ArticlePDF Available

Abstract

Surface coatings of the Cr–B system have been obtained by magnetron sputtering in the DC and high power impulse (HIPIMS) regimes. It is established that the passage from the DC regime to HIPIMS leads to suppression of the columnar grain growth and a twofold increase in the resistance of coatings to plastic deformation, while the plasticity index and hardness of coatings increase by 29 and 18%, respectively.
ISSN 10637850, Technical Physics Letters, 2014, Vol. 40, No. 7, pp. 614–617. © Pleiades Publishing, Ltd., 2014.
Original Russian Text © Ph.V. KiryukhantsevKorneev, D. Horwat, J.F. Pierson, E.A. Levashov, 2014, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2014, Vol. 40, No. 14,
pp. 63–70.
614
The method of magnetron sputtering (MS) in
highfrequency (HF) or direct current (DC) regimes
is widely used in practice for depositing thinfilm
coatings with a broad range of compositions in a num
ber of applications. In recent years, a modification of
this technique called highpower impulse magnetron
sputtering (HIPIMS) has been extensively developed
[1–4]. A specific feature of HIPIMS is the supply of
very high power in short pulses on magnetron, which
prevents the target material from overheating and
melting. Magnetron sputtering at powers within
10 kW–10 MW (corresponding to a specific power
density of 0.1–5 kW/cm
2
versus 1–50 W/cm
2
in the
conventional DC regime) ensures a significant
increase in the plasma density: from ~10
10
ion/cm
3
for DCMS to 10
13
–10
14
ion/cm
3
for HIPIMS [1, 5].
In this case, sputtered atoms are intensely ionized
during passage through the plasma and the flux to
the substrate consists predominantly of ions, rather
than atoms as in the case of conventional DCMS.
An increase in the ion/atom ratio in the flux, which
is inherent in HIPIMS, leads to a significant
improvement of the adhesion strength of deposited
coatings due to the formation of pseudodiffusion lay
ers and ion implantation effects at the stage of prelim
inary etching of the substrate [2]. The mechanical
properties and wear resistance of coatings are also
improved due to increased density of their structure [3,
4, 6]. At present, the use of HIPIMS is restricted to the
deposition of coating based on pure metals and com
pounds of the MeO
x
and MeN types (Me = Ti, Cr, Al,
Zr, V, etc.) [1–7]. To the best of our knowledge, no
data have been reported to date on the HIPIMS depo
sition of transition metal borides. As a rule, HIPIMS
regimes are employed with targets of pure metals or
alloys [2–7].
The present work is devoted to a comparative study
of the structure and properties of Cr–B coatings
deposited by DCMS and HIPIMS using a composite
boride target.
A boride target was prepared by the method of self
propagating hightemperature synthesis (SHS) [8].
According to the Xray diffraction (XRD) data, the
phase composition of the target corresponded to
61.5% CrB
2
+ 21.0% CrB + 17.5% Cr
3
B
4
. The disk
cathode had a diameter of 50 mm and a thickness of
5 mm. The coatings were deposited in a vacuum setup
comprising a 40 L vacuum chamber with three magne
trons and Adixen Alcatel pumping stage based on Pas
cal 2021 SD forevacuum pump and Act 600TH turbo
molecule pump. The distance from target to substrate
was 70 mm. The magnetic induction at the center of
the target surface was 61 mT. The target was sputtered
in argon and the area of a sputtered zone was about
onethird of the target area. The gas supply was con
trolled by a Flow View VI.17 program. Coatings in the
DCMS regime were deposited using a Pinnacle+
(Advanced Energy, United States) source at a power of
350 W and a gas pressure of 1 Pa. The HIPIMS regime
was realized using an SPIK 2000A source (Melec,
Germany) at voltage amplitude of up to 600 V, pulse
duration of 3 ms, and duty cycle of 13.33%, respec
tively. The working gas pressures were 1 and 1.7 Pa,
which allowed the peak currents of 7.5 and 20 A,
respectively, to be reached.
The waveforms of process parameters were
recorded using a Tektronix TDS 2024B oscilloscope.
Figure 1 shows the typical current waveforms mea
sured in the HIPIMS regime, which reveals two
Comparative Analysis of Cr–B Coatings Deposited
by Magnetron Sputtering in DC and HIPIMS Modes
Ph. V. KiryukhantsevKorneev*, D. Horwat, J. F. Pierson, and E. A. Levashov
National University of Science and Technology, Moscow, 119049 Russia
Institut Jean Lamour, Université de Lorraine, UMR 7198CNRS, Nancy F54000, France
*email: kiruhancevkorneev@yandex.ru
Received December 27, 2013
Abstract
—Surface coatings of the Cr–B system have been obtained by magnetron sputtering in the DC and
highpower impulse (HIPIMS) regimes. It is established that the passage from the DC regime to HIPIMS
leads to suppression of the columnar grain growth and a twofold increase in the resistance of coatings to plas
tic deformation, while the plasticity index and hardness of coatings increase by 29 and 18%, respectively.
