Xinyu Zhao

Xinyu Zhao
Auburn University | AU · Department of Electrical & Computer Engineering

About

5
Publications
345
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24
Citations
Introduction

Publications

Publications (5)
Article
Full-text available
Prior to carrying out the proximity effect correction by optimizing the spatial distribution of dose in electron beam lithography, one first needs to determine the minimum total dose required. A conventional method typically used to determine the minimum total dose is the trial-and-error approach, which can be unnecessarily costly and wasteful. In...
Article
As the minimum feature size continues to decrease, the line edge roughness (LER) has become a critical issue to be addressed. The LER is caused by a number of stochastically fluctuating effects involved in the fabrication process using electron-beam lithography. Since the LER does not scale with the feature size, it can significantly limit the mini...
Article
Full-text available
The relative critical dimension variation of nanoscale features has become large enough to significantly affect the minimum feature size and maximum circuit density realizable in most lithographic processes. One source of such variation is the line edge roughness (LER). In the electron-beam lithographic process, the fluctuation of exposure (energy...
Article
As the minimum feature size continues to decrease, the line edge roughness (LER) has become a critical issue to be addressed. The LER is caused by a number of stochastically fluctuating effects involved in the fabrication process using electron-beam lithography. Since the LER does not scale with the feature size, it can significantly limit the mini...

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