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J. Hayakawa,
S. Ikeda,
K. Miura,
M. Yamanouchi,
Young Min Lee,
R. Sasaki,
M. Ichimura,
K. Ito,
T. Kawahara,
R. Takemura, T. Meguro,
F. Matsukura,
H. Takahashi,
H. Matsuoka,
H. Ohno
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ABSTRACT: We investigated the effect of using a synthetic ferrimagnetic (SyF) free layer in MgO-based magnetic tunnel junctions (MTJs) on current-induced magnetization switching (CIMS), particularly for application to spin-transfer torque random access memory (SPRAM). The employed SyF free layer had a Co<sub>40</sub>Fe<sub>40</sub>B<sub>20</sub>/Ru/Co<sub>40</sub>Fe<sub>40</sub>B<sub>20</sub>and Co<sub>20</sub>Fe<sub>60</sub>B<sub>20</sub>/Ru/Co<sub>20</sub>Fe<sub>60</sub>B<sub>20</sub>structures, and the MTJs (100 times (150-300) nm<sup>2</sup>) were annealed at 300 <sup>deg</sup>C. The use of SyF free layer resulted in low intrinsic critical current density ( J <sub>c0</sub>) without degrading the thermal-stability factor ( E / k <sub>B</sub> T , where E , k <sub>B</sub>, and T are the energy potential, the Boltzmann constant, and temperature, respectively). When the two CoFeB layers of a strongly antiferromagnetically coupled SyF free layer had the same thickness, J <sub>c0</sub> was reduced to 2-4 times10<sup>6</sup> A/cm<sup>2</sup>. This low J <sub>c0</sub> may be due to the decreased effective volume under the large spin accumulation at the CoFeB/Ru. The E / k <sub>B</sub> T was over 60, resulting in a retention time of over ten years and suppression of the write current dispersion for SPRAM. The use of the SyF free layer also resulted in a bistable (parallel/antiparallel) magnetization configuration at zero field, enabling the realization of CIMS without the need to apply external fields to compensate for the offset field.
IEEE Transactions on Magnetics 08/2008; · 1.36 Impact Factor
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T. Kawahara,
R. Takemura,
K. Miura,
J. Hayakawa,
S. Ikeda,
Young Min Lee,
R. Sasaki,
Y. Goto,
K. Ito, T. Meguro,
F. Matsukura,
H. Takahashi,
H. Matsuoka,
H. Ohno
[show abstract]
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ABSTRACT: A 1.8 V 2 Mb SPin-transfer torque RAM (SPRAM) chip using a 0.2 mum logic process with an MgO tunneling barrier cell demonstrates the circuit technologies for potential low-power nonvolatile RAM, or universal memory. This chip features an array scheme with bit-by-bit bi-directional current writing to achieve proper spin-transfer torque writing of 100 ns, and parallelizing-direction current reading with a low-voltage bit-line for preventing read disturbances that lead to 40 ns access time.
IEEE Journal of Solid-State Circuits 02/2008; · 3.23 Impact Factor
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ABSTRACT: The current-driven magnetization switching in CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) with various free layer materials including synthetic structure was studied in this paper. The MTJ films were deposited on SiO<sub>2</sub>/Si substrates using RF magnetron sputtering. The tunnel magnetoresistance (TMR) ratios and current-voltage (I-V) characteristics of the the MTJs were measured at room temperature using a dc four-probe method and with a magnetic field of up to 1 kOe. The TMR ratio and the current-driven magnetization switching at critical current densities were shown as a function of annealing temperature for two types of MTJs with different free layer.
Magnetics Conference, 2006. INTERMAG 2006. IEEE International; 06/2006
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R. Takemura,
T. Kawahara,
K. Miura,
J. Hayakawa,
S. Ikeda,
Y.M. Lee,
R. Sasaki,
Y. Goto,
K. Ito, T. Meguro,
F. Matsukura,
H. Takahashi,
H. Matsuoka,
H. Ohno
[show abstract]
[hide abstract]
ABSTRACT: A 1.8 V 2-Mb SPRAM (SPin-transfer torque RAM) chip using 0.2-mum logic process with MgO tunneling barrier cell demonstrates the circuit technologies for potential low power non-volatile RAM, or universal memory. This chip features: an array scheme with bit-by-bit bi-directional current write to achieve proper spin-transfer torque writing of 100-ns, and parallelizing-direction current reading with low voltage bit-line that leads to 40-ns access time.
Integrated Circuit Design and Technology, 2007. ICICDT '07. IEEE International Conference on;