DOI:
10.1134/S1063785014070219
TECHNICAL PHYSICS LETTERS Vol. 40 No. 7 2014
COMPARATIVE ANALYSIS OF Cr–B COATINGS 615
extrema. The first (within 0–150
μ
s) is related to rar
efaction on the passage from argon plasma to that
based on the target components [7], while the second
(within 250–350
μ
s) is related to reflection of the ion
flux from chamber walls back to the target, as was
demonstrated in [9]. The substrates had the form of
disks made of cemented carbide VK6M with a diame
ter of 30 mm and a thickness of 5 mm. Prior to coat
ing, the substrates were ground and ultrasonically
treated in isopropyl alcohol. Using Thermax indicator
strips, it was established that the substrate temperature
in DCMS and HIPIMS experiments did not exceed
100
°
C. The elemental concentration–depth profiles
were obtained using the method of glowdischarge
optical emission spectroscopy (GDOES) using a Pro
filer 2 instrument (Horiba JobinYvon, France). In
addition, the structure of coating was studied by scan
ning electron microscopy (SEM) on a Hitachi S4800
instrument operating at an accelerating voltage of 15
kV. The Xray diffraction (XRD) analysis was per
formed on Difray 401 NP (Scientific Instruments,
Russia) and Thermo Scientific diffractometers using
Cr
K
α
and Co
K
α
radiations. The values of hardness,
elastic modulus, and elastic recovery of coatings were
determined using a Nano Hardness Tester (CSM
Instruments) at an indenter load of 4 mN.
According to the data of GDOES, chromium and
boron were uniformly distributed in depth of coatings.
Averaged concentrations of these elements in the coat
ings and their thicknesses determined from elemental
depth profiles are presented in the table for both
DCMS and HIPIMS regimes. As can be seen from
these data, the B/Cr atomic ratio decreases from 1.78
to 1.44 with increasing specific power density. In
addition to the main elements, the coatings also con
tained small amounts of oxygen (1–1.5 at %) and
carbon (0.2–0.6 at %), which is related to penetration
of these elements from the working gas and SHS target
material. The coating thickness in the DCMS regime
was 3.8
μ
m, while that in the HIPIMS (1 Pa) regime
was much smaller (0.4
μ
m) and only reached about 3.3
μ
m at a gas pressure increased to 1.7 Pa. The coating
growth rate estimated from data on their thicknesses
was 14, 1.5, and 12 nm/min for the DCMS, HIPIMS
(1 Pa), and HIPIMS (1.7 Pa) regimes, respectively.
The XRD patterns of DCMS coatings (Fig. 2a) dis
played intense WC peaks from the substrate and a peak
at 2
θ
= 54.4
°
, which corresponds to the (101) reflec
tion from a hexagonal CrB
2
phase (JCPDS card 89
3533). The calculated values of the interplanar dis
tance and average crystallite size were 0.19592 and
9 nm, respectively. In the case of HIPIMS coatings,
the reflections from WC were supplemented by
strongly broadened lines at 2
θ
= 51.7
°
and 53.7
°
(Fig. 2b). The first of these peaks is probably related to
the formation of phases of the Cr
2
B, CrB, and Cr
3
B
4
types (JCPDS cards 894876, 893587, and 760188),
while the second peak is due to the presence of CrB
2
phase. Thus, the XRD data agree well with the results
of chemical analyses, according to which the passage
from DCMS to HIPIMS regime leads to an increase
in the Cr/B ratio. This effect can be explained by the
preferential sputtering of boron from deposited coat
ings under the action of ion bombardment. In the case
of HIPIMS coatings, the intensification of ion bom
bardment leads to a decrease in the CrB
2
phase crys
tallite size (6.5 nm) as compared to that in DCMS
coatings. SEM examination of the crosssection frac
ture of samples showed that Cr–B coatings obtained
in the DCMS regime possess a wellpronounced
columnar structure (Figs. 3a and 3b) with an average
20
15
10
5
0
5
100 0 100 200 300 400 500
Time,
μ
s
Discharge current, A
1 Pa
1.7 Pa
Fig. 1.
