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ABSTRACT: To shorten the silicon debugging time of VLSI chips with design
rules of 0.5 μ or less, an E-beam prober becomes an indispensable
tool. However, the accuracy of E-beam positioning has to be greatly
improved to the 0.1 μ level so the best waveform can be acquired. To
achieve such high precision, we use image processing techniques to do
pattern matching between the CAD layout database and the SEM image. We
will discuss the methods to filter and segment the SEM image, the
methods to do the registration between the CAD layout database and the
SEM image, and the method for final beam positioning on the SEM image.
We will also reveal some test results
Test Conference, 1993. Proceedings., International; 11/1993
