Han Mingyue

Beihang University (BUAA) | BUAA · BUAA-Haidian School of Applied Technology

The investigation of plasma dynamics and optimization of target particle diffusion are particularly important and urgent in the recently emerging bipolar-pulse high-power impulse magnetron sputtering (BP-HiPIMS) discharge. In this paper, a novel approach, in which an external auxiliary anode was installed in front of the sputtering target, was prop...

As an emerging and extraordinary plasma source, the bipolar-pulse high power impulse magnetron sputtering (BP-HiPIMS) has promising prospects and wide industrial applications. In this paper, an effort to optimize the plasma flux and energy in BP-HiPIMS via auxiliary anode and solenoidal coil was made. This novel plasma source contains two types of...

Investigating the ion dynamics in the emerging bipolar pulse high power impulse magnetron sputtering (BP-HiPIMS) discharge is necessary and important for broadening its industrial applications. Recently, an optimized plasma source operating the BP-HiPIMS with an auxiliary anode and a solenoidal coil is proposed to enhance the plasma flux and energy...

As an emerging and extraordinary plasma source, bipolar pulsed high power impulse magnetron sputtering (BP-HiPIMS) discharge has been widely concerned by academia and industry due to the ability to control the deposited ion energy. In the present work, with the intension of increasing the high-energy ion fraction and flux during deposition, the BP-...

As an emerging ion acceleration plasma source, the bipolar-pulse high power impulse magnetron sputtering (BP-HiPIMS) discharge provides an effective approach to improve deposited ion energy and tailor the film properties for a large range of applications. The ion acceleration mechanism in BP-HiPIMS discharge is very vital but still unclear now. In...

High power impulse magnetron sputtering (HiPIMS) is a promising physical vapor deposition technique with one of the main drawbacks being its relatively low deposition rate. In this article, a method was propose by using a positive ions extraction pulse (Uextract) which would be immediately applied to the sputtering target after the HiPIMS negative...

The purpose of this paper is to explore the effect of geometric position on the film properties for a complex-shaped substrate in high-power impulse magnetron sputtering (HiPIMS) discharge. The substrate is a trapezoidal prism, whose base has four inner corners of 60°, 120°, 75°, and 105°. A negative bias is added to this trapezoidal prism during t...

In high power impulse magnetron sputtering (HiPIMS) discharge, generally, the current onset lags the applied pulse voltage by a significant time which can reach to several tens of microseconds, especially at a low gas pressure. The existence of this delay will affect the instantaneous and average power, and in turn, it determines the plasma dynamic...

In high power impulse magnetron sputtering (HiPIMS) discharge, the cathode sheath is a particularly vital section which determines the spatial distribution of electric field and the energy and transport of charged particles. In this work, a single Langmuir probe is employed to explore the effects of dynamic cathode sheath on electron transport at t...

High power impulse magnetron sputtering (HiPIMS) discharge has become a core technology in the field of physical vapor deposition (PVD) due to high ionization rate. In view of the complex physical field and the high peak power (~MW) in HiPIMS discharge, the uneven plasma seriously affects the performance of the thin films. From the temporal/spatial...

To enhance the cutting performance of TiAlSiN coated cemented carbide tools by inserting Ti interlayers and to explore their mechanism, TiAlSiN/Ti multilayer coatings with different Ti thicknesses, including 0 nm, 25 nm, 50 nm, 100 nm, and 150 nm, were deposited onto cemented carbide (WC-10 wt%, Co) substrates by high power impulse magnetron sputte...