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Breakdown of SEMI E10 standard (Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability.)  

Breakdown of SEMI E10 standard (Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability.)  

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Article
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Increasing productivity demands on leading-edge scanners require greatly improved light source availability. This translates directly to minimizing downtime and maximizing productive time, as defined in the SEMI E10 standard. Focused efforts to achieve these goals are ongoing and Cymer has demonstrated significant improvements on production light s...

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Context 1
... SEMI E10 standard, illustrated in Figure 1, defines downtime to include preventative maintenance and replacement of consumables, such as light source chambers and optics. The two blue downtime boxes denote the total time lost (downtime) due to module replacement, while the green standby box indicates non-productive manufacturing time that includes Halogen gas refills. ...

Citations

... Over many years of observing fielded light sources and understanding the critical aspects of gas control, Cymer has continually applied this learning to the development of new controllers. In the development of the iGLX concept, this led to three key concepts that built on Cymer's successful GLX™ Gas Management System [2] and are incorporated into the iGLX System: ...
... Figure 2 shows the iGLX Gas Management System illustrating these concepts. Key differences from the GLX System concept [2] are: ...
Article
At high-utilization lithography sites, laser light source gas replenishments and gas maintenance operations typically require between 9 and 16 hours per year, during which the light source is unavailable for production. Reducing this downtime is important for increasing the productivity of the lithography cell. Light sources also require intermittent gas maintenance that must be performed manually and therefore can be subject to variability in duration and repeatability. This paper will outline the targeted improvements in availability achieved by equipping the light source with Cymer's iGLXTM Gas Management System. The iGLX System extends the pulse-based interval between gas refills to 4 billion pulses for Cymer's XLA-series and XLR-series light sources, while maintaining existing performance. Additionally, the iGLX System automates some gas maintenance events that were previously manual, improving their speed and reducing variability. This paper will provide some performance data during extended light source operation on lithography cells equipped with the iGLX System. For high-utilization lithography cells, the iGLX System can reduce gas maintenance related downtime by up to 75%, increasing light source availability up to 12 hours per year. Total halogen gas usage can also be reduced by up to 16%, and manual gas maintenance events can be eliminated. The iGLX System has been installed on multiple high-volume scanner systems, which experienced these improvements immediately, and are continuing to operate nominally. As the iGLX System is deployed in volume, additional availability improvements can be realized by more readily synchronizing other lithography line maintenance events with gas replenishment events.
... Tighter LASER bandwidth control is definitely required to achieve the requirements of CD control of leading edge technology nodes beyond 45 nm. This paper describes the impact of a new LASER technology by Cymer, called Gas Lifetime eXtension (GLX) [4], [5] , on logic poly gate CD control in two high-volume products of a leading technology node. Brief explanations on GLX functions and basic working theory are discussed. ...
... No other process or equipment factors were changed to minimize experimental noises. The theory of GLX was reported by K. O'Brien [5] . Generally speaking, GLX stabilizes LASER bandwidth long term performance by several technology advancements, including cleaner discharge chambers (which generate fewer contaminants), improved component reliability, new signal processing techniques, and advanced gas control algorithms. ...
Article
Control of circuit CD in a photolithographic process has become increasingly important, particularly for those advanced nodes below 45nm because it influences device performances greatly. The variation of circuit CD depends on many factors, for example, CD uniformity on reticles, focus, lens aberrations, partial coherence, photoresist performance and LASER spectral bandwidth. In this paper, we focus on LASER spectral bandwidth effects to reduce circuit CD variation. High-volume products of a leading technology node are examined and a novel LASER control function: Gas Lifetime eXtenstion (GLX) is implemented to obtain stable LASER bandwidth. The LASER bandwidth variation was stabilized by changing laser F2 gas concentration through advanced control algorithm and signal process techniques. Product photo-pattern CD variation and device electrical performances will be examined to confirm the benefits of the LASER bandwidth stabilization.
Conference Paper
In response to significant neon supply constraints, Cymer has responded with a multi-part plan to support its customers. Cymer’s primary objective is to ensure that reliable system performance is maintained while minimizing gas consumption. Gas algorithms were optimized to ensure stable performance across all operating conditions. The Cymer neon support plan contains four elements: 1. Gas reduction program to reduce neon by >50% while maintaining existing performance levels and availability; 2. short-term containment solutions for immediate relief. 3. qualification of additional gas suppliers; and 4. long-term recycling/reclaim opportunity. The Cymer neon reduction program has shown excellent results as demonstrated through the comparison on standard gas use versus the new >50% reduced neon performance for ArF immersion light sources. Testing included stressful conditions such as repetition rate, duty cycle and energy target changes. No performance degradation has been observed over typical gas lives.