Waveforms of current in the HIPIMS regimes at
a gas pressure of 1 and 1.7 Pa.
Deposition parameters and characteristics of coatings
Sputtering regime Specific
power,
kW/cm
2
h
,
μ
mComposition, at %
H
, GPa
E
, GPa
H
/
EH
3
/
E
2
,
GPa
W
, %
Cr B
DCMS 1 Pa 0.047 3.8 36 64 28 330 0.085 0.202 51
HIPIMS 1 Pa 0.6* 0.4 39 61 21 260 0.081 0.137 47
HIPIMS 1.7 Pa 1.6* 3.3 41 59 33 300 0.110 0.399 58
* Per pulse.
616
TECHNICAL PHYSICS LETTERS Vol. 40 No. 7 2014
KIRYUKHANTSEVKORNEEV et al.
diameter of columnar grains about 70 nm, which
implies that each of these crystallites consists of
smaller ones with dimensions below 10 nm. HIPIMS
coatings possessed a structure of higher density and
contained no columnar elements (Fig. 3c). It should
be also noted that a columnar structure is unfavorable
from the standpoint of mechanical properties, wear
resistance, and corrosion resistance of coatings.
The results of measurements of the hardness (
H
),
elastic modulus (
E
), elastic recovery (
W
), index of
plasticity (
H
/
E
), and resistance to plastic deformation
(
H
3
/
E
2
) are presented in the table. In DCMS coatings,
the hardness, elastic modulus, and elastic recovery
reached values of
H
= 28 GPa,
E
= 330 GPa, and
W
=
51%, respectively. After the sputtering at 1 Pa in the
HIPIMS regime, the
H
and
E
values decreased by 20–
25%, which was probably related to a small thickness
of these coatings and the influence of a hardalloy sub
strate with
H
~ 20 GPa. The HIPIMS coatings depos
ited at 1.7 Pa had
H
= 33 GPa,
E
= 300 GPa, and
W
=
58%. Note that the passage to HIPIMS not only
increases the hardness of coatings, but also improves
their elasticplastic characteristics, including the
index of plasticity (
H
/
E
= 0.110) and resistance to
plastic deformation (
H
3
/
E
2
= 0.399), which also
directly influence the wear resistance and local defor
mation of the material [10]. The observed change in
the properties of coatings on the passage to HIPIMS
8300
8800
9300
9800
10300
10800
11300
11800
Intensity, a. u.
40 42 44 46 48 50 52 54 56 58 60
2
θ
, deg
6000
6500
40 42 44 46 48 50 52 54 56 58 60
2
θ
, deg
7000
7500
8000
8500
9000
(a)
(b)
Fig. 2.
XRD patterns of coatings obtained in the (a)
DCMS and (b) HIPIMS (1.7 Pa) regimes.
3
µ
m3
µ
m
(b)
(a) (c)
200 nm
Fig. 3.
SEM images of the crosssectio n fracture of C r–B coatings d eposited in th e (a, b) DCMS and (c) H IPIMS (1.7 Pa) regimes .
TECHNICAL PHYSICS LETTERS Vol. 40 No. 7 2014
COMPARATIVE ANALYSIS OF Cr–B COATINGS 617
may be related to an increase both in the density of
coatings and in the level of internal stresses. In order to
elucidate the main factor, the characteristics of coat
ings obtained in the DCMS and HIPIMS (1.7 Pa)
regimes were repeatedly measured after keeping the
samples for 6 months under normal conditions, during
which the internal stresses must be partly or com
pletely relaxed. The coatings of both types exhibited
close values of
H
= 24–25 GPa, while the values of
W
and
E
remained unchanged. Therefore, this experi
ment showed that the main contribution to increasing
H
is related to the increased level of internal stresses
achieved due the intensification of ion bombardment
in the HIPIMS regime.
Acknowledgments.
The authors are grateful to
N.V. Shvyndina and A. Kozlov for their help in struc
tural investigations. The authors gratefully acknowl
edge the financial support of the Ministry of Educa
tion and Science of the Russian Federation in the
framework of Increase Competitiveness Program of
NUST “MISiS” (no. K22014012).
REFERENCES
1. U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehi
asarian, and J. T. Gudmundsson, Thin Solid Films
513
,
1 (2006).
2. M. Lattemann, A. P. Ehiasarian, J. Bohlmark, P. A. O. Pers
son, and U. Helmersson, Surf. Coat. Technol.
200
,
6495 (2006).
3. E. Lewin, D. Loch, A. Montagne, A. P. Ehiasarian, and
J. Patscheider, Surf. Coat. Technol.
232
, 680 (2013).
