Publications (3)16.7 Total impact
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Article: Mass Sensors: Small 2/2009.
Small 02/2009; 5(2). · 8.35 Impact Factor -
Article: Nanomechanical mass sensor for spatially resolved ultrasensitive monitoring of deposition rates in stencil lithography.
Small 01/2009; 5(2):176-80. · 8.35 Impact Factor -
Conference Proceeding: Nanomechanical mass sensor for monitoring deposition rates through confined apertures.
4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2009, Shenzhen, China, January 5-8, 2009; 01/2009
Top Journals
- Small (2)
Institutions
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2009
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Barcelona Microelectronics Institute
Barcelona, Catalonia, Spain
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