s. Novia BerrielUniversity of Central Florida | UCF
s. Novia Berriel
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Introduction
Publications
Publications (20)
This publisher’s note reports the addition of an author in J. Opt. Soc. Am. B 41, B1 (2024)JOBPDE0740-322410.1364/JOSAB.503550.
Real-time detection of intermediate species and final products at the surface and near-surface in interfacial solid–gas reactions is critical for an accurate understanding of heterogeneous reaction mechanisms. In this article, an experimental method that can simultaneously monitor the ultrafast dynamics at the surface and above the surface in photo...
Atomic layer deposition (ALD) of ruthenium (Ru) is being investigated for next generation interconnects and conducting liners for copper metallization. However, integration of ALD Ru with diffusion barrier refractory metal nitrides, such as tantalum nitride (TaN), continues to be a challenge due to its slow nucleation rates. Here, we demonstrate th...
High harmonic generation (HHG) in solids has been identified as a promising mechanism for light source generation and for spectroscopy of materials. HHG from bulk solids, however, often suffers from nonlinear propagation effects, resulting in a loss of spectral coherence and the skewing of spectroscopic measurements. Here, we study HHG in epitaxial...
Electronic excitations in matter responds to the sub-cycle optical field variation rather than the pulse envelope, resulting in sub-cycle optical nonlinearity. Here, we employ single-shot waveform measurement to investigate sub-cycle nonlinearity in a ZnO film.
CeO2 nanostructures have been utilized for various biomedical, sensor, and catalysis applications owing to their unique defect structure, enabling them to have regenerative oxidative properties. Defect engineering in CeO2 nanostructures has major importance, enabling them to be utilized for specific applications. Despite various synthesis methods,...
The synthesis, characterization, and thermogravimetric analysis of tris(N,N'-di-isopropylacetamidinate)molybdenum(III), Mo(iPr-AMD)3, are reported. Mo(iPr-AMD)3 is a rare example of a homoleptic mononuclear complex of molybdenum(III) and fills a longstanding gap in the literature of transition metal(III) trisamidinate complexes. Thermogravimetric a...
We study high-order harmonic generation from epitaxial ZnO films grown on Al 2 O 3 substrate. We observe a saturation of the harmonic intensity for a film thickness of 30 nm.
We study the carrier-envelope phase (CEP) dependence of high-order harmonics generated in bulk ZnO crystals. The CEP dependence measured for laser polarization oriented parallel to and perpendicular to the c-axis exhibit different periodicities.
5-Aminosalicylic acid (5-ASA) is a first-line defense drug used to treat mild cases of inflammatory bowel disease. When administered orally, the active pharmaceutical ingredient is released throughout the gastrointestinal tract relieving chronic inflammation. However, delayed and targeted released systems for 5-ASA to achieve optimal dose volumes i...
Rigorous coupled wave analysis (RCWA) is conducted on in situ spectroscopic ellipsometry data to understand profile evolution during film deposition inside nanotrenches. Lithographically patterned SiO 2 nanotrenches are used as test structures. The nanotrenches are 170 nm wide at the top with a taper angle of 4.5° and are 300 nm in depth. Atomic la...
A machine learning approach is applied to estimate film thickness from in situ spectroscopic ellipsometry data. Using the atomic layer deposition of ZnO as a model process, the ellipsometry spectra obtained contains polarization data (Ψ, Δ) as a function of wavelength. Within this dataset, 95% is used for training the machine learning algorithm, an...
Over the recent years, there has been an extensive adoption of Machine Learning (ML) in a plethora of real-world applications, ranging from computer vision to data mining and drug discovery. In this paper, we utilize ML to facilitate efficient film fabrication, specifically Atomic Layer Deposition (ALD). In order to make advances in ALD process dev...
Process development in atomic layer deposition (ALD) is often time-consuming, requiring optimization of saturation curves and temperature windows for controlled deposition rates. Any ALD process should be self-limiting in nature, exhibiting a temperature window of nominal deposition and a linear deposition rate. Meeting these criteria usually requi...