Daniel Fan

University of Melbourne | MSD ·  Department of Electrical and Electronic Engineering

Individual cells and multicellular systems respond to cell-scale curvatures in their environments, guiding migration, orientation, and tissue formation. However, it remains largely unclear how cells collectively explore and pattern complex landscapes with curvature gradients across the Euclidean and non-Euclidean spectra. Here, we show that mathema...

Kinetic inductance detectors (KIDs) are superconducting energy-resolving detectors, sensitive to single photons from the near-infrared to ultraviolet. We study a hybrid KID design consisting of a β-phase tantalum (β-Ta) inductor and a Nb−Ti−N interdigitated capacitor. The devices show an average intrinsic quality factor Qi of 4.3×105±1.3×105. To in...

Kinetic Inductance Detectors (KIDs) are superconducting energy-resolving detectors, sensitive to single photons from the near-infrared to ultraviolet. We study a hybrid KID design consisting of a beta phase tantalum ($\beta$-Ta) inductor and a NbTiN interdigitated capacitor (IDC). The devices show an average intrinsic quality factor $Q_i$ of 4.3$\t...

Machine-matter, of which mechanical metamaterials and meta-devices are important sub-categories, is emerging as a major paradigm for designing advanced functional materials. Various exciting applications of these concepts have been recently demonstrated, ranging from exotic mechanical properties to device-like and adaptive functionalities. The vast...

High-NA light sheet illumination can improve the resolution of single-molecule localization microscopy (SMLM) by reducing the background fluorescence. These approaches currently require custom-made sample holders or additional specialized objectives, which makes the sample mounting or the optical system complex and therefore reduces the usability o...

Single-photon avalanche diode (SPAD) arrays can be used for single-molecule localization microscopy (SMLM) because of their high frame rate and lack of readout noise. SPAD arrays have a binary frame output, which means photon arrivals should be described as a binomial process rather than a Poissonian process. Consequentially, the theoretical minimu...

Optical microrobotics is an emerging field that has the potential to improve upon current optical tweezer studies through avenues such as limiting the exposure of biological molecules of interest to laser radiation and overcoming the current limitations of low forces and unwanted interactions between nearby optical traps. However, optical microrobo...

Detected kidney stone cases are increasing globally, yet knowledge on the conditions for stone formation is lacking. Experimental approaches mimicking the micro-environmental conditions present in vivo can help scientists untangle intertwined physiochemical and biological phenomena leading to kidney stone formation. As crystal nucleation often init...

Optical sectioning technologies achieve high precision localization by reducing the background photon count. We use tilted light-sheet microscopy to achieve optical sectioning in localization microscopy, enabling thick sample observation and low background photon count images. A deformable mirror was incorporated to generate a tetrapod point spread...

A bstract Individual cells and multicellular systems have been shown to respond to cell-scale curvatures in their environments, guiding migration, orientation, and tissue formation. However, it remains unclear how cells collectively explore and pattern complex landscapes with curvature gradients across the Euclidean and non-Euclidean spectra, partl...

Organ-on-chip (OoC) technology is increasingly used for biomedical research and to speed up the process of bringing a drug from lab to the market. The main fluidic components of an OoC device are microfluidic channels and porous membranes arranged in three dimensions. Current chips are often assembled from several parts. In the development phase a...

The realization of biomimetic microenvironments for cell biology applications such as organ-on-chip, in vitro drug screening, and tissue engineering is one of the most fascinating research areas in the field of bioengineering. The continuous evolution of additive manufacturing techniques provides the tools to engineer these architectures at differe...

Fabricating large areas of geometrically complex and precisely controlled topographies is required for the studies of cell behavior on patterned surfaces. Direct laser writing (DLW) is an advanced 3D-fabrication technique, which facilitates the manufacturing of structures within various scales (from a few hundred nanometers to millimeters). However...

High power SiC MOSFET technologies are critical for energy saving in, e.g., distribution of electrical power. They suffer, however, from low near-interface mobility, the origin of which has not yet been conclusively determined. Here, we present unique concerting evidence for the presence of interface defects in the form of carbon clusters at native...

We propose and demonstrate an all-dielectric metasurface-based roll-angle sensor, in which the roll angle is translated into the change of polarization state of the probe light. A circular polarization beam splitter is designed and fabricated to split the probe light into right-circularly polarized and left-circularly polarized light beams, whose i...

We report on the uniaxial strain and thermal conductivity of well-ordered, suspended silicon nanowire arrays between 10 to 20 nm width and 22 nm half-pitch, fabricated by extreme-ultraviolet (UV) interference lithography. Laser-power-dependent Raman spectroscopy showed that nanowires connected monolithically to the bulk had a consistent strain of ∼...

Extreme ultraviolet interference lithography (EUV-IL, λ = 13.5 nm) has been shown to be a powerful technique not only for academic, but also for industrial research and development of EUV materials due to its relative simplicity yet record high-resolution patterning capabilities. With EUV-IL, it is possible to pattern high-resolution periodic image...

Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric d...

Extreme ultraviolet interference lithography records the interference pattern of two diffracted, coherent light beams, where the pattern resolution is half the diffraction grating resolution. The fabrication of diffraction grating masks by e-beam lithography is restricted by the electron proximity effect and pattern transfer limitations into diffra...

EUV interference lithography records the interference pattern of two diffracted, coherent light beams, where the pattern resolution is half the diffraction grating resolution. The fabrication of diffraction grating masks by e-beam lithography is restricted by the electron proximity effect and pattern transfer limitations into diffraction efficient...

Achromatic Talbot lithography (ATL) at extreme ultraviolet (EUV) wavelengths has been used to produce one or two-dimensional periodic patterns over large areas. In this work, an ATL transmission mask was used to perform EUV exposures at 13.5 nm and 8.8 nm illumination wavelengths at two different synchrotron facilities, to study the broadband natur...

We demonstrate the fabrication of high-resolution (sub-100 nm) nanowires and nanodots using HSQ/PMMA bilayer resists for a negative-tone lift-off process. The high resolution patterning on HSQ layers was performed using EUV (extreme ultraviolet) interference lithography at the Swiss Light Source (SLS). The thicknesses of HSQ and of the sacrificial...

Patterning of ultra-dense, large-area lines down to 11 nm half-pitch using extreme ultraviolet (EUV) interference lithography with two types of inorganic photoresist is shown. The resist patterns are transferred using plasma etching into silicon (Si) for both types of resist. 14 nm half-pitch silicon nanowires with 1∶1 aspect ratio and square cross...

As extreme ultraviolet lithography (EUVL) prepares for its insertion into the high-volume manufacturing phase, many challenges still remain to be addressed. Among several issues, development of EUV resists with tight specifications of sensitivity (dose), resolution (HP) and line-edge roughness (LER) is required. Chemically-amplified resists (CARs)...

Manufacturing efficient and broadband optics is of high technological importance for various applications in all wavelength regimes. Particularly in the extreme ultraviolet and soft x-ray spectra, this becomes challenging due to the involved atomic absorption edges that rapidly change the optical constants in these ranges. Here we demonstrate a new...

The authors demonstrate a method for facile fabrication of transmission grating masks used in extreme ultraviolet interference lithography (EUV-IL) based on a footing strategy during electron beam writing of mask gratings. By modifying the electron beam lithography pattern and dose distribution, a thin footing is generated between the mask grating...

We report on the impact of the doping concentration design on the performance of silicon microwire arrays as photovoltaic devices. We have fabricated arrays with different p- and n-doping profiles and thicknesses, obtaining mean efficiencies as high as 9.7% under AM 1.5G solar illumination. The results reveal the importance of scaling the microwire...