L. Dobrescu

University of Bucharest, Bucharest, Bucuresti, Romania

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Publications (26)0 Total impact

  • Conference Proceeding: Modeling the behaviour of the sub-micron MOS transistors in mixed-signal integrated circuits
    D. Dobrescu, N. Vizireanu, L. Dobrescu
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    ABSTRACT: Recent mixed-signal circuits designed in deep sub-micron technologies uses 5-7 interconnection layers. The distributed capacitance between these layers, the increased resistance of the current path, due to the high W/L ratio, and the inductances of the terminals act as complex loads for the MOS transistors operated at small signal. This paper studies the behaviour of the sub-micron MOS transistors with mixed (resistive/inductive) loads and points out several methods for improving the circuit parameters. The aspect of the distributed resistance and capacitance of the interconnection lines between the circuit and the load is also discussed. The wire sizing problem, which for a great part of the circuit designers is based on the DC value, is analysed from a new point of view: signal propagation.
    Semiconductor Conference, 2005. CAS 2005 Proceedings. 2005 International; 11/2005
  • Conference Proceeding: A MEMS dedicated to the bio-components detection, inspired from the SON architecture
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    ABSTRACT: The Silicon On Insulator technology has reached a new stage through the nanodevices way: Silicon On Nothing, where "Nothing" means a vacuum cavity underneath an ultrathin Si film. A mobile and thin semiconductor membrane results, by enlarging the cavity. In the empty space can be handled a bioliquid using a diffuser/nozzle micropump. The mobile Si membrane is bending by the substrate biasing and plays a double role: as actuator and detector. This paper presents a MEMS, based on a new work principle than traditional ISFETs, which detects the ionic analytes from a bioliquid and has its own actuator for the microfluidic handle.
    Semiconductor Conference, 2005. CAS 2005 Proceedings. 2005 International; 11/2005
  • Conference Proceeding: MOS functional device with increased transconductance
    L. Dobrescu, A. Rusu
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    ABSTRACT: In sub-micron technologies, reducing the electronic devices dimensions under 100nm creates strong advantages, such as increased density of the devices and higher working frequency. Scaling down the structures has some drawbacks. The most important one, concerning the signal amplifiers, is the very small transconductance value when operating the MOS transistor at subthreshold conditions[1]. Increasing the width of the device is not a suitable solution for a higher transconductance because it implies large silicon areas and lower frequency. In this paper a new MOS functional device is presented. This device is SPICE simulated and it has a I<sub>D</sub> ∼ V<sub>GS</sub><sup>3</sup> dependence replacing the classical quadratic I<sub>D</sub> ∼ V<sub>GS</sub><sup>2</sup> solution of the MOS transistor in saturation regime. This new device also introduces a new point of view for the "super- slope" MOS devices concept.
    Semiconductor Conference, 2005. CAS 2005 Proceedings. 2005 International; 11/2005
  • Conference Proceeding: Alternative methods of parameters extraction based on the Pseudo-MOS technique
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    ABSTRACT: The pseudo-MOS transistor is a dedicated device for in situ electrical characterization of the SOI wafers. In this paper were extracted some parameters for a 200nm Si-film manufactured in SIMOX technique. In this scope, experimental Curves I<sub>D</sub>-V<sub>G</sub>, I<sub>D</sub>-V<sub>D</sub> in inversion and accumulation were used, This work presents an alternative method for the threshold and fiat-band voltages extraction, using the Non-linear Electrical Conduction Theorem.
    Microelectronics, 2004. 24th International Conference on; 06/2004
  • Conference Proceeding: A new job for the pseudo-MOS transistor: working in the pressure sensors field
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    ABSTRACT: Recently, pressure sensors that combine SOI structures with the properties of piezoelectric layers have been developed. With a SOI-MOSFET used as a transducer element, the sensor can detect pressures just over a threshold value, corresponding to the inversion onset. In this paper, a pseudo-MOS/SOI transistor is the transducer that enhances the work regime: accumulation or inversion for a SOI-MOSFET like regime and depletion for a J-FET like regime. A PZT layer is used for sensing the pressure. New analytical models for the sensor sensitivity in various regimes are presented. ATLAS simulations, based on the concept of "equivalent gate voltage", verify how does the sensor works and provide the current through the transducer. A strongly non-linear characteristic of the sensor results.
    Electronics, Circuits and Systems, 2002. 9th International Conference on; 02/2002
  • Conference Proceeding: Exacts solutions of the Poisson's equations in pseudo-MOS/SOI transistors
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    ABSTRACT: The pseudo-MOS/SOI transistor can be a test device or an inherent part of an SOI device controlled by the back gate. Previous models relied on the depletion approximation to compute the potential and electric field distributions. The advantage is computational simplicity; but it can only be applied just for the depletion regime. The exact solutions of the Poisson equations describe the electric field and potential in the pseudo-MOS transistors for all working regimes. The analytical models are compared with ATLAS simulations.
