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Journal of Modern Optics 07/2003; 50(11):1637-1647. · 1.17 Impact Factor
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ABSTRACT: A new spatial filtering technique is proposed for improving image contrast and depth of focus in projection photolithography. The technique is based on fractional Fourier domain filtering. Unlike the current pupil filtering method, the fractional filter can be placed at any location along the projection optical path other than the pupil plane. The theory of partial coherent diffraction combined with fractional Fourier domain filtering is presented. Phase filters for contact hole and line-space patterns have been designed. Computer simulation of complete imaging process including fractional Fourier domain filtering have been carried out. The simulation has demonstrated that the new filtering technique can significantly improve image fidelity, reduce the optical proximity effect and increase the depth of focus. Because of the flexibility in filter location, it is predicted to be easier to implement in a practical optical lithography system.
Microelectronic Engineering · 1.56 Impact Factor
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ABSTRACT: Spheric lens designed by nonlinear phase fitting method is proposed to duplicate the performance of logarithmic axicon, which can obtain a beam with long-focal-depth, small focal spot and side lobe. Moreover, the spheric lens is easier and less expensive for manufacture than logarithmic or aspherical elements. Based on this method, a simple lens is designed for the plasma diagnostic system in inertial confinement fusion. It is verified through Fresnel diffraction integral and an initial experiment that the performance of the lens can satisfy the requirements of the plasma measurements.
Optics Communications.
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ABSTRACT: A new method has been developed to design gray-tone masks for microlens fabrication. Unlike previous methods which modulate the light intensity by changing the cell size or cell pitch only, the method relays on adjusting both the shape and position of a cell which gives an extra freedom to control the design accuracy. Based on the theory of partial coherent light and the resist development model, the intensity distribution through the gray-tone mask and exposure of photoresist have been simulated. Nonlinear effects in aerial image and resist development have been take into account to correct the mask design. A grey tone mask for microlens array has been fabricated and printed by a g-line stepper. Hemispherical photoresist structures have been achieved.
Microelectronic Engineering.
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ABSTRACT: A new method to fabricate hybrid micro-optical elements in one-step lithography is proposed in this paper. A gray-tone coding method has been developed to achieve one step photolithography of achromatic hybrid micro-optical elements. Design and simulation of hybrid lens with grey-tone mask are presented. The aberrations of optical elements are pre-corrected in the lithography process. The operating range of the hybrid optical element is in infrared band (8.0∼12.0 μm) with the central wavelength at 10.6 μm.
Microelectronic Engineering.
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ABSTRACT: A novel method is proposed to fabricate refractive micro lens array using dichromate gelatin (DCG) and an enzyme. DCG has optical properties similar to glass but is sensitive to UV light. The enzyme solution is used to develop the optically exposed DCG instead of a conventional water–isopropanol developer, which greatly enhances the surface relief depth. The continuous surface relief structure is realized by a coded grey-tone mask. A computer program has been developed to code an arbitrary 3D surface relief shape into a grey-tone mask design. The DCG properties and the lithography process are described. The grey-tone coding principle is presented. Unlike the current processes where patterned photoresist relief structure has to be transferred to a substrate material, the fabricated DCG micro lens array can be directly used as an optical element. The new process opens a new route of micro lens fabrication, which is simple and low cost.
Microelectronic Engineering.
