[Show abstract][Hide abstract] ABSTRACT: Waveguide structures were fabricated in both nanocrystalline CVD diamond (NCD) and HPHT type 1b single crystal diamond using photolithography and reactive ion etching. The combination of these techniques allows the patterning of many long photonic structures simultaneously, making it easily scalable. Emphasis has been placed on reducing sidewall roughness to prevent loss due to scattering. In single crystal diamond a peak-to-peak roughness of approximately 10 nm (estimated from SEM images) was achieved for the majority of the structure sidewall.
Diamond and Related Materials 11/2008; · 1.57 Impact Factor
[Show abstract][Hide abstract] ABSTRACT: Diamond photonic devices present a range of opportunities due to their unique properties. This paper presents progress in the fabrication of diamond waveguides using reactive ion etching (RIE), as a step towards all-diamond optics.
Optical Internet, 2007 and the 2007 32nd Australian Conference on Optical Fibre Technology. COIN-ACOFT 2007. Joint International Conference on; 07/2007
[Show abstract][Hide abstract] ABSTRACT: Diamond has a range of extraordinary properties and the recent ability to produce high quality synthetic diamond has paved the way for the fabrication of practical diamond devices. This paper details the recent progress in the fabrication of waveguide structures in diamond which are desirable as the basis for quantum key distribution (QKD), quantum computing and high-power, high speed microwave chips. The diamond ridge waveguide structures are produced by photolithography and reactive ion etching (RIE) with some additional processing with a focused ion beam (FIB). The processes currently used are discussed along with experimental results. Future fabrication goals and potential methods for achieving these goals are also presented.