    Semiconductor Conference, 2002. CAS 2002 Proceedings. International; 02/2002
  • Conference Proceeding: MOS channel length modulation in weak inversion
    M. Brezeanu, A. Rusu, L. Dobrescu
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    ABSTRACT: This paper is concerned with the investigation of MOSFETs in weak inversion. A new model is proposed for the transistor operating in the saturation zone. In order to validate the model, measurements on several transistors were carried out, which proved good agreement with the experimental model.
    Semiconductor Conference, 2002. CAS 2002 Proceedings. International; 02/2002
  • Conference Proceeding: Mechanical influences on the electrical characteristics of the mobile gate MOS capacitors
    L. Dobrescu, D. Dobrescu, A. Rusu, C. Ravariu
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    ABSTRACT: This paper presents the model for an electromechanical variable capacitor designed as an MOS capacitor with a beam. It studies the influences of the beam on the electrical characteristics of the capacitor.
    Microelectronics, 2002. MIEL 2002. 23rd International Conference on; 02/2002
  • Conference Proceeding: On the limit between subthreshold and strong inversion regions inthe EKV model using the nonlinear electrical conduction theorem
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    ABSTRACT: This paper presents a new approach to investigate the limit between the subthreshold and strong inversion regions in the EKV model based on the Nonlinear Electrical Conduction Theorem that involves calculations of the drain-current derivatives. The main advantage is the simultaneous extraction of the threshold voltage, V<sub>T</sub> and of the limit current, I<sub>s</sub>, between subthreshold and strong inversion regions. The proposed method is validated on ultra short channel MOSFET's
    Semiconductor Conference, 2001. CAS 2001 Proceedings. International; 11/2001
  • Conference Proceeding: A designing roule for a pressure sensor with PZT layer
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    ABSTRACT: In the pressure sensors domain, the SOI structures bring some advantages: electrical insulation, high temperature sensors, an excellent etch stop layer (buried oxide), compatibility with microelectronic technology, lowering in thermal noise. The goal of this paper is to highlight a pressure sensor based on a coupling between piezoelectric effect in PZT and an Ψ-MOSFET. The analytical models, that will be presented, stand for a useful tool at a first iteration of the sensor designing
    Semiconductor Conference, 2001. CAS 2001 Proceedings. International; 11/2001
  • Conference Proceeding: Image force effect on forward characteristic of a rectifiermetal-semiconductor contact
    D. Dobrescu, A. Rusu, F. Udrea, L. Dobrescu
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    ABSTRACT: The image force effect is appreciated, especially, for the reverse regime of the rectifier metal-semiconductor contact, causing a weak dependence of the saturation current on the applied voltage. Applying this concept to the forward bias, at high values of currents, the ideality factor has an important increase. Combining this effect with the effect of the series resistance, which is important in the same range of currents, an important depreciation of the rectifier properties is observed
    Semiconductor Conference, 2001. CAS 2001 Proceedings. International; 11/2001
  • Conference Proceeding: The suspended-gate MOSFET (SG-MOSFET): a modeling outlook for the design of RF MEMS switches and tunable capacitors
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    ABSTRACT: This paper reports on the modeling and key design aspects of an innovative MEMS device: the suspended-gate MOSFET (SG-MOSFET). Based on the coupled-electromechanical equations describing the suspended gate actuation, we present the investigation of the pull-in voltages and of the capacitance switching and tuning ranges for RF applications. A quasi-analytical model is developed for the gate-to-substrate capacitance of the SG-MOSFET and then, validated by numerical simulation. A SPICE macromodel using a polynomial voltage-controlled source is validated for the DC simulation of the SG-MOSFET. Guide lines for the low-voltage design of an SG-MOSFET RF switch are detailed
    Semiconductor Conference, 2001. CAS 2001 Proceedings. International; 02/2001
  • Conference Proceeding: A SPICE modeling of the negative resistance breakdown region for the bipolar junction transistor
    D. Dobrescu, L. Dobrescu, A. Rusu
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    ABSTRACT: This paper presents and studies new developed SPICE models for the breakdown region of the junction transistor biased in the common-emitter configuration. In such case, the output electrical characteristic has a negative slope, especially for very small or negative base currents
    Microelectronics, 2000. Proceedings. 2000 22nd International Conference on; 02/2000
  • Conference Proceeding: An analytical model for static characteristics of a Pseudo-MOStransistor with neutral channel
    L. Dobrescu
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    ABSTRACT: The Pseudo-MOS transistor can be obtained on all SOI structure, without any lithographic technique. The aim of this paper is to give an accurate model for the volume current of an ψ-MOSFET, when a non-uniform neutral channel between source and drain exists. A possible application is that in the domain of the microsensors in SOI technology, that implies the conduction through neutral channel. The PISCES simulations and analytical models are 2-dimensional. Some experiments on pseudo-MOS transistor manufactured in SIMOX technique are achieved to validate the analytical model
