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ABSTRACT: In this work, the nucleation and growth of InAs nanowires on patterned SiO(2)/Si(111) substrates is studied. It is found that the nanowire yield is strongly dependent on the size of the etched holes in the SiO(2), where openings smaller than 180 nm lead to a substantial decrease in nucleation yield, while openings larger than ≈500nm promote nucleation of crystallites rather than nanowires. We propose that this is a result of indium particle formation prior to nanowire growth, where the size of the indium particles, under constant growth parameters, is strongly influenced by the size of the openings in the SiO(2) film. Nanowires overgrowing the etched holes, eventually leading to a merging of neighboring nanowires, shed light into the growth mechanism.
Journal of Crystal Growth 11/2011; 334(1):51-56. · 1.73 Impact Factor
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ABSTRACT: Crystal phase control in single III-V semiconductor nanowires has emerged recently as an important challenge and possible complement to conventional bandgap engineering in single material systems. Here we investigate a supply interruption method for precise crystal phase control in single nanowires. The nanowires are grown by metalorganic vapor phase epitaxy using gold particles as seeds and are analyzed by transmission electron microscopy. It is observed that wurtzite segments with controlled length and position can be inserted on demand into a pure InAs zincblende nanowire. The interface between wurtzite and zincblende segments can be made atomically sharp and the segments can be made only a few bilayers in thickness. The growth mechanisms, applicability and limitations of the technique are presented and discussed.
Nanotechnology 07/2011; 22(26):265606. · 3.98 Impact Factor
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Nina Hrauda,
Jianjun Zhang,
Eugen Wintersberger,
Tanja Etzelstorfer, Bernhard Mandl,
Julian Stangl,
Dina Carbone,
Vaclav Holý,
Vladimir Jovanović,
Cleber Biasotto,
Lis K Nanver,
Jürgen Moers,
Detlev Grützmacher,
Günther Bauer
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ABSTRACT: For advanced electronic, optoelectronic, or mechanical nanoscale devices a detailed understanding of their structural properties and in particular the strain state within their active region is of utmost importance. We demonstrate that X-ray nanodiffraction represents an excellent tool to investigate the internal structure of such devices in a nondestructive way by using a focused synchotron X-ray beam with a diameter of 400 nm. We show results on the strain fields in and around a single SiGe island, which serves as stressor for the Si-channel in a fully functioning Si-metal-oxide semiconductor field-effect transistor.
Nano Letters 05/2011; 11(7):2875-80. · 13.20 Impact Factor
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Dominik Kriegner,
Christian Panse, Bernhard Mandl,
Kimberly A Dick,
Mario Keplinger,
Johan M Persson,
Philippe Caroff,
Daniele Ercolani,
Lucia Sorba,
Friedhelm Bechstedt,
Julian Stangl,
Günther Bauer
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ABSTRACT: The atomic distances in hexagonal polytypes of III-V compound semiconductors differ from the values expected from simply a change of the stacking sequence of (111) lattice planes. While these changes were difficult to quantify so far, we accurately determine the lattice parameters of zinc blende, wurtzite, and 4H polytypes for InAs and InSb nanowires, using X-ray diffraction and transmission electron microscopy. The results are compared to density functional theory calculations. Experiment and theory show that the occurrence of hexagonal bilayers tends to stretch the distances of atomic layers parallel to the c axis and to reduce the in-plane distances compared to those in zinc blende. The change of the lattice parameters scales linearly with the hexagonality of the polytype, defined as the fraction of bilayers with hexagonal character within one unit cell.
Nano Letters 03/2011; 11(4):1483-9. · 13.20 Impact Factor
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ABSTRACT: In this work we demonstrate experimentally the dependence of InSb crystal structure on the ratio of Sb to In atoms at the growth front. Epitaxial InSb wires are grown by a self-seeded particle assisted growth technique on several different III-V substrates. Detailed investigations of growth parameters and post-growth energy dispersive x-ray spectroscopy indicate that the seed particles initially consist of In and incorporate up to 20 at.% Sb during growth. By applying this technique we demonstrate the formation of zinc-blende, 4H and wurtzite structure in the InSb wires (identified by transmission electron microscopy and synchrotron x-ray diffraction), and correlate this sequential change in crystal structure to the increasing Sb/In ratio at the particle-wire interface. The low ionicity of InSb and the large diameter of the wire structures studied in this work are entirely outside the parameters for which polytype formation is predicted by current models of particle seeded wire growth, suggesting that the V/III ratio at the interface determines crystal structure in a manner well beyond current understanding. These results therefore provide important insight into the relationship between the particle composition and the crystal structure, and demonstrate the potential to selectively tune the crystal structure in other III-V compound materials as well.