4. A. P. Ehiasarian, P. Eh. Hovsepian, L. Hultman, and
U. Helmersson, Thin Solid Films
457
, 270 (2004).
5. A. V. Kozyrev, N. S. Sochugov, K. V. Oskomov, A. N. Za
kharov, and A. N. Odivanova, Plasma Phys. Rep.
37
,
621 (2011).
6. V. Sittinger, O. Lenck, M. Vergöhl, B. Szyszka, and
G. Brauer, Thin Solid Films
548
, 18 (2013).
7. D. Horwat and A. Anders, J. Appl. Phys.
108
, 123306
(2010).
8. V. V. Kurbatkina, E. A. Levashov, E. I. Patsera, N. A. Ko
chetov, and A. S. Rogachev, Int. J. SHS
17
, 189 (2008).
9. J. Alami, J. T. Gudmundsson, J. Bohlmark, J. Birch,
and U. Helmersson, Plasma Sources Sci. Technol.
14
,
525 (2005).
10. D. V. Shtansky, S. A. Kulinich, E. A. Levashov, A. N. She
veiko, F. V. Kiriuhancev, and J. J. Moore, Thin Solid
Films
420–421
, 330 (2002).
Translated by P. Pozdeev
... Two major categories of multifunctional coatings show strong potential in achieving control over severe BUE formation during machining. The first is the boride family of coatings, which possess high hardness and chemical stability of the transition metal borides [33,[56][57][58][59][60][61][62]. During cutting they also exhibit self-lubricating/protective properties [28]. ...
... However, a wide variety of transition metal-based boride coatings has recently appeared on the market [33,56]. In addition to the beneficial micro-mechanical properties [58][59][60][61][62] the major advantage of these coatings is their strong potential to deliver multi-functional performance due to the formation of various tribo-films under operation. This provides extra opportunities to control BUE formation in a several ways, such as the improvement of thermal barrier and lubricating properties of the coated tools. ...
Article
Full-text available
The relationship between the wear process and the adaptive response of the coated cutting tool to external stimuli is demonstrated in this review paper. The goal of the featured case studies is to achieve control over the behavior of the tool/workpiece tribo-system, using an example of severe tribological conditions present under machining with intensive built-up edge (BUE) formation. The built-ups developed during the machining process are dynamic structures with a dual role. On one hand they exhibit protective functions but, on the other hand, the process of built-up edge formation is similar to an avalanche. Periodical growth and breakage of BUE eventually leads to tooltip failure and catastrophe of the entire tribo-system. The process of BUE formation is governed by the stick–slip phenomenon occurring at the chip/tool interface which is associated with the self-organized critical process (SOC). This process could be potentially brought under control through the engineered adaptive response of the tribo-system, with the goal of reducing the scale and frequency of the occurring avalanches (built-ups). A number of multiscale frictional processes could be used to achieve this task. Such processes are associated with the strongly non-equilibrium process of self-organization during friction (nano-scale tribo-films formation) as well as physical–chemical and mechanical processes that develop on a microscopic scale inside the coating layer and the carbide substrate. Various strategies for achieving control over wear behavior are presented in this paper using specific machining case studies of several hard-to-cut materials such as stainless steels, titanium alloy (TiAl6V4), compacted graphitic iron (CGI), each of which typically undergoes strong built-up edge formation. Various categories of hard coatings deposited by different physical vapor deposition (PVD) and chemical vapor deposition (CVD) methods are applied on cutting tools and the results of their tribological and wear performance studies are presented. Future research trends are outlined as well.
... A promising method for producing coatings from ceramic materials is magnetron sputtering, which provides ease of control of the structural-phase state, high quality and low roughness of coatings, no restrictions on the choice of substrate material, preservation of the geometry of the product, and relatively high deposition rates [8,23,24]. High-power impulse magnetron sputtering (HIPIMS) provides additional possibilities for improving the characteristics of coatings [25,26]. HIPIMS, due to its higher power, yields a significant increase in plasma density from ~10 10 ion/cm 3 for direct current magnetron sputtering (DCMS) up to 10 13 -10 14 ion/cm 3 for HIPIMS [27]. ...
... Among the advantages of this method are easy control of the composition, structure, and properties of the coatings; low concentration of defects; low roughness; high purity; no restrictions on the choice of substrate material; preservation of the product's geometry; and relatively high deposition rates. The use of high-power impulse mode magnetron sputtering (HIPIMS) provides additional opportunities for improving the characteristics of coatings [20][21][22][23]. The HIPIMS method, due to its higher power, provides a significant increase in plasma density from~10 10 ion/cm 3 for DCMS to 10 13 -10 14 ion/cm 3 for HIPIMS [24]. ...
