Electron Beam Lithography

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20 Tips for depositing very thin films of metals
By Jason Ross · University of Washington Seattle

Jason Ross · University of Washington Seattle

I'm using a 100 KV Joel JBX-6300FS

I'm using a 100 KV Joel JBX-6300FS

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1 Which resistance would be better for silver nanodot fabrication using EBL?
By Upkar Kumar · Cochin University of Science and Technology

Jens Bolten · AMO GmbH

The circularity of your nanodots will depend on a variety of parameters such as the diameter of the dots, the thickness of the Ag layer, the ebeam too... [more]

The circularity of your nanodots will depend on a variety of parameters such as the diameter of the dots, the thickness of the Ag layer, the ebeam tool and the PMMA development process used, and so on. As you mention a MMA/PMMA double layer resist stack I assume that you want to fabricate the nanodots via a lift-off process. For larger (d>200nm) and/or thicker (t>20nm) Ag dots a stack like this might be a good or even the only choice. For very small dots and a very thin Ag layer a single PMMA might be the better option, depending on your tool and process. If you both resist materials available I would simply give both options a try on a test sample and then chose the one showing the better results.

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5 Using electron-beam lithography with a set polymer thickness, what is the difference in dosage between a conducting layer being on top versus beneath?
By Jed Ziegler · Vanderbilt University

Jed Ziegler · Vanderbilt University

Thank you all for your comments and answers and sorry if it seemed a bit vague. I wasn't looking to simulate or get precise values, just a general rul... [more]

Thank you all for your comments and answers and sorry if it seemed a bit vague. I wasn't looking to simulate or get precise values, just a general rule of thumb as I consider switching substrates. PMMA is actually the resist I am using. Thanks again.

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3 Proximity Effect Correction
By Ravi Kumar Chintalapudi · University of Hyderabad

Frederick Chen · Industrial Technology Research Institute

PEC is only needed when you have features of different densities to be targeted at a common size. Many e-beam writers (like MEBES and Nuflare) also ha... [more]

PEC is only needed when you have features of different densities to be targeted at a common size. Many e-beam writers (like MEBES and Nuflare) also have the PEC built-in. But you have to assess the scale of the PEC. For lower energy (<10 keV), you only need to worry about smaller length scales (um and less). For larger energies, like >10 keV, you have to worry about backscattering and fogging from many microns even millimeters, as well as the shorter-range. So these have to be modeled as separate gaussian functions, to be convolved with your pattern..

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Open Could the sharp shape of electron beam welding be explained with beam self-focusing?
In the root part of the electron beam, power density must be lowered by vapor in the keyhole. Observations are opposite, however. There we can see a d... [more]

In the root part of the electron beam, power density must be lowered by vapor in the keyhole. Observations are opposite, however. There we can see a decrease of weld cross-section and of heat-affected zone width. So, could the sharp shape of electron beam welding be explained with beam self-focusing?

By Georgi Mladenov · Bulgarian Academy of Sciences

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7 Does anyone know an alternative source for ZEP resist?
By Jens Bolten · AMO GmbH

Jens Bolten · AMO GmbH

Dear Gianluca, thanks for your suggestion regarding HSQ. If you browse through my publication list you might notice that we work with HSQ quite a lot ... [more]

Dear Gianluca, thanks for your suggestion regarding HSQ. If you browse through my publication list you might notice that we work with HSQ quite a lot and for quite a while, this is more or less our “working horse” resist material. Whenever possible we tend to use HSQ. Nonetheless for some applications we need to use a positive tone resist like PMMA or ZEP.

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Question:
Open What is the best resist for making 300nm wide 2um deep geometry in InP by EBL and RIE? (An EBL resist, which has physical strength to withstand dry etching)
What is the best resist or procedure for making 300nm wide 2um deep geometry in InP by EBL and RIE? (An EBL resist, which has physical strength to wit... [more]

What is the best resist or procedure for making 300nm wide 2um deep geometry in InP by EBL and RIE? (An EBL resist, which has physical strength to withstand dry etching)

By Viswas Nair · Indian Institute of Technology Kanpur

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4 Have you observed a time(or depth)-dependent solubility rate during development of nano-dimensional structures?
By Georgi Mladenov · Bulgarian Academy of Sciences

Georgi Mladenov · Bulgarian Academy of Sciences

I wish to add that generally, at minituarization of lithographic images the problem with optimization of edges of developed profiles increases. At sub... [more]

I wish to add that generally, at minituarization of lithographic images the problem with optimization of edges of developed profiles increases. At submicron and in nano-dimensional profiles to fabricate near to wertical developed resist profile-edges become absolutely needed. This can be achieved by optimization of lithography results based on experimental investigations or computer simulations. As Jens appointed the knowledge of time-dependent developing rate can be important for 3D-litography, and absolutely needed at fabrication of nano-dimensional structures by electron lithography!!!

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2 Does anyone have some EBL samples to spear for research?
By Slobodan Mitic · Max-Planck-Institut für extraterrestrische Physik

Slobodan Mitic · Max-Planck-Institut für extraterrestrische Physik

It would be great if we can make collaboration. If you are interested i can give you more details about the research. Many thanks

It would be great if we can make collaboration. If you are interested i can give you more details about the research. Many thanks

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3 How many of you are using Nabilty?
By Tejabhiram Yadavalli · SRM University

Bulat Gaifullin · Lomonosov Moscow State University

Is there anyone who can compare Nabity and Nanomaker (www.nanomaker.com)?

Is there anyone who can compare Nabity and Nanomaker (www.nanomaker.com)?

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About Electron Beam Lithography

Electron beam lithography (e-beam lithography) is the practice of emitting a beam of electrons in a patterned fashion across a surface covered with a film (the resist), "exposing" the resist and of selectively removing either exposed or non-exposed regions of the resist ("developing").

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Electron Beam Lithography

About Electron Beam Lithography

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