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Electronic structure of Ti 1− x Fe x O 2−δ thin films with oxygen vacancies probed by soft X-ray spectroscopy

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Abstract

The physical properties and electronic structure of c-axis-oriented Ti1−xFexO2−δ thin films have been studied by soft X-ray spectroscopy. The c-axis lattice constant increases with increasing Fe concentration. Fe ions have mixed valence states of Fe2+ and Fe3+ with a high-spin configuration. The intensity of the unoccupied Ti 3d state decreases and that of the occupied Ti 3d state increases owing to oxygen vacancies with Fe substitution. The electronic structure in the band gap region consists of Fe 3d and Ti 3d states, which correspond to the remnant of the lower Hubbard hand. The density of states (DOS) at the Fermi level, which is closely related to electrical conductivity, is composed of the Ti 3d state. The electrical conductivity of heavily doped Ti1−xFexO2−δ thin films decreases owing to the electron correlation of Ti 3d electrons.

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... TiO 2 thin film with Anatase structure can control from an insulator phase to semiconductor or metal phase by lightly carrier doping. [1][2][3][4][5][6][7][8][9][10] The carrier doping is made by substitution of different ion on the Ti site and O site or removing the O constituent accompanied with oxygen vacancy formation. Typical materials are Nb-doped TiO 2 (Ti 1−x Nb x O 2 ), 1,2) Ta-doped TiO 2 (Ti 1−x Ta x O 2 ), 3) and TiO 2−δ with oxygen vacancies. ...
... Typical materials are Nb-doped TiO 2 (Ti 1−x Nb x O 2 ), 1,2) Ta-doped TiO 2 (Ti 1−x Ta x O 2 ), 3) and TiO 2−δ with oxygen vacancies. 10) Furthermore, Fe-doped TiO 2 (Ti 1−x Fe x O 2 ), 6,7) and Co-doped TiO 2 (Ti 1−x Co x O 2 ) 4,5) are also known as diluted magnetic semiconductors. These conducting thin films are expected to be a transparent electrode of flat panel display and spintronics device. ...
... Therefore, the electrical and structural properties of carrier-doped TiO 2 thin film have been extensively studied in the research area of applied physics. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16] Since the atomic switching device using Ag 2 S thin film has been realized by Terabe et al., 17) similar studies have been reported in WO 3−x , 18) Ta 2 O 5 , 19,20) and TiO 2−δ , [11][12][13][14][15] which have the electron-ion mixed conduction. Such a phenomena can apply the non-volatile memory device such as resistance random access memory based on Redox reaction. ...
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