    Semiconductor Conference, 2000. CAS 2000 Proceedings. International; 02/2000
  • Conference Proceeding: Threshold voltage extraction methods for MOS transistors
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    ABSTRACT: The threshold voltage of the MOS transistor is a very important parameter used in all circuit simulation programs. The aim of this paper is to compare several largely applied threshold voltage extraction methods used both for long channel and short channel MOSFETs. This methods use either the linear operation region or the saturation operation region of the transistors. The new derivative extraction method proposed in this paper doesn't depend on the operation region for long channel devices and gives comparable results for short channel devices. It is a very simple and accurate extraction method. The experimental data used in the paper were measured using a HP4155B system. The mathematical calculation and the threshold voltage extraction are performed using MATHCAD designed programs
    Semiconductor Conference, 2000. CAS 2000 Proceedings. International; 02/2000
  • Conference Proceeding: The threshold voltage model of a SOI-MOSFET on films with Gaussian profile
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    ABSTRACT: The analytical models for electric field and potential distributions are useful for a lot of SOI devices, like SOI-MOSFET, SOI-BJT, three-dimensional device, SOI sensors and the others. For example, they are necessary for establish the inversion or accumulation conditions for front and back interfaces. The paper refers to a one-dimensional analysis, both for partially and fully depleted devices on films with nonuniform doping. The goal of this paper is to obtain an accurate model for the field and the potential distribution in the SOI structures with Gaussian doping concentration of impurities in the film. The results have been used for threshold voltage deduction, but they represent a reference point in developing of new models for SOI-devices fabricated on Gaussian profile films. In the fully depleted films case, the depletion of the silicon substrate for gate voltages that entirely depleted the film was considered. The results were compared with PISCES numerical simulations and were in good agreement
    Devices, Circuits and Systems, 2000. Proceedings of the 2000 Third IEEE International Caracas Conference on; 02/2000
  • Conference Proceeding: 8 bit presetable digital to analog converter design
    D. Dobrescu, V. Bucar, L. Dobrescu
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    ABSTRACT: This paper presents an 8 bit digital to analog converter with logic presetable steps implemented in a 0.8 micron BiCMOS technology. The circuit design emphasis its simplicity and compactness. The designed circuit parameters, together with the description and the layout of the converter and the current source as well as some component blocks are presented in this paper
    Semiconductor Conference, 1999. CAS '99 Proceedings. 1999 International; 02/1999
  • Conference Proceeding: The influence of buried insulator type and film thickness on threshold voltage of a partially and fully depleted SOI-MOSFET
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    ABSTRACT: Nowadays SOI technologies represent a milestone in the fabrication of devices and integrated systems on thin films. The analytical models for the threshold voltage are useful for many SOI devices. Our analysis has focused on partially and fully depleted films, achieved on insulators like oxide, nitride or oxinitride. This paper gives a simple and accurate estimation of the threshold voltage. The results were in a good agreement both with PISCES numerical simulations and with experimental data
    Semiconductor Conference, 1999. CAS '99 Proceedings. 1999 International; 02/1999
  • Conference Proceeding: Double barrier resonant tunneling diodes in frequency multiplier applications performances study
    D. Neculoiu, D. Dobrescu, L. Dobrescu
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    ABSTRACT: This paper presents a computer aided study of the performances that can be obtained by using the Double Barrier Tunneling (DBRT) diodes in frequency multiplier applications. The Harmonic-Balance method is used to analyse the circuits. It is shown that the conversion efficiency and also the output power versus input power have a hysteresis type behaviour. The multiplication efficiency which results from the simulations is compared to the theoretic and previously reported ones. It is shown that the negative differential resistance region does not lead to conversion losses diminishing
    Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International; 11/1998
  • Conference Proceeding: New parabolic-law model for Zener diodes
    A. Rusu, D. Dobrescu, C. Anghel, L. Dobrescu
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    ABSTRACT: The paper takes into account the experimental dependence of the differential resistance of the Zener diodes on the current. Considering logarithmic coordinates, the dependence has a linear form with a slope less than unity, that invalidates the exponential model-the most encountered model in Spice. As consequence a new model for the regulation region of the Zener diode is derived. The new model is described by a parabolic-law equation
    Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International; 11/1998

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Institutions

  • 1998–2005
    • University of Bucharest
      Bucharest, Bucuresti, Romania