Article
Full-text available
In this study, Mo-(Y,Zr)-Si-B coatings were obtained by direct current magnetron sputtering (DCMS) and high-power impulse magnetron sputtering (HIPIMS) using mosaic targets. The results showed that the addition of Y and Zr into the composition of Mo-Si-B coatings led to the suppression of columnar grain growth, a decrease in the crystallite size of h-MoSi2 phase from ~50 to ~5 nm, and an increase in the amorphous to crystalline phases ratio Doping of the Mo-Si-B coating with Y and Zr promoted an increase in oxidation resistance at a temperature of 1000 °C. The introduction of yttrium into the composition of Mo-Si-B contributed to an increase in their crack resistance when heated to 1300 °C. High oxidation resistance of the coatings was provided by a defect-free SiO2 + MoO3 + Y2O3 surface layer. The transition from the DCMS mode to HIPIMS decreased the texture of the Mo-Si-B coatings. The use of an HIPIMS mode led to a decrease in the oxidation rate of Mo-(Y)-Si-B coatings at T = 1000 °C by 1.6–4.5 times compared to DCMS. In the case of Mo-Y-Si-B coatings, the use of HIPIMS led to a decrease of more than 50% in the thickness of the oxide layer at a temperature of 1300 °C.
... As an exception, we can highlight the article [15] related to ZrB2 coating. Present work is devoted to the application of HIPIMS technology for sputtering of ceramic cathodes for deposition of 3 types of samples: hard CrB 2 coatings [16], wear-and corrosion-resistant TiAlNiC coatings [17], and oxidation-resistant coatings based on MoSiB [18], as well as their comparison with base coatings obtained in DC mode. ...
Conference Paper
Full-text available
The effects of using of the HIPIMS technology for deposition of coatings for various purposes, including CrB, TiAlNiC, and MoHfSiB, are studied. Ceramic targets obtained by self-propagating high-temperature synthesis were used for sputtering. It is shown that the transition from DC to HIPIMS modes increases the structure density, hardness, elastic-plastic properties, wear and corrosion resistance, cracking resistance during thermocycles, and oxidation resistance of the coatings. The adhesive strength can be significantly increased if preliminary ion cleaning of substrates is used.
... Magnetron sputtering method offers numerous advantages, including easy control of composition, structure, and properties of coatings, low defects concentration in the coating, low surface roughness and contamination by admixtures, the absence of the restrictions regarding the material of the substrate, good retention of substrate geometry, high deposition rates. Application of pulsed (PMS) and high-power impulse (HIPIMS) magnetron sputtering modes opens additional possibilities for the ceramic coatings deposition [24][25][26][27][28][29][30] by increasing their mechanical and tribological properties. ...
Article
The hard wear-resistant nanocomposite Ti-Al-Ni-C-N coatings were deposited by direct current magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HIPIMS) in the Ar, Ar+15%N2, and Ar+25%N2 atmospheres. The structure of coatings was analyzed using the X-ray diffraction analysis, glow discharge optical emission spectroscopy, and scanning electron microscopy. Mechanical and tribological properties were measured using the nanoindentation and scratch testing as well as by tribological testing using the “pin-on-disc” scheme. Electrochemical corrosion resistance and oxidation resistance of coatings were investigated. The results suggest that the coatings are based on the FCC phases TiCN and Ni3Al with crystallites size ~3 and ~15 nm, correspondingly. DCMS coatings with optimal composition were characterized by hardness 34 GPa, stable friction coefficient <0.26 and wear rate < 5×10-6 mm3N-1m-1. Application of HIPIMS mode allowed the increase of adhesion strength, tribological properties and corrosion resistance of coatings.
... Hard wear resistant coatings for various applications can successfully be deposited by magnetron sputtering of composite targets fabricated using self-propagating high-temperature synthesis (SHS) [1]. Previously, magnetron sputtering have been used for sputtering of the SHS targets in the DC mode [2][3][4][5], in the pulsed DC [6][7][8], RF [9], and HIPIMS [10] modes. There are limited data [11] on preparing coatings by cathodic arc evaporation of SHS targets, although this method has several undoubted advantages. ...
