Article

Picometre control for sub-70 nm geometries

Article

Picometre control for sub-70 nm geometries

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Abstract

The picometer control for sub 70 nm geometries was discussed. Narrowing the width of the spectral line used for lithography is the key for enabling the design of high numerical aperture (NA) lenses. The detrimental effects of chromatic dependency of optical aberrations, particularly upon focus were minimized because these effects produce loss of contrast and log slope of the image.

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