Here we report a facile sulfation of TiO2 semiconductor photocatalyst by simply grinding and calcination method using elemental sulfur from desulfurisation of petroleum. The successful sulfation of the prepared visible light active was proved by FT‐IR and XPS measurements, as well. The photocatalytic tests revealed that the S‐TiO2‐2 is the most efficient member of the samples, which has greater photocatalytic activity than TiO2 in the photodegradation of formic acid, under both UV and by visible light activation. Moreover, the improved electrokinetic and water dispersibility behaviours of the sulfur modified photocatalyst allowed the preparation of polyacrylate based photoreactive thin film with increased photocatalytic and strong antimicrobial properties and improved mechanical behavior.