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Oxidation dynamics and optical properties of oxygen-containing yttrium hydride thin films

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Abstract

The synthesis of the photochromic YHO films is based on the oxidation of deposited yttrium hydride in ambient conditions. The actual state of the films during the deposition process, which is influenced by the deposition pressure and the oxidation caused by the residual gases, is not completely known. We report on the YHxOy thin films deposited by reactive pulsed-DC magnetron sputtering. Since the visible light transmittance is closely related to the phase and chemical composition of the films, in situ transmittance measurements during and after deposition are performed to investigate the oxidation in more detail. Spectroscopic ellipsometry is used to determine the optical constants of YHxOy throughout the film thickness. In order to obtain metallic YH2-x films with a low oxygen content, a low sputtering pressure (<1 Pa) is required, otherwise the films are already partially transparent during the deposition. The oxidation is faster when higher deposition pressures are used. This is due to the more porous growth of the microstructure at higher pressures that is observed at the surface and cross-section images of the films. The films exhibit a refractive index gradient perpendicular to the substrate surface, which is related to the porosity and variation of the chemical composition.

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Two cylindrically symmetric and complementary sputtering geometries, the post and hollow cathodes, were used to deposit thick (∼25-μ) coatings of various metals (Mo, Cr, Ti, Fe, Cu, and Al-alloy) onto glass and metallic substrates at deposition rates of 1000–2000 Å/min under various conditions of substrate temperature, argon pressure, and plasma bombardment. Coating surface topographies and fracture cross sections were examined by scanning electron microscopy. Polished cross sections were examined metallographically. Crystallographic orientations were determined by x-ray diffraction. Microstructures were generally consistent with the three-zone model proposed by Movchan and Demchishin [Fiz. Metal. Metalloved. 28, 653 (1969)]. Three differences were noted: (1) at low argon pressures a broad zone 1–zone 2 transition zone consisting of densely packed fibrous grains was identified; (2) zone 2 columnar grains tended to be faceted at elevated temperatures, although facets were often replaced by smooth flat surfaces at higher temperatures; (3) zone 3 equiaxed grains were generally not observed at the deposition conditions investigated. Hollow cathode deposition accentuated those features of coating growth that relate to intergrain shading.
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A new method has been developed to synthesize compact yttriumtrihydride by making use of a thin film technique. For electrical measurements yttrium films of typically 500 nm thickness are covered under UHV conditions by a 5 nm thick palladium overlayer which consists of electrically disconnected islands. Loading of these films with hydrogen up to the trihydride phase can then be done ex-situ in a reasonably short time (around 20–40h) by applying gas pressures of about 60 × 105 Pa. For a thicker Pd layer (above 20 nm) this time can be considerably shorter (t ∼ 125 s). The film morphology stays intact during the loading process although the film thickness increases by approximately 11% and the crystal structure changes from h.c.p. to f.c.c. and back to h.c.p. These samples are, therefore, very well suited for an investigation of the remarkable electrical and optical properties of trihydrides, as recently reported by Huiberts et al. (Nature, 380, 1996, 231). In this article we give evidence for the island structure of the palladium overlayer and make a comparison of a number of physical properties of yttrium and its related hydrides as thin films with literature values for the same material in bulk form. These properties include lattice parameters for the different hydride phases, electrical resistivity for yttrium and its dihydride and Hall coefficient for yttrium. The characteristics of the yttriumhydride thin films are very similar to those of bulk material. Furthermore, we performed concentration measurements and resistivity measurements during hydrogen loading. It is shown that the resistivity rises three orders of magnitude when yttrium is loaded up to the trihydride phase at 60 × 105 Pa.
  • B C Marstein
  • S Z Hauback
  • Karazhanov
Marstein, B.C. Hauback, S.Z. Karazhanov, A new thin film photochromic material: Oxygencontaining yttrium hydride, Solar energy materials and solar cells 95(12) (2011) 3596-3599.