Yu. A. Mankelevich

Publications (4)4.67 Total impact

• Article: Charging of submicron structures during silicon dioxide etching in one- and two-frequency gas discharges

  A. P. Palov, Yu. A. Mankelevich, T. V. Rakhimova, D. Shamiryan
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  ABSTRACT: A model that combines the Monte Carlo method for calculating electron and ion trajectories in three-dimensional geometry and A model that combines the Monte Carlo method for calculating electron and ion trajectories in three-dimensional geometry and an analytic approach developed for calculating an electric field in two-dimensional geometry is used to simulate the charging an analytic approach developed for calculating an electric field in two-dimensional geometry is used to simulate the charging of the surface of periodic submicron SiO2 structures by electron and ion fluxes in the plasma of a one- and a two-frequency capacitive RF discharge. The energy distribution of the surface of periodic submicron SiO2 structures by electron and ion fluxes in the plasma of a one- and a two-frequency capacitive RF discharge. The energy distribution function of the electrons and ions that come to the bottom of a submicron structure in an argon and an argon-containing plasma function of the electrons and ions that come to the bottom of a submicron structure in an argon and an argon-containing plasma is calculated for structures with a width of 11–45 nm and an aspect ratio of d/w = 1–10 (where d and w are the depth and width of the structure). It is shown that secondary electronelectron emission plays an important role in is calculated for structures with a width of 11–45 nm and an aspect ratio of d/w = 1–10 (where d and w are the depth and width of the structure). It is shown that secondary electronelectron emission plays an important role in the redistribution of the electric charge and, accordingly, of the electric potential in a submicron structure. It is demonstrated the redistribution of the electric charge and, accordingly, of the electric potential in a submicron structure. It is demonstrated that, when the secondary electron-electron emission mechanism is taken into account, the ion energy spectrum at the bottom that, when the secondary electron-electron emission mechanism is taken into account, the ion energy spectrum at the bottom of a submicron structure is shifted toward lower energies and becomes broader in comparison with the spectrum of an ion flux of a submicron structure is shifted toward lower energies and becomes broader in comparison with the spectrum of an ion flux from an RF discharge plasma. Moreover, the shift and broadening depend only on the secondary electron-electron emission coefficient, from an RF discharge plasma. Moreover, the shift and broadening depend only on the secondary electron-electron emission coefficient, the energy of the charged particles, and the aspect ratio. the energy of the charged particles, and the aspect ratio.
  Plasma Physics Reports 04/2010; 36(10):891-901. · 0.65 Impact Factor
• Article: Charging and the secondary electron–electron emission on a trench surface: broadening and shift of ion energy spectrum at plasma trench etching

  A P Palov, Yu A Mankelevich, T V Rakhimova, D Shamiryan
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  ABSTRACT: Trench surface charging at the plasma etching of dielectrics and semiconductors is a negative phenomenon because it leads to non-uniform etching of the trench bottom, undesirable etching of its wall, etch stop and breakdown of lower level device elements. To investigate the charging of a SiO2 trench surface by argon radio frequency discharge plasma we applied the 3D Monte Carlo method for modelling the electron and ion trajectories inside a trench and used the 2D analytical method to calculate electric fields and potentials produced by the deposited charges. The secondary electron–electron emission was taken into account as a really important mechanism of electrical charge redistribution on the trench surface. The ion energy spectra were calculated for the trench aspect ratios (depth d/width w) of 1–20 and trench widths of 11, 22 and 45 nm for 180 eV ion flux. The transformation of an initial ion energy spectrum from a delta function at 180 eV into bell-shaped curves with peak shifts of 10–60 eV and broadening of 5–30 eV is obtained.
  Journal of Physics D Applied Physics 02/2010; 43(7):075203. · 2.54 Impact Factor
• Article: Mathematical Modeling of the Plasma-Chemical Pyrolysis of Methane

  D. I. Slovetskii, Yu. A. Mankelevich, S. D. Slovetskii, T. V. Rakhimova
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  ABSTRACT: A mathematical model was developed for the plasma-chemical pyrolysis of methane, which includes the latest data on the mechanism and kinetics of chemical processes of hydrocarbon pyrolysis and mixing of methane jets with hydrogen heated in an arc plasma torch. The results of calculations on methane conversion and the synthesis of acetylene and its homologues satisfactorily agree with experimental data over a wide range of parameters of the process. It was shown that the methane conversion is initiated via interaction with atomic hydrogen, acetylene is produced through the dissociation of intermediate products involving radicals, and the consumption of acetylene is due to the synthesis of its homologues involving vinylidenecarbene and methylenecarbene in the ground and excited states.
  High Energy Chemistry 12/2001; 36(1):44-52. · 0.81 Impact Factor
• Article: Current dynamics and mechanisms for the instability of a non-self-sustained glow discharge in nitrogen

  Yu. A. Mankelevich, A. F. Pal’, N. A. Popov, T. V. Rakhimova, A. V. Filippov
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  ABSTRACT: The current dynamics in a non-self-sustained glow discharge in atmospheric-pressure nitrogen (with a small admixture of oxygen) at cryogenic and room temperatures is studied experimentally and theoretically. For the first time, the theoretical model incorporates the processes of the decomposition of O 2 + ·N2 and NO+·N2 complex ions in collisions with vibrationally excited nitrogen molecules and the associative ionization reactions with the participation of excited nitrogen and oxygen atoms. The computation results agree quite satisfactorily with the experimental data on the current dynamics and the duration of the stable phase of a non-self-sustained discharge for various applied voltages. Even a small (0.01%) oxygen admixture is found to greatly affect the dynamics of the ion composition and the characteristic duration of the stable phase of a non-self-sustained discharge in atmospheric-pressure nitrogen.
  Plasma Physics Reports 10/2001; 27(11):979-989. · 0.65 Impact Factor