Shrutidhara Sarma

• PhD
• Professor (Assistant) at Indian Institute of Technology Jodhpur

Hi, I am looking for a JRF/PhD for an Indo-German project. Check out the poster attached for details. Deadline extended to 31st January 2023. If you are motivated and sincere, send your CV with subject "TESSLA" to shrutidhara@iitj.ac.in

I am trying to calculate the electrical conductivity of PVDF-organic solvent system (e.g. PVDF in Acetone or PVDF in DMSO etc.) where different solvents (primary or binary solvents) are used for making solution. Is there any general empirical relation that can describe electrical conductivity of a polymer solution as a function of its concentration?

P.S.: I don't need specific experimental data. Models based on neural networks are also fine as long as it can draw a relation between the two (electrical conductivity and concentration).

I am trying to print thin films of conductive materials on different substrates for printed electronics purpose. As such Inkjet Printing is my first choice. Is there any other AM based technique which can do similar printing (less than 50 micrometer thickness)?

Is Fused Filament Deposition a reliable option in terms of resolution? How thin can the filament get after being fused?

What about Selective Laser Sintering (SLS)?

If anybody has any experience/idea please comment.

Any insight will be appreciated deeply.

I need to optimize an airfoil using dynamic characterization for which I need to calculate the pitching moments vs. time. I am very new to GH Bladed. Can anyone suggest me where would I find tutorials for plotting such time varying parameters? 

I need a Cu layer of approx. 25 micro meter thickness on a Si substrate. I have tried every possible way of galvanic deposition but in vain. Can anyone please tell me an effective way of growing nice quality thick Cu film on Si.

Please note I cannot use any conductive metal like Ag as an intermediate layer because I intend to grow Graphene on the Cu later and I need only Graphene and not composite.  

I need a Cu layer of approx. 25 micro meter on top of a Si substrate for Graphene growth. The substrate is also having a native layer of SiO2 on top of the Si.

When trying to electroplate I fixed the Si substrate on a Copper foil and covered it with black tape leaving only a small area of (substrate) Si exposed, where I need the deposition to happen.

My question is if I sputter a very thin layer of silver (Ag) on the Si substarate, would it affect the growth of Grpahene later on the Cu which will be deposited on Ag/SiO2/Si?

Because Si is not conducting, it is pretty hard to deposit Cu on Si directly.

The thickness of sputtered Cu layer (Cu/SiO2/Si) substrate is approx 200nm. The substrates are heated in a typical CVD chamber with Argon (100sccm) until 950 degree Celsius at a pressure of 10^(-3) mbar. When reached 950 degrees, acetylene is used as carbon source gas at flow rate of 20 sccm for 10 mins. But there is no Graphene when analyzed through Raman spectroscopy. What am I doing wrong?

Is the thickness of Cu film too less or is the temperature not appropriate or am I depositing for too much time?

Any help would be greatly appreciated.

P.S. I have also tried lowering the temperature to 900 and 850 degrees but that did not help.