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4
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6
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Citations since 2017
Introduction
Currently pursuing an academic career as a PhD candidate at the IDS group at the University of Twente. This research focuses on new methods and new materials to grow thin films by Atomic Layer Deposition (ALD).
Publications
Publications (4)
A novel atomic layer deposition (ALD) process was developed for low-resistivity molybdenum (Mo) from molybdenum dichloride dioxide (MoCl2O2) and atomic hydrogen (at-H). A wide ALD window of self-limiting growth was observed between 150 and 450 °C. No film deposition occurred with molecular hydrogen (H2), demonstrating the necessity to have at-H to...
We report on the fabrication and modification of a top-down nanofabrication platform for enormous parallel silicon nanowire-based devices. We explain the nanowire formation in detail, using an additive hybrid lithography step, optimising a reactive ion etching recipe for obtaining smooth and vertical nanowires under a hybrid mask, and embedding the...
This paper introduces a new self-aligned procedure for wafer-scale fabrication of curved metal-insulator-semiconductor (cMIS) tunneling junctions with nanometric lateral dimensions. The fabrication process is based on the use of an array of silicon nano-pillars embedded in a silicon nitride membrane. The junctions are formed at the apex of pyramida...
