[show abstract][hide abstract] ABSTRACT: Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications.
[show abstract][hide abstract] ABSTRACT: In this work we demostrate a table top nanopatterning tool based on the illumination with compact Soft X-Ray (SXR) laser.
Two approaches consisting of interferometric lithography (IL) and de-magnifying imaging using diffractive optics were used.
Surface patterning was realized on commercial photoresists covering surfaces up to ≈ 50 × 50 μ m2 with exposures f few seconds.
Using interferometric lithography features down to ≈ 60 nm were obtained.