Nanotechnology 02/2011; 22(14):145603. · 3.98 Impact Factor
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ABSTRACT: We show that the principally two-dimensional (2D) scanning tunneling microscope (STM) can be used for imaging of 1D micrometer high free-standing nanowires. We can then determine nanowire megahertz resonance frequencies, image their top-view 2D resonance shapes, and investigate axial stress on the nanoscale. Importantly, we demonstrate the extreme sensitivity of electron tunneling even at very high frequencies by measuring resonances at hundreds of megahertz with a precision far below the angstrom scale.
Nano Letters 10/2010; 10(10):3893-8. · 13.20 Impact Factor
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ABSTRACT: Group III-V nanowires offer the exciting possibility of epitaxial growth on a wide variety of substrates, most importantly silicon. To ensure compatibility with Si technology, catalyst-free growth schemes are of particular relevance, to avoid impurities from the catalysts. While this type of growth is well-documented and some aspects are described, no detailed understanding of the nucleation and the growth mechanism has been developed. By combining a series of growth experiments using metal-organic vapor phase epitaxy, as well as detailed in situ surface imaging and spectroscopy, we gain deeper insight into nucleation and growth of self-seeded III-V nanowires. By this mechanism most work available in literature concerning this field can be described.
Nano Letters 10/2010; 10(11):4443-9. · 13.20 Impact Factor
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ABSTRACT: The fabrication of core-shell structures is crucial for many nanowire device concepts. For the proper tailoring of their electronic properties, control of structural parameters such as shape, size, diameter of core and shell, their chemical composition, and information on their strain fields is mandatory. Using synchrotron X-ray diffraction studies and finite element simulations, we determined the chemical composition, dimensions, and strain distribution for series of InAs/InAsP core-shell wires grown on Si(111) with systematically varied growth parameters. In particular we detect initiation of plastic relaxation of these structures with increasing shell thickness and/or increasing phosphorus content. We establish a phase diagram, defining the region of parameters leading to pseudomorphic nanowire growth. This is important to avoid extended defects which are detrimental for their electronic properties.
Nano Letters 04/2009; 9(5):1877-82. · 13.20 Impact Factor
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ABSTRACT: We present x-ray diffraction based methods to quantitatively determine the wurtzite content of nanowire ensembles and to investigate the effect of twinning. An increased lattice constant in growth direction is found for all investigated InAs and InP nanowire samples. This increase is independent of the wurtzite content. Using x-ray pole figures we find that twinning is present in GaAs/Si branched nanowires, which leads to 60° rotations of the lattice.
MRS Proceedings. 12/2008; 1206.
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ABSTRACT: III-V nanowires have been fabricated by metal-organic vapor-phase epitaxy without using Au or other metal particles as a catalyst. Instead, prior to growth, a thin SiOx layer is deposited on the substrates. Wires form on various III-V substrates as well as on Si. They are nontapered in thickness and exhibit a hexagonal cross-section. From high-resolution X-ray diffraction, the epitaxial relation between wires and substrates is demonstrated and their crystal structure is determined.
Nano Letters 09/2006; 6(8):1817-21. · 13.20 Impact Factor
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ABSTRACT: We report the temperature dependence of the Au-assisted growth of InAs nanowires in MOVPE. Extensive studies of the growth of such nanowires have attributed growth to the so-called vapor-liquid-solid (VLS) mechanism, with a liquid Au-In alloy particle. We assert here that growth is instead assisted by a solid particle and does not occur at all when the particle is a liquid. Thus the temperature range of InAs nanowire growth is limited by the melting of the Au-In alloy. Comparison with growth of InAs nanowires in the same system assisted by a layer of SiO(x) is used to support this conclusion.
Nano Letters 05/2005; 5(4):761-4. · 13.20 Impact Factor
