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Ga⁺ implantation into the Fe5GT flake. (a) Microscopy image of a Fe5GT flake with the thickness ∼90 nm as indicated in (g). (b) Enlarged microscopy image of the region with various Ga exposure times. The milling area is labeled with different colors of squares (5 × 5 µm²). (h) Depth profile for areas with different exposure times in the region shown in (b). (c)–(f) Typical images of energy dispersive x-ray (EDX) spectroscopy mapping of 120 s Ga-implanted Fe5GT. (i) Atomic ratio of Ga implanted into the Fe5GT as a function of milling time.

Ga⁺ implantation into the Fe5GT flake. (a) Microscopy image of a Fe5GT flake with the thickness ∼90 nm as indicated in (g). (b) Enlarged microscopy image of the region with various Ga exposure times. The milling area is labeled with different colors of squares (5 × 5 µm²). (h) Depth profile for areas with different exposure times in the region shown in (b). (c)–(f) Typical images of energy dispersive x-ray (EDX) spectroscopy mapping of 120 s Ga-implanted Fe5GT. (i) Atomic ratio of Ga implanted into the Fe5GT as a function of milling time.

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The creation of van der Waals (vdW) ferromagnets with tunable Curie temperature (TC) and magnetic anisotropy is essential in developing vdW magnet-based devices. Here, we report an effective and reliable method for modulating the magnetic properties of vdW Fe5GeTe2 by site-specific Ga+ implantation. In this study, we report an easy axis in the ab-p...

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