Cylindrical magnetron sputtering cathodes wrap a single, continuous target around substrates and coat from all directions simultaneously. The coating rate is high and uniform within the cathode volume, and 3D objects can be coated rapidly without rotation. The targets, which are simple cylinders erode very uniformly. Utilizations between 50 and 75% are typical, depending on the diameter-to-length
... [Show full abstract] ratio. Much of the material that does not arrive on the coated part goes back onto the target to be used again, reducing waste and minimizing the need for system cleaning. Use of cylindrical magnetron sputtering for rapid-cycle decorative and functional coatings is presented, pointing out the factors influencing system size and performance.