Applications of radioactive ion beams produced at the ISOLDE facility for Mössbauer studies of probe atoms in solids are presented.
Examples are given for a site-selective incorporation on different substitutional sites in compound semiconductors by ion
implantation and thermal annealing of the radiation damage resulting from the implantation. The interactions of the probe
atoms with lattice defects created in the implantation process have been studied to elucidate likely causes for the site-selective
implantation mechanism. The technique has enabled to determine the electronic densities at electrically active substitutional
probe atoms, having shallow donor or acceptor states as well as states deeper in the band gap. The results are in good agreement
with theoretical results from local density calculations. Methodological aspects of the Mössbauer emission techniques employed
at ISOLDE are compared to alternative accelerator based techniques and the consequences of the application of different precursor
isotopes to the 57Fe Mössbauer isotope are treated in detail for 57Fe in silicon. Finally, results obtained for the magnetic hyperfine interactions of 5 sp impurities associated with vacancies
in ferromagnetic metals are discussed.