Vladyslav Matkivskyi

Norwegian University of Science and Technology | NTNU · Department of Materials Science and Engineering

This work is dedicated to developing a method of combined surface morphology- and crystallographic analysis for crystalline silicon. To demonstrate the applicability of the method, a series of chemical operations, such as polishing and texturing, were applied to multi-crystalline silicon samples. The samples were pre- and post-analysed with WLI and...

The current work aimed to demonstrate the application of a technique where white light interferometry (WLI) and Laue X-ray crystallography scanner character-isation were combined to study the chemical etching response of diamond cut multi-crystalline Si (mc-Si) wafers. Using this technique, the effect of different texturing additives (isopropyl alc...

This work is dedicated to the study of electronic-beam (e-beam) evaporated titanium oxide (TiOx) contact for polycrystalline silicon hetero-junction solar cells. A TiOx material obtained by e-beam evaporation method is suggested as a possible alternative to the atomic layer deposition (ALD) process. The purpose is to achieve corresponding passivati...

The paper consider oxygen contamination of HCPA ALD grown GaN films under an air conditioning and during different time duration. High resolution XPS analysis of HCPA ALD grown GaN films after diluted 1:10 HF(41 %) : H2O and undiluted HF (41 %) influence on oxygen impurities was investigated. Lesser oxygen impurities have been observed. Better resi...