Olivier Semprez

Olivier Semprez
Qualia LLC

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6
Publications
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38
Citations

Publications

Publications (6)
Article
Powerful extreme ultraviolet (EUV) sources at 13.5 nm are a prerequisite for the economical operation of lithography scanners for semi-conductor manufacturing. These sources have been under development for more than 10 years. At the beginning, many source concepts were considered. Compact technologies like dense plasma focus or capillary Z-pinch di...
Article
The picometer control for sub 70 nm geometries was discussed. Narrowing the width of the spectral line used for lithography is the key for enabling the design of high numerical aperture (NA) lenses. The detrimental effects of chromatic dependency of optical aberrations, particularly upon focus were minimized because these effects produce loss of co...
Article
In many respects, excimer lasers are almost ideal light sources for optical lithography applications. Their narrow bandwidth and high power provide two of the main characteristics required of a light source for high-resolution imaging. However, for deep-UV lithography projection tools with no chromatic aberration correction in the imaging lens, eve...
Article
To sustain optical lithography for the next five years, the industry must systematically address the technical challenges that will be encountered in developing and using the progression of excimer laser light sources needed, specifically KrF, ArF, and F 2 lasers. While the challenges are formidable, there are no fundamental limits to the physics b...
Article
The emergence of laser-based DUV lithography in the chip making environment, enabled by the ability to mass produce excimer lasers, confirmed the extendibility of optical lithography. The use of a KrF light source, at a wavelength of 248 nm, required a redesign of the entire exposure system. The pulsed nature of the light introduced new variables i...

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