Thin Films from Solvated Metal Atoms and Metal-Metal Bonded Compounds



Metals such as Pd, Pt, Cu, Ag, Ga, In, Ge, Sn, and Pb are evaporated under vacuum and the vapors (atoms) condensed at 77 K with excess organic solvents. In this way solvated metal atoms are produced.. Upon warmup to room temperature metal atom agglomeration occurs in certain solvents to yield stable colloidal particles in solution. In many cases these are the first examples of non-aqueous colloids of these metals, and they are very novel in that they are free of contaminating reducing agents, halide ions, etc., and they are living colloids--by removal of solvent metallic films can be grown on various substrates under very mile conditions. Characterizing these colloidal particles and the films therefrom is an important part of this project. A second area is the proposed synthesis of new metal-metal bonded compounds, eg. R2A1-A1R2, as possible new Chemical Vapor Deposition materials for thin film production. Unusual synthetic approaches, some involving metal vapors, are underway. Compounds containing Al, Ga, In, and level, is that two metal atoms could be deposited at a time on a hot substrate target, thereby generating films of novel structure/stoichiometry (when mixed metals are being codeposited).

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