Publications (3)8.4 Total impact
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Article: Effect of voltage and capacitance in nanosecond pulse discharge enhanced laser-induced breakdown spectroscopy.
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ABSTRACT: The laser ablation fast pulse discharge plasma spectroscopy (LA-FPDPS) technique has demonstrated its validity to enhance the optical emission of laser-induced plasma. It has the potential to improve the performance of traditional LIBS measurement. Very recently, LA-FPDPS with a nanosecond pulse discharge circuit has been developed, which has a better capability to enhance the optical emission intensity of laser plasma compared with that using a microsecond pulse discharge circuit. In this paper, the effect of the discharge capacitance and discharge voltage on the optical emission of soil plasma generated by LA-FPDPS with a nanosecond pulse discharge circuit is evaluated in detail. In addition, the stability of the time delay between the laser firing and discharge, and between the discharge and optical emission, has been carefully investigated.Applied Optics 03/2012; 51(7):B42-8. · 1.41 Impact Factor -
Article: Development of a nanosecond discharge-enhanced laser plasma spectroscopy.
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ABSTRACT: A nanosecond pulse discharge circuit is developed and used to enhance the optical emission of laser plasma. An intense discharge spark was observed with a peak discharge current of 1.9 kA and a peak power of 6.5 MW. The main electric energy deposition only lasted for ∼40 ns. An intense optical emission was observed. The line intensity of plasma emission was greatly increased along with an improved signal-to-noise ratio, in comparison with that using a microsecond pulse discharge circuit. From the measured spectra, electron temperature and electron number density were estimated. The mechanism of the optical emission enhancement was briefly discussed.Optics Letters 08/2011; 36(15):2961-3. · 3.40 Impact Factor -
Article: Optical emission enhancement using laser ablation combined with fast pulse discharge.
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ABSTRACT: In this paper, a high voltage and fast pulse discharge circuit is developed and combined with laser ablation to enhance optical emission from Si crystal. The new characters of the discharge circuit and its effect on the plasma emission are presented. Characterizing by a damping and periodical oscillating discharge voltage and current with a short period of approximately 0.5 micros, the discharge automatically occurs approximately 1 micros after laser ablation. Significant optical emission enhancement, up to 52 times improved signal intensity relative to the signal in the absence of the discharge spark, is observed. Better line stability in terms of relative standard deviation and improved signal to noise (S/N) ratio are also achieved. The enhanced line intensity with better stability and S/N ratio, similar with the observation when using double-pulse laser induced breakdown spectroscopy (DP-LIBS), probably will benefit element analysis in the future.Optics Express 02/2010; 18(3):2573-8. · 3.59 Impact Factor
Top Journals
- Optics Express (1)
- Applied Optics (1)
- Optics Letters (1)
Institutions
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2010–2012
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Zhejiang Normal University
Jinhua, Zhejiang Sheng, China
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