Article
Full-text available
Ti–Cr–B–N coatings were successfully deposited using reactive pulsed cathodic arc evaporation (CAE) of ceramic TiCrB target. The influence of the substrate negative bias voltage on the coating impact wear resistance and mechanical properties has been studied. Structural investigations have been carried out using X-ray diffraction analysis, transmission and scanning electron microscopy, glow-discharge optical-emission spectroscopy, and optical profilometry. The coating properties have been estimated by impact tests, scratch-test, and nanoindentation. The obtained results show that the coatings consist of Ti(Cr)N fcc phase with crystallites 1–2 nm in size and amorphous BNx tissure. The coatings obtained at Ubias=-250 V demonstrated highest hardness of 24 GPa, whereas samples deposited at Ubias=-500V exhibited minimal wear rate (worn area of 12 μm2) in impact conditions. Coatings obtained by Pulsed CAE with intensive ion-bombardment possess high adhesion strength higher than 120 N.
Article
Покрытия Mo–(Y, Zr)–Si–B были получены методами магнетронного напыления постоянного тока (DCMS, direct current magnetron sputtering) и высокомощного импульсного магнетронного напыления (HIPIMS, high power impulse magnetron sputtering) с использованием композиционных мишеней MoSi 2 + 10% MoB и (MoSi 2 + 10% MoB) + 20% ZrB 2 , с расположенными в их зоне эрозии сегментами Y суммарной площадью 5 и 10 см 2 . Структура и состав покрытий исследовались методами сканирующей и просвечивающей электронной микроскопии, оптической эмиссионной спектроскопии тлеющего разряда и рентгенофазового анализа. Были определены твердость, модуль упругости, упругое восстановление, адгезионная прочность, стойкость покрытий к ударным циклическим и абразивным воздействиям. Жаростойкость и термическая стабильность оценивалась при нагреве покрытий до максимальной температуры 1000°C в муфельной печи и в колонне просвечивающего электронного микроскопа, соответственно. Установлено, что основу покрытия Mo–Si–B составляет фаза h -MoSi 2 с текстурой в направлении [110] и размером кристаллитов 75 нм. Легирование покрытий Zr и Y, а также переход от DCMS к режиму HIPIMS, способствовали подавлению преимущественного роста кристаллитов, повышению их дисперсности и объемной доли аморфной фазы, что приводило к повышению трещиностойкости и адгезионной прочности покрытий. Применение метода HIPIMS при осаждении покрытий вызвало рост твердости и модуля упругости на 10%, стойкости к циклическим ударным воздейстивмя на 60%, абразивной стойкости на 20%, увеличению жаростойкости до 20%. Покрытия Mo–Y–Zr–Si–B оптимального состава обладали высокой термической стабильностью, – основная структурная составляющая, гексагональная фаза h -MoSi 2 , сохранялась в температурном диапазоне 20–1000°C, а также обеспечивали повышение жаростойкости Mo подложки более, чем в 9 раз при 1000°С.
Article
The Mo-Si-B, Mo-Zr-Si-B, and Mo-Hf-Si-B coatings were deposited by magnetron sputtering of the MoSi2-MoB, MoSi2-MoB-ZrB2 and MoSi2-MoB-HfB2 targets. The composition and structure of coatings were investigated by glow discharge optical emission spectroscopy, scanning electron microscopy, X-ray diffraction, transmission electron microscopy, X-ray photoelectron and Raman spectroscopy. Mechanical properties were measured by nanoindentation method. The short-time oxidation resistance of coatings was evaluated at temperatures of 1100, 1300, and 1500°C. The results showed that all coatings deposited onto alumina substrates were characterized by a dense columnar structure. Mo-Si-B coatings contained phases of hexagonal h-MoSi2 and amorphous a-MoB. With the addition of Zr and Hf, an increase in the lattice parameter and a decrease in the grain size of h-MoSi2 by 50 and 25%, respectively, were observed. The base Mo-Si-B coating had a high hardness of 30 GPa. The introduction of Zr and Hf led to a decrease in hardness by 24 and 20%, respectively. The Mo-Si-B coating was characterized by a minimal oxidation depth (<10 nm) at 1100°C and 1300°C, but a network of cracks that penetrated to the substrate was formed. Cracks on the surface of the Mo-Zr-Si-B and Mo-Hf-Si-B coatings were not observed; the formation of oxide layers, 0.3–2.0 μm thick, was revealed. The oxidation resistance of coatings at temperature of 1500°C increased in direction Mo-Si-B→Mo-Hf-Si-B→Mo-Zr-Si-B. The best results for the Mo-Zr-Si-B coating were associated with a smaller grain size, higher thermal stability, and the formation of a protective layer based on SiO2 with the inclusion of ZrO2 crystallites.
