Article

Effect of nitrogen incorporation and ultraviolet irradiation on interactions of perfluoropolyether with carbon surfaces using quantum chemical study

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  • University of Barishal
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Abstract

Reducing the head-media spacing is of crucial importance in enabling future high-density magnetic recording. In this work,we have studied the effect of nitrogen incorporation and ultraviolet (UV) irradiation on the interaction between the perfluoropolyether (PFPE) to the carbon surface using quantum chemical method. This paper explores that the UV bonding of PFPE Z-tetraol molecule significantly changes their structural and electronic properties. The results showed that the UV irradiation significantly strengthens bonding of PFPE on carbon surfaces. It is also found that nitrogen incorporation changes the structural and chemical properties of carbon surface and enhanced the bonding between PFPE and carbon surface.

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Article
Two-dimensional graphene exhibits many fascinating properties such as ballistic electronic conduction and quantum Hall effect at room temperature.1-4 Graphene doped electrochemically or through charge-transfer with electron-donor and -acceptor molecules,5-7 shows marked changes in electronic structure, with characteristic signatures in the Raman spectra.5-10 Substitutional doping, universally used in tuning properties of semiconductors, could be a powerful tool to control the electronic properties of graphene. Here, we present the structure and properties of boron and nitrogen doped graphenes, obtained by more than one method involving arc discharge in appropriate gaseous atmosphere, by using modified graphite electrode or by the transformation of nano-diamond. Using a combination of experiment and firstprinciples theory, we demonstrate systematic changes in the carrier-concentration and electronic structure of graphenes with B/N-doping, accompanied by stiffening of the Gband and intensification of the defect related D-band in the Raman spectra. Such n/p - type graphenes obtained without external fields or chemical agents should find device applications.
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