K. J. Hennessy

Publications (2)0 Total impact

• Conference Proceeding: Highly sensitive assessment of dry etch damage by measuring microdisk resonator Q

  K.H. Lee, C.F. Wang, Y.S. Choi, K.J. Hennessy, E.L. Hu, J. He, P.M. Petroff
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  ABSTRACT: We discuss a novel optical assessment of dry etch damage, with high degree of sensitivity, by measuring the microdisk resonator Q. Effects of etch gas composition, bias power and sample preparation (resist reflow) were examined
  Lasers and Electro-Optics Society, 2006. LEOS 2006. 19th Annual Meeting of the IEEE; 11/2006
• Article: Highly sensitive assessment of dry etch damage by measuring microdisk resonator Q

  K H Lee, C. F. Wang, Y S Choi, K. J. Hennessy, E.L. Hu, J. He, P. M. Petroff
  [show abstract] [hide abstract]
  ABSTRACT: We discuss a novel optical assessment of dry etch damage, with high degree of sensitivity, by measuring the microdisk resonator Q. Effects of etch gas composition, bias power and sample preparation (resist reflow) were examined.