Article
Full-text available
The technology of pulsed cathode-arc evaporation (P-CAE) has been successfully applied for coating deposition in the Cr–B–C–N system. The coatings had a structure typical for arc coatings with a significant fraction of the condensed droplet phase, but the formation of an adverse columnar morphology has been eliminated. The coatings contained crystallites of the h-CrB2 and с-CrN phases along with a large amount of the amorphous phase, the composition of which varied depending on the type of the working environment. The coatings obtained in argon demonstrated the highest hardness of 12 GPa, while those obtained in the C2H4 medium were characterized by the highest elastic-plastic properties (elastic recovery 72%). The friction coefficient of coatings deposited in Ar, N2, and C2H4 media was 0.7, 0.4, and 0.3, respectively. The phase of diamond-like carbon in the latter case resulted in a decrease in the friction coefficient due to high fraction of sp2-bonded carbon serving as a dry lubricant. The coatings of the optimal composition were resistant to high temperature oxidation in the temperature range 600–1000°С. At high temperatures, the oxidation process was followed by intensive diffusion of boron atoms in depth of the substrate
Article
Full-text available
Gas compression and strong rarefaction have been observed for high power impulse magnetron sputtering (HIPIMS) discharges using a copper target in argon. Time-resolved ion saturation currents of 35 probes were simultaneously recorded for HIPIMS discharges operating far above the self-sputtering runaway threshold. The argon background pressure was a parameter for the evaluation of the spatial and temporal development of the plasma density distribution. The data can be interpreted by a massive onset of the sputtering flux (sputter wind) that causes a transient densification of the gas, followed by rarefaction and the replacement of gas plasma by the metal plasma of sustained self-sputtering. The plasma density pulse follows closely the power pulse at low pressure. At high pressure, the relatively remote probes recorded a density peak only after the discharge pulse, indicative for slow, diffusive ion transport.
Article
Full-text available
Gas compression and strong rarefaction have been observed for high power impulse magnetron sputtering (HIPIMS) discharges using a copper target in argon. Time-resolved ion saturation currents of 35 probes were simultaneously recorded for HIPIMS discharges operating far above the self-sputtering runaway threshold. The argon background pressure was a parameter for the evaluation of the spatial and temporal development of the plasma density distribution. The data can be interpreted by a massive onset of the sputtering flux (sputter wind) that causes a transient densification of the gas, followed by rarefaction and the replacement of gas plasma by the metal plasma of sustained self-sputtering. The plasma density pulse follows closely the power pulse at low pressure. At high pressure, the relatively remote probes recorded a density peak only after the discharge pulse, indicative for slow, diffusive ion transport.
Article
Full-text available
Results are presented for experimental studies of the plasma glow in a high-current pulsed magnetron discharge by using a high-speed optical frame camera. It is found that the discharge plasma is inhomogeneous in the azimuthal direction. The plasma bunches rotate with a linear velocity of ∼1 cm/μs in the direction of electron Hall drift, and their number is proportional to the discharge current. Plasma inhomogeneities in the form of plasma jets propagate in the form of plasma jets from the cathode region toward the anode. It is shown analytically that the formation of inhomogeneities is caused by the necessity to transfer high-density electron current across the magnetic field.
Article
The high degree of ionization of the sputtered material during the coating process is one of the main features of HIPIMS (high power impulse magnetron sputtering). The use of HIPIMS leads to better film quality for hard coatings based on metal nitrides and to more conformal coatings during via fillings with high aspect ratios used in microelectronics. HIPIMS metal oxides are used in many applications, including optical coatings for filters or transparent conducting oxides in photovoltaics, low emissivity coatings, heat mirrors or panel heaters, as well as touch panels and displays. Several coatings based on HIPIMS were developed to reveal the benefits of this technology for applications. An overview of applications in industry and research is presented.
Article
For Cr + B mixtures, we investigated the influence of mechanoactivation (MA) on the thermal effect of SHS reaction, burning velocity, and combustion temperature, and optimized MA conditions. Using the technique of forced SHS compaction, we manufactured the CrB2-based compacts up to 125 mm in diameter (residual porosity 3–5%) from green mixtures subjected to MA under optimized conditions.
