Si wafer (e.g., 100 mm in diameter) can then incorporate alarge number of relays produced in a single fabrication run and each relay, based on a cantilever that moves laterally under electrostatic attraction, can be uniquely designed and fabricated to operate ata specific turn-on (actuation) voltage. Moreover, these relays on the same wafer can be interconnected as desired to perform a variety of logic operations. In this work, we present the novelfabrication methods and test results for both micro- and nano-scale relays. Although micro- and nano-scale devices involve lithographic processes of different scales, the resultant operation of the fabricated relays is tested in the same manner. As an initial viability test, micro- and nano-scaled cantilever modeling simulations with actuation voltages (Vpi) of 10 – 45V are compared against analytical models showing a 3 - 4 % difference between them. Furthermore, simulated testing to ascertain the stress response of cantilevers suggest a potential fatigue lifetime of > 10 billion cycles. Additionally, preliminary DC and AC ON/OFF switching characteristics of fabricated nano-scalerelays were found to have actuation voltages (Vpi) near ~43V.
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Emerging applications such as the Internet-of-Things and more-electric aircraft require electronics with integrated data storage that can operate in extreme temperatures with high energy efficiency. As transistor leakage current increases with temperature, nanoelectromechanical relays have emerged as a promising alternative. However, a reliable and scalable non-volatile relay that retains its state when powered off has not been demonstrated. Part of the challenge is electromechanical pull-in instability, causing the beam to snap in after traversing a section of the airgap. Here we demonstrate an electrostatically actuated nanoelectromechanical relay that eliminates electromechanical pull-in instability without restricting the dynamic range of motion. It has several advantages over conventional electrostatic relays, including low actuation voltages without extreme reduction in critical dimensions and near constant actuation airgap while the device moves, for improved electrostatic control. With this nanoelectromechanical relay we demonstrate the first high-temperature non-volatile relay operation, with over 40 non-volatile cycles at 200 ∘C.
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Direct contact, ohmic MEMS switches for RF applications have several advantages over other conventional switching devices. Advantages include lower insertion loss, higher isolation, and better switching figure-of-merit (cut-off frequency). The most important aspect of a direct-contact RF MEMS switch is the metal microcontact which can dictate the lifetime and reliability of the switch. Therefore, an understanding of contact reliability is essential for developing robust MEMS switches. This paper discusses and reviews the most important work done over the past couple of decades toward understanding ohmic micro-contacts. We initially discuss the contact mechanics and multi-physics models for studying Hertzian and multi-asperity contacts. We follow this with a discussion on models and experiments for studying adhesion. We then discuss experimental setups and the development of contact test stations by various groups for accelerated testing of microcontacts, as well as for analysis of contact reliability issues. Subsequently, we analyze a number of material transfer mechanisms in microcontacts under hot and cold switching conditions. We finally review the material properties that can help determine the selection of contact materials. A trade-off between contact resistance and high reliability is almost always necessary during selection of contact material; this paper discusses how the choice of materials can help address such trade-offs.
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In this study, a new analytical model is developed for an electrostatic Microelectromechanical System (MEMS) cantilever actuator to establish a relation between the displacement of its tip and the applied voltage. The proposed model defines the micro-cantilever as a rigid beam supported by a hinge at the fixed-end with a spring point force balancing the structure. The approach of the model is based on calculation of the electrostatic pressure centroid on the cantilever beam to localize the equivalent electrostatic point load. Principle outcome of the model is just one formula valid for all displacements ranging from the initial to the pull-in limit position. Our model also shows that the pull-in limit position of a cantilever is approximately 44% of the initial gap. This result agrees well with both simulation results and experimental measurements reported previously. The formula has been validated by comparing the results with former empirical studies. For displacements close to the pull-in limit, the percentage errors of the formula are within 1% when compared with real measurements carried out by previous studies. The formula also gives close results (less than 4%) when compared to simulation outcomes obtained by finite element analysis. In addition, the proposed formula measures up to numerical solutions obtained from several distributed models which demand recursive solutions in structural and electrostatic domains.
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In electrostatic switches, the inability to correlate hysteretic-switching (an electrical attribute) and adhesion force (a structural attribute) makes the predictive design difficult. The van-der-Waals interactions (FvdW) to adhesion may even be large enough to cause the release voltage ( VREL ) to shift past V = 0, afterward, the device never spring-back when the gate voltage is removed. The main part of this paper is devoted to addressing this issue in all-metal relay configuration. We present a physical model for shifting of VREL in its switching curve. A rule-based analytical model for VREL (precisely correlating FvdW ) is first derived and found to be well fitted with the experimental data. The fabricated all-metal dielectric-less relay design mitigates the nonidealities (e.g. no work-function difference and no dielectric-charging) in FvdW calculation which is a major improvement over the past approach. Our modeling outcomes improve the understanding of how surface effects (mainly vdW force) influence the releasing sequence in M/NEMS devices that often employ contact-based switching. Temperature influence on switching characteristics is also investigated. The results demonstrate that lateral-dimensions and the temperature drive pull-out (PO) operation more dominantly than pull-in (PI).
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Hot switching and hydrocarbon-induced contact activation limit the lifetimes and exacerbate the surface erosion/damage in switches. However, the relative effects of voltage and contamination have not been studied. We report on these effects in Pt-coated microswitches. Long lifetime, as determined from electrical contact resistance (ECR) data versus switch cycle count, was observed under cold switching conditions. Cycling under hot switching conditions was performed at different contact voltage levels VcV_{c} in: 1) a clean, hydrocarbon-free environment and 2) the presence of 40 ppm benzene (C 6 H 6 ) in N 2 gas. In the clean environment, carbon-induced contact activation did not occur, but the switches exhibited an ECR increase in as little as 100 times less than under cold switching conditions. The degree of erosion increased with VcV_{c} in both environments. In the contaminated environment, substantial amount of tribopolymer (TP) was generated and contact activation increased as VcV_{c} increased. For the conditions tested, this work shows that minimizing environmental contamination is the strongest factor in minimizing contact erosion in microswitches, while lowering VcV_{c} also plays an important role.
Book
This reference describes the role of various intermolecular and interparticle forces in determining the properties of simple systems such as gases, liquids and solids, with a special focus on more complex colloidal, polymeric and biological systems. The book provides a thorough foundation in theories and concepts of intermolecular forces, allowing researchers and students to recognize which forces are important in any particular system, as well as how to control these forces. This third edition is expanded into three sections and contains five new chapters over the previous edition.
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Contact resistance and its evolution are important parameters that determine the useful lifetime of MEMS switches. This work investigates the stiction force and evolution of contact resistance for five different metals (iridium, tungsten, nickel, ruthenium, and platinum). A Pt AFM probe was used as the counter electrode and the contact resistance over 100,000 cycles in nitrogen were recorded. Although this is small number of cycles compared to the desired 1 quadrillion cycles, it reveals a great deal about the contact quality provided that very small changes in the contact resistance are monitored and analyzed. Tungsten showed the largest increase in the contact resistance of 4% that was attributed to its surface anodic oxidation as imaged with AFM. We also used an infrared camera to monitor the contact temperature and noted a small flash of light when the probe touched the surface. Heating and the nano-plasma deposits carbonous materials on the metal contact area increasing contact resistance.