Publications (2)0.81 Total impact
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Article: Atomic layer deposition of titanium dioxide thin films from tetraethoxytitanium and water
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ABSTRACT: The structure and chemical composition of the titanium dioxide thin films formed by atomiclayer deposition (ALD) from tetraethoxytitanium and water precursors were studied by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, grazing incidence X-ray diffraction, Fourier transform infrared spectroscopy, and atomic force microscopy. The deposited films were demonstrated to have good stoichiometry and anatase type polycrystalline structure. The growth per cycle of titanium dioxide was calculated by an ALD model taking into account the sizes and number of ligands in reactant molecules.Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques 04/2012; 4(3):379-383. · 0.34 Impact Factor -
Article: Atomic layer deposition of the titanium dioxide thin film from tetraethoxytitanium and water
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ABSTRACT: Using the methods of Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, X-ray diffraction in the geometry of the grazing beam, and Fourier transform infrared spectroscopy, we studied the chemical composition and structure of thin films of titanium dioxide formed by atomic layer deposition from tetraethoxytitanium and water. It is shown that the films obtained are characterized by a high stoichiometry of composition and by amorphous or polycrystalline structure of the anatase modification, depending on the number of reaction cycles. Using a model of the process of atomic layer deposition that takes into account the size and number of ligands of the reacting molecules, we calculated the amount of titanium dioxide deposited in a single reaction cycle.Russian Journal of General Chemistry 04/2012; 80(6):1091-1096. · 0.47 Impact Factor