Article
We report on electrostatic probe measurements of a high-power pulsed magnetron discharge. Space- and time-dependent characteristics of the plasma parameters are obtained as functions of the process parameters. By applying high-power pulses (peak power of ~0.5 MW), with a pulse-on time of ~100 µs and a repetition frequency of 20 ms, peak electron densities of the order of ~1019 m− 3, i.e. three orders of magnitude higher than for a conventional dc magnetron discharge, are achieved soon after the pulse is switched on. At high sputtering gas pressures (>5 mTorr), a second peak occurs in the electron density curve, hundreds of microseconds after the pulse is switched off. This second peak is mainly due to an ion acoustic wave in the plasma, reflecting off the chamber walls. This is concluded from the time delay between the two peaks in the electron and ion saturation currents, which is shown to be dependent on the chamber dimensions and the sputtering gas composition. Finally, the electron temperature is determined, initially very high but decreasing rapidly as the pulse is turned off. The reduction seen in the electron temperature, close to the etched area of the cathode, is due to cooling by the sputtered metal atoms.
Article
A comparative analysis of fracture for various films is presented. Films of Cr–B, Ti–Si–N, Ti–B–N and Ti–Cr–B–N were deposited by DC magnetron sputtering of composite targets. The indentation of the as-deposited films on (0 0 1) Si substrates was made using Vickers microhardness tester at a load of 10, 25 and 50 g. The scanning electron microscopy and atomic force microscopy studies were fulfilled to investigate the film behavior during localized deformation. Both homogeneous and localized inhomogeneous deformations of the fracture surface were observed and described. Isolated particles located within the area of deformation were frequently observed. The films were characterized in terms of their structure, hardness, elastic modulus, elastic recovery and surface topography. The H3/E2 ratio (i.e. resistance to plastic deformation) was proposed to be a ranking parameter for the prediction of shear banding under the localized deformation. The correlation between the surface roughness, surface relief inside indentations and columnar fracture morphology was outlined. It was suggested that column sliding is the dominant fracture mechanism resulting in the formation of breaking-away particles under unloading.
Article
Sliding, abrasive, and impact wear tests were performed on chromium nitride (CrN)-based coatings deposited on mirror-polished M2 high speed steel substrates by the novel high power impulse magnetron sputtering (HIPIMS) utilising high peak cathode powers densities of 3000 W cm−2. The coatings were compared to single layer CrN and multilayer superlattice CrN/NbN coatings deposited by the arc bond sputtering (ABS) technique designed to improve the coating substrate adhesion by a combined steered cathodic arc/unbalanced magnetron (UBM) sputtering process. The substrates were metal ion etched using non-reactive HIPIMS or steered cathodic arc at a substrate bias voltage of −1200 V. Subsequently a 2- to 3-μm thick CrN or CrN/NbN coating was deposited by reactive HIPIMS or UBM. No bias was used during the HIPIMS deposition, while the bias during UBM growth was in the range 75–100 V. The ion saturation current measured by a flat electrostatic probe reached values of 50 mA cm−2 peak for HIPIMS and 1 mA cm−2 continuous during UBM deposition. The microstructure of the HIPIMS coatings observed by transmission electron microscopy was fully dense in contrast to the voided columnar structure observed in conventional UBM sputtered CrN and CrN/NbN. The sliding wear coefficients of the HIPIMS CrN films of 2.3×10−16 m3 N−1 m−1 were lower by a factor of 4 and the roughness of the wear track was significantly reduced compared to the UBM-deposited CrN. The abrasive wear coefficient of the HIPIMS coating was 2.2×10−13 m3 N−1 m−1 representing an improvement by a factor of 3 over UBM deposited CrN and a wear resistance comparable to that of the superlattice CrN/NbN. The adhesion of the HIPIMS deposited CrN was comparable to state-of-the-art ABS technology.
Article
In order to improve the adhesion of hard coatings such as CrN, a surface pretreatment by the novel high power impulse magnetron sputtering (HIPIMS) technique followed by reactive unbalanced d.c. magnetron sputtering deposition was performed using a Cr target. The HIPIMS plasma comprising a high metal ion-to-neutral ratio consisting of single- and double-charged metal species identified by mass spectrometry increased the metal ion flux to the substrate. When applying a negative substrate bias Ub the adhesion was enhanced due to sputter cleaning of the surface and metal ion intermixing in the interface region. This intermixing, resulting in a gradual change of the composition, is considered to enhance the adhesion of the hard coatings on steel substrates. The pretreatment was carried out in an inert gas atmosphere at a pressure of pAr = 1 mTorr, the duration was varied between 25 and 75 min, whereas the negative substrate bias was varied between 400 V and 1200 V. The adhesion was found to depend on the substrate bias as well as on the target power and, for low substrate bias, on the duration of the pretreatment. For CrN the critical load of failure determined by scratch test could be increased in comparison to the values reported for specimens pretreated by conventional Ar etching. The influence of the target peak voltage, the substrate bias as well as pretreatment time on the constitution and morphology of the interface after the pretreatment is discussed applying analytical transmission electron microscopy.