Feng-Xiang Wang

Publications (3)0.96 Total impact

• Article: Property analysis of planar optical waveguide in NYAB formed by He + ion implantation

  Ming-Qi Meng, Fei Lu, Ke-Ming Wang, Feng-Xiang Wang, Wei Li, Chang-Qin Ma, De-Hua Jiang, Qing-Ming Lu
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  ABSTRACT: The authors report the first ion implanted planar optical waveguide in the nonlinear and multifunctional crystal Nd_xY _1-xAl₃(BO₃)₄ (NYAB). The refractive index profiles are characterised for both n_n and n _e. The index changes show that a typical barrier waveguide is formed in the implanted NYAB crystal and comparisons of the refractive index profiles before and after annealing are given. The damage in the crystal surface that was caused by the implantation of MeV He ions was investigated by using an RBS/channelling technique and there was some decrease in the damage of the surface of the crystal after annealing. The loss of the waveguide was measured before and after annealing
  Electronics Letters 07/1997; · 0.96 Impact Factor
• Article: Refractive index profiles of ion implanted waveguides in thulium sodium yttrium tungstate

  Feng Chen, Hui Hu, Ke-Ming Wang, Fei Lu, Bo-Rong Shi, Feng-Xiang Wang, Zhen-Xiang Cheng, Huan-Chu Chen, Ding-Yu Shen
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  ABSTRACT: Planar waveguides were first formed in thulium sodium yttrium tungstate (Tm:NaY(WO4)2) crystals by the implantation of MeV He, P and Ni ions with certain doses at room temperature, respectively. The refractive index profiles of the three ion implanted waveguides were found different to some extent. The present data show that He+ ion implanted waveguides in Tm:NaY(WO4)2 should be the typical barrier type one, while a combination of radiation damage and radiation enhanced diffusion may be responsible for the refractive index profiles of the MeV Ni+ and P+ ion implanted waveguides in Tm:NaY(WO4)2.
  Optics Communications.
• Article: Optical waveguide formation by MeV H+ implanted into LiNbO3 crystal

  Hui Hu, Fei Lu, Feng Chen, Feng-Xiang Wang, Jian-Hua Zhang, Xiang-Dong Liu, Ke-Ming Wang, Bo-Rong Shi
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  ABSTRACT: A MeV H+ ion-implanted waveguide was formed on an LiNbO3 substrate. The dose of implanted H+ ions was 2×1016 ions/cm2 with an energy of 1.0 MeV at room temperature. The dark modes were measured using the prism coupling technique. The refractive index profile was analyzed using the reflectivity calculation method. The fiber probe technique was used to measure the attenuation of the waveguide. The lattice damage in the guide region caused by H+ ion implantation was investigated using the RBS/channeling technique.
